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    • 81. 发明授权
    • Enhanced high availability for group VPN in broadcast environment
    • 在广播环境中增强组VPN的高可用性
    • US08442230B1
    • 2013-05-14
    • US12952623
    • 2010-11-23
    • Anthony NgChih-Wei ChaoNagavenkata Suresh MelamNilesh Kumar Maheshwari
    • Anthony NgChih-Wei ChaoNagavenkata Suresh MelamNilesh Kumar Maheshwari
    • H04L9/00
    • H04L43/10H04L9/0822H04L63/0272H04L63/065H04L63/164
    • A light-weight resilient mechanism is used to synchronize server secure keying data with member devices in a highly-scalable distributed group virtual private network (VPN). A server device generates an initial secure keying data set, for the VPN, that includes a first version identifier, and sends, to member devices and via point-to-point messages, the secure keying data set. The server device sends, to the member devices, heartbeat push messages including the first version identifier. The server device generates an updated secure keying data set with a second version identifier and sends, to the member devices, a key push message that includes the updated data set. The server device sends, to the member devices, heartbeat push messages including the second version identifier. Member devices may use the first and second version identifiers to confirm that secure keying data sets are current and quickly identify if updates are missed.
    • 轻量级的弹性机制用于将服务器安全密钥数据与高度可扩展的分布式组虚拟专用网(VPN)中的成员设备同步。 服务器设备为VPN生成包括第一版本标识符的初始安全密钥数据集,并向成员设备发送安全密钥数据集,并通过点对点消息发送安全密钥数据集。 服务器设备向成员设备发送包括第一版本标识符的心跳推送消息。 服务器设备生成具有第二版本标识符的更新的安全密钥数据集,并向成员设备发送包括更新的数据集的密钥推送消息。 服务器设备向成员设备发送包括第二版本标识符的心跳推送消息。 成员设备可以使用第一和第二版本标识符来确认安全密钥数据集是当前的,并且快速识别是否错过更新。
    • 87. 发明授权
    • Thin film transistor substrate, electronic apparatus, and methods for fabricating the same
    • 薄膜晶体管基板,电子设备及其制造方法
    • US07745826B2
    • 2010-06-29
    • US12249968
    • 2008-10-13
    • Ming-Wei SunChih-Wei Chao
    • Ming-Wei SunChih-Wei Chao
    • H01L29/04
    • H01L27/1296H01L29/66757
    • A TFT substrate includes a substrate and at least a TFT disposed thereon. The TFT includes a semiconductor island and at least a gate. The semiconductor island has a source region, a drain region, and a channel region interposed therebetween. The semiconductor island has sub-grain boundaries. The gate corresponds to the channel region. A first included angle between an extending direction of the gate and a line connecting the centroid of the source region with the centroid of the drain region is not substantially equal to 90 degrees. A second included angle between the sub-grain boundaries in the channel region and the line connecting the centroid of the source region with the centroid of the drain region is not substantially equal to 0 degree or 90 degrees. Additionally, a method of fabricating a TFT substrate, an electronic apparatus, and a method of fabricating the electronic apparatus are also provided.
    • TFT基板包括基板和至少设置在其上的TFT。 TFT包括半导体岛和至少一个栅极。 半导体岛具有源极区,漏极区和插入其间的沟道区。 半导体岛具有亚晶界。 门对应于通道区域。 栅极的延伸方向与连接源极区域的质心与漏极区域的质心之间的第一夹角基本上不等于90度。 沟道区域中的子晶界之间的第二夹角与将源极区域的质心与漏极区域的质心连接的线基本上不等于0度或90度。 此外,还提供了制造TFT基板的方法,电子设备和制造该电子设备的方法。
    • 88. 发明申请
    • THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD OF FABRICATING THEREOF
    • 薄膜晶体管阵列基板及其制造方法
    • US20100051950A1
    • 2010-03-04
    • US12337583
    • 2008-12-17
    • Ming-Wei SunChih-Wei Chao
    • Ming-Wei SunChih-Wei Chao
    • H01L29/04H01L21/84H01L21/36
    • H01L21/02675H01L21/02532H01L21/02595H01L21/268H01L27/12H01L27/1214H01L27/1274H01L27/1285H01L29/04H01L29/66757
    • A thin film transistor array substrate includes a substrate, a plurality of poly-silicon islands and a plurality of gates. The substrate has a display region, a gate driver region and a source driver region. Each poly-silicon island disposed on the substrate has a source region, a drain region and a channel region disposed therebetween. The poly-silicon islands include several first poly-silicon islands and several second poly-silicon islands. The first poly-silicon islands having main grain boundaries and sub grain boundaries are only disposed within the display region and the gate driver region. The main grain boundaries of the first poly-silicon islands are only disposed within the source regions and/or the drain regions. The second poly-silicon islands are disposed in the source driver region. Grain sizes of the first poly-silicon islands are substantially different from those of the second poly-silicon islands. Gates corresponding to the channel regions are disposed on the substrate.
    • 薄膜晶体管阵列基板包括基板,多个多晶硅岛和多个栅极。 衬底具有显示区域,栅极驱动器区域和源极驱动器区域。 设置在基板上的每个多硅岛具有源极区域,漏极区域和设置在其间的沟道区域。 多晶硅岛包括几个第一多晶硅岛和几个第二多晶硅岛。 具有主晶粒边界和子晶界的第一多晶硅岛仅设置在显示区域和栅极驱动器区域内。 第一多晶硅岛的主晶粒边界仅设置在源区和/或漏区内。 第二多晶硅岛设置在源极驱动器区域中。 第一多晶硅岛的晶粒尺寸与第二多晶硅岛的晶粒尺寸基本不同。 对应于沟道区的栅极设置在衬底上。
    • 90. 发明授权
    • EEPROM and method of manufacturing the same
    • EEPROM及其制造方法
    • US07572700B2
    • 2009-08-11
    • US12180521
    • 2008-07-26
    • Chih-Wei ChaoChin-Wei HuChi-Wen Chen
    • Chih-Wei ChaoChin-Wei HuChi-Wen Chen
    • H01L21/336
    • H01L29/7881H01L21/84H01L27/115H01L27/11558H01L27/1203
    • An EEPROM includes a substrate, a first semiconductor layer and a second semiconductor layer formed on the substrate. The first semiconductor layer is isolated from the second semiconductor layer by a trench. A first source and a first drain are located at two opposing sides of the first semiconductor layer. A first dielectric layer is formed on the first semiconductor layer, and a first floating gate is formed on the first dielectric layer. A second source and a second drain are located at two opposing sides of the second semiconductor layer. A second dielectric layer is formed on the second semiconductor layer, and a second floating gate is formed on the second dielectric layer. The first floating gate and the second floating gate are electrically connected.
    • EEPROM包括基板,形成在基板上的第一半导体层和第二半导体层。 第一半导体层通过沟槽与第二半导体层隔离。 第一源极和第一漏极位于第一半导体层的相对两侧。 在第一半导体层上形成第一电介质层,在第一电介质层上形成第一浮栅。 第二源极和第二漏极位于第二半导体层的两个相对侧。 在第二半导体层上形成第二电介质层,在第二电介质层上形成第二浮栅。 第一浮栅和第二浮栅电连接。