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81. 发明授权

US07723133B2 Method for forming pattern, and method for manufacturing liquid crystal display 有权
标题翻译：形成图案的方法和制造液晶显示器的方法
公开(公告)号：US07723133B2
公开(公告)日：2010-05-25
申请号：US11769301
申请日：2007-06-27
申请人： Katsuyuki Moriya , Toshimitsu Hirai
发明人： Katsuyuki Moriya , Toshimitsu Hirai
IPC分类号： H01L21/00
CPC分类号： G03F7/0007 , G02F2001/136295 , H05K3/0023 , H05K3/1241 , H05K3/1258 , H05K2201/09727 , H05K2201/09909 , H05K2203/1173
摘要： A method for forming a pattern, comprises: forming a bank film on a substrate; performing a lyophobic treatment on a surface of the bank film; patterning the bank film on which the lyophobic treatment has been performed to form a bank; performing a surface modification treatment in which a hydroxyl group on a surface of a pattern forming region partitioned by the bank is alkylated; disposing a functional liquid in the pattern forming region; and firing the functional liquid to form a pattern.
摘要翻译：一种形成图案的方法，包括：在基板上形成堤膜; 对银膜的表面进行疏油处理; 图案化已经进行疏油处理的银行薄膜以形成银行; 进行表面改性处理，其中由所述堤分隔的图案形成区域的表面上的羟基被烷基化; 在图案形成区域中设置功能性液体; 并烧制功能液体以形成图案。

82. 发明授权

US07713578B2 Method for fabricating thin film pattern, method for fabricating device, electro-optical apparatus, and electronic apparatus 有权
标题翻译：薄膜图案的制造方法，制造装置的方法，电光装置和电子装置
公开(公告)号：US07713578B2
公开(公告)日：2010-05-11
申请号：US10849235
申请日：2004-05-20
申请人： Toshimitsu Hirai
发明人： Toshimitsu Hirai
IPC分类号： G03F9/00
CPC分类号： H01L27/14687 , G02F2001/136295 , H01L21/288 , H01L27/12 , H01L27/1292 , H01L27/3244 , H01L27/3295 , H01L51/0005 , H01L51/0021 , H05K3/1241
摘要： A method for fabricating a thin film pattern on a substrate includes a bank forming step of forming banks in a predetermined pattern on said substrate, a first material disposing step of disposing first liquid droplets made of a function liquid between said banks to form a first pattern, a second material disposing step of disposing second liquid droplets made of a function liquid on said first pattern, and an intermediate drying step of removing at least a part of a solvent contained in said first liquid droplets between said first material disposing step and said second material disposing step.
摘要翻译：在基板上制造薄膜图案的方法包括：在所述基板上以预定图案形成堤的堤形成步骤;在所述堤之间设置由功能液体制成的第一液滴形成第一图案的第一材料设置步骤; 第二材料配置步骤，将由功能液体制成的第二液滴设置在所述第一图案上;以及中间干燥步骤，在所述第一材料配置步骤和所述第二材料配置步骤之间除去包含在所述第一液滴中的溶剂的至少一部分材料配置步骤

83. 发明申请

US20100055559A1 BATTERY AND METHOD FOR PRODUCING SAME 审中-公开
标题翻译：电池及其制造方法
公开(公告)号：US20100055559A1
公开(公告)日：2010-03-04
申请号：US12546722
申请日：2009-08-25
申请人： Toshimitsu Hirai , Yasushi Takano , Kohei Ishida
发明人： Toshimitsu Hirai , Yasushi Takano , Kohei Ishida
IPC分类号： H01M6/12 , H01M4/82
CPC分类号： H01M10/0436 , H01M10/0525 , Y10T29/49108
摘要： A battery includes a base member and a plurality of films arranged adjacent to each other on a same surface of the base member, at least a part of one of the films being overlapped with an adjacent one of the films.
摘要翻译：电池包括基底构件和在基底构件的相同表面上彼此相邻布置的多个膜，其中一个膜的至少一部分与相邻的一个膜重叠。

84. 发明授权

US07604922B2 Process of surface treatment, surface treating device, surface treated plate, and electro-optic device, and electronic equipment 失效
标题翻译：表面处理，表面处理装置，表面处理板和电光装置以及电子设备的处理
公开(公告)号：US07604922B2
公开(公告)日：2009-10-20
申请号：US11426453
申请日：2006-06-26
申请人： Toshimitsu Hirai , Hironori Hasei
发明人： Toshimitsu Hirai , Hironori Hasei
IPC分类号： H01J3/14 , H01L21/00
CPC分类号： H05K3/1208 , G01N2013/0208 , G02F1/13439 , G06K19/07749 , H01J2209/02 , H01J2217/49207 , H05K2203/1173
摘要： A process of providing a hydrophobic property to the surface of a plate, and a process of providing a hydrophilic property to the surface by irradiating energy light (radiation) on the surface of the plate, which is provided with the hydrophobic property are provided Variations in the accumulated illumination intensity of radiation on the surface of the plate are controlled to 20% or less.
摘要翻译：提供了一种对板表面提供疏水性的方法，以及通过在提供疏水性的板的表面上照射能量光（辐射）而向表面提供亲水性的方法提供了变化将板的表面上的辐射累积照射强度控制在20％以下。

85. 发明授权

US07547567B2 Method of forming film pattern, device, method of manufacturing device, electro-optical device, and electronic apparatus 失效
标题翻译：薄膜图案的形成方法，装置，制造装置的方法，电光装置和电子装置
公开(公告)号：US07547567B2
公开(公告)日：2009-06-16
申请号：US11347689
申请日：2006-02-03
申请人： Katsuyuki Moriya , Toshimitsu Hirai
发明人： Katsuyuki Moriya , Toshimitsu Hirai
IPC分类号： H01L21/00
CPC分类号： H01L27/3246 , H01L27/3276 , H01L51/0005 , H01L51/0022 , H01L51/56 , H05K3/125 , H05K3/1258 , H05K2203/013 , H05K2203/0568 , H05K2203/1173
摘要： A method of forming a film pattern by disposing functional liquid on a substrate includes: forming banks on the substrate; disposing the functional liquid in regions partitioned by the banks; and drying the functional liquid disposed on the substrate. The forming of the banks includes forming a thin film on the substrate, the thin film being made of a material for forming the banks, performing lyophobic treatment on a surface of the thin film, and patterning the thin film into the shapes of the banks.
摘要翻译：通过在基板上配置功能性液体来形成膜图案的方法包括：在基板上形成堤; 将功能液体置于由银行划分的区域内; 并干燥设置在基板上的功能液。堤的形成包括在基板上形成薄膜，薄膜由用于形成堤的材料制成，在薄膜的表面上进行疏液处理，并将薄膜图案化成堤的形状。

86. 发明授权

US07429530B2 Method of forming a pattern, method of forming wiring, semiconductor device, TFT device, electro-optic device, and electronic instrument 有权
标题翻译：形成图案的方法，布线形成方法，半导体器件，TFT器件，电光器件和电子仪器
公开(公告)号：US07429530B2
公开(公告)日：2008-09-30
申请号：US11232328
申请日：2005-09-21
申请人： Katsuyuki Moriya , Toshimitsu Hirai
发明人： Katsuyuki Moriya , Toshimitsu Hirai
IPC分类号： H01L21/44
CPC分类号： H01L21/288 , H01L21/76838 , H01L27/1292
摘要： A method of forming a pattern of a functional layer on a surface of a substrate, where a pattern region, to which the pattern is provided, is edged with a boundary layer, and has a first region and a second region communicated with the first region and having a narrower width than the first region, the method includes: providing an intermediate layer having adhesiveness with the substrate and lyophilicity with a functional fluid to the first and the second regions; ejecting a droplet of the functional fluid to the first region; and allowing the droplet of the functional fluid ejected to the first region to automatically flow to the second region with the lyophilicity with the intermediate layer.
摘要翻译：在基板的表面上形成功能层的图案的方法，其中设置有图案的图案区域边界层边缘化，并且具有与第一区域连通的第一区域和第二区域并且具有比第一区域窄的宽度，该方法包括：提供与基底具有粘合性的中间层和具有功能流体的第一和第二区域的亲液性; 将功能流体液滴喷射到第一区域; 并且允许喷射到第一区域的功能流体的液滴以与中间层的亲液性自动流动到第二区域。

87. 发明授权

US07410905B2 Method for fabricating thin film pattern, device and fabricating method therefor, method for fabricating liquid crystal display, liquid crystal display, method for fabricating active matrix substrate, electro-optical apparatus, and electrical apparatus 失效
标题翻译：制造薄膜图案的方法，其装置及其制造方法，液晶显示器的制造方法，液晶显示器，有源矩阵基板的制造方法，电光装置和电气设备
公开(公告)号：US07410905B2
公开(公告)日：2008-08-12
申请号：US10854668
申请日：2004-05-27
申请人： Toshihiro Ushiyama , Toshimitsu Hirai , Toshiaki Mikoshiba , Hiroshi Kiguchi , Hironori Hasei
发明人： Toshihiro Ushiyama , Toshimitsu Hirai , Toshiaki Mikoshiba , Hiroshi Kiguchi , Hironori Hasei
IPC分类号： H01L21/30 , B05D7/00 , B41J2/01
CPC分类号： H05K3/1258 , G02F1/13439 , G02F2001/136295 , H01L27/12 , H01L27/1292 , H01L27/3211 , H01L51/0004 , H05K3/107 , H05K3/1241 , H05K2201/09036 , H05K2201/09909
摘要： A method for fabricating a thin film pattern on a substrate, includes the steps of: forming a concave part on the substrate that conforms to the thin film pattern; and applying a function liquid into the concave part.
摘要翻译：一种在基板上制造薄膜图案的方法，包括以下步骤：在基板上形成符合薄膜图案的凹部; 以及将功能液施加到所述凹部中。

88. 发明授权

US07371698B2 Method of forming film pattern, active matrix substrate, electro-optic device, and electronic apparatus 失效
标题翻译：形成膜图案，有源矩阵基板，电光器件和电子设备的方法
公开(公告)号：US07371698B2
公开(公告)日：2008-05-13
申请号：US11419830
申请日：2006-05-23
申请人： Katsuyuki Moriya , Toshimitsu Hirai
发明人： Katsuyuki Moriya , Toshimitsu Hirai
IPC分类号： H01L21/469
CPC分类号： H01L51/0005 , H01L27/3295
摘要： A method of forming a film pattern includes the steps of forming a bank for partitioning a pattern forming area including a first pattern forming area and a second pattern forming area having an intersection with the first pattern forming area and divided in the intersection into sub-areas, disposing a functional liquid to the first pattern forming area to form a first film pattern, and disposing a functional liquid to the sub-areas to form second film patterns, executing a lyophobic process on the entire surface of a substrate including the first film pattern, the second film patterns, and the bank, weakening the lyophobicity on the substrate while selectively maintaining the lyophobicity on predetermined positions of the respective second film patterns formed in a divided condition after executing the lyophobic process, stacking a cap layer on the first film pattern and the second film patterns after weakening the lyophobicity, removing the lyophobicity in the predetermined positions of the respective second film patterns formed in the divided condition after stacking the cap layer, and forming a conductive film between the predetermined position of one of the second film patterns and the predetermined position of another of the second film patterns to electrically connect the second film patterns formed in the divided condition.
摘要翻译：一种形成膜图案的方法包括以下步骤：形成用于分割包括第一图案形成区域的图案形成区域的堤岸和与第一图案形成区域相交的第二图案形成区域，并将其交叉分成子区域将功能液体配置到第一图案形成区域以形成第一膜图案，并且将功能液体设置到子区域以形成第二膜图案，在包括第一膜图案的基板的整个表面上执行疏液工艺，第二膜图案和堤岸，在执行疏液处理之后，以分离状态形成的各个第二膜图案的预定位置选择性地保持疏液性，从而削弱基板上的疏液性，在第一膜图案上堆叠盖层并且在弱化疏液性之后的第二膜图案，去除预定位置的疏液性在层叠盖层之后以分割状态形成的各个第二膜图案，以及在第二膜图案之一的预定位置和另一个第二膜图案的预定位置之间形成导电膜，以将第二膜模式形成于分割状态。

89. 发明授权

US07364622B2 Method and apparatus for fabricating a device, and the device and an electronic equipment 失效
标题翻译：用于制造装置的方法和装置，以及装置和电子设备
公开(公告)号：US07364622B2
公开(公告)日：2008-04-29
申请号：US10382576
申请日：2003-03-07
申请人： Hironori Hasei , Toshimitsu Hirai
发明人： Hironori Hasei , Toshimitsu Hirai
IPC分类号： B05B13/02
CPC分类号： H01L21/76802 , B41J2/14233 , B41J2202/09 , H01L21/76826 , H01L27/1285 , H01L27/1292 , H01L27/3244 , H01L51/56 , H01L2251/5315
摘要： The invention provides an apparatus for fabricating a device, in which a high operation efficiency is maintained in a drying treatment for a multilayer-interconnection device. The device can also be fabricated inexpensively. An apparatus for fabricating a device has an inkjet unit that can dispose a liquid material on a substrate, and a preparatory dryer to blow a gas heated at a predetermined temperature to the substrate.
摘要翻译：本发明提供一种用于制造装置的装置，其中在多层互连装置的干燥处理中维持高操作效率。该装置也可以廉价地制造。一种用于制造装置的装置具有能够将液体材料配置在基板上的喷墨单元和将预定温度加热的气体吹向基板的预备干燥机。

90. 发明授权

US07326585B2 Forming process of thin film pattern and manufacturing process of device, electro-optical apparatus and electronic apparatus 失效
标题翻译：薄膜图案的形成过程和器件，电光设备和电子设备的制造过程
公开(公告)号：US07326585B2
公开(公告)日：2008-02-05
申请号：US10843426
申请日：2004-05-12
申请人： Toshimitsu Hirai
发明人： Toshimitsu Hirai
IPC分类号： H01L21/00
CPC分类号： H05K3/1258 , H01L21/02422 , H01L21/02532 , H01L21/02639 , H01L21/288 , H01L21/3205 , H01L21/76838 , H05K3/125 , H05K2201/09909 , H05K2203/1173
摘要： The invention provides a forming process of a thin film pattern capable of properly realizing a thin line. The forming process of a thin film pattern of the invention can be a process of forming a thin film pattern by arranging a functional liquid on a substrate P. The process can include a bank forming step to set up banks protrudingly on the substrate corresponding to the thin film pattern, a repellent liquefaction step of imparting a liquid repellent property to the bank by CF4 plasma processing, and a material arranging step of arranging the functional liquid between the banks imparted with the liquid repellent property.
摘要翻译：本发明提供能够适当地实现细线的薄膜图案的成形工艺。本发明的薄膜图案的形成过程可以是通过在基板P上布置功能液体来形成薄膜图案的工艺。该工艺可以包括堤形成步骤，用于在对应于基板P的基板上突出地设置堤薄膜图案，通过CF 4等离子体处理赋予堤的疏液性的驱避剂液化工序，以及在赋予防液性的两组之间配置功能性液体的材料配置工序。

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