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81. 发明申请

US20110108825A1 ORGANIC ELECTROLUMINESCENT DEVICE AND ITS PRODUCTION METHOD 审中-公开
标题翻译：有机电致发光器件及其制造方法
公开(公告)号：US20110108825A1
公开(公告)日：2011-05-12
申请号：US13002743
申请日：2009-07-01
申请人： Yasunori Uetani
发明人： Yasunori Uetani
IPC分类号： H01L51/54 , H01L51/56
CPC分类号： H05B33/26 , C08G73/0266 , H01B1/127 , H01B1/128 , H01L51/0036 , H01L51/0043 , H01L51/5206
摘要： An organic electroluminescent device comprising a cathode, an anode formed by an application method, and a light emitting layer disposed between the above-described anode and the above-described cathode.
摘要翻译：一种有机电致发光器件，包括阴极，通过施加方法形成的阳极和设置在上述阳极和上述阴极之间的发光层。

82. 发明申请

US20100327271A1 COMPOSITION AND ORGANIC PHOTOELECTRIC CONVERTER USING THE SAME 失效
标题翻译：使用该组合物和有机光电转换器
公开(公告)号：US20100327271A1
公开(公告)日：2010-12-30
申请号：US12867799
申请日：2009-02-17
申请人： Yasunori Uetani
发明人： Yasunori Uetani
IPC分类号： H01L51/54 , H01B1/12 , H01B1/24
CPC分类号： H01L51/0036 , B82Y10/00 , C08G61/123 , C08G61/126 , C08G75/32 , C08G2261/3142 , C08G2261/3223 , C08G2261/3246 , C08G2261/364 , C08G2261/411 , C08G2261/91 , C08L65/00 , C08L2205/02 , H01B1/127 , H01B1/128 , H01L51/0043 , H01L51/0047 , H01L51/4253 , Y02E10/549
摘要： An organic photoelectric converter having excellent photoelectric conversion efficiency can be produced by using a composition containing a polymer compound A having a repeating unit represented by formula (1) and a polymer compound B having a repeating unit represented by formula (2): wherein R2 and R2 respectively represent a hydrogen atom, a fluorine atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group, an aryloxy group, an arylthio group, an arylalkyl group, an arylalkoxy group or an arylalkylthio group, wherein R3 and R4 respectively represent a hydrogen atom, a fluorine atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group, an aryloxy group, an arylthio group, an arylalkyl group, an arylalkoxy group or an arylalkylthio group, and p represents an integer of 2 to 10.
摘要翻译：通过使用含有具有式（1）表示的重复单元的高分子化合物A和具有式（2）表示的重复单元的高分子化合物B，可以制造具有优异的光电转换效率的有机光电转换器：其中R2和 R2分别表示氢原子，氟原子，烷基，烷氧基，烷硫基，芳基，芳氧基，芳硫基，芳烷基，芳烷氧基或芳烷硫基，其中R3和 R4分别表示氢原子，氟原子，烷基，烷氧基，烷硫基，芳基，芳氧基，芳硫基，芳烷基，芳烷氧基或芳烷硫基，p表示 2〜10的整数。

83. 发明申请

US20100276643A1 COMPOSITION CONTAINING FULLERENE DERIVATIVE AND ORGANIC PHOTOELECTRIC CONVERTER USING THE SAME 审中-公开
标题翻译：含有富勒烯衍生物和有机光电转换器的组合物
公开(公告)号：US20100276643A1
公开(公告)日：2010-11-04
申请号：US12811764
申请日：2008-12-25
申请人： Yasunori Uetani , Shota Moriwaki
发明人： Yasunori Uetani , Shota Moriwaki
IPC分类号： H01B1/04
CPC分类号： H01L51/0047 , B82Y10/00 , H01L51/0025 , H01L51/4253 , Y02E10/549 , Y02P70/521
摘要： Disclosed is a composition which is characterized by obtained by bringing an adsorbent into contact with a composition containing a fullerene derivative and a solvent.
摘要翻译：公开了一种组合物，其特征在于通过使吸附剂与含有富勒烯衍生物和溶剂的组合物接触而获得。

84. 发明申请

US20100193033A1 COMPOSITION AND ORGANIC PHOTOELECTRIC CONVERTER 有权
标题翻译：组合物和有机光电转换器
公开(公告)号：US20100193033A1
公开(公告)日：2010-08-05
申请号：US12671109
申请日：2008-08-08
申请人： Yasunori Uetani
发明人： Yasunori Uetani
IPC分类号： H01L31/0256
CPC分类号： H01L51/0043 , B82Y10/00 , C08G61/02 , C08G61/126 , C08G2261/148 , C08G2261/3142 , C08K3/04 , C08K3/045 , C08L65/00 , H01L51/0036 , H01L51/0039 , H01L51/0047 , H01L51/4253 , Y02E10/549
摘要： A composition containing a polymer having a structural unit represented by the following formula (1) and a structural unit represented by the following formula (2), and a fullerene with a carbon number of 70 or more or a fullerene derivative having a fullerene skeleton with a carbon number of 70 or more: wherein, Q, R, R1 and R2 each independently denote a hydrogen atom, and so on.
摘要翻译：一种组合物，其含有具有下述式（1）表示的结构单元的聚合物和下述式（2）所示的结构单元和碳数为70以上的富勒烯或具有富勒烯骨架的富勒烯衍生物，碳数为70以上：其中，Q，R，R 1和R 2各自独立地表示氢原子等。

85. 发明授权

US07576223B2 Chemical amplification type resist composition 失效
标题翻译：化学放大型抗蚀剂组合物
公开(公告)号：US07576223B2
公开(公告)日：2009-08-18
申请号：US12155072
申请日：2008-05-29
申请人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
发明人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
IPC分类号： C07D333/46 , C07D335/02
CPC分类号： G03F7/0045 , C07C381/12 , C07D333/46 , G03F7/0395 , G03F7/0397 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：本发明提供式（Ia）的锍盐，其包含式（Ib）的结构单元和化学扩增型正性抗蚀剂组合物的聚合化合物，其包含（A）酸产生剂，其包含至少一种选自以下的化合物由式（Ia）的锍盐，包含式（Ib）的结构单元的聚合化合物和式（Ic）的锍盐组成。和（B）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

86. 发明申请

US20080269506A1 Chemical amplification type resist composition 失效
标题翻译：化学放大型抗蚀剂组合物
公开(公告)号：US20080269506A1
公开(公告)日：2008-10-30
申请号：US12155072
申请日：2008-05-29
申请人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
发明人： Airi Yamada , Yasunori Uetani , Akira Kamabuchi
IPC分类号： C07C381/12 , C07D333/24 , C07D335/02
CPC分类号： G03F7/0045 , C07C381/12 , C07D333/46 , G03F7/0395 , G03F7/0397 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and(B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
摘要翻译：本发明提供式（Ia）的锍盐，其包含式（Ib）的结构单元和化学扩增型正性抗蚀剂组合物的聚合化合物，其包含（A）酸产生剂，其包含至少一种选自以下的化合物由式（Ia）的锍盐，包含式（Ib）的结构单元的聚合化合物和式（Ic）的锍盐组成。和（B）树脂，其含有具有酸不稳定基团的结构单元，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱性水溶液中。

87. 发明授权

US07129014B2 Positive resist composition 失效
公开(公告)号：US07129014B2
公开(公告)日：2006-10-31
申请号：US10404671
申请日：2003-04-02
申请人： Kouji Toishi , Yoshiko Miya , Yasunori Uetani
发明人： Kouji Toishi , Yoshiko Miya , Yasunori Uetani
IPC分类号： G03C1/71
CPC分类号： G03F7/0045 , C08F8/44 , G03F7/0046 , G03F7/0395 , Y10S430/108
摘要： The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator, and multifunctional epoxy compound, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.

88. 发明授权

US06846609B2 Chemical amplification type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06846609B2
公开(公告)日：2005-01-25
申请号：US10239896
申请日：2001-03-21
申请人： Yasunori Uetani , Takakiyo Terakawa , Kaoru Araki
发明人： Yasunori Uetani , Takakiyo Terakawa , Kaoru Araki
IPC分类号： C08F2/48 , C08F212/14 , C08F220/20 , C08F220/28 , C08K5/00 , C08K5/16 , C08L25/18 , C08L33/14 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , C08F220/28 , Y10S430/106 , Y10S430/111
摘要： A chemical amplification type positive resist composition is provided, comprising a resin which has at least one polymerization unit selected from a polymerization unit of 3-hydroxy-1-adamantyl acrylate and a polymerization unit of 3,5-dihydroxy-1-adamantyl (meth)acrylate, a polymerization unit of hydroxystyrene and a polymerization unit having a group uhstable to an acid, is itself insoluble or poorly soluble in an alkali but becomes alkali-soluble after said group unstable to an acid is dissociated by the action of an acid; and an acid generator, the composition being excellent in various abilities such as sensitivity, resolution, heat resistance, film retention ratio, applicability, exposure clearance, dry etching resistance and the like, particularly having further improved resolution and exposure clearance.
摘要翻译：提供化学放大型正性抗蚀剂组合物，其包含具有至少一个选自丙烯酸3-羟基-1-金刚烷基酯的聚合单元的聚合单元和3,5-二羟基-1-金刚烷基（甲基）丙烯酸酯的聚合单元的树脂，）丙烯酸酯，羟基苯乙烯的聚合单元和具有与酸成反应的基团的聚合单元本身在碱中不溶或难溶，但在酸不稳定的所述基团被酸的作用解离后，其变成碱溶性; 和酸发生剂，特别是具有进一步提高分辨率和曝光间隙的各种能力，例如灵敏度，分辨率，耐热性，保膜率，适用性，曝光间隙，耐干蚀刻性等优异的组合物。

89. 发明授权

US06627381B1 Chemical amplification type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06627381B1
公开(公告)日：2003-09-30
申请号：US09890803
申请日：2001-10-25
申请人： Yasunori Uetani , Akira Kamabuchi
发明人： Yasunori Uetani , Akira Kamabuchi
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/039 , G03F7/0397
摘要： A chemical amplification type positive resist composition comprising: a resin which has a hydroxystyrene-based polymerization unit, a 3-hydroxy-1-adamantyl methacrylate-based polymerization unit and a polymerization unit having a group unstable toward an acid, and, though insoluble or hardly soluble in an alkali in itself, becomes alkali-soluble after the acid-unstable group has been cleaved by the action of an acid; and an acid generating agent is provided. This resist composition is improved in exposure latitude and resolution. Moreover, such properties as sensitivity, heat resistance, the ratio of residual thickness, coatability, and dry etching resistance are also maintained good. Thus, through the use of this composition, a fine resist pattern can be formed with high precision.
摘要翻译：一种化学放大型正型抗蚀剂组合物，包括：具有羟基苯乙烯类聚合单元，甲基丙烯酸3-羟基-1-金刚烷基酯聚合单元和具有对酸不稳定的基团的聚合单元的树脂，以及尽管不溶或不溶本身难溶于碱，在酸不稳定基团通过酸的作用被切割后，变成碱溶性的; 并提供酸生成剂。该抗蚀剂组合物在曝光宽容度和分辨率方面得到改善。此外，还保持了诸如灵敏度，耐热性，残留厚度比，涂布性和耐干蚀刻性等特性。因此，通过使用该组合物，可以高精度地形成精细的抗蚀剂图案。

90. 发明授权

US06569596B1 Negative working chemical amplification type resist compositions 失效
标题翻译：负工作化学放大型抗蚀剂组合物
公开(公告)号：US06569596B1
公开(公告)日：2003-05-27
申请号：US09584149
申请日：2000-05-31
申请人： Yasunori Uetani , Airi Yamada , Hiroki Inoue
发明人： Yasunori Uetani , Airi Yamada , Hiroki Inoue
IPC分类号： G03F7004
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A negative working chemical amplification type resist composition, which is capable of giving more improved resolution; and comprises an alkali-soluble resin, a cross-linking agent, a N-substituted succinimide compound represented by the following formula (I): wherein R represents an unsubstituted or substituted alkyl, an alicyclic hydrocarbon residue, an aryl or a camphor group, and an acid generator other than the above N-substituted succinimide compound is provided.
摘要翻译：负性工作化学放大型抗蚀剂组合物，其能够提供更好的分辨率; 并且包含碱溶性树脂，交联剂，由下式（I）表示的N-取代琥珀酰亚胺化合物：其中R表示未取代或取代的烷基，脂环族烃残基，芳基或樟脑基，提供除了上述N-取代琥珀酰亚胺化合物之外的酸酐发生剂。

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