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81. 发明专利

JPH0295203A ALIGNING DEVICE 失效
公开(公告)号：JPH0295203A
公开(公告)日：1990-04-06
申请号：JP24814188
申请日：1988-09-30
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YAMAMOTO MASAKI , SATO TAKEO , AOKI SHINICHIRO , YAMAGUCHI KATSUMASA , NOMURA NOBORU
IPC分类号： G01B11/00 , H01L21/027
摘要： PURPOSE:To decrease the cost of a rough aligning table by providing a vernier type reference diffraction grating, 1st and 2nd vernier type diffraction gratings, a lens with positive power, and a split type photodetector. CONSTITUTION:Coherent light beam from a laser 4 is split by the two different- pitch diffraction gratings of the vernier type reference diffraction grating 6. The two split diffracted light beams are converged by the illumination lens 9 to generate diffracted light beams by two different-pitch close diffraction gratings of the 1st and 2nd vernier type diffraction gratings 7 and 8 provided to a mask 1 and a wafer 2. Then the diffracted light beams are converged on the split type photodetector 12 through an image forming lens 10 to obtain a signal corresponding to the position shift between the wafer 1 and wafer 2 and the measurement range of the position shift between the both is expanded with a difference in the period of the signal. Consequently, the mechanical accuracy requirements for the rough aligning table for aligning the mask 1 and wafer 2 within the position shift measurement range can be reduced and the cost of the rough aligning table is reduced.

82. 发明专利

JPH0288906A ALIGNMENT OPTICAL SYSTEM 失效
公开(公告)号：JPH0288906A
公开(公告)日：1990-03-29
申请号：JP24131488
申请日：1988-09-27
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YAMAMOTO MASAKI , SATO TAKEO , AOKI SHINICHIRO , YAMAGUCHI KATSUMASA
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027
摘要： PURPOSE:To always obtain a stable misalignment detecting signal regardless of the magnitude of reflectance on a wafer surface by inclining a misalignment detecting light beam in a direction orthogonally crossed with a misalignment detecting direction so that the light beam is made incident and providing an aperture for cutting multiple reflected light on a mask. CONSTITUTION:A beam projecting optical system is inclined in the direction perpendicular to the misalignment detecting direction so as to make the beam 1 obliquely incident and the aperture which can cut the multiple interference light between the mask 3 and the wafer 4 is provided on a mark. When the misalignment detecting beam 1 inclined by an angle alpha is made incident just on the aperture which opens to the mask 3 placed close to the wafer 4, the light exiting to the outside from the aperture of width alpha again after being reflected on the surface of the wafer becomes very little. Thus, gap dependent component included in the light obtained through the aperture can be made very little.

83. 发明专利

JPH0269927A ALIGNING OPTICAL APPARATUS 失效
公开(公告)号：JPH0269927A
公开(公告)日：1990-03-08
申请号：JP22171188
申请日：1988-09-05
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： AOKI SHINICHIRO , SATO TAKEO , YAMAGUCHI KATSUMASA , YAMAMOTO MASAKI , NOMURA NOBORU
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To easily align by aligning the focus of an objective lens moved by a first moving unit with the mark of a wafer to align a photomask with the wafer, and retreating the lens by a second moving unit at the time of exposure. CONSTITUTION:A first moving unit 7, and an objective lens 6 are moved vertically along a guide member 8, the focus of the lens is aligned to the aligning mark 18 of a photomask 1, and the position is measured by a TV camera 14 through a mirror 9, a half mirror 15 and a condensing lens 13. The unit 7 and the lens 6 are again moved vertically along the member 8. On the other hand, a wafer unit 3 is moved in directions X, Y, O, sequentially focused to two or more alignment marks 19 formed on a wafer 2 and the positions are measured by the camera 14. The unit 3 is moved in the directions X, Y, O from the results to be controlled to a normal position with respect to the photomask 1 at the exposure position. The lens 6, the units 8, 11 are moved horizontally along a base 12 to be retreated from the exposure region.

84. 发明专利

JP2005083447A Expansion/contraction structure and its control device 有权
标题翻译：扩展/承包结构及其控制装置
公开(公告)号：JP2005083447A
公开(公告)日：2005-03-31
申请号：JP2003315038
申请日：2003-09-08
申请人： Matsushita Electric Ind Co Ltd , 松下電器産業株式会社
发明人： OKAZAKI YASUNAO , YAMAMOTO MASAKI
IPC分类号： B25J19/00 , F15B15/10 , G05D3/12
摘要： PROBLEM TO BE SOLVED: To provide an elastic expansion/contraction structure, flexible, greatly displaceable, quickly responsive and controllable with high accuracy. SOLUTION: The expansion/contraction structure comprises a plurality of hollow elastic bodies 2, 4 arranged in series, a connection sealing member 8 for connecting the hollow elastic bodies 2, 4 to each other and sealing them with air tightness, a set of sealing members 6, 7 for sealing the hollow elastic bodies 2, 4 at their ends which are not sealed by the connection sealing member 8, and a fluid passing member 9 for pouring fluid into or out of the hollow insides of the hollow elastic bodies 2, 4. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供弹性膨胀/收缩结构，灵活，大可移位，快速响应和高精度可控。解决方案：膨胀/收缩结构包括多个串联布置的中空弹性体2,4，用于将中空弹性体2,4相互连接并密封它们的连接密封件8，一套用于密封未被连接密封构件8密封的中空弹性体2,4的密封构件6,7，以及用于将流体倒入或排出中空弹性体的中空内部的流体通过构件9 （C）2005，JPO＆NCIPI

85. 发明专利

JP2002199750A SURFACE ACOUSTIC WAVE ACTUATOR 失效
公开(公告)号：JP2002199750A
公开(公告)日：2002-07-12
申请号：JP2000394296
申请日：2000-12-26
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： ASAI KATSUHIKO , AOKI SHINICHIRO , YAMAMOTO MASAKI , SHIMIZU NORITOMO
IPC分类号： H02N2/00
摘要： PROBLEM TO BE SOLVED: To provide a surface acoustic wave actuator which can drive a rotor without restrictions regarding the size of surface acoustic wave transfer portion. SOLUTION: In the surface acoustic wave actuator obtained, a surface acoustic wave transfer portion provided to a rotor includes a means for attaining selective contact of two or more output extracting members; the output extracting members, provided with the surface acoustic transfer portion at the front surface, are projected in contact with the surface acoustic wave transfer portion to generate a drive force via a friction force, causing a rotor to make relative movement with respect to the fixed portion; the output extracting members, having reached the end portion of the surface acoustic wave transfer portion depending on the relative movement of the rotor are isolated from the surface acoustic wave transfer portion; and the output extracting members, provided with the surface acoustic wave transfer portion at the front surface are projected, so as to be brought in contact with the surface acoustic wave transfer portion. Thereby, the rotor may be driven in the range where an output extracting member is made to be in contact with the surface acoustic wave transfer portion, and the rotor can be driven without restrictions regarding the size of the surface acoustic wave transfer portion.

86. 发明专利

JP2002107140A APPARATUS FOR MEASURING FINE SURFACE SHAPE AND METHOD FOR FABRICATING STYLUS 失效
公开(公告)号：JP2002107140A
公开(公告)日：2002-04-10
申请号：JP2000303372
申请日：2000-10-03
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YAMAMOTO MASAKI
IPC分类号： G01B7/00 , B81B7/02 , B81C99/00 , G01B7/28 , G01B21/00 , G01B21/20 , B81C5/00
摘要： PROBLEM TO BE SOLVED: To stably measure fine surface shape with the use of a stylus, having high hardness and high degree of freedom of machining shape, in a fine surface shape-measuring apparatus used for measuring a three-dimensional shape, in the order of sub millimeters for mechanical parts. SOLUTION: The stylus 1b has a fine projecting part 1a at a leading end in a cantilever structure, and a crystal oscillator 9, having the stylus 1b bonded fixedly, is oscillated near the resonance frequency by a drive circuit 25. The oscillation is transmitted to the leading end of the stylus. When a fine projecting part 1a is brought into contact with a measuring object face through oscillation, the oscillation amplitude and oscillation phase of the crystal oscillator change, whereby piezoelectric charges are detected from an electrode 10. When a fine movement stage 21 is positioned in an oscillation direction to make a state of oscillation signals constant and a measuring object 16 is moved by a stage 17, the stylus leading end 1a moves, tracing the rough shape of the measuring object face 16a, and enables the shape to be measured stably.

87. 发明专利

JP2543200B2 失效
公开(公告)号：JP2543200B2
公开(公告)日：1996-10-16
申请号：JP23779789
申请日：1989-09-13
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： SATO TAKEO , YAMAMOTO MASAKI , AOKI SHINICHIRO , SUGYAMA YOSHUKI , NAKANISHI YOSHITO , TAKEUCHI HIROYUKI
IPC分类号： G01M11/02

88. 发明专利

JPH07331898A FLOOR CONSTRUCTION OF SHOWER ROOM 失效
公开(公告)号：JPH07331898A
公开(公告)日：1995-12-19
申请号：JP12342994
申请日：1994-06-06
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YAMAMOTO MASAKI , TAMAIZUMI HIROFUMI
IPC分类号： E03C1/20 , E04F15/00 , E04H1/12
摘要： PURPOSE:To make it possible to prevent the incursion of hot water to a neighboring room side from a shower room side in a state to connect the floor surface of the shower room to the floor surface of the neighboring room through a doorway by simple drainage construction from the floor surface of the shower room. CONSTITUTION:Floor surface 4 around a doorway 3 between a shower room 1 and a neighboring room 2 are so formed that they are flush with floor surface 5 of the neighboring room 2 through the doorway 3. A drainage basin 7 equipped with the basin cover 6 flush with the floor surface 4 of the shower room 1 is only formed in the shower room 1 in excess of the approximately same size as the width of the doorway along the doorway 3 of the floor surface 4 in the shower room 1, and water is collected from the whole area of the floor surfaces 4 in the shower room 1 and is drained.

89. 发明专利

JPH0547632A ALIGNMENT DETECTOR 失效
公开(公告)号：JPH0547632A
公开(公告)日：1993-02-26
申请号：JP20086591
申请日：1991-08-09
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： IWAZAWA TOSHIYUKI , SATO TAKEO , YAMAMOTO MASAKI
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To detect an alignment with high reliability and accuracy by eliminating instability of a vibration mirror due to extraneous vibration, concerning an alignment detector to be used in a reduction projection aligner or other device. CONSTITUTION:Let the repetition rate of an excimer laser oscillator 1 be Fa, and the frequency at which the orignal pattern can be reproduced when sampling is carried out at Fa be f (f is smaller than 1/10 of Fa). A vibration mirror 13 is driven at the frequency Fm=Fa+f or Fm=Fa-f. A differential frequency signal generator 22 and a phase shifter 23 are installed, and a signal whose frequency is the difference between Fa and Fm (¦Fa-Fm¦) is generated by the differential frequency signal generator 22. The phase of the signal is shifted by the phase shifter 23 so that the signal may be synchronous with an output signal of a low-pass filter 27. After that, the phase-shifted frequency signal is inputted into a phase detector 28. By this method, an alignment detector with high reliability and accuracy can be provided.

90. 发明专利

JPH0430413A ALIGNMENT UNIT 失效
公开(公告)号：JPH0430413A
公开(公告)日：1992-02-03
申请号：JP13591890
申请日：1990-05-25
申请人： MATSUSHITA ELECTRIC IND CO LTD
发明人： YAMAMOTO MASAKI , TAKEUCHI HIROYUKI , SUGIYAMA YOSHIYUKI , AOKI SHINICHIRO , SATO TAKEO
IPC分类号： G01B11/00 , F02B75/02 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To make it possible to conduct a highly precise alignment even when an exposing operation is being performed by a method wherein a two-cycle coherent, having the wavelength different from exposure wavelength, is interfered on an object, and an optical beat signal is detected by the light-detecting device, located outside the exposure light flux, from the reflection light of the alignment mark in the exposure light flux of a second object. CONSTITUTION:An interference fringe of an arbitrary pitch is formed by allowing a two-cycle alignment light, having the wavelength different from an exposure light, to interfere with each other on the alignment mark 5 of the reticle of a first object, this interference fringe is color-corrected by a correction optical system 18, and it is projected on the wafer 2 of a second object through the intermediary of a projection lens 4. The reflected light, coming from a two-dimensional diffraction grating mark 6 for alignment on the object 2, is received by the light detector of the optical system 18 after a speckle pattern has been removed by a spacial filtering optical system. An alignment can be conducted by controlling the relative position of the reticle 1 and the wafer 2 by the positional deviation signal obtained from the comparison of position of the detected optical beat signal. As the interception of the exposure light can be prevented by projecting an alignment light on the correction optical system arranged outside the above-mentioned exposure light flux, an alignment operation can be conducted in a highly precise manner even using an alignment light having the wavelength different from the wavelength of the exposure light or even when an exposing operation is being conducted.

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