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81. 发明申请

US20070141483A1 Near-field exposure photoresist and fine pattern forming method using the same 失效
标题翻译：近场曝光光刻胶和使用其的精细图案形成方法
公开(公告)号：US20070141483A1
公开(公告)日：2007-06-21
申请号：US11703108
申请日：2007-02-07
申请人： Takako Yamaguchi , Ryo Kuroda
发明人： Takako Yamaguchi , Ryo Kuroda
IPC分类号： G03F1/00
CPC分类号： G03F7/0226 , G03F7/0236 , G03F7/0752 , G03F7/168 , G03F7/2014
摘要： A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.
摘要翻译：用于通过近场曝光形成精细图案的近场光致抗蚀剂包括碱溶性诺瓦克树脂，通过近场曝光光反应的二叠氮型光敏剂，通过近场产生酸的光酸产生剂暴露和溶剂。

82. 发明申请

US20070082279A1 Near-field exposure method and device manufacturing method using the same 审中-公开
标题翻译：近场曝光方法及使用其的装置制造方法
公开(公告)号：US20070082279A1
公开(公告)日：2007-04-12
申请号：US10554994
申请日：2005-06-30
申请人： Natsuhiko Mizutani , Ryo Kuroda
发明人： Natsuhiko Mizutani , Ryo Kuroda
IPC分类号： G03F7/20
CPC分类号： G03F7/7035 , B82Y10/00 , G03F7/70325
摘要： Disclosed is a near-field exposure method including a process of bringing a light blocking film with a plurality of small openings each having an opening width not greater than a wavelength of exposure light, into close contact with a photoresist layer provided on a surface of a substrate, and a process of projecting exposure light from an exposure light source to the light blocking film to transfer an opening pattern of the light blocking film to the photoresist layer, wherein, on the basis of a correlation between (a) a distance from a node of a standing wave to be produced in the photoresist layer to the light blocking film and (b) a light intensity distribution of near-field light to be produced in the photoresist layer adjacent the light blocking film, the distance from the standing wave node to the light blocking film is determined so as to provide a desired light intensity distribution.
摘要翻译：公开了一种近场曝光方法，包括使具有不大于曝光光的波长的开口宽度的多个小开口的遮光膜与设置在曝光光的表面上的光致抗蚀剂层紧密接触的工艺以及将曝光光源的曝光光投射到遮光膜以将遮光膜的开口图案转印到光致抗蚀剂层的处理，其中，基于（a）距离在光致抗蚀剂层中产生的阻挡膜的驻波的节点和（b）在与阻挡膜相邻的光致抗蚀剂层中产生的近场光的光强度分布，与驻波结点的距离确定遮光膜以提供期望的光强度分布。

83. 发明申请

US20060188398A1 Sensor for detecting a target substance in a fluid 审中-公开
标题翻译：用于检测流体中目标物质的传感器
公开(公告)号：US20060188398A1
公开(公告)日：2006-08-24
申请号：US10553977
申请日：2004-08-27
申请人： Koji Yano , Takeshi Imamura , Mitsuro Sugita , Kohei Okamoto , Takeo Yamazaki , Hidenori Shiotsuka , Toshihiko Ouchi , Ryo Kuroda
发明人： Koji Yano , Takeshi Imamura , Mitsuro Sugita , Kohei Okamoto , Takeo Yamazaki , Hidenori Shiotsuka , Toshihiko Ouchi , Ryo Kuroda
IPC分类号： G01N33/50
CPC分类号： G02B6/02385 , B82Y20/00 , G01N21/21 , G01N21/253 , G01N21/39 , G01N21/774 , G01N33/54373 , G02B6/02347 , G02B6/0239 , G02B6/1225
摘要： A device for detecting a target substance in a fluid is provided. This device comprises a periodic structure having a vacant portion for passing the fluid containing the target substance and a solid portion arranged regularly and capable of transmitting an electromagnetic wave, an electro-magnetic wave-projecting means for projecting the electromagnetic wave to the periodic structure, and a detecting means for measuring the magnetic wave emitted from the periodic structure to detect a change in periodic distribution of a refractive index. This sensor is highly sensitive in a small size.
摘要翻译：提供了一种用于检测流体中的目标物质的装置。该装置包括周期性结构，其具有用于使含有目标物质的流体的空间部分和用于传递电磁波的规则排列的固体部分的空穴部分，用于将电磁波投射到周期性结构的电磁波投射装置，以及检测装置，用于测量从周期结构发射的磁波，以检测折射率的周期性分布的变化。该传感器在小尺寸下非常灵敏。

84. 发明申请

US20060108219A1 Chemical sensor and chemical sensor apparatus 审中-公开
标题翻译：化学传感器和化学传感器设备
公开(公告)号：US20060108219A1
公开(公告)日：2006-05-25
申请号：US10530182
申请日：2004-06-23
申请人： Ryo Kuroda , Tomohiro Yamada
发明人： Ryo Kuroda , Tomohiro Yamada
IPC分类号： C12Q1/00
CPC分类号： G01N21/553 , G01N21/554
摘要： A chemical sensor for detecting a reaction of a sensor material with a specimen on the basis of an intensity of a surface plasmon polariton wave propagated along a surface of a sensor medium including the sensor material is principally constituted by the sensor medium. The sensor medium includes a periodic structure and the sensor material disposed on the periodic structure. The periodic structure has a pitch substantially equal to an integral multiple of a wavelength of the surface plasma polariton wave generated by irradiating an interface between the periodic structure and the sensor material with light.
摘要翻译：基于传感器材料的传感器介质的表面传播的表面等离子体激元波的强度，检测传感器材料与试样的反应的化学传感器主要由传感器介质构成。传感器介质包括周期性结构和设置在周期性结构上的传感器材料。周期性结构具有基本上等于通过用光照射周期性结构和传感器材料之间的界面而产生的表面等离子体极化子波的波长的整数倍的间距。

85. 发明申请

US20060078818A1 Near-field exposure photoresist and fine pattern forming method using the same 审中-公开
公开(公告)号：US20060078818A1
公开(公告)日：2006-04-13
申请号：US11289595
申请日：2005-11-30
申请人： Takako Yamaguchi , Ryo Kuroda
发明人： Takako Yamaguchi , Ryo Kuroda
IPC分类号： G03C5/18
CPC分类号： G03F7/0226 , G03F7/0236 , G03F7/0752 , G03F7/168 , G03F7/2014
摘要： A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.

86. 发明授权

US07022463B2 Near-field exposure photoresist and fine pattern forming method using the same 失效
标题翻译：近场曝光光刻胶和使用其的精细图案形成方法
公开(公告)号：US07022463B2
公开(公告)日：2006-04-04
申请号：US10921184
申请日：2004-08-19
申请人： Takako Yamaguchi , Ryo Kuroda
发明人： Takako Yamaguchi , Ryo Kuroda
IPC分类号： G03F7/30 , G03F7/023
CPC分类号： G03F7/0226 , G03F7/0236 , G03F7/0752 , G03F7/168 , G03F7/2014
摘要： A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.
摘要翻译：用于通过近场曝光形成精细图案的近场光致抗蚀剂包括碱溶性诺瓦克树脂，通过近场曝光光反应的二叠氮型光敏剂，通过近场产生酸的光酸产生剂暴露和溶剂。

87. 发明申请

US20060007440A1 Method and apparatus for detecting relative positional deviation between two objects 失效
标题翻译：用于检测两个物体之间的相对位置偏差的方法和装置
公开(公告)号：US20060007440A1
公开(公告)日：2006-01-12
申请号：US11166106
申请日：2005-06-27
申请人： Ryo Kuroda , Yasuhisa Inao
发明人： Ryo Kuroda , Yasuhisa Inao
IPC分类号： G01B11/00
CPC分类号： G03F9/7076 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7038 , G03F9/7042
摘要： Disclosed is a method and apparatus for detecting a relative positional deviation between first and second objects. In one preferred form of the invention, the detecting method includes the steps of (i) providing the first and second objects with diffraction gratings, respectively, each having a grating pitch larger than a wavelength of a light source used, (ii) placing the first and second objects so that a dielectric material layer having a thickness smaller than the wavelength of the light source used is interposed between the first and second objects, and so that the diffraction gratings of the first and second objects are opposed to each other, (iii) projecting light from the light source onto the diffraction gratings of the first and second objects, and (iv) detecting the relative positional deviation between the first and second objects on the basis of diffraction light projected from the diffraction gratings to a space.
摘要翻译：公开了一种用于检测第一和第二物体之间的相对位置偏差的方法和装置。在本发明的一个优选形式中，检测方法包括以下步骤：（i）分别为第一和第二物体提供衍射光栅，每个衍射光栅具有大于所使用的光源的波长的光栅间距，（ii）第一和第二物体，使得具有小于所使用的光源的波长的厚度的介电材料层插入在第一和第二物体之间，并且使得第一和第二物体的衍射光栅彼此相对（（ iii）将来自光源的光投射到第一和第二物体的衍射光栅上，以及（iv）基于从衍射光栅投影到衍射光栅的衍射光来检测第一和第二物体之间的相对位置偏差。

88. 发明申请

US20050247117A1 PROBE WITH HOLLOW WAVEGUIDE AND METHOD FOR PRODUCING THE SAME 失效
标题翻译：具有中空波长的探针及其制造方法
公开(公告)号：US20050247117A1
公开(公告)日：2005-11-10
申请号：US11102662
申请日：2005-04-11
申请人： Yasuhiro Shimada , Ryo Kuroda
发明人： Yasuhiro Shimada , Ryo Kuroda
IPC分类号： G01B11/30 , B81B1/00 , B81C1/00 , G01Q60/06 , G01Q60/18 , G01Q60/22 , G01Q60/38 , G01Q70/12 , G01Q80/00 , G02B6/10 , G02B6/122 , G02B6/24 , G11B7/135 , G11B7/22 , G01B5/28
CPC分类号： G01Q60/22 , G02B6/10 , G02B6/122 , G02B6/241
摘要： A probe for detecting light or irradiating light comprises a cantilever supported at an end thereof by a substrate, a hollow tip formed at a free end of the cantilever, a microaperture formed at the end of the tip, and a hollow waveguide formed inside the cantilever. A method for producing a probe for light detection or light irradiation which comprises the steps of working a substrate to form a groove therein, forming a flat plate-shaped cover portion on the groove to form a hollow waveguide having an opening in a part thereof, forming a hollow tip having a microaperture on the opening, and removing a part of the substrate by etching, to form a cantilever.
摘要翻译：用于检测光或照射光的探针包括在其一端由基底支撑的悬臂，形成在悬臂的自由端的中空尖端，在尖端的端部形成的微孔，以及形成在悬臂内的中空波导。一种用于光检测或光照射的探针的制造方法，包括以下步骤：在基板上加工形成槽，在所述槽上形成平板状的盖部，形成在其一部分具有开口部的中空波导管，在开口上形成具有微孔的中空尖端，并通过蚀刻去除衬底的一部分，以形成悬臂。

89. 发明授权

US06891151B2 Probe with hollow waveguide and method for producing the same 失效
标题翻译：中空波导探头及其制造方法
公开(公告)号：US06891151B2
公开(公告)日：2005-05-10
申请号：US09879905
申请日：2001-06-14
申请人： Yasuhiro Shimada , Ryo Kuroda
发明人： Yasuhiro Shimada , Ryo Kuroda
IPC分类号： G01B11/30 , B81B1/00 , B81C1/00 , G01Q60/06 , G01Q60/18 , G01Q60/22 , G01Q60/38 , G01Q70/12 , G01Q80/00 , G02B6/10 , G02B6/122 , G02B6/24 , G11B7/135 , G11B7/22 , H01J5/16
CPC分类号： G01Q60/22 , G02B6/10 , G02B6/122 , G02B6/241
摘要： A probe for detecting light or irradiating light comprises a cantilever supported at an end thereof by a substrate, a hollow tip formed at a free end of the cantilever, a microaperture formed at the end of the tip, and a hollow waveguide formed inside the cantilever.A method for producing a probe for light detection or light irradiation which comprises the steps of working a substrate to form a groove therein, forming a flat plate-shaped cover portion on the groove to form a hollow waveguide having an opening in a part thereof, forming a hollow tip having a microaperture on the opening, and removing a part of the substrate by etching, to form a cantilever.
摘要翻译：用于检测光或照射光的探针包括在其一端由基底支撑的悬臂，形成在悬臂的自由端的中空尖端，在尖端的端部形成的微孔，以及形成在悬臂内的中空波导。一种用于光检测或光照射的探针的制造方法，包括以下步骤：在基板上加工形成槽，在所述槽上形成平板状的盖部，形成在其一部分具有开口部的中空波导管，在开口上形成具有微孔的中空尖端，并通过蚀刻去除衬底的一部分，以形成悬臂。

90. 发明申请

US20050056351A1 Surface treatment method, process for producing near-field exposure mask using the method, and nanoimprint lithography mask 审中-公开
标题翻译：表面处理方法，使用该方法制造近场曝光掩模的方法和纳米压印光刻掩模
公开(公告)号：US20050056351A1
公开(公告)日：2005-03-17
申请号：US10912123
申请日：2004-08-06
申请人： Tomohiro Yamada , Ryo Kuroda
发明人： Tomohiro Yamada , Ryo Kuroda
IPC分类号： B32B15/04 , G03F1/48 , G03F7/00 , G03F9/00 , H01L21/027
CPC分类号： C23C26/00 , B82Y10/00 , B82Y40/00 , G03F1/50 , G03F7/0002
摘要： A surface treatment method includes a step of forming a metal layer on at least a part of a surface of a structural member, and a step of exposing the metal layer to a plasma based on SF6 to effect surface treatment.
摘要翻译：表面处理方法包括在结构构件的表面的至少一部分上形成金属层的步骤，以及基于SF 6将金属层暴露于等离子体以进行表面处理的步骤。

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