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    • 83. 发明申请
    • METHOD OF FORMING SEMICONDUCTOR THIN FILM AND INSPECTION DEVICE OF SEMICONDUCTOR THIN FILM
    • 形成半导体薄膜的方法和半导体薄膜检测装置
    • US20100197050A1
    • 2010-08-05
    • US12695347
    • 2010-01-28
    • Nobuhiko UmezuYoshio Inagaki
    • Nobuhiko UmezuYoshio Inagaki
    • H01L21/66H01L21/268H01L21/428G06F19/00
    • G01N21/45G01N21/8422G01N21/9501H01L21/02532H01L21/02675H01L22/12
    • A method of forming a semiconductor thin film includes the steps of: forming an amorphous semiconductor thin film on a substrate; partially forming a crystalline semiconductor thin film for each element region by irradiating laser light to the amorphous semiconductor thin film to selectively perform a heating treatment on the amorphous semiconductor thin film, and crystallizing an amorphous semiconductor thin film corresponding to an irradiation region; and inspecting crystallinity of the crystalline semiconductor thin film. The inspection step includes the steps of obtaining an optical step based on an optical phase difference between a crystallized region and an uncrystallized region by irradiating light to the crystalline semiconductor thin film and the amorphous semiconductor thin film, and evaluating one or both of sorting of the crystalline semiconductor thin film and control of crystallinity of the crystalline semiconductor thin film, based on the obtained optical step.
    • 一种形成半导体薄膜的方法包括以下步骤:在衬底上形成非晶半导体薄膜; 通过向非晶半导体薄膜照射激光来选择性地对非晶半导体薄膜进行加热处理,并使与照射区域相对应的非晶半导体薄膜结晶,从而对每个元件区域部分地形成晶体半导体薄膜; 并检查结晶半导体薄膜的结晶度。 检查步骤包括以下步骤:通过将光照射到结晶​​半导体薄膜和非晶半导体薄膜上,基于结晶区域和未结晶区域之间的光学相位差获得光学步骤,并评估其中的一个或两个 基于获得的光学步骤,结晶半导体薄膜和结晶半导体薄膜的结晶度的控制。
    • 89. 发明申请
    • Electrophotographic photoconductor and manufacturing method of electrophotographic photoconductor
    • 电子照相感光体和电子照相感光体的制造方法
    • US20070077507A1
    • 2007-04-05
    • US11523370
    • 2006-09-19
    • Junichiro OtsuboJun AzumaKeiji MaruoYoshio InagakiNorio NakaiKazunari HamasakiShiho Okawa
    • Junichiro OtsuboJun AzumaKeiji MaruoYoshio InagakiNorio NakaiKazunari HamasakiShiho Okawa
    • G03G5/14
    • G03G5/047G03G5/142G03G5/144
    • The present invention provides an electrophotographic photoconductor which can reduce the generation of fogging under a high-temperature and high-moisture condition and can be easily manufactured, and a method of manufacturing such an electrophotographic photoconductor. In an electrophotographic photoconductor which includes a support base body, an intermediate layer and a photoconductor layer and a manufacturing method of such an electrophotographic photoconductor, the intermediate layer contains titanium oxide and a binding resin and a ΔL value of the intermediate layer satisfies a following relationship formula (1) or a ΔA value of the intermediate layer satisfies a following relationship formula (2), that is, −5.0≦ΔL≦0 (1) and ΔA≦0.055 (2), wherein the ΔL value is a value which is obtained by subtracting an L value (a parameter value which is measured by a color-difference meter in accordance with JIS Z 8722) which is measured with respect to a single support base body from the L value which is measured in a state that the intermediate layer is formed on the support base body, and the ΔA value is a value which is obtained by subtracting reflection absorbance (a parameter value which is measured by a color-difference meter) which is measured with respect to a single support base body from the reflection absorbance which is measured in a state that the intermediate layer is formed on the support base body.
    • 本发明提供一种电子照相感光体,其可以在高温高湿条件下降低发烟,并且可以容易地制造,以及制造这种电照相感光体的方法。 在包括支撑基体,中间层和感光体层的电子照相感光体中,以及这种电子照相感光体的制造方法,中间层含有氧化钛和粘合树脂,中间层的ΔL值满足以下关系 式(1)或中间层的ΔA值满足关系式(2),即-5.0 <=ΔL<= 0(1)和ΔA<= 0.055(2),其中ΔL值为 通过从在一个状态下测量的L值中减去相对于单个支撑基体测量的L值(由根据JIS Z 8722测量的色差计的参数值)获得的值 中间层形成在支撑基体上,DeltaA值是通过减去反射吸光度(通过色差计测量的参数值)而获得的值 r),其从在支撑基体上形成中间层的状态下测量的反射吸光度相对于单个支撑体基体测量。