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81. 发明申请

US20140230724A1 METHOD FOR FORMING MAGNESIUM OXIDE THIN FILM AND PROCESSED PLATE 有权
标题翻译：形成氧化镁薄膜和加工板的方法
公开(公告)号：US20140230724A1
公开(公告)日：2014-08-21
申请号：US14343719
申请日：2012-03-09
申请人： Tomofumi Susaki , Hideo Hosono , Tadahiro Fujihashi , Yoshitake Toda
发明人： Tomofumi Susaki , Hideo Hosono , Tadahiro Fujihashi , Yoshitake Toda
IPC分类号： C30B23/06
CPC分类号： C30B23/066 , B01D53/02 , B01D2253/1124 , B01D2253/25 , B01D2257/504 , B01J20/041 , B01J20/3204 , B01J20/3236 , C30B23/025 , C30B29/16 , Y02C10/08
摘要： A method for depositing a magnesium oxide thin film on a substrate by a laser abrasion method using a sintered body or single crystal of magnesium oxide as a target. In this method, a flat processed film made of magnesium oxide having a (111) plane as its front surface is prepared, using a substrate made of strontium titanate having a (111) plane as its principal surface or yttria-stabilized zirconia having a (111) plane as its principal surface, by directly depositing a film on the principal surface of the substrate and epitaxially growing the film.
摘要翻译：通过使用氧化镁的烧结体或单晶作为靶的激光磨损法将氧化镁薄膜淀积在基板上的方法。在该方法中，使用具有（111）面作为其主面的由钛酸锶构成的基板或氧化钇稳定化的氧化锆由（111）面作为其前表面的氧化镁制成的平面加工膜，具有（ 111）面作为其主表面，通过在衬底的主表面上直接沉积膜并外延生长膜。

82. 发明申请

US20140128252A1 PEROVSKITE OXIDE CONTAINING HYDRIDE ION, AND METHOD FOR MANUFACTURING SAME 有权
标题翻译：包含氢氧化钙的氧化铝及其制造方法
公开(公告)号：US20140128252A1
公开(公告)日：2014-05-08
申请号：US14130184
申请日：2012-07-05
申请人： Hideo Hosono , Hiroshi Kageyama , Yoji Kobayashi , Mikio Takano , Takeshi Yajima
发明人： Hideo Hosono , Hiroshi Kageyama , Yoji Kobayashi , Mikio Takano , Takeshi Yajima
IPC分类号： B01J39/02
CPC分类号： B01J39/02 , B01J23/002 , B01J23/02 , C01B3/001 , C01B3/503 , C01G23/003 , C01G23/005 , C01G23/006 , C01P2002/34 , C01P2002/72 , C01P2004/52 , C01P2006/32 , C01P2006/40 , H01M4/9033 , Y02E60/324 , Y02E60/50
摘要： [Problem] Many oxide-ion conductors exhibit high functionality at high temperatures due to the large weight and charge of oxide ions, and it has been difficult to achieve the functionality at low temperatures.[Solution] A perovskite oxide having hydride ion conductivity, at least 1 at % of the oxide ions (O2−) contained in a titanium-containing perovskite oxide being substituted with hydride ions (H−). This oxide, in which negatively charged hydride ions (H−) are used for the ionic conduction, has both hydride ion conductivity and electron conductivity. As a starting material, the titanium-containing perovskite oxide is kept together with a powder of an alkali metal or alkaline-earth metal hydride selected from LiH, CaH2, SrH2, and BaH2 in a temperature range of 300° C. or higher and lower than the melting point of the hydride in a vacuum or an inert gas atmosphere to substitute some of the oxide ions in the oxide with the hydride ions, resulting in the introduction of the hydride ions into oxygen sites.
摘要翻译： [问题]由于氧化物离子的重量和电荷大，许多氧化物离子导体在高温下表现出高功能性，并且难以在低温下实现官能度。 [解决方案]具有氢化物离子传导性的钙钛矿氧化物，其中包含在含钛的钙钛矿氧化物中的氧化物离子（O 2 - ）的至少1at％被氢离子（H）取代。这种氧化物（其中带负电荷的氢离子（H））用于离子传导，具有氢离子传导性和电子传导性。作为原料，将含钛的钙钛矿氧化物与选自LiH，CaH 2，SrH 2和BaH 2的碱金属或碱土金属氢化物的粉末在300℃以上的温度范围内保持比氢化物在真空或惰性气体气氛中的熔点高，以氢化物离子代替氧化物中的一些氧化物离子，导致氢离子进入氧位。

83. 发明授权

US07892457B2 Sputtering target, thin film for optical information recording medium and process for producing the same 有权
标题翻译：溅射靶，光学信息记录介质用薄膜及其制造方法
公开(公告)号：US07892457B2
公开(公告)日：2011-02-22
申请号：US12721939
申请日：2010-03-11
申请人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
发明人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
IPC分类号： H01B1/08 , B05D5/06
CPC分类号： C23C14/086 , C04B35/453 , C04B2235/3217 , C04B2235/3225 , C04B2235/3272 , C04B2235/3284 , C04B2235/3286 , C04B2235/3293 , C04B2235/5436 , C04B2235/77 , C04B2235/775 , C23C14/3414 , G11B7/2531 , G11B7/2578 , G11B7/266 , G11B2007/25706 , G11B2007/25708 , G11B2007/2571 , G11B2007/25715 , Y02T50/67 , Y10T428/12
摘要： A sputtering target is provided that has a relative density of 80% or more and contains a compound having as its principal component zinc oxide satisfying AXBYO(KaX+KbY)/2(ZnO)m, 1
摘要翻译：提供具有80％以上的相对密度的溅射靶，并且含有主要成分为满足AXBYO（KaX + KbY）/ 2（ZnO）m，1

84. 发明授权

US07344660B2 Sputtering target and process for producing the same 失效
标题翻译：溅射目标和生产方法
公开(公告)号：US07344660B2
公开(公告)日：2008-03-18
申请号：US10547816
申请日：2004-02-03
申请人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
发明人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
IPC分类号： H01B1/10
CPC分类号： C04B35/645 , C04B35/547 , C04B2235/3227 , C04B2235/446 , C04B2235/5409 , C04B2235/5436 , C04B2235/72 , C04B2235/77 , C04B2235/786 , C23C14/3414 , Y10T428/12
摘要： A manufacturing method of a sputtering target having mainly oxychalcogenide containing La and Cu by sintering at least one or more powders selected from an elementary substance of a constituent element, oxide or chalcogenide as the raw material, characterized in including a reaction step of retaining the [material] at a temperature of 850° C. or less for 1 hour or more during the sintering step, wherein this [material], after the reaction step, is subject to pressure sintering at a temperature that is higher than the reaction step temperature. In addition to increasing the density of a P-type transparent conductive material target having mainly oxychalcogenide containing La and Cu and enabling the enlargement of the target at a low manufacturing cost, the existence of unreacted matter in the target can be eliminated, the production yield can be improved by suppressing the generation of cracks in the target, and the quality of deposition formed by sputtering this kind of target can also be improved.
摘要翻译：一种溅射靶的制造方法，其特征在于，具有通过烧结选自构成元素的基本物质，氧化物或硫族化物的至少一种以上的粉末作为原料的含有含有La和Cu的氧化硫元素的溅射靶，其特征在于，包括：材料]在烧结工序中在850℃以下的温度下保持1小时以上，其中在反应工序后，将该材料在比反应步骤温度高的温度进行加压烧结。除了增加含有含有La和Cu的含氧硫属元素的P型透明导电材料靶的密度以外，能够以低的制造成本扩大靶，除此之外，可以消除靶中未反应物的存在，生产率可以通过抑制靶中的裂纹的产生而得到改善，也可以提高通过溅射形成的沉积物的质量。

85. 发明申请

US20060147740A1 Sputtering target, thin film for optical information recording medium and process for producing the same 有权
标题翻译：溅射靶，光学信息记录介质用薄膜及其制造方法
公开(公告)号：US20060147740A1
公开(公告)日：2006-07-06
申请号：US10547815
申请日：2004-02-03
申请人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
发明人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
IPC分类号： B22D7/00
CPC分类号： C23C14/086 , C04B35/453 , C04B2235/3217 , C04B2235/3225 , C04B2235/3272 , C04B2235/3284 , C04B2235/3286 , C04B2235/3293 , C04B2235/5436 , C04B2235/77 , C04B2235/775 , C23C14/3414 , G11B7/2531 , G11B7/2578 , G11B7/266 , G11B2007/25706 , G11B2007/25708 , G11B2007/2571 , G11B2007/25715 , Y02T50/67 , Y10T428/12
摘要： Provided is a sputtering target having a relative density of 80% or more and containing a compound having as its principal component zinc oxide satisfying AXBYO(KaX+KbY)/2(ZnO)m, 1
摘要翻译：本发明提供一种具有80％以上的相对密度的溅射靶，其含有主要成分为氧化锌的化合物，所述氧化锌满足A B Y + KbY）/ 2（ZnO）m 1，m，X，m，0

86. 发明授权

US4703019A Glass useful as either photosensitive glass or opaline foam glass 失效
标题翻译：玻璃可用作感光玻璃或乳白色泡沫玻璃
公开(公告)号：US4703019A
公开(公告)日：1987-10-27
申请号：US861269
申请日：1986-05-09
申请人： Yoshihiro Abe , Hideo Hosono
发明人： Yoshihiro Abe , Hideo Hosono
IPC分类号： C03C3/062 , C03C3/064 , C03C3/145 , C03C3/17 , C03C3/253 , C03C4/00 , C03C4/02 , C03C4/04 , C03C11/00
CPC分类号： C03C11/007 , C03C11/00 , C03C3/062 , C03C3/145 , C03C3/17 , C03C3/253 , C03C4/005 , C03C4/04
摘要： The invention relates to a photosensitive and heat-sensitive glass which is composed of 25-70 mol % of Al.sub.2 O.sub.3 and/or Ga.sub.2 O.sub.3, 30-75 mol % of at least one of CaO, BaO, SrO and MgO and 0-40 mol % of an auxiliary component which is at least one of SiO.sub.2, GeO.sub.2, B.sub.2 O.sub.3 and P.sub.2 O.sub.5. The glass is produced by melting a batch mixture of powdery raw materials. By exposure to UV rays the glass colors in yellowish brown, and the color does not fade by termination of the exposure. Bleaching of the colored glass is accomplished by heating for a short time at about 150.degree.-300.degree. C. Coloration and bleaching can be repeated without deterioration. The same glass turns into an opaline foam glass, which presents a very attractive appearance, by heat treatment at a temperature above the softening temperature. This change is irreversible. The foams created in the glass matrix are usually tens of microns in diameter.
摘要翻译：本发明涉及一种感光和热敏玻璃，其由25-70mol％的Al2O3和/或Ga2O3，30-75mol％的CaO，BaO，SrO和MgO中的至少一种和0-40mol％的SiO 2，GeO 2，B 2 O 3和P 2 O 5中的至少一种的辅助成分。玻璃是通过熔化粉末状原料的批料混合而制成的。通过暴露于紫外线，玻璃颜色呈黄棕色，并且颜色不会通过曝光终止而褪色。有色玻璃的漂白通过在约150-300℃下加热短时间来实现。可以重复着色和漂白而不变质。相同的玻璃变成蛋白质泡沫玻璃，通过在高于软化温度的温度下进行热处理，呈现出非常有吸引力的外观。这种变化是不可逆转的。在玻璃基质中产生的泡沫通常直径为几十微米。

87. 发明授权

US09150423B2 Ammonia synthesis catalyst and ammonia synthesis method 有权
标题翻译：氨合成催化剂和氨合成方法
公开(公告)号：US09150423B2
公开(公告)日：2015-10-06
申请号：US13824227
申请日：2011-12-06
申请人： Hideo Hosono , Michikazu Hara , Masaaki Kitano , Sung Wng Kim , Satoru Matsuishi , Yoshitake Toda , Toshiharu Yokoyama , Fumitaka Hayashi
发明人： Hideo Hosono , Michikazu Hara , Masaaki Kitano , Sung Wng Kim , Satoru Matsuishi , Yoshitake Toda , Toshiharu Yokoyama , Fumitaka Hayashi
IPC分类号： C01C1/04 , B01J35/00 , B01J37/08 , B01J37/16 , B01J37/18 , B01J23/46 , B01J23/745 , B01J23/75 , B01J35/10 , B01J37/02 , B01J21/04
CPC分类号： C01C1/0411 , B01J21/04 , B01J23/462 , B01J23/745 , B01J23/75 , B01J35/002 , B01J35/0033 , B01J35/1009 , B01J37/0201 , B01J37/086 , B01J37/16 , B01J37/18 , Y02P20/52
摘要： The present invention provides a catalyst substance that is stable and performs well in the synthesis of ammonia, one of the most important chemical substances for fertilizer ingredients and the like. The catalyst substance exhibits catalytic activity under mild synthesis conditions not requiring high pressure, and is also advantageous from a resource perspective. Further provided is a method for producing the same. This catalyst comprises a supported metal catalyst that is supported on a mayenite type compound including conduction electrons of 1015 cm−3 or more and serving as a support for the ammonia synthesis catalyst. The mayenite type compound used as the support may take any form, including that of powder, a porous material, a sintered body, a thin-film, or a single crystal. Use of this catalyst makes it possible to increase the electron donating ability toward a transition metal.
摘要翻译：本发明提供一种氨合成稳定性良好的催化剂物质，其为化肥成分等最重要的化学物质之一。催化剂物质在不需要高压的温和合成条件下表现出催化活性，并且从资源角度来看也是有利的。进一步提供其制造方法。该催化剂包含负载在包含1015cm-3以上的导电电子的钙铝石型化合物作为氨合成催化剂的载体的载体金属催化剂。用作载体的钙铝石型化合物可以是任何形式，包括粉末，多孔材料，烧结体，薄膜或单晶。使用该催化剂使得可以增加向过渡金属的给电能力。

88. 发明申请

US20060099126A1 Sputtering target and process for producing the same 失效
标题翻译：溅射目标和生产方法
公开(公告)号：US20060099126A1
公开(公告)日：2006-05-11
申请号：US10547816
申请日：2004-02-03
申请人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
发明人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
IPC分类号： C01F17/00 , B22D7/00
CPC分类号： C04B35/645 , C04B35/547 , C04B2235/3227 , C04B2235/446 , C04B2235/5409 , C04B2235/5436 , C04B2235/72 , C04B2235/77 , C04B2235/786 , C23C14/3414 , Y10T428/12
摘要： A manufacturing method of a sputtering target having mainly oxychalcogenide containing La and Cu by sintering at least one or more powders selected from an elementary substance of a constituent element, oxide or chalcogenide as the raw material, characterized in including a reaction step of retaining the [material] at a temperature of 850° C. or less for 1 hour or more during the sintering step, wherein this [material], after the reaction step, is subject to pressure sintering at a temperature that is higher than the reaction step temperature. In addition to increasing the density of a P-type transparent conductive material target having mainly oxychalcogenide containing La and Cu and enabling the enlargement of the target at a low manufacturing cost, the existence of unreacted matter in the target can be eliminated, the production yield can be improved by suppressing the generation of cracks in the target, and the quality of deposition formed by sputtering this kind of target can also be improved.
摘要翻译：一种溅射靶的制造方法，其特征在于，具有通过烧结选自构成元素的基本物质，氧化物或硫族化物的至少一种以上的粉末作为原料的含有含有La和Cu的氧化硫元素的溅射靶，其特征在于，包括：材料]在烧结工序中在850℃以下的温度下保持1小时以上，其中在反应工序后，将该材料在比反应步骤温度高的温度进行加压烧结。除了增加含有含有La和Cu的含氧硫属元素的P型透明导电材料靶的密度以外，能够以低的制造成本扩大靶，除此之外，可以消除靶中未反应物的存在，生产率可以通过抑制靶中的裂纹的产生而得到改善，也可以提高通过溅射形成的沉积物的质量。

89. 发明授权

US06611317B1 Exposure apparatus, semiconductor device, and photomask 失效
标题翻译：曝光装置，半导体装置和光掩模
公开(公告)号：US06611317B1
公开(公告)日：2003-08-26
申请号：US09701180
申请日：2001-02-16
申请人： Tohru Ogawa , Hideo Hosono , Shinya Kikugawa , Yoshiaki Ikuta , Akio Masui , Noriaki Shimodaira , Shuhei Yoshizawa
发明人： Tohru Ogawa , Hideo Hosono , Shinya Kikugawa , Yoshiaki Ikuta , Akio Masui , Noriaki Shimodaira , Shuhei Yoshizawa
IPC分类号： G03B2772
CPC分类号： G03F7/70058 , G03F7/70241 , G03F7/70958
摘要： An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm−1 or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm−1.
摘要翻译：一种曝光装置，其中构成曝光光源系统的光学部件，照明光学系统，光掩模和投影光学系统中的至少一个由用于光学部件的合成石英玻璃制成，其吸收系数为0.70 cm-1或更小，以及归因于约3640cm -1处的SiOH伸缩振动的红外吸收峰。

90. 发明授权

US07897068B2 Sputtering target, thin film for optical information recording medium and process for producing the same 有权
公开(公告)号：US07897068B2
公开(公告)日：2011-03-01
申请号：US12794129
申请日：2010-06-04
申请人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
发明人： Hideo Hosono , Kazushige Ueda , Masataka Yahagi , Hideo Takami
IPC分类号： H01B1/08 , B32B18/00
CPC分类号： C23C14/086 , C04B35/453 , C04B2235/3217 , C04B2235/3225 , C04B2235/3272 , C04B2235/3284 , C04B2235/3286 , C04B2235/3293 , C04B2235/5436 , C04B2235/77 , C04B2235/775 , C23C14/3414 , G11B7/2531 , G11B7/2578 , G11B7/266 , G11B2007/25706 , G11B2007/25708 , G11B2007/2571 , G11B2007/25715 , Y02T50/67 , Y10T428/12
摘要： A sputtering target is provided that has a relative density of 80% or more and contains a compound having as its principal component zinc oxide satisfying AXBYO(KaX+KbY)/2(ZnO)m, 1

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