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    • 81. 发明授权
    • Thin film transistor array panel and a method for manufacturing the same
    • US07098480B2
    • 2006-08-29
    • US10273298
    • 2002-10-18
    • Dong-Gyu KimJong-Soo Yoon
    • Dong-Gyu KimJong-Soo Yoon
    • H01L29/00
    • G02F1/13458G02F1/136227G02F2001/136222H01L27/12H01L27/124H01L27/1285H01L27/1288H01L27/1292H01L29/4908H01L29/66765H01L29/78633
    • Disclosed is a simplified method for manufacturing a liquid crystal display. A gate wire including a gate line, a gate pad, and a gate electrode are formed on a substrate. A gate insulating layer, a semiconductor layer, and an ohmic contact layer are sequentially deposited, and a photoresist layer is coated thereon. The photoresist layer is exposed to light through a mask and developed to form a photoresist pattern. At this time, a first portion of the photoresist pattern which is located between the source electrode and the drain electrode is thinner than a second portion which is located on the data wire, and the photoresist layer is totally removed on other parts. The thin portion is made by controlling the amount of irradiating light or by a reflow process to form a thin portion, and the amount of light is controlled by using a mask that has a slit, a small pattern smaller than the resolution of the exposure device, or a partially transparent layer. Next, the exposed portions of conductor layer are removed by wet etch or dry etch, and thereby the underlying ohmic contact layer is exposed. Then the exposed ohmic contact layer and the underlying semiconductor layer are removed by dry etching along with the first portion of the photoresist layer. The residue of the photoresist layer is removed by ashing. Source/drain electrodes are separated by removing the portion of the conductor layer at the channel and the underlying ohmic contact layer pattern. Then, the second portion of the photoresist layer is removed, and red, green, and blue color filters, a pixel electrode, a redundant gate pad, and a redundant data pad are formed.
    • 84. 发明申请
    • Thin film transistor array panel used for a liquid crystal display and a manufacturing method thereof
    • 用于液晶显示器的薄膜晶体管阵列面板及其制造方法
    • US20060033102A1
    • 2006-02-16
    • US11249278
    • 2005-10-14
    • Dong-Gyu Kim
    • Dong-Gyu Kim
    • H01L29/04
    • H01L27/1288G02F1/1368H01L27/1214H01L29/78633
    • A gate insulating layer, an amorphous silicon layer, an n+ amorphous silicon layer and a metal layer are deposited in sequence after a gate line, a gate electrode and a gate pad are formed on a substrate, using a first mask. The metal layer is etched to form a data line, a source electrode, a drain electrode and a data pad through a photolithography process, using a second mask, and the n+ amorphous silicon layer is etched, using the patterned data line, the source electrode, the drain electrode and the data pad as the mask. A light shielding film and a passivation film, or a passivation film also having a function of the light shielding film are deposited, and is etched through the photolithography process, using a third mask which leaves a portion covering the gate line, the gate electrode, the gate pad and the data line, the source electrode, and the drain electrode. The amorphous silicon layer and the gate insulating layer are etched, using the patterned light shielding film and passivation film, or the patterned passivation film also having the function of the light shielding film as the mask. Here, the gate pad, the data pad and a part of the drain electrode are exposed. A pixel electrode connected to the drain electrode, is formed and indium tin oxide (ITO) pads covering the exposed gate pad and the exposed data pad, is formed by depositing an ITO film and etching thorough the photolithography, using a fourth mask. As a result, a thin film transistor array panel used for a liquid crystal display is fabricated by only four masks.
    • 在栅极线,栅电极和栅极焊盘形成在基板上之后,依次沉积栅绝缘层,非晶硅层,n + +非晶硅层和金属层,使用 第一个面具。 通过使用第二掩模的光刻工艺蚀刻金属层以形成数据线,源电极,漏电极和数据焊盘,并使用第二掩模蚀刻n + 图案化数据线,源电极,漏电极和数据焊盘作为掩模。 沉积还具有遮光膜功能的遮光膜和钝化膜或钝化膜,并通过光刻工艺蚀刻,使用第三掩模,该第三掩模留下覆盖栅极线的部分,栅电极, 栅极焊盘和数据线,源电极和漏电极。 使用图案化的遮光膜和钝化膜蚀刻非晶硅层和栅极绝缘层,或者也具有遮光膜功能的图案化的钝化膜作为掩模。 这里,露出栅极焊盘,数据焊盘和漏电极的一部分。 形成连接到漏电极的像素电极,并且通过使用第四掩模沉积ITO膜并彻底蚀刻来形成覆盖暴露的栅极焊盘和暴露的数据焊盘的氧化铟锡(ITO)焊盘。 结果,仅用四个掩模制造用于液晶显示器的薄膜晶体管阵列面板。
    • 86. 发明授权
    • Thin film transistor array panel used for a liquid crystal display and a manufacturing method thereof
    • 用于液晶显示器的薄膜晶体管阵列面板及其制造方法
    • US06969643B2
    • 2005-11-29
    • US10692033
    • 2003-10-23
    • Dong-Gyu Kim
    • Dong-Gyu Kim
    • H01L21/77H01L21/84H01L27/12H01L29/786H01L21/20H01L21/00
    • H01L27/1288G02F1/1368H01L27/1214H01L29/78633
    • A gate insulating layer, an amorphous silicon layer, an n+ amorphous silicon layer and a metal layer are deposited in sequence after a gate line, a gate electrode and a gate pad are formed on a substrate, using a first mask. The metal layer is etched to form a data line, a source electrode, a drain electrode and a data pad through a photolithography process, using a second mask, and the n+ amorphous silicon layer is etched, using the patterned data line, the source electrode, the drain electrode and the data pad as the mask. A light shielding film and a passivation film, or a passivation film also having a function of the light shielding film are deposited, and is etched through the photolithography process, using a third mask which leaves a portion covering the gate line, the gate electrode, the gate pad and the data line, the source electrode, and the drain electrode. The amorphous silicon layer and the gate insulating layer are etched, using the patterned light shielding film and passivation film, or the patterned passivation film also having the function of the light shielding film as the mask. Here, the gate pad, the data pad and a part of the drain electrode are exposed. A pixel electrode connected to the drain electrode, is formed and indium tin oxide (ITO) pads covering the exposed gate pad and the exposed data pad, is formed by depositing an ITO film and etching thorough the photolithography, using a fourth mask. As a result, a thin film transistor array panel used for a liquid crystal display is fabricated by only four masks.
    • 在栅极线,栅电极和栅极焊盘形成在基板上之后,依次沉积栅绝缘层,非晶硅层,n + +非晶硅层和金属层,使用 第一个面具。 通过使用第二掩模的光刻工艺蚀刻金属层以形成数据线,源电极,漏电极和数据焊盘,并使用第二掩模蚀刻n + 图案化数据线,源电极,漏电极和数据焊盘作为掩模。 沉积还具有遮光膜功能的遮光膜和钝化膜或钝化膜,并通过光刻工艺蚀刻,使用第三掩模,该第三掩模留下覆盖栅极线的部分,栅电极, 栅极焊盘和数据线,源电极和漏电极。 使用图案化的遮光膜和钝化膜蚀刻非晶硅层和栅极绝缘层,或者也具有遮光膜功能的图案化的钝化膜作为掩模。 这里,露出栅极焊盘,数据焊盘和漏电极的一部分。 形成连接到漏电极的像素电极,并且通过使用第四掩模沉积ITO膜并彻底蚀刻来形成覆盖暴露的栅极焊盘和暴露的数据焊盘的氧化铟锡(ITO)焊盘。 结果,仅用四个掩模来制造用于液晶显示器的薄膜晶体管阵列面板。
    • 89. 发明授权
    • Liquid crystal display, thin film transistor array panel for liquid crystal display and manufacturing method thereof
    • 液晶显示器,液晶显示器用薄膜晶体管阵列面板及其制造方法
    • US06862052B2
    • 2005-03-01
    • US10147345
    • 2002-05-16
    • Dong-Gyu Kim
    • Dong-Gyu Kim
    • G02F1/1368G02F1/1362H01L21/336H01L29/786G02F1/1343
    • G02F1/13458G02F1/13624G02F1/136286G02F2001/136236H01L27/124H01L27/1288
    • A gate wire is formed on the insulating substrate. The gate wire has gate lines, first and second gate electrodes connected to the gate lines, and gate pads. A gate insulating layer, first and second semiconductor layers and an ohmic contact layer are sequentially formed thereon. A data wire is formed on the ohmic contact layer. The data wire has first and second data lines, data line connectors, first and second source electrodes, first and second drain electrodes, and data pads. A passivation layer is formed on the data wire, and has contact holes respectively exposing the first and the second drain electrodes, and the gate and the data pads. Pixel electrodes, and subsidiary gate and data pads are formed on the passivation layer. As described above, the data line is provided at opposite sides of the pixel area so that variation in the pixel voltage due to the parasitic capacitance between the partitioned areas with different degree of misalignment is reduced. In addition, two TFTs are provided in each pixel area so that the parasitic capacitance between the gate and the drain electrodes in two respective partitioned areas with left-biased and right-biased misalignment is kept to be constant. In this way, the pixel voltage variation between the two partitioned areas is reduced to prevent non-uniformity in the brightness.
    • 在绝缘基板上形成栅极线。 栅极线具有栅极线,连接到栅极线的第一和第二栅电极以及栅极焊盘。 在其上依次形成栅极绝缘层,第一和第二半导体层以及欧姆接触层。 数据线形成在欧姆接触层上。 数据线具有第一和第二数据线,数据线连接器,第一和第二源电极,第一和第二漏电极和数据焊盘。 在数据线上形成钝化层,并且具有分别暴露第一和第二漏电极以及栅极和数据焊盘的接触孔。 像素电极和辅助栅极和数据焊盘形成在钝化层上。 如上所述,数据线设置在像素区域的相对侧,使得由于具有不同失准程度的分割区域之间的寄生电容引起的像素电压的变化减小。 此外,在每个像素区域中设置两个TFT,使得具有左偏置和右偏置未对准的两个相应分区中的栅极和漏电极之间的寄生电容保持恒定。 以这种方式,减小了两个划分区域之间的像素电压变化,以防止亮度的不均匀。
    • 90. 发明申请
    • Liquid crystal display
    • 液晶显示器
    • US20050007510A1
    • 2005-01-13
    • US10851642
    • 2004-05-24
    • Dong-Gyu KimSang-Soo KimSang-Wook Lee
    • Dong-Gyu KimSang-Soo KimSang-Wook Lee
    • G02F1/1333G02F1/13G02F1/1343G02F1/1345G02F1/136G02F1/1362G09F9/30
    • G02F1/13458G02F1/1345G02F1/13452G02F1/136286
    • A liquid crystal display includes an insulating substrate, gate and data lines formed on the substrate to define pixel areas, or collectively a display area. Gate signal interconnection wires are formed at a corner portion of the substrate outside the display area to transmit gate electrical signals, and provided with gate signal interconnection lines and first and second gate signal interconnection pads connected to both ends of the gate signal interconnection lines. A gate insulating layer, and a protective layer are further formed on the substrate, and provided with first and second contact holes exposing the first and second gate signal interconnection pads. Gate and data signal transmission films are attached to the substrate, and provided with first and second gate signal leads and first and second gate signal wires. The first and second gate signal leads are connected to the first and second gate signal interconnection pads through the first and second contact holes. The first or the second gate signal lead completely covers the first or the second contact hole at least in the longitudinal direction of the lead.
    • 液晶显示器包括绝缘基板,形成在基板上的门和数据线,以限定像素区域,或统称为显示区域。 栅极信号互连线形成在显示区域外部的基板的角部,以传输栅极电信号,并且设置有栅极信号互连线以及连接到栅极信号互连线两端的第一和第二栅极信号互连焊盘。 栅极绝缘层和保护层进一步形成在基板上,并且设置有暴露第一和第二栅极信号互连焊盘的第一和第二接触孔。 栅极和数据信号传输膜附着到衬底上,并且设置有第一和第二栅极信号引线以及第一和第二栅极信号线。 第一和第二栅极信号引线通过第一和第二接触孔连接到第一和第二栅极信号互连焊盘。 第一或第二栅极信号引线至少在引线的纵向上完全覆盖第一或第二接触孔。