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    • 81. 发明申请
    • Electroformed mold and manufacturing method therefor
    • 电铸模具及其制造方法
    • US20080254162A1
    • 2008-10-16
    • US12076974
    • 2008-03-26
    • Kimihiro IimuraMuneo FurutaniShoji ArakiNobuyoshi Tanaka
    • Kimihiro IimuraMuneo FurutaniShoji ArakiNobuyoshi Tanaka
    • C25D1/10B29B11/06
    • B29C33/04C25D1/10
    • It includes an electroformed shell 6, which has a molding surface 60 and is formed by electroforming processing, a media flow path 2 for circulating a heat medium so as to perform temperature adjustment on the molding surface 60 formed in the electroformed shell 6, a backing member 71 with which the electroformed shell 6 is backed, and media conveying paths 74, respectively provided in an upstream-side end portion 21 and a downstream-side end portion 21, for flowing a heat medium into or out of the media flow path 2. A connecting jig 1 for connecting the media flow path 2 and the media conveying paths 74 is embedded in the electroformed shell 6. The connecting jig 1 includes a cavity portion formed therein, an opening hole having a cross-sectional shape which is substantially the same as the shape of a radially cross-section of the media flow path 2, and a connecting hole having a cross-sectional shape which is substantially the same as the shape of an outside diametrical cross-section of a pipe member 741 constituting each of the media conveying paths 74. The opening hole and the connecting hole are communicated with each other through the cavity portion.
    • 它包括电铸壳6,其具有成型表面60并且通过电铸处理形成;介质流路2,用于循环热介质,以便在形成于电铸壳6中的模制表面60上进行温度调节;背衬 电动外壳6支撑的构件71和分别设置在上游侧端部21和下游侧端部21中的介质输送路径74,用于使热介质流入或流出介质流路2 。 用于连接介质流路2和介质输送路径74的连接夹具1嵌入电铸壳6中。 连接夹具1包括形成在其中的空腔部分,具有与介质流动路径2的径向横截面的形状基本相同的横截面形状的开孔,以及具有横截面的连接孔 形状与构成每个介质输送路径74的管构件741的外径截面的形状大致相同。 开孔和连接孔通过空腔部彼此连通。
    • 82. 发明授权
    • Connector for use in substrate
    • 用于基板的连接器
    • US07357670B2
    • 2008-04-15
    • US11656719
    • 2007-01-23
    • Nobuyoshi Tanaka
    • Nobuyoshi Tanaka
    • H01R13/60
    • H01R12/7017H01R12/724
    • A fixing part (12) has two resiliently deformable legs (18) separated by a slot (17). A locking projection (19) is formed at a distal end (19C) of the fixing part (12) and has a locking surface (19A) spaced from the distal end (19C). A maximum cross-sectional dimension (A) of the fixing part (12) at the locking surface (19A) exceeds the diameter (d) of a through-hole (71) in a substrate (70). A tapered sliding-contact surface (19B) extends from the locking surface (19A) to the distal end (19C). Noncontact surfaces (21) are at opposite circumferential ends of each sliding contact surface (19B) and substantially adjacent the slot (17). The noncontact surfaces (22) of each locking projection (19) are spaced from one another at the slot (17) by distances that are no greater than the diameter (d) of the through-hole (71).
    • 固定部分(12)具有由槽(17)分开的两个可弹性变形的支脚(18)。 锁定突起(19)形成在固定部分(12)的远端(19C)处并且具有与远端(19C)间隔开的锁定表面(19A)。 固定部分(12)在锁定表面(11A)处的最大横截面尺寸(A)超过衬底(70)中的通孔(71)的直径(d)。 锥形滑动接触表面(19B)从锁定表面(19A)延伸到远端(19C)。 非接触表面(21)在每个滑动接触表面(19B)的相对的周向端部处并且基本上邻近狭槽(17)。 每个锁定突起(19)的非接触表面(22)在槽(17)处彼此间隔开不超过通孔(71)的直径(d)的距离。
    • 83. 发明授权
    • Projection exposure apparatus
    • 投影曝光装置
    • US07158210B2
    • 2007-01-02
    • US10762481
    • 2004-01-23
    • Kazuo IizukaJunji IsohataNobuyoshi Tanaka
    • Kazuo IizukaJunji IsohataNobuyoshi Tanaka
    • G03B27/42G03B27/32
    • G03F7/70791G03F7/70066G03F7/70291G03F7/70425G03F7/70466G03F7/70475
    • A projection exposure apparatus with a small size and low cost suitable for repeated pattern exposure. The apparatus includes an illumination system which irradiates light to a mask including plural columns of a mask pattern for repeated exposure to a member to form plural columns of an exposure pattern, a projection system which projects light from the mask onto the member, an exposure stage which moves the member, and a mask stage which moves the mask. The light irradiation and step driving of the exposure stage for moving the member by a movement amount equal to n times a pitch of the columns of the exposure pattern are alternately performed. The mask is moved by a movement amount equal to n times a pitch of the columns of the mask pattern with step driving of the exposure stage in early and later phases of the repeated exposure.
    • 具有小尺寸和低成本的投影曝光装置,适用于重复图案曝光。 该装置包括照射系统,其将光照射到包括多个掩模图案列的掩模,用于反复暴露于构件以形成多列曝光图案;投影系统,其将来自掩模的光投射到构件上;曝光台 移动该构件,以及移动面罩的掩模台。 交替执行用于使构件移动移动量等于曝光图案的列的间距的n倍的曝光台的光照射和阶跃驱动。 通过在反复曝光的早期阶段和稍后阶段中曝光阶段的步进驱动,将掩模移动等于掩模图案的列的间距的n倍的移动量。
    • 84. 发明授权
    • Projection exposure mask, projection exposure apparatus, and projection exposure method
    • 投影曝光掩模,投影曝光装置和投影曝光方法
    • US07030962B2
    • 2006-04-18
    • US10762468
    • 2004-01-23
    • Kazuo IizukaJunji IsohataNobuyoshi Tanaka
    • Kazuo IizukaJunji IsohataNobuyoshi Tanaka
    • G03B27/42G03B27/32G03F9/00
    • G03F7/7005G03F7/70208G03F7/70283G03F7/70308G03F7/70358G03F7/70466G03F7/70791
    • A projection exposure apparatus includes a projection exposure mask. The projection exposure mask includes a first mask pattern for exposing a member to form a continuous pattern thereon and a second mask pattern for exposing the member to form a discontinuous pattern thereon, one of the first and second mask patterns being a reflecting type mask and the other mask pattern being a transmitting type mask pattern, a projection system which projects light from the reflecting type mask pattern and light from the transmitting type mask pattern onto the member, a first illumination system which irradiates light to the reflecting type mask pattern from one side of the projection exposure mask, a second illumination system which irradiates light to the transmitting type mask pattern from the opposite side of the one side of the projection exposure mask, and a substrate stage which moves the member in a direction substantially orthogonal to a projection light axis of the projection system.
    • 投影曝光装置包括投影曝光掩模。 投影曝光掩模包括用于曝光构件以形成其上的连续图案的第一掩模图案和用于使构件暴露以在其上形成不连续图案的第二掩模图案,第一和第二掩模图案中的一个是反射型掩模, 其他掩模图案是透射型掩模图案,将来自反射型掩模图案的光和来自透射型掩模图案的光投射到构件上的投影系统,从一侧向反射​​型掩模图案照射光的第一照明系统 投影曝光掩模的第二照明系统,从投影曝光掩模的一侧的相对侧向发射型掩模图案照射光的第二照明系统;以及基板台,该基板台沿与投影光线大致正交的方向移动 投影系统的轴。
    • 87. 发明授权
    • Excimer laser oscillation apparatus
    • 准分子激光振荡装置
    • US06282221B1
    • 2001-08-28
    • US08891972
    • 1997-07-11
    • Tadahiro OhmiNobuyoshi Tanaka
    • Tadahiro OhmiNobuyoshi Tanaka
    • H01S322
    • H01S3/0388H01S3/0305H01S3/225
    • An excimer laser oscillation apparatus comprises a laser chamber for storing a laser gas, a pair of electrodes arranged in the chamber, and a voltage application circuit for applying a voltage to the pair of electrodes to excite the laser gas. A fluorine passivation film is formed on an inner surface of said laser chamber. The excimer laser apparatus further has a circuit for applying a voltage to the pair of electrodes to flow a current that exceeds a light-emission threshold value between the pair of electrodes while alternately changing a flowing direction thereof. And, the pair of electrodes have an oxygen content of not more than 10 ppm.
    • 准分子激光振荡装置包括用于存储激光气体的激光室,布置在腔室中的一对电极,以及用于向一对电极施加电压以激发激光气体的电压施加电路。 在所述激光室的内表面上形成氟钝化膜。 准分子激光装置还具有用于向一对电极施加电压以在一对电极之间流过超过发光阈值的电流同时交替改变其流动方向的电路。 并且,该对电极的氧含量不大于10ppm。
    • 89. 发明授权
    • Computer graphics system with texture mapping
    • 计算机图形系统与纹理映射
    • US5767858A
    • 1998-06-16
    • US566244
    • 1995-12-01
    • Kei KawaseNobuyoshi Tanaka
    • Kei KawaseNobuyoshi Tanaka
    • G06T11/20G06T15/00G09B9/08
    • G06T15/04
    • Provided are a plurality of texture memory clusters for storing interleaved texture image data composed of a plurality of texels in each memory so as to avoid duplication, each having a collecting circuit for computing, from the coordinates of a texture image for one pixel, texels for calculating a texture value corresponding to the coordinates, and for collecting the texel values from the plurality of texture memory clusters, and circuitry for calculating the texture value for the above one pixel from the collected texel values, a bus for interconnecting the plurality of memory clusters, and a plurality of texture generators each connected to one of the plurality of memory clusters for calculating the coordinates of the texture image for the above one pixel. Texel values can efficiently exchanged between each memory cluster without redundantly holding texels in memories.
    • 提供了多个纹理存储器簇,用于在每个存储器中存储由多个纹理构成的交织纹理图像数据,以避免重复,每个具有用于从一个像素的纹理图像的坐标计算的收集电路, 计算与所述坐标相对应的纹理值,以及用于从所述多个纹理存储器簇收集纹理值,以及用于从所收集的纹素值计算上述一个像素的纹理值的电路,用于互连所述多个存储器簇的总线 以及多个纹理生成器,每个纹理生成器连接到多个存储器簇中的一个用于计算上述一个像素的纹理图像的坐标。 Texel值可以在每个存储器集群之间高效地交换,而不会在存储器中冗余地保存纹素。