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    • 83. 发明授权
    • Extended protection for embedded erase of non-volatile memory cells
    • 扩展保护非易失性存储单元的嵌入式擦除
    • US09343172B2
    • 2016-05-17
    • US13965731
    • 2013-08-13
    • Fuchen MuChen HeYanzhuo Wang
    • Fuchen MuChen HeYanzhuo Wang
    • G11C11/34G11C16/34G11C16/14
    • G11C16/3459G11C16/14G11C16/345
    • Methods and systems are disclosed for extended erase protection for non-volatile memory (NVM) cells during embedded erase operations for NVM systems. The embodiments described herein utilize an additional threshold voltage (Vt) check after soft programming operation within an embedded erase operation completes to provide extended erase protection of NVM cells. In particular, the threshold voltages for NVM cells are compared against a threshold voltage (Vt) check voltage (VCHK) level and an additional embedded erase cycle is performed if any NVM cells are found to exceed the threshold voltage (Vt) check voltage (VCHK) level. The threshold voltage (Vt) check voltage (VCHK) level can be, for example, a voltage level that is slightly higher than an erase verify voltage (VEV) level and lower than read voltage level (VR).
    • 公开了用于NVM系统的嵌入式擦除操作期间用于非易失性存储器(NVM)单元的扩展擦除保护的方法和系统。 本文描述的实施例在嵌入式擦除操作中的软编程操作完成之后利用额外的阈值电压(Vt)检查,以提供NVM单元的扩展擦除保护。 特别地,NVM单元的阈值电压与阈值电压(Vt)检查电压(VCHK)电平进行比较,并且如果发现任何NVM单元超过阈值电压(Vt)检查电压(VCHK),执行附加的嵌入式擦除周期 )级别。 阈值电压(Vt)检查电压(VCHK)电平可以是例如略高于擦除验证电压(VEV)电平且低于读取电压电平(VR)的电压电平。
    • 84. 发明授权
    • Nonvolatile semiconductor memory device
    • 非易失性半导体存储器件
    • US09070474B2
    • 2015-06-30
    • US14019731
    • 2013-09-06
    • KABUSHIKI KAISHA TOSHIBA
    • Tatsuo Izumi
    • G11C11/34G11C16/06G11C16/34G11C16/16
    • G11C16/344G11C16/16G11C16/3445G11C16/345
    • An erase verify operation is executed divided into at least a first erase verify operation and a second erase verify operation. The first erase verify operation is an operation that applies a verify read voltage only to a first group of memory cells among the plurality of memory cells included in the NAND cell unit, and applies a first read pass voltage to memory cells other than the first group of memory cells. The second erase verify operation is an operation that applies the verify read voltage to a second group of memory cells different from the first group of memory cells, and applies a second read pass voltage different from the first read pass voltage to memory cells other than the second group of memory cells.
    • 执行擦除验证操作被划分为至少第一擦除验证操作和第二擦除验证操作。 第一擦除验证操作是将验证读取电压仅施加到包括在NAND单元单元中的多个存储单元中的第一组存储单元的操作,并将第一读取通过电压施加到除了第一组之外的存储单元 的记忆细胞。 第二擦除验证操作是将验证读取电压施加到与第一组存储器单元不同的第二组存储器单元的操作,并将不同于第一读取通过电压的第二读取通过电压施加到除 第二组记忆细胞。
    • 90. 发明申请
    • Nonvolatile semiconductor memory device
    • 非易失性半导体存储器件
    • US20070140015A1
    • 2007-06-21
    • US11639807
    • 2006-12-16
    • Shoichi Kawamura
    • Shoichi Kawamura
    • G11C11/34
    • G11C16/344G11C16/3409G11C16/3445G11C16/345
    • A nonvolatile semiconductor memory device. The nonvolatile semiconductor memory device includes a memory cell formed in a first well outputs a first voltage in response to a reference voltage necessary for program and erase verify operations. A reference cell formed in a second well generates a second voltage in response to the reference voltage in the program and erase verify operations. A comparator circuit compares the first voltage to the second voltage to detect whether the verify operation for the memory cell has passed, in the verify operation. A bias applying unit applies the same bias voltage to the first and second wells in the verify operation: Although there is an over-erased cell, an erase verify, operation can be correctly performed.
    • 非易失性半导体存储器件。 非易失性半导体存储器件包括形成在第一阱中的存储单元响应于编程和擦除验证操作所需的参考电压而输出第一电压。 形成在第二阱中的参考单元响应于程序中的参考电压和擦除验证操作而产生第二电压。 在验证操作中,比较器电路将第一电压与第二电压进行比较,以检测存储单元的验证操作是否已经过去。 偏置施加单元在验证操作中向第一和第二阱施加相同的偏置电压:尽管存在过擦除的单元,但可以正确地执行擦除验证操作。