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    • 82. 发明授权
    • Sulfonyl hydrazide developers for photothermographic and thermographic
elements
    • 用于光热照相和热成像元素的磺酰基酰肼显影剂
    • US5464738A
    • 1995-11-07
    • US369738
    • 1995-01-06
    • Doreen C. LynchSharon M. SimpsonPaul G. Skoug
    • Doreen C. LynchSharon M. SimpsonPaul G. Skoug
    • G03C8/40B41M5/333G03C1/498
    • G03C1/49827B41M5/3333G03C1/061G03C1/4989
    • Sulfonyl hydrazides are used as developers in phothothermographic and thermographic elements. The sulfonyl hydrazides have the formula:R.sup.1 --CO--NHNH--SO.sub.2 --R.sup.2wherein R.sup.1 and R.sup.2 may be each independently selected from the group consisting of alkyl and alkenyl groups of up to 20 carbon atoms, preferably alkyl and alkenyl of up to 10 carbon atoms, more preferably alkyl and alkenyl groups of up to 5 carbon atoms; alkoxy groups of up to 20 carbon atoms, preferably of up to 10 carbon atoms, and more preferably of up to 5 carbon atoms; aryl, alkaryl, and aralkyl groups of up to 20 carbon atoms, preferably of up to 10 carbon atoms, and more preferably up to 6 carbon atoms; aryloxy groups of up to 20 carbon atoms, preferably of up to 10 carbon atoms, and more preferably of up to 6 carbon atoms; non-aromatic and aromatic heterocyclic ring groups containing up to 6 ring atoms; alicyclic ring groups containing up to 6 ring carbon atoms; and fused ring and bridging groups comprising up to 14 ring atoms.The photothermographic and thermographic elements the present invention may be used as a photomaks in a process where there is a subsequent exposure of an ultraviolet radiation sensitive imageable medium.
    • 磺酰肼用作光热敏成像和热成像元件中的显影剂。 磺酰肼具有下式:R1-CO-NHNH-SO2-R2,其中R1和R2可以各自独立地选自由至多20个碳原子的烷基和烯基组成的组,优选至多10个碳原子的烷基和链烯基 原子,更优选至多5个碳原子的烷基和链烯基; 优选至多20个碳原子,优选至多10个碳原子,更优选至多5个碳原子的烷氧基; 最多20个碳原子,优选至多10个碳原子,更优选最多6个碳原子的芳基,烷芳基和芳烷基; 最多20个碳原子,优选至多10个碳原子,更优选至多6个碳原子的芳氧基; 含有至多6个环原子的非芳族和芳族杂环基团; 含有多达6个环碳原子的脂环族基团; 以及包含至多14个环原子的稠合环和桥连基团。 本发明的光热敏照相和热成像元件可以在随后暴露紫外线照射敏感成像介质的过程中用作光敏元件。