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    • 82. 发明申请
    • Liquid crystal display
    • 液晶显示器
    • US20070229452A1
    • 2007-10-04
    • US11730257
    • 2007-03-30
    • Yutaka SanoTakashi KunimoriToshihiko TanakaMasanori Yasumori
    • Yutaka SanoTakashi KunimoriToshihiko TanakaMasanori Yasumori
    • G09G3/36
    • G02F1/13318G01J1/4204G02F1/1336G02F1/136209G02F1/13624G02F2001/133618G02F2001/136245G09G3/3406G09G3/3648G09G2360/144
    • A liquid crystal display (LCD) 1 according to an embodiment of the present invention includes a liquid crystal panel having a TFT substrate 2, a CF substrate 25, and a liquid crystal layer 14 interposed between the two substrates; a TFT ambient light photosensor having a semiconductor layer 19L for detecting external light; a photodetector unit LS1 having a capacitor Cw in which a predetermined reference voltage is charged and a voltage charged by leakage current of the TFT ambient light photosensor is lowered; and an ambient light photosensor reader unit Re1 for reading a voltage charged in the capacitor for a predetermined read period. The photodetector unit is disposed on a first surface of the TFT substrate 2 that is in contact with the liquid crystal layer, and the surface of the photodetector unit except for the semiconductor layer 19L and its periphery is covered by a light-shielding layer 21. It is therefore possible to provide an LCD in which malfunction or reduced sensitivity of its ambient light photosensor due to light from its backlights is prevented with a simple structure.
    • 根据本发明实施例的液晶显示器(LCD)1包括具有TFT基板2,CF基板25和插入在两个基板之间的液晶层14的液晶面板; 具有用于检测外部光的半导体层19L的TFT环境光感应器; 具有预定参考电压被充电的电容器Cw和TFT环境光电传感器的漏电流充电的电压的光检测器单元LS 1降低; 以及环境光光电传感器读取单元Re 1,用于在预定的读取周期内读取在电容器中充电的电压。 光检测器单元设置在与液晶层接触的TFT基板2的第一表面上,除了半导体层19L及其周边外的光检测器单元的表面被覆盖 因此可以提供一种LCD,其中以简单的结构防止由于来自其背光的光而导致的环境光传感器的故障或降低的灵敏度。
    • 85. 发明授权
    • Power generating unit general monitor/control apparatus
    • 发电机组通用监控/控制装置
    • US07110863B2
    • 2006-09-19
    • US10508535
    • 2003-03-28
    • Toshihiko TanakaHiroshi FukudaJin MurataToshihiro Yamada
    • Toshihiko TanakaHiroshi FukudaJin MurataToshihiro Yamada
    • G05D11/00
    • H02J13/001Y02E60/74Y04S10/30Y04S10/40
    • A generation unit general monitor-control system for generally monitoring and controlling electric power generation units (A-3 etc.), the general monitor-control system allocating relations between the electric power generation units and interface devices (11) for monitoring and controlling the generation units. The monitor-control system includes: a unit database (13) storing process data and operation signals; process input-output means (14) for reading out the data from this unit database and outputting the data to the generation units; unit database input-output portion (12) for receiving demands from the interface devices, detecting addresses of the generation units allotted to the interface devices, and referring to data corresponding to the addresses; interface device designating means (22) for designating interface devices; and an interface-device-unit-relation rewriting device (18) for rewriting the allocation relation between the generation unit and the interface devices based upon command from the interface device designating means.
    • 一般监视和控制发电机组(A-3等)的发电机组通用监视控制系统,分配发电机组和接口装置(11)之间关系的一般监视控制系统,用于监控和控制 一代单位。 监视器控制系统包括:存储过程数据和操作信号的单元数据库(13); 过程输入输出装置(14),用于从该单元数据库读出数据并将数据输出到生成单元; 单元数据库输入输出部分(12),用于从接口设备接收需求,检测分配给接口设备的生成单元的地址,并参考对应于该地址的数据; 接口装置指定装置(22),用于指定接口装置; 以及用于根据来自接口设备指定装置的命令重写生成单元和接口设备之间的分配关系的接口设备单元关系重写设备(18)。
    • 86. 发明申请
    • Process for fabricating semiconductor device and method for generating mask pattern data
    • 制造半导体器件的方法和用于产生掩模图案数据的方法
    • US20060183310A1
    • 2006-08-17
    • US10551553
    • 2004-12-22
    • Toshihiko Tanaka
    • Toshihiko Tanaka
    • H01L21/44
    • G03F7/70425G03F7/70441
    • A method of fabricating a semiconductor device including a first wiring pattern extending in a vertical direction and a second wiring pattern identical in geometry to the first wiring pattern and extending in a (horizontal) direction orthogonal to the vertical direction, including the steps of: employing linearly polarized illumination to perform exposure along a mask pattern including mask patterns used to form the first and second wiring patterns, respectively; and subsequently forming the first and second wiring patterns having a geometry along the mask patterns. The mask patterns to form the first and second wiring patterns are formed to be different in geometry.
    • 一种制造半导体器件的方法,所述半导体器件包括在垂直方向上延伸的第一布线图案和与所述第一布线图案相同的第二布线图案,并且沿与垂直方向垂直的(水平)方向延伸,包括以下步骤: 线偏振照明,沿着包括用于形成第一和第二布线图案的掩模图案的掩模图案进行曝光; 随后沿掩模图案形成具有几何形状的第一和第二布线图案。 形成第一和第二布线图案的掩模图案形成为几何形状不同。
    • 89. 发明授权
    • Defect inspection system
    • 缺陷检查系统
    • US06973209B2
    • 2005-12-06
    • US09917845
    • 2001-07-25
    • Toshihiko Tanaka
    • Toshihiko Tanaka
    • G01N21/94G01N21/956G06K9/00
    • G06T7/0004G01N21/94G01N21/956G06T7/0002G06T2200/24G06T2207/30148
    • A defect inspection system is provided which comprises an image acquiring section for acquiring a two-dimensional image of a subject which is a processing target in a manufacturing process, a defect extracting section for extracting a defect by a defect extraction algorithm using a predetermined parameter for an image acquired by the image acquiring section, a displaying section for displaying an image of a defect of the subject extracted by the defect extracting section, a parameter adjusting section for adjusting the parameter in accordance with a defect extraction degree for the subject, and a quality judging section for judging the quality of the subject based on a defect information extracted by the defect extracting section.
    • 提供了一种缺陷检查系统,其包括图像获取部分,用于获取在制造过程中作为处理对象的被摄体的二维图像;缺陷提取部分,用于通过使用预定参数的缺陷提取算法提取缺陷, 由图像获取部获取的图像,用于显示由缺陷提取部提取的被检体的缺陷的图像的显示部,用于根据对象的缺陷提取度来调整参数的参数调整部,以及 质量判断部分,用于基于由缺陷提取部分提取的缺陷信息来判断对象的质量。
    • 90. 发明申请
    • Power generating unit general monitor/control apparatus
    • 发电机组通用监控/控制装置
    • US20050159826A1
    • 2005-07-21
    • US10508535
    • 2003-03-28
    • Toshihiko TanakaHiroshi FukudaJin MurataToshihiro Yamada
    • Toshihiko TanakaHiroshi FukudaJin MurataToshihiro Yamada
    • G05B23/02G05B15/00
    • H02J13/001Y02E60/74Y04S10/30Y04S10/40
    • A generation unit general monitor-control system for generally monitoring and controlling electric power generation units (A-3 etc.), the general monitor-control system allocating relations between the electric power generation units and interface devices (11) for monitoring and controlling the generation units. The monitor-control system includes: a unit database (13) storing process data and operation signals; process input-output means (14) for reading out the data from this unit database and outputting the data to the generation units; unit database input-output portion (12) for receiving demands from the interface devices, detecting addresses of the generation units allotted to the interface devices, and referring to data corresponding to the addresses; interface device designating means (22) for designating interface devices; and an interface-device-unit-relation rewriting device (18) for rewriting the allocation relation between the generation unit and the interface devices based upon command from the interface device designating means.
    • 一般监视和控制发电机组(A-3等)的发电机组通用监视控制系统,分配发电机组和接口装置(11)之间关系的一般监视控制系统,用于监控和控制 一代单位。 监视器控制系统包括:存储过程数据和操作信号的单元数据库(13); 过程输入输出装置(14),用于从该单元数据库读出数据并将数据输出到生成单元; 单元数据库输入输出部分(12),用于从接口设备接收需求,检测分配给接口设备的生成单元的地址,并参考对应于该地址的数据; 接口装置指定装置(22),用于指定接口装置; 以及用于根据来自接口设备指定装置的命令重写生成单元和接口设备之间的分配关系的接口设备单元关系重写设备(18)。