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    • 84. 发明申请
    • PROCESS FOR PRODUCING PHOTONIC CRYSTALS AND CONTROLLED DEFECTS THEREIN
    • 生产光子晶体及其控制缺陷的方法
    • WO2005066672A1
    • 2005-07-21
    • PCT/US2003/038775
    • 2003-12-05
    • 3M INNOVATIVE PROPERTIES COMPANYANDERSON, Mark, T.LEATHERDALE, Catherine, A.THOMPSON, Scott, D.
    • ANDERSON, Mark, T.LEATHERDALE, Catherine, A.THOMPSON, Scott, D.
    • G02B6/12
    • G03F7/0047B82Y20/00C30B29/60C30B33/00G02B6/1225G02B6/138G03F7/038G03F7/2053G03F7/40
    • A process comprises (a) providing a substantially inorganic photoreactive composition comprising (1) at least one cationically reactive species, (2) a multi-photon photoinitiator system, and10 (3) a plurality of precondensed, inorganic nanoparticles; (b) exposing, using a multibeam interference technique involving at least three beams, at least a portion of the photoreactive composition to radiation of appropriate wavelength, spatial distribution, and intensity to produce a two-dimensional or three-dimensional periodic pattern of reacted and non-reacted portions of the photoreactive composition; (c) exposing at least a portion of the non-reacted portion of the photoreactive composition to radiation of appropriate wavelength and intensity to cause multi-photon absorption and photoreaction to form additional reacted portion; (d) removing the non-reacted portion or the reacted portion of the photoreactive composition to form interstitial void space; and (e) at least partially filling the interstitial void space with at least one material having a refractive index that is different from the refractive index of the remaining portion.
    • 一种方法包括(a)提供基本上无机的光反应性组合物,其包含(1)至少一种阳离子反应性物质,(2)多光子光引发剂体系和10(3)多个预先被引发剂的无机纳米粒子; (b)使用涉及至少三个光束的多光束干涉技术将至少一部分光反应性组合物暴露于适当波长,空间分布和强度的辐射,以产生二维或三维周期性图案, 光反应性组合物的未反应部分; (c)将光反应性组合物的未反应部分的至少一部分暴露于适当波长和强度的辐射,以引起多光子吸收和光反应以形成额外的反应部分; (d)除去光反应性组合物的未反应部分或反应部分以形成间隙空隙; 和(e)至少部分地用至少一种具有不同于其余部分的折射率的折射率的材料填充间隙空隙。