专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

81. 发明申请

US20140030844A1 BIFACIAL SOLAR CELL USING ION IMPLANTATION 有权
标题翻译：使用离子植入的双极太阳能电池
公开(公告)号：US20140030844A1
公开(公告)日：2014-01-30
申请号：US14043115
申请日：2013-10-01
申请人： Atul Gupta , Nicholas P.T. Bateman
发明人： Atul Gupta , Nicholas P.T. Bateman
IPC分类号： H01L31/18
CPC分类号： H01L31/18 , H01L31/0684 , H01L31/1804 , H01L31/1864 , H01L31/1868 , Y02E10/547 , Y02P70/521
摘要： An improved bifacial solar cell is disclosed. In some embodiments, the front side includes an n-type field surface field, while the back side includes a p-type emitter. In other embodiments, the p-type emitter is on the front side. To maximize the diffusion of majority carriers and lower the series resistance between the contact and the substrate, the regions beneath the metal contacts are more heavily doped. Thus, regions of higher dopant concentration are created in at least one of the FSF or the emitter. These regions are created through the use of selective implants, which can be performed on one or two sides of the bifacial solar cell to improve efficiency.
摘要翻译：公开了一种改进的双面太阳能电池。在一些实施例中，前侧包括n型场表面场，而后侧包括p型发射器。在其他实施例中，p型发射器在前侧。为了使多数载流子的扩散最大化并降低接触和衬底之间的串联电阻，金属接触点下方的区域更加重掺杂。因此，在至少一个FSF或发射极中产生较高掺杂浓度的区域。这些区域是通过使用选择性植入物产生的，这可以在双面太阳能电池的一侧或两侧进行，以提高效率。

82. 发明授权

US08216923B2 Integrated shadow mask/carrier for patterned ion implantation 失效
标题翻译：用于图案化离子注入的集成阴影掩模/载体
公开(公告)号：US08216923B2
公开(公告)日：2012-07-10
申请号：US12895927
申请日：2010-10-01
申请人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
发明人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
IPC分类号： H01L21/425
CPC分类号： H01L21/677 , H01J37/3171 , H01J2237/31711 , H01L21/68735 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。此外，公开了改进的基板载体。通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。在一些实施例中，可以使用载体创建各种图案，使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤。此外，由于基板与载体的对准是关键的，所以载体可以包含对准特征以确保基板正确地定位在载体上。在一些实施例中，使用重力来将衬底保持在载体上，因此，引导离子使得离子束朝向载体的底侧向上移动。

83. 发明授权

US08097866B2 Apparatus for measuring beam characteristics and a method thereof 有权
标题翻译：用于测量光束特性的装置及其方法
公开(公告)号：US08097866B2
公开(公告)日：2012-01-17
申请号：US12031643
申请日：2008-02-14
申请人： Joseph C. Olson , Atul Gupta
发明人： Joseph C. Olson , Atul Gupta
IPC分类号： G01T1/00
CPC分类号： H01J37/3171 , H01J37/304 , H01J2237/2446 , H01J2237/24507 , H01J2237/24528 , H01J2237/24542
摘要： An apparatus and a method for detecting particle beam characteristics are disclosed. In one embodiment, the apparatus may have a body including a first end and second end and at least one detector between the first and second ends. The apparatus may have a transparent state where a portion of the particles entering the apparatus may pass through the apparatus. The apparatus may also have a minimum transparency state where substantially all of the particles entering the apparatus may be prevented from passing through the apparatus and detected. Different transparency state may be achieved by rotating the apparatus or the detector contained therein. With the apparatus, it is possible to detect the beam properties such as the beam intensity, angle, parallelism, and a distribution of the particles in a particle beam.
摘要翻译：公开了一种用于检测粒子束特性的装置和方法。在一个实施例中，设备可以具有包括第一端和第二端的主体以及在第一端和第二端之间的至少一个检测器。该设备可以具有透明状态，其中进入设备的一部分颗粒可以通过设备。该装置还可以具有最小的透明度状态，其中可以防止进入装置的基本上所有的颗粒通过装置并被检测。可以通过旋转装置或其中包含的检测器来实现不同的透明度状态。利用该装置，可以检测诸如光束强度，角度，平行度以及颗粒束中颗粒分布的光束特性。

84. 发明授权

US08084293B2 Continuously optimized solar cell metallization design through feed-forward process 有权
标题翻译：通过前馈过程不断优化太阳能电池金属化设计
公开(公告)号：US08084293B2
公开(公告)日：2011-12-27
申请号：US12754712
申请日：2010-04-06
申请人： Benjamin Riordon , Russell Low , Atul Gupta , William Weaver
发明人： Benjamin Riordon , Russell Low , Atul Gupta , William Weaver
IPC分类号： H01L21/00
CPC分类号： H01L31/022425 , H01L21/266 , H01L31/022433 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells, is disclosed. The doped regions are created on the substrate, using a mask or without the use of lithography or masks. After the implantation is complete, visual recognition is used to determine the exact region that was implanted. This information can then be used by subsequent process steps to crate a suitable metallization layer and provide alignment information. These techniques can also be used in other ion implanter applications. In another aspect, a dot pattern selective emitter is created and imaging is used to determine the appropriate metallization layer.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。使用掩模或不使用光刻或掩模在衬底上产生掺杂区域。植入完成后，使用视觉识别来确定植入的确切区域。然后可以通过随后的工艺步骤来使用该信息来对合适的金属化层进行包装并提供对准信息。这些技术也可用于其他离子注入机应用。在另一方面，产生点图案选择性发射体，并且使用成像来确定合适的金属化层。

85. 发明申请

US20110272602A1 Masked Ion Implant with Fast-Slow Scan 失效
标题翻译：具有快速扫描的掩蔽离子植入物
公开(公告)号：US20110272602A1
公开(公告)日：2011-11-10
申请号：US13188837
申请日：2011-07-22
申请人： Nicholas P.T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
发明人： Nicholas P.T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
IPC分类号： G21K5/10
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/31711 , H01L21/266 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.
摘要翻译：制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。离子束被引导通过掩模中的多个孔朝向衬底。衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。

86. 发明申请

US20110244625A1 Continuously Optimized Solar Cell Metallization Design through Feed-Forward Process 有权
标题翻译：通过前馈过程持续优化太阳能电池金属化设计
公开(公告)号：US20110244625A1
公开(公告)日：2011-10-06
申请号：US12754712
申请日：2010-04-06
申请人： Benjamin Riordon , Russell Low , Atul Gupta , William Weaver
发明人： Benjamin Riordon , Russell Low , Atul Gupta , William Weaver
IPC分类号： H01L31/18
CPC分类号： H01L31/022425 , H01L21/266 , H01L31/022433 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells, is disclosed. The doped regions are created on the substrate, using a mask or without the use of lithography or masks. After the implantation is complete, visual recognition is used to determine the exact region that was implanted. This information can then be used by subsequent process steps to crate a suitable metallization layer and provide alignment information. These techniques can also be used in other ion implanter applications. In another aspect, a dot pattern selective emitter is created and imaging is used to determine the appropriate metallization layer.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。使用掩模或不使用光刻或掩模在衬底上产生掺杂区域。植入完成后，使用视觉识别来确定植入的确切区域。然后可以通过随后的工艺步骤来使用该信息来对合适的金属化层进行包装并提供对准信息。这些技术也可用于其他离子注入机应用。在另一方面，产生点图案选择性发射体，并且使用成像来确定合适的金属化层。

87. 发明授权

US08008176B2 Masked ion implant with fast-slow scan 有权
标题翻译：具有快速扫描的掩蔽离子植入物
公开(公告)号：US08008176B2
公开(公告)日：2011-08-30
申请号：US12853698
申请日：2010-08-10
申请人： Nicholas P. T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
发明人： Nicholas P. T. Bateman , Steven M. Anella , Benjamin B. Riordon , Atul Gupta
IPC分类号： H01L21/425
CPC分类号： H01J37/3171 , H01J37/20 , H01J2237/20228 , H01J2237/31711 , H01L21/266 , H01L31/068 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.
摘要翻译：制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。离子束被引导通过掩模中的多个孔朝向衬底。衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。

88. 发明申请

US20110124186A1 APPARATUS AND METHOD FOR CONTROLLABLY IMPLANTING WORKPIECES 有权
标题翻译：用于控制工件的装置和方法
公开(公告)号：US20110124186A1
公开(公告)日：2011-05-26
申请号：US12947078
申请日：2010-11-16
申请人： Anthony Renau , Ludovic Godet , Timothy J. Miller , Joseph C. Olson , Vikram Singh , James Buonodono , Frank Sinclair , Deepak A. Ramappa , Russell Low , Atul Gupta , Kevin M. Daniels
发明人： Anthony Renau , Ludovic Godet , Timothy J. Miller , Joseph C. Olson , Vikram Singh , James Buonodono , Frank Sinclair , Deepak A. Ramappa , Russell Low , Atul Gupta , Kevin M. Daniels
IPC分类号： H01L21/265 , G21K5/10
CPC分类号： B01J19/081 , H01J37/3171 , H01J37/32357 , H01J37/32422 , H01J37/32623 , H01J2237/0453 , H01J2237/1205 , H01L21/2236 , H01L31/022425 , H01L31/068 , H01L31/08 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.
摘要翻译：等离子体处理装置包括等离子体源，其被配置为在等离子体室中产生等离子体，使得等离子体包含用于注入工件的离子。该装置还包括聚焦板装置，该聚焦板装置具有孔结构，其被配置为修改离开聚焦板附近的等离子体鞘的等离子体鞘的形状，使得离开孔结构的孔的离子限定聚焦离子。该设备还包括处理室，其包含与聚焦板间隔开的工件，使得在工件处的聚焦离子的固定注入区域基本上比孔更窄。该装置被配置为通过在离子注入期间扫描工件来在工件中产生多个图案化区域。

89. 发明授权

US07888249B2 Use of chained implants in solar cell 有权
标题翻译：在太阳能电池中使用链式植入物
公开(公告)号：US07888249B2
公开(公告)日：2011-02-15
申请号：US12760227
申请日：2010-04-14
申请人： Nicholas P. T. Bateman , Atul Gupta , Paul Sullivan , Paul J. Murphy
发明人： Nicholas P. T. Bateman , Atul Gupta , Paul Sullivan , Paul J. Murphy
IPC分类号： H01L21/425
CPC分类号： H01L31/18 , H01J37/3171 , H01J37/32412 , H01J2237/0827 , H01J2237/202 , H01J2237/31711 , H01L21/26513 , H01L21/266 , H01L31/068 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The manufacture of solar cells is simplified and cost reduced through by performing successive ion implants, without an intervening thermal cycle. In addition to reducing process time, the use of chained ion implantations may also improve the performance of the solar cell. In another embodiment, two different species are successively implanted without breaking vacuum. In another embodiment, the substrate is implanted, then flipped such that it can be and implanted on both sides before being annealed. In yet another embodiment, one or more different masks are applied and successive implantations are performed without breaking the vacuum condition, thereby reducing the process time.
摘要翻译：太阳能电池的制造通过执行连续的离子注入而没有中间热循环而简化并降低成本。除了缩短处理时间之外，使用链式离子注入也可以提高太阳能电池的性能。在另一个实施方案中，连续地植入两种不同的物质而不破坏真空。在另一个实施例中，植入衬底，然后翻转，使得其可以在退火之前两面植入。在另一个实施例中，施加一个或多个不同的掩模，并且在不破坏真空条件的情况下执行连续的注入，由此减少处理时间。

90. 发明授权

US07868305B2 Technique for ion beam angle spread control 有权
标题翻译：离子束角扩散控制技术
公开(公告)号：US07868305B2
公开(公告)日：2011-01-11
申请号：US11145949
申请日：2005-06-07
申请人： Atul Gupta , Joseph C. Olson
发明人： Atul Gupta , Joseph C. Olson
IPC分类号： H01J37/302
CPC分类号： H01J37/304 , H01J37/1477 , H01J37/3171 , H01J2237/1507 , H01J2237/3045 , H01J2237/30455 , H01J2237/30472 , H01J2237/31703 , H01L21/26586
摘要： A technique for ion beam angle spread control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread control. The method may comprise directing one or more ion beams at a substrate surface at two or more different incident angles, thereby exposing the substrate surface to a controlled spread of ion beam incident angles.
摘要翻译：公开了一种用于离子束角度扩展控制的技术。在一个特定的示例性实施例中，该技术可以被实现为用于离子束角度扩展控制的方法。该方法可以包括以两个或更多个不同的入射角度在衬底表面处引导一个或多个离子束，从而将衬底表面暴露于受控的离子束入射角扩散。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式