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    • 86. 发明申请
    • Optoelectronic Devices Having Deep Level Defects and Associated Methods
    • 具有深层缺陷和相关方法的光电器件
    • US20120292729A1
    • 2012-11-22
    • US13472325
    • 2012-05-15
    • Christopher Vineis
    • Christopher Vineis
    • H01L31/0236H01L31/18
    • H01L31/0236H01L31/02363H01L31/18Y02E10/50
    • Semiconductor structures, devices, and methods that can exhibit various enhanced properties, such as, for example, enhanced light detection properties are provided. In one aspect, for example, an optoelectronic device can include a semiconductor material having an enhanced absorption region and a first defect in the enhanced absorption region, where the first defect is a deep-level defect generated by a first defect carrier type that is either a deep-level donor carrier type or a deep-level acceptor carrier type. The device can also include a second defect in the enhanced absorption region, where the second defect is either a shallow-level defect or a deep-level defect, and where the second defect is generated by a second defect carrier type that is opposite to the first defect carrier type. Furthermore, the enhanced absorption region has an external quantum efficiency of at least about 0.5% for electromagnetic radiation wavelengths greater than 1250 nm.
    • 提供了能够呈现各种增强特性的半导体结构,器件和方法,例如增强的光检测性质。 在一个方面,例如,光电子器件可以包括具有增强的吸收区域和增强的吸收区域中的第一缺陷的半导体材料,其中第一缺陷是由第一缺陷载体类型产生的深层缺陷, 深层供体载体型或深层受体载体型。 该装置还可以包括增强吸收区域中的第二缺陷,其中第二缺陷是浅层缺陷或深层缺陷,并且其中第二缺陷由与第二缺陷相反的第二缺陷载体类型产生 第一缺陷载体类型。 此外,增强的吸收区域对于大于1250nm的电磁辐射波长具有至少约0.5%的外部量子效率。