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    • 82. 发明授权
    • Semiconductor memory devices including recess-type control gate electrodes and methods of fabricating the semiconductor memory devices
    • 包括凹型控制栅电极的半导体存储器件和制造半导体存储器件的方法
    • US08148767B2
    • 2012-04-03
    • US11709860
    • 2007-02-23
    • Yoon-dong ParkJune-mo KooKyoung-lae Cho
    • Yoon-dong ParkJune-mo KooKyoung-lae Cho
    • H01L29/788
    • H01L21/28273B82Y10/00H01L21/28282H01L27/115H01L27/11521H01L27/11568H01L29/66825H01L29/66833H01L29/7881H01L29/792H01L29/7923
    • A semiconductor memory device includes a semiconductor substrate, a control gate electrode recessed in the semiconductor substrate, a storage node layer interposed between a sidewall of the control gate electrode and the semiconductor substrate, a tunneling insulation layer interposed between the storage node layer and the semiconductor substrate, a blocking insulation layer interposed between the storage node layer and the control gate electrode, and first and second channel regions formed around a surface of the semiconductor substrate to at least partially surround the control gate electrode. The semiconductor memory device may include a plurality of control gate electrodes, storage node layers, tunneling insulation layers, blocking insulation layers, and continuous first and second channel regions. A method of fabricating the semiconductor memory device includes etching the semiconductor substrate to form a plurality of holes, forming the tunneling insulation layers, storage node layers, blocking insulation layers, and control gate electrodes.
    • 半导体存储器件包括半导体衬底,凹入半导体衬底中的控制栅极电极,插在控制栅电极的侧壁和半导体衬底之间的存储节点层,介于存储节点层和半导体衬底之间的隧道绝缘层 衬底,介于存储节点层和控制栅电极之间的阻挡绝缘层,以及形成在半导体衬底的表面周围以至少部分地围绕控制栅电极的第一和第二沟道区。 半导体存储器件可以包括多个控制栅电极,存储节点层,隧道绝缘层,阻挡绝缘层以及连续的第一和第二沟道区。 制造半导体存储器件的方法包括蚀刻半导体衬底以形成多个孔,形成隧道绝缘层,存储节点层,阻挡绝缘层和控制栅电极。
    • 88. 发明申请
    • Image sensor using photo-detecting molecule and method of operating the same
    • 使用光检测分子的图像传感器及其操作方法
    • US20090294633A1
    • 2009-12-03
    • US12385122
    • 2009-03-31
    • Kwang-soo SeolYoon-dong Park
    • Kwang-soo SeolYoon-dong Park
    • H01L27/146H01L31/0256H01L51/46
    • H01L27/14603H01L27/14627H01L27/307H01L51/0043H01L51/0073H01L51/424H01L51/4246Y02E10/549
    • Provided is an image sensor using a photo-detecting molecule and a method of operating the image sensor. The image sensor may include a plurality of first electrodes disposed parallel to each other and a plurality of second electrodes disposed parallel to each other in a direction perpendicular to the first electrodes and above the first electrodes, and a plurality of subpixels formed in regions where the first electrodes cross the second electrodes. Each of the subpixels may comprise a photo-detecting molecule layer that may generate charges by absorbing light having a certain wavelength, a charge generation layer that may form a plurality of secondary electrons by receiving the charges from the photo-detecting molecule layer when a known voltage is applied between the first electrodes and the second electrodes, and a variable resistance layer, an electrical state of which is changed by receiving the secondary electrons generated from the charge generation layer.
    • 提供了使用光检测分子的图像传感器和操作图像传感器的方法。 图像传感器可以包括彼此平行设置的多个第一电极和在垂直于第一电极并且在第一电极上方彼此平行设置的多个第二电极,以及多个子像素,其形成在 第一电极与第二电极交叉。 每个子像素可以包括可以通过吸收具有一定波长的光而产生电荷的光检测分子层,电荷产生层可以通过从已知的光检测分子层接收电荷而形成多个二次电子 在第一电极和第二电极之间施加电压,并且通过接收从电荷产生层产生的二次电子而改变其电状态的可变电阻层。