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81. 发明申请

WO1995009358A1 INSPECTION SYSTEM WITH IN-LENS, OFF-AXIS ILLUMINATOR 审中-公开
标题翻译：具有内透镜，离轴照明器的检查系统
公开(公告)号：WO1995009358A1
公开(公告)日：1995-04-06
申请号：PCT/US1994011160
申请日：1994-09-30
申请人： OPTICAL SPECIALTIES, INC.
发明人： OPTICAL SPECIALTIES, INC. , LIN, Lawrence, H. , SCHEFF, Victor, A.
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G02B27/46
摘要： An inspection system (2) employs a beam of monochromatic light (12) that travels through a Fourier transform lens (16) before striking a specimen wafer (4) at an angle ( theta ) with respect to the normal (26) of the specimen wafer (4) to produce diffracted light (28b and 28c) that has a broad spatial frequency spectrum which can be selectively filtered to produce a dark field image pattern of the various sized defects in an inspection area (22) of the wafer. The nearly collimated beam of monochromatic light strikes the wafer at an angle ( theta ) with respect to the normal of the wafer of between zero degrees and a predetermined maximum angle. For the inspection system disclosed, the predetermined maximum angle is the angle formed when the beam of monochromatic light is as far away from the optic axis as possible yet still within the numerical aperture of the Fourier transform lens (16). Moreover, if a specific range of defect sizes is anticipated, the system can be optimized by setting the angle ( theta ) at which the collimated beam of monochromatic light strikes the wafer to the angle ( theta ) which allows the system to collect those spatial frequencies which are best representative of the anticipated range of defects sizes.
摘要翻译：检查系统（2）使用穿过傅里叶变换透镜（16）的单色光束（12），在相对于样本的法线（26）以一定角度（θ）撞击样本晶片（4）之前，晶片（4）以产生具有宽空间频谱的衍射光（28b和28c），其可被选择性地过滤以在晶片的检查区域（22）中产生各种尺寸的缺陷的暗视场图像图案。几乎准直的单色光束以相对于晶片法线的角度（θ）以零度和预定的最大角度撞击晶片。对于所公开的检查系统，预定的最大角度是当单色光束尽可能远离光轴仍然在傅里叶变换透镜（16）的数值孔径内时形成的角度。此外，如果预期具有特定范围的缺陷尺寸，则可以通过将准直的单色光束到晶片的角度（θ）设置为允许系统收集这些空间频率的角度（theta）来优化系统这是最有代表性的预期范围的缺陷尺寸。

82. 发明申请

WO1989011645A1 DEFECT INSPECTION APPARATUS 审中-公开
标题翻译：缺陷检查装置
公开(公告)号：WO1989011645A1
公开(公告)日：1989-11-30
申请号：PCT/JP1989000514
申请日：1989-05-23
申请人： KABUSHIKI KAISHA CSK , SUGIMURA, Koichi , KIMURA, Fumio , IZAWA, Shigeru
发明人： KABUSHIKI KAISHA CSK
IPC分类号： G01N21/88
CPC分类号： G01N21/95623
摘要： This invention relates to a defect inspection apparatus which can detect easily and accurately any defects of a recording medium and eliminates the necessity for electric image processing or image processing by software otherwise required to eliminate regular patterns. This image inspection apparatus includes imaging optical system such as a microscope for enlarging an optical recording area of an optical recording medium having regular pattern and an image processing unit for converting the enlarged image by the imaging optical system to an image signal and detecting the defect of the optical recording area from the image signal. A spatial filter for removing a spatial frequency component of the regular pattern is disposed in the imaging optical system.
摘要翻译：本发明涉及一种能够容易且准确地检测记录介质的任何缺陷的缺陷检查装置，并且消除了通过软件进行电子图像处理或图像处理的必要性，否则需要消除规则图案。该图像检查装置包括诸如显微镜的成像光学系统，用于放大具有规则图案的光学记录介质的光学记录区域和用于将成像光学系统的放大图像转换为图像信号的图像处理单元，并且检测缺陷来自图像信号的光学记录区域。用于去除规则图案的空间频率分量的空间滤波器设置在成像光学系统中。

83. 发明公开

EP3081901A1 INSPECTION METHOD AND DEVICE FOR INSPECTING A SURFACE PATTERN 无效
标题翻译：意大利语VORRICHTUNG ZUR INSPEKTION EINEROBERFLÄCHENSTRUKTUR
公开(公告)号：EP3081901A1
公开(公告)日：2016-10-19
申请号：EP15164145.3
申请日：2015-04-17
申请人： Hennecke Systems GmbH
发明人： Windeln, Wilbert
IPC分类号： G01B11/30 , G01M11/00 , G01R31/26 , G01R31/28 , G01N21/896 , G01N21/95 , G01N21/956 , G01N21/958 , H01L33/00
CPC分类号： G01B11/02 , G01B2210/56 , G01N21/896 , G01N21/9501 , G01N21/956 , G01N21/95623 , G01N21/958 , G01R31/2635 , G01R31/2831
摘要： The invention relates to an inspection method for inspecting a surface pattern (4) formed on a front side of a substrate (3), preferably of a sapphire wafer, the method comprising the steps of:
(a) irradiating , with first light (1), preferably having different wavelengths, a first area of the surface pattern (4) from the front side of the substrate (3);
(b) measuring at least one characteristic of said first light (1) after having interacted with the surface pattern (4), preferably by diffraction;
(c) irradiating , with second light (2), preferably having different wavelengths, a second area of the surface pattern (4) through the back side of the substrate (3), wherein the first area and the second area at least partially, preferably completely, overlap with each other;
(d) measuring at least one characteristic of said second light (2) after having interacted with the surface pattern (4), preferably by diffraction;
(e) calculating a quantity (T) containing information about at least one geometric property of the surface pattern (4) of the substrate (3), wherein the quantity (T) is a function of both, the characteristic of the first light (1) measured in step (b) and the characteristic of the second light (2) measured in step (d).
摘要翻译：本发明涉及一种用于检查形成在基板（3）的前侧上的表面图案（4）的检查方法，优选为蓝宝石晶片，该方法包括以下步骤：（a）用第一光（1 ），优选具有不同的波长，所述表面图案（4）的从所述基板（3）的前侧的第一区域; （b）优选通过衍射测量与所述表面图案（4）相互作用之后所述第一光（1）的至少一个特性; （c）通过衬底（3）的背面与第二光（2）辐射优选具有不同波长的表面图案（4）的第二区域，其中第一区域和第二区域至少部分地，优选地完全相互重叠; （d）优选通过衍射测量在与表面图案（4）相互作用之后测量所述第二光（2）的至少一个特性; （e）计算包含关于所述基板（3）的所述表面图案（4）的至少一个几何特性的信息的量（T），其中所述数量（T）是所述第一光的特性 1）和步骤（d）中测量的第二光（2）的特性。

84. 发明公开

EP2850385A4 SUBSTRATE INSPECTION 审中-公开
标题翻译：基板回顾
公开(公告)号：EP2850385A4
公开(公告)日：2015-12-30
申请号：EP13790078
申请日：2013-05-15
申请人： KLA TENCOR CORP
发明人： RAMACHANDRAN MAHENDRA PRABHU , MEEKS STEVEN W , SAPPEY ROMAIN
IPC分类号： G01B11/25 , G01N21/47 , G01N21/95 , G01N21/956 , G01N21/958
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/8422 , G01N21/956 , G01N21/95623 , G01N21/958

85. 发明授权

EP1682879B1 UTILISATION DE LA TRANSFORMEE DE FOURIER OPTIQUE POUR LE CONTROLE DIMENSIONNEL EN MICROELECTRONIQUE 有权
标题翻译：使用合格的光学Fourier变换随着微电子尺寸公差
公开(公告)号：EP1682879B1
公开(公告)日：2015-10-14
申请号：EP04816136.8
申请日：2004-09-17
申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives
发明人： PETIT, Jérôme , CHATON, Patrick , GRAND, Gilles , LEROUX, Thierry
IPC分类号： G01N21/956
CPC分类号： G01N21/956 , G01B11/0616 , G01N21/95623

86. 发明公开

EP2823288A1 WAFER AND RETICLE INSPECTION SYSTEMS AND METHOD FOR SELECTING ILLUMINATION PUPIL CONFIGURATIONS 有权
标题翻译：晶片和光掩膜检查系统和方法以供选择小学生照明配置
公开(公告)号：EP2823288A1
公开(公告)日：2015-01-14
申请号：EP13757677.3
申请日：2013-03-01
申请人： KLA-Tencor Corporation
发明人： CHEN, Grace, H. , BRUNNER, Rudolf , GAO, Lisheng , DANEN, Robert, M. , CHEN, Lu
IPC分类号： G01N21/88 , H01L21/66
CPC分类号： G01N21/8806 , G01N21/8851 , G01N21/9501 , G01N21/956 , G01N21/95623 , G01N2021/8822 , G01N2021/95676 , G01N2201/061 , G01N2201/0638 , G01N2201/068 , G01N2201/12
摘要： In an optical inspection tool, an illumination aperture is opened at each of a plurality of aperture positions of an illumination pupil area one at a time across the illumination pupil area. For each aperture opening position, an incident beam is directed towards the illumination pupil area so as to selectively pass a corresponding ray bundle of the illumination beam at a corresponding set of one or more incident angles towards the sample and an output beam, which is emitted from the sample in response to the corresponding ray bundle of the incident beam impinging on the sample at the corresponding set of one or more incident angles, is detected. A defect detection characteristic for each aperture position is determined based on the output beam detected for each aperture position. An optimum aperture configuration is determined based on the determined defect detection characteristic for each aperture position.

87. 发明授权

EP1495357B1 UV compatible programmable spatial filter 失效
标题翻译： UV-兼容可编程空间滤波器
公开(公告)号：EP1495357B1
公开(公告)日：2013-10-30
申请号：EP03745648.0
申请日：2003-03-28
申请人： KLA-Tencor Technologies Corporation
发明人： WILK, Dieter, E. , TANG, Anlun , VELLA, Eric, N. , RUNYON, Rex , SULLIVAN, Jamie, M. , JOHNSON, Ralph, T.
IPC分类号： G01N21/956 , G02B27/46
CPC分类号： G02B27/46 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/95676

88. 发明授权

EP0804722B1 SURFACE INSPECTION SYSTEM 有权转让
标题翻译： DEVICE调查曲面的
公开(公告)号：EP0804722B1
公开(公告)日：2010-11-10
申请号：EP95943798.9
申请日：1995-12-08
申请人： KLA-Tencor Corporation
发明人： JORDON, John, R., III , NIKOONAHAD, Mehrdad , WELLS, Keith, B.
IPC分类号： G01N21/95 , G01N21/94
CPC分类号： G01N21/95623 , G01N21/94 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/8825 , G01R31/2831 , G01R31/308 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A high throughput surface inspection system with enhanced detection sensitivity is described. The acquired data is processed in real time at a high rate of below 50 MHZ thereby reducing the cost for data processing. Anomalies are detected and verified by comparing adjacent repeating patterns and the height of the surface (40) is monitored and corrected dynamically to reduce misregistration errors between adjacent repeating patterns. Local thresholds employing neighborhood information are used for detecting and verifying the presence of anomalies. The sampled point spread function of the combined illumination (22) and collection system (90, 92, 111b) is exploited for anomaly detection and verification.

89. 发明公开

EP2130030A1 A METHOD OF IMAGING RADIATION FROM AN OBJECT ON A DETECTION DEVICE AND AN INSPECTION DEVICE FOR INSPECTING AN OBJECT 有权
标题翻译： PROCESS FOR辐射的物体的对检测器设备检查装置用于检查的对象的图片
公开(公告)号：EP2130030A1
公开(公告)日：2009-12-09
申请号：EP08723915.8
申请日：2008-03-21
申请人： ASML Netherlands B.V.
发明人： SNEL, Robert , BLEEKER, Arno Jan , VAN BRUG, Hedser
IPC分类号： G01N21/95
CPC分类号： G01N21/94 , G01N21/8806 , G01N21/95623 , G01N2021/8822
摘要： A method of imaging radiation from an object on a detection device. The method includes directing a beam of coherent radiation to the object, scanning the beam of radiation over an angle in or out of a plane of incidence relative to the object, and imaging scattered radiation from the object on the detection device.

90. 发明公开

EP2063260A1 Fourier transform deflectometry system and method 审中-公开
标题翻译：四变换 - Deflektometries系统和Verfahren
公开(公告)号：EP2063260A1
公开(公告)日：2009-05-27
申请号：EP07121009.0
申请日：2007-11-19
申请人： Lambda-X
发明人： Beghuin, Didier , Joannex, Luc
IPC分类号： G01N21/956 , G01B11/25 , G01M11/02
CPC分类号： G01N21/95623 , G01B11/25 , G01M11/0264 , G01M11/0278
摘要： The present invention relates to a Fourier transform deflectometry system 1 and method for the optical inspection of a phase and amplitude object 2 placed in an optical path between a grating 3 and an imaging system 4, at a distance h of said grating 3. The grating 3 forms a contrast-based periodic pattern with spatial frequencies µ 0 , v 0 in, respectively, orthogonal axes x,y in an image plane, and the imaging system 4 comprises an objective 5 and an imaging sensor 6 comprising a plurality of photosensitive elements. According to the method of the invention, a first image of said pattern, distorted by the phase and amplitude object 2, is first captured through the objective 5 by the imaging sensor 6. Then, a Fourier transform of said first image in a spatial frequency domain is calculated, at least one first- or higher-order spectrum of said Fourier transform is selected and shifted in said frequency domain, so as to substantially place it at a central frequency of said Fourier transform, and a reverse Fourier transform of said at least one shifted first- or higher-order spectrum of said Fourier transform is performed so as to obtain a complex function g(x,y)=I(x,y)e iϕp(x,y) , wherein I(x,y) is an intensity and ϕ(x,y) a phase linked to optical deflection angles θ x , θ y in, respectively, the directions of the x and y axes, in the following form: ϕ(x,y)=-2πh(µ 0 tanθ x +v 0 tanθ y ).
摘要翻译：本发明涉及一种傅立叶变换偏转系统1和方法，用于光学检查放置在光栅3与成像系统4之间的光路中的相位和幅度物体2，距离为所述光栅3的距离。光栅 3分别形成具有空间频率μ0，v 0 in，在图像平面中的正交轴x，y的基于对比度的周期性图案，并且成像系统4包括物镜5和成像传感器6，成像传感器6包括多个感光元件。根据本发明的方法，通过成像传感器6首先通过物镜5捕获由相位和幅度对象2失真的所述图案的第一图像。然后，以空间频率对所述第一图像进行傅立叶变换计算所述傅里叶变换的至少一个第一或更高阶频谱，并在所述频域中移位，以便将其基本上置于所述傅里叶变换的中心频率，并且所述at 执行所述傅里叶变换的至少一个移位的一阶或更高阶光谱，以便获得复函数g（x，y）= I（x，y）eiÕp（x，y），其中I（x，y））是一个强度，Õ（x，y）分别与x和y轴的方向相关联的光偏转角¸x，¸y的相位，如下形式：Õ（x，y）= - 2 - （μ0 tan x + v 0 tan y y）。

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