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    • 83. 发明授权
    • Process for aryl-quinone and aryl-naphthoquinone diazide sulfonic acids
    • 芳基 - 醌和芳基 - 萘醌二叠氮磺酸的方法
    • US4931549A
    • 1990-06-05
    • US29843
    • 1987-03-24
    • Paul Berner
    • Paul Berner
    • C07C309/23C07C67/00C07C301/00C07C303/22C07C309/26C07C309/53G03F7/008G03F7/022
    • C07C303/22
    • A process for the preparation of aryl-diazide-sulfonic acids by a series of sequential in-situ process steps. The process comprises the nitrosation of a hydroxyarylsulfonic acid; conversion of the nitroso-derivative to a sulfamate which is then diazotized to the diazide. Temperature and pH are maintained in predetermined ranges to maintain the reaction products in solution without the formation side-products or the need to isolate intermediates.The process of the invention is particularly useful in the preparation of light-sensitive materials such as naphthoquinonediazide sulfonic acids which are used in the preparation of photoresist compositions. The invention provides a high purity product at a high material efficiency, high equipment utilization, low effluent discharge, and reduced cost.
    • 通过一系列顺序原位工艺步骤制备芳基二叠氮磺酸的方法。 该方法包括羟基芳基磺酸的亚硝化; 将亚硝基衍生物转化成氨基磺酸盐,然后将其重氮化成二叠氮化物。 将温度和pH保持在预定范围内,以将反应产物保持在溶液中而不会形成副产物或需要分离中间体。 本发明的方法特别可用于制备用于制备光致抗蚀剂组合物的光敏材料如萘醌二叠氮化物磺酸。 本发明提供高纯度的产品,材料效率高,设备利用率高,污水排出量低,成本降低。