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81. 发明申请

US20070229452A1 Liquid crystal display 有权
标题翻译：液晶显示器
公开(公告)号：US20070229452A1
公开(公告)日：2007-10-04
申请号：US11730257
申请日：2007-03-30
申请人： Yutaka Sano , Takashi Kunimori , Toshihiko Tanaka , Masanori Yasumori
发明人： Yutaka Sano , Takashi Kunimori , Toshihiko Tanaka , Masanori Yasumori
IPC分类号： G09G3/36
CPC分类号： G02F1/13318 , G01J1/4204 , G02F1/1336 , G02F1/136209 , G02F1/13624 , G02F2001/133618 , G02F2001/136245 , G09G3/3406 , G09G3/3648 , G09G2360/144
摘要： A liquid crystal display (LCD) 1 according to an embodiment of the present invention includes a liquid crystal panel having a TFT substrate 2, a CF substrate 25, and a liquid crystal layer 14 interposed between the two substrates; a TFT ambient light photosensor having a semiconductor layer 19L for detecting external light; a photodetector unit LS1 having a capacitor Cw in which a predetermined reference voltage is charged and a voltage charged by leakage current of the TFT ambient light photosensor is lowered; and an ambient light photosensor reader unit Re1 for reading a voltage charged in the capacitor for a predetermined read period. The photodetector unit is disposed on a first surface of the TFT substrate 2 that is in contact with the liquid crystal layer, and the surface of the photodetector unit except for the semiconductor layer 19L and its periphery is covered by a light-shielding layer 21. It is therefore possible to provide an LCD in which malfunction or reduced sensitivity of its ambient light photosensor due to light from its backlights is prevented with a simple structure.
摘要翻译：根据本发明实施例的液晶显示器（LCD）1包括具有TFT基板2，CF基板25和插入在两个基板之间的液晶层14的液晶面板; 具有用于检测外部光的半导体层19L的TFT环境光感应器; 具有预定参考电压被充电的电容器Cw和TFT环境光电传感器的漏电流充电的电压的光检测器单元LS 1降低; 以及环境光光电传感器读取单元Re 1，用于在预定的读取周期内读取在电容器中充电的电压。光检测器单元设置在与液晶层接触的TFT基板2的第一表面上，除了半导体层19L及其周边外的光检测器单元的表面被覆盖因此可以提供一种LCD，其中以简单的结构防止由于来自其背光的光而导致的环境光传感器的故障或降低的灵敏度。

82. 发明申请

US20070188743A1 Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same 有权
标题翻译：掩模毛坯的缺陷检查方法和系统以及使用其的制造半导体器件的方法
公开(公告)号：US20070188743A1
公开(公告)日：2007-08-16
申请号：US11707127
申请日：2007-02-16
申请人： Toshihiko Tanaka , Tsuneo Terasawa , Yoshihiro Tezuka
发明人： Toshihiko Tanaka , Tsuneo Terasawa , Yoshihiro Tezuka
IPC分类号： G01N21/88 , G01N21/00
CPC分类号： G01N21/956 , B82Y10/00 , B82Y40/00 , G01N2021/8822 , G01N2021/95676 , G03F1/24 , G03F1/84
摘要： Defect detection is performed with two settings, that is, setting of a focus position where a signal intensity obtained from a dot pattern is maximum and setting of a focus position where a signal intensity obtained from a hole pattern is maximum. In addition, defect detection is performed at a predetermined focus position previously set and for the detected defect, the focus position is changed at that position to find a focus position where the signal intensity is maximum. If the focus position is away from a signal light-receiving system, the defect is determined as dot-shaped. If the focus position is close to the signal light-receiving system, the defect is determined as hole-shaped. If the focus position is intermediate of them, the defect is determined as an elongated-shaped.
摘要翻译：通过两种设置执行缺陷检测，即，从点图案获得的信号强度设置为最大的聚焦位置的设置和从孔图案获得的信号强度的最大焦点位置的设置。此外，在预先设定的预定焦点位置执行缺陷检测，对于检测到的缺陷，在该位置改变焦点位置以找到信号强度最大的聚焦位置。如果聚焦位置远离信号光接收系统，则该缺陷被确定为点状。如果聚焦位置靠近信号光接收系统，则将该缺陷确定为孔形。如果焦点位置是它们的中间位置，则将缺陷确定为细长形状。

83. 发明申请

US20070155052A1 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light 有权
公开(公告)号：US20070155052A1
公开(公告)日：2007-07-05
申请号：US11714837
申请日：2007-03-07
申请人： Tsuneo Terasawa , Toshihiko Tanaka , Ko Miyazaki , Norio Hasegawa , Kazutaka Mori
发明人： Tsuneo Terasawa , Toshihiko Tanaka , Ko Miyazaki , Norio Hasegawa , Kazutaka Mori
IPC分类号： H01L21/58
CPC分类号： G03F7/70425 , G03F1/00 , G03F1/56 , H01L2224/05001 , H01L2224/05008 , H01L2224/05022 , H01L2224/05024 , H01L2224/05569 , H01L2224/05572 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/92125 , H01L2924/15311 , Y10S438/944 , Y10S438/946 , H01L2924/00
摘要： Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby an exposure treatment is performed.

84. 发明授权

US07110863B2 Power generating unit general monitor/control apparatus 有权
标题翻译：发电机组通用监控/控制装置
公开(公告)号：US07110863B2
公开(公告)日：2006-09-19
申请号：US10508535
申请日：2003-03-28
申请人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
发明人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
IPC分类号： G05D11/00
CPC分类号： H02J13/001 , Y02E60/74 , Y04S10/30 , Y04S10/40
摘要： A generation unit general monitor-control system for generally monitoring and controlling electric power generation units (A-3 etc.), the general monitor-control system allocating relations between the electric power generation units and interface devices (11) for monitoring and controlling the generation units. The monitor-control system includes: a unit database (13) storing process data and operation signals; process input-output means (14) for reading out the data from this unit database and outputting the data to the generation units; unit database input-output portion (12) for receiving demands from the interface devices, detecting addresses of the generation units allotted to the interface devices, and referring to data corresponding to the addresses; interface device designating means (22) for designating interface devices; and an interface-device-unit-relation rewriting device (18) for rewriting the allocation relation between the generation unit and the interface devices based upon command from the interface device designating means.
摘要翻译：一般监视和控制发电机组（A-3等）的发电机组通用监视控制系统，分配发电机组和接口装置（11）之间关系的一般监视控制系统，用于监控和控制一代单位。监视器控制系统包括：存储过程数据和操作信号的单元数据库（13）; 过程输入输出装置（14），用于从该单元数据库读出数据并将数据输出到生成单元; 单元数据库输入输出部分（12），用于从接口设备接收需求，检测分配给接口设备的生成单元的地址，并参考对应于该地址的数据; 接口装置指定装置（22），用于指定接口装置; 以及用于根据来自接口设备指定装置的命令重写生成单元和接口设备之间的分配关系的接口设备单元关系重写设备（18）。

85. 发明申请

US20060183310A1 Process for fabricating semiconductor device and method for generating mask pattern data 失效
标题翻译：制造半导体器件的方法和用于产生掩模图案数据的方法
公开(公告)号：US20060183310A1
公开(公告)日：2006-08-17
申请号：US10551553
申请日：2004-12-22
申请人： Toshihiko Tanaka
发明人： Toshihiko Tanaka
IPC分类号： H01L21/44
CPC分类号： G03F7/70425 , G03F7/70441
摘要： A method of fabricating a semiconductor device including a first wiring pattern extending in a vertical direction and a second wiring pattern identical in geometry to the first wiring pattern and extending in a (horizontal) direction orthogonal to the vertical direction, including the steps of: employing linearly polarized illumination to perform exposure along a mask pattern including mask patterns used to form the first and second wiring patterns, respectively; and subsequently forming the first and second wiring patterns having a geometry along the mask patterns. The mask patterns to form the first and second wiring patterns are formed to be different in geometry.
摘要翻译：一种制造半导体器件的方法，所述半导体器件包括在垂直方向上延伸的第一布线图案和与所述第一布线图案相同的第二布线图案，并且沿与垂直方向垂直的（水平）方向延伸，包括以下步骤：线偏振照明，沿着包括用于形成第一和第二布线图案的掩模图案的掩模图案进行曝光; 随后沿掩模图案形成具有几何形状的第一和第二布线图案。形成第一和第二布线图案的掩模图案形成为几何形状不同。

86. 发明申请

US20060134706A1 Atopic dermatitis inducer 审中-公开
标题翻译：特应性皮炎诱导剂
公开(公告)号：US20060134706A1
公开(公告)日：2006-06-22
申请号：US10563795
申请日：2004-07-09
申请人： Michihiro Hide , Toshihiko Tanaka , Akio Tanaka , Kaori Ishii , Hidenori Suzuki
发明人： Michihiro Hide , Toshihiko Tanaka , Akio Tanaka , Kaori Ishii , Hidenori Suzuki
IPC分类号： G01N33/567 , C12N5/08 , C07K16/42
CPC分类号： C07K16/4291 , A61K2039/505 , C07K14/47
摘要： An atopic dermatitis inducer binding to a human own IgE antibody and activating mast cells and basophiles, which includes a purified human secretion fraction, or an antigenic molecule or an antigenic determinant in the purified fraction, and obtained through the following steps of: filtering a human secretion, removing insoluble matters and collecting the filtrate; mixing the filtrate with a ConA-affinity carrier and collecting the supernatant; and separating a component having a histamine-releasing activity from the supernatant by column chromatography. This inducer is effective in diagnosing and treating human atopic dermatitis.
摘要翻译：特异性皮炎诱导剂与人自身的IgE抗体结合并激活肥大细胞和嗜碱性细胞，其包括纯化的人分泌部分，或纯化级分中的抗原性分子或抗原决定簇，并通过以下步骤获得：过滤人分泌，去除不溶物并收集滤液; 将滤液与ConA亲和载体混合并收集上清液; 并通过柱层析从上清液中分离具有组胺释放活性的组分。该诱导剂有效地诊断和治疗人类特应性皮炎。

87. 发明授权

US06987984B1 High-frequency switch module 有权
标题翻译：高频开关模块
公开(公告)号：US06987984B1
公开(公告)日：2006-01-17
申请号：US09700671
申请日：2000-03-17
申请人： Shigeru Kemmochi , Mitsuhiro Watanabe , Hiroyuki Tai , Tsuyoshi Taketa , Toshihiko Tanaka
发明人： Shigeru Kemmochi , Mitsuhiro Watanabe , Hiroyuki Tai , Tsuyoshi Taketa , Toshihiko Tanaka
IPC分类号： H04M1/00
CPC分类号： H01P1/2135 , H01P1/15 , H04B1/0057 , H04B1/44 , H04B1/48
摘要： A high-frequency switch module comprising one band-separating circuit and two switch circuits, the first switch circuit being connected to one circuit separated by the band-separating circuit, and the second switch circuit being connected to the other circuit thereof; the first switch circuit being a circuit for switching a transmission system and a reception system for a first transmitting and receiving system; and the second switch circuit being a circuit for switching a transmission system and a reception system for a second transmitting and receiving system and a transmission system and a reception system for a third transmitting and receiving system.
摘要翻译：一种高频开关模块，包括一个带分离电路和两个开关电路，第一开关电路连接到由带分离电路分离的一个电路，第二开关电路连接到另一个电路; 第一开关电路是用于切换传输系统的电路和用于第一发送和接收系统的接收系统; 第二开关电路是用于切换第二发送和接收系统的传输系统和接收系统的电路，以及用于第三发送和接收系统的传输系统和接收系统。

88. 发明授权

US06973209B2 Defect inspection system 失效
标题翻译：缺陷检查系统
公开(公告)号：US06973209B2
公开(公告)日：2005-12-06
申请号：US09917845
申请日：2001-07-25
申请人： Toshihiko Tanaka
发明人： Toshihiko Tanaka
IPC分类号： G01N21/94 , G01N21/956 , G06K9/00
CPC分类号： G06T7/0004 , G01N21/94 , G01N21/956 , G06T7/0002 , G06T2200/24 , G06T2207/30148
摘要： A defect inspection system is provided which comprises an image acquiring section for acquiring a two-dimensional image of a subject which is a processing target in a manufacturing process, a defect extracting section for extracting a defect by a defect extraction algorithm using a predetermined parameter for an image acquired by the image acquiring section, a displaying section for displaying an image of a defect of the subject extracted by the defect extracting section, a parameter adjusting section for adjusting the parameter in accordance with a defect extraction degree for the subject, and a quality judging section for judging the quality of the subject based on a defect information extracted by the defect extracting section.
摘要翻译：提供了一种缺陷检查系统，其包括图像获取部分，用于获取在制造过程中作为处理对象的被摄体的二维图像;缺陷提取部分，用于通过使用预定参数的缺陷提取算法提取缺陷，由图像获取部获取的图像，用于显示由缺陷提取部提取的被检体的缺陷的图像的显示部，用于根据对象的缺陷提取度来调整参数的参数调整部，以及质量判断部分，用于基于由缺陷提取部分提取的缺陷信息来判断对象的质量。

89. 发明申请

US20050159826A1 Power generating unit general monitor/control apparatus 有权
标题翻译：发电机组通用监控/控制装置
公开(公告)号：US20050159826A1
公开(公告)日：2005-07-21
申请号：US10508535
申请日：2003-03-28
申请人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
发明人： Toshihiko Tanaka , Hiroshi Fukuda , Jin Murata , Toshihiro Yamada
IPC分类号： G05B23/02 , G05B15/00
CPC分类号： H02J13/001 , Y02E60/74 , Y04S10/30 , Y04S10/40
摘要： A generation unit general monitor-control system for generally monitoring and controlling electric power generation units (A-3 etc.), the general monitor-control system allocating relations between the electric power generation units and interface devices (11) for monitoring and controlling the generation units. The monitor-control system includes: a unit database (13) storing process data and operation signals; process input-output means (14) for reading out the data from this unit database and outputting the data to the generation units; unit database input-output portion (12) for receiving demands from the interface devices, detecting addresses of the generation units allotted to the interface devices, and referring to data corresponding to the addresses; interface device designating means (22) for designating interface devices; and an interface-device-unit-relation rewriting device (18) for rewriting the allocation relation between the generation unit and the interface devices based upon command from the interface device designating means.
摘要翻译：一般监视和控制发电机组（A-3等）的发电机组通用监视控制系统，分配发电机组和接口装置（11）之间关系的一般监视控制系统，用于监控和控制一代单位。监视器控制系统包括：存储过程数据和操作信号的单元数据库（13）; 过程输入输出装置（14），用于从该单元数据库读出数据并将数据输出到生成单元; 单元数据库输入输出部分（12），用于从接口设备接收需求，检测分配给接口设备的生成单元的地址，并参考对应于该地址的数据; 接口装置指定装置（22），用于指定接口装置; 以及用于根据来自接口设备指定装置的命令重写生成单元和接口设备之间的分配关系的接口设备单元关系重写设备（18）。

90. 发明授权

US06686099B2 Method of manufacturing a photomask 有权
标题翻译：制造光掩模的方法
公开(公告)号：US06686099B2
公开(公告)日：2004-02-03
申请号：US09954065
申请日：2001-09-18
申请人： Toshihiko Tanaka , Norio Hasegawa , Tsuneo Terasawa
发明人： Toshihiko Tanaka , Norio Hasegawa , Tsuneo Terasawa
IPC分类号： G03F900
CPC分类号： G03F1/72 , G03F1/68
摘要： After a shade pattern constituted by a resist film formed on a photomask is stripped, a new shade pattern constituted by a resist film is formed on the photomask to reclaim a photomask.
摘要翻译：在由光掩模上形成的抗蚀剂膜构成的阴影图案被剥离之后，在光掩模上形成由抗蚀剂膜构成的新的阴影图案以回收光掩模。

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