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81. 发明专利

JPH06215893A MEASURING DEVICE FOR HIGH FREQUENCY EXCITATION PLASMA 失效
公开(公告)号：JPH06215893A
公开(公告)日：1994-08-05
申请号：JP2210693
申请日：1993-01-15
申请人： OMI TADAHIRO
发明人： OMI TADAHIRO , HIRAYAMA MASAKI
IPC分类号： H05H1/00
摘要： PURPOSE:To precisely measure plasma potential by setting the absolute value of the impedance between a first electrode and earthing 5 times or more the absolute value of the impedance between the first electrode and a plasma. CONSTITUTION:To minimize the impedance of a sheath, an electrode 103 is connected to an electrode 101 through a capacitor, and no direct current is thus carried to the electrode 103. Since the direct current is only carried through the electrode 101 with a small surface area, it hardly disturb a plasma. A filter 111 is provided on a probe, whereby the impedance of the probe in an excitation frequency is increased. For example, the absolute value of the impedance of the filter 111 in excitation frequency 200MHz is 6.2kOMEGA, the reactance of a solid wire 110 is 160OMEGA, and the absolute value of the impedance of the electrode 101 to earthing is surely 6kOMEGA or more. Thus, each plasma parameter can be precisely measured.

82. 发明专利

JPH06172972A DUST COLLECTOR FOR VACUUM TREATING DEVICE 失效
公开(公告)号：JPH06172972A
公开(公告)日：1994-06-21
申请号：JP32334992
申请日：1992-12-02
申请人： CANON KK , APPLIED MATERIALS JAPAN , OMI TADAHIRO
发明人： GOTOU AKIHIRO , YAMAGAMI ATSUSHI , OKAMURA NOBUYUKI , OMI TADAHIRO , SHIBATA SUNAO
IPC分类号： C23C14/22 , C23C14/00 , C23C16/44
摘要： PURPOSE:To improve performance such as the reliability of a vacuum treating device yield, reproducibility or the like by executing dust collection treating in a vacuum chamber with the intake air, utilizing the pressure difference from the chamber. CONSTITUTION:A gas for dust collection treating is supplied into the vacuum chamber 100 by connecting a nozzle 10 to the vacuum chamber 100 for vacuum treating. Then, a suction opening 12 is connected to the vacuum chamber 100 in which the dust collection treating is executed by sucking air while utilizing the pressure difference. The vacuum chamber 100 is one for plasma treating. The vacuum chamber 100 is also one for producing semiconductor by plasma treating. As a result, dust is removed under non-contact state without opening the vacuum chamber into atmosphere.

83. 发明专利

JPH06108279A HYDROGEN OXYGEN GENERATING DEVICE 失效
公开(公告)号：JPH06108279A
公开(公告)日：1994-04-19
申请号：JP25868292
申请日：1992-09-28
申请人： OMI TADAHIRO
发明人： OMI TADAHIRO
IPC分类号： C25B1/06 , C25B1/02 , C25B9/00 , C25B9/06 , C25B11/04 , H01M8/06 , H01M8/18
摘要： PURPOSE:To provide a generator which hardly uses fossil fuel, does not pollute the global environment, can generate a large electric power at a low cost and is obtainable in place of a heat power plant. CONSTITUTION:This generator is constituted by housing a soln. prepd. by adding a material which dissociates in a solvent which itself does not dissociate into the solvent in a housing having inside surfaces possessing corrosion resistance and insulation characteristic and immersing anode electrodes 11, 11', 11'' of small work functions and cathode electrodes 12, 12', 12'' having the large work functions into the soln. in such a manner that these electrodes face each other. The generator, otherwise, has the vessel which has the inside surfaces possessing the corrosion resistance and the insulation characteristic, the soln. which is housed within this vessel by being shut off from the atm. and is prepd. by adding water to an unhydrous hydrogen fluoride soln., the anode electrodes which are immersed in this soln. so as to face each other and consist of the materials having the corrosion resistance and the small work functions, the cathode electrodes which consist of the materials having the corrosion resistance and the large work functions and a heat applying means.

84. 发明专利

JPH05317690A METHOD FOR GENERATING SOLID PARTICLE AEROSOL 失效
公开(公告)号：JPH05317690A
公开(公告)日：1993-12-03
申请号：JP14700692
申请日：1992-05-13
申请人： JAPAN SYNTHETIC RUBBER CO LTD , OMI TADAHIRO
发明人： OMI TADAHIRO , AOTANI SEIJI , WAKABAYASHI KENGO
IPC分类号： B01J13/00 , C09K3/30
摘要： PURPOSE:To provide a method capable of stably supplying an aerosol under sufficiently controlled state, where in the aerosol, an aggregative solid particle is dispersed in a state of primary particle and the state of the concentration of the solid particle is stable even if the conc. is high. CONSTITUTION:This method has processes to feed a particle dispersed solution D through a particle dispersed solution feeding pipe 20 inserted into the particle dispersed solution D and to spray into a dilution gas through a spraying narrow pore 23 by applying pressure with carbon dioxide gas to a tight closed vessel 10 housing the particle dispersed solution D composed of a carbon dioxide soluble liquid dispersing medium and the solid particle.

85. 发明专利

JPH05152217A EXHAUST SYSTEM FOR MANUFACTURING HIGH-PERFORMANCE SEMICONDUCTOR AND CONTROL METHOD THEREOF 失效
公开(公告)号：JPH05152217A
公开(公告)日：1993-06-18
申请号：JP33954691
申请日：1991-11-29
申请人： TOYO ENGINEERING CORP , OMI TADAHIRO
发明人： OKUYAMA NOBUHISA , OMI TADAHIRO
IPC分类号： H01L21/205 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To prevent the inflow of an unnecessary gas from the outside by installing a discharge-side gas purge valve capable of exhausting a gas from a discharge-side piping and a purge-gas bypass device bypassing a discharge-side sluice valve and capable of passing the gas between the discharge-side sluice valve and the discharge opening of a vacuum pump. CONSTITUTION:An suction-side gate valve 12 is closed and a discharge-side sluice valve 32 is opened on starting. A suction-side gas purge valve 13 is opened, and the suction port of a vacuum pump 20 is supplied with nitrogen gas N2 kept at atmospheric pressure. The vacuum pump is started at that time, and a purge effect may also be improved. A gas in the vacuum pump 20 is purged, and the suction-side gas purge valve 13 is closed. It is desirable that the suction-side gas purge valve 13 is mounted near the suction-side gate valve 12. When the vacuum pump 20 is started and the suction side is evacuated, the suction-side gate valve is opened. Accordingly, the back flow of an exhaust gas into the pump by a diffusion can be prevented.

86. 发明专利

JPH05136114A ULTRAPURE WATER SUPPLYING DEVICE, SUBSTRATE WASHING METHOD, AND DEVICE AND METHOD FOR MANUFACTURING ULTRAPURE WATER 失效
公开(公告)号：JPH05136114A
公开(公告)日：1993-06-01
申请号：JP32088591
申请日：1991-11-08
申请人： OMI TADAHIRO
发明人： OMI TADAHIRO
IPC分类号： B08B3/02 , C02F1/04 , H01L21/00 , H01L21/304
摘要： PURPOSE:To obtain a substrate washing method by which even a very small amount of impurities can be washed away from the inside of a narrow trench or hole having a high aspect ratio with a washing liquid without causing contamination and ultrapure water used for the method. CONSTITUTION:A steam generating means 1 for heating first ultrapure water to first steam, steam heating means 3 for heating the first steam to second steam of a temperature higher than that of the first steam, and cooling means 5 which cools the second steam to second ultrapure water are provided in the middle of a pipeline 7 for supplying prescribed ultrapure water to an ultrapure water using point.

87. 发明专利

JPH0551749A VACUUM TREATING DEVICE 失效
公开(公告)号：JPH0551749A
公开(公告)日：1993-03-02
申请号：JP23227491
申请日：1991-08-20
申请人： OMI TADAHIRO
发明人： OMI TADAHIRO , KONISHI NOBUHIRO
IPC分类号： C23C16/44 , H01L21/203 , H01L21/285 , H01L21/677 , H01L21/68
摘要： PURPOSE:To prevent the deposition of particles on a material to be treated by injecting UV into a gas passing through a tube with the inner surface formed with an insulator and introducing the gas into a vessel. CONSTITUTION:A sample 107 is treated in the load-lock chamber 101 of a vacuum vessel. Nitrogen gas passing through a pipeline 103 is irradiated with UV from a deuterium lamp 104. The partially ionized nitrogen gas flows onto the sample 107 to remove electrification of the sample. The pipeline 103 is formed with an insulator to prevent the neutralization of the formed ion and electron. Even if the sample 107 moving in the vessel is charged, the electric charge is neutralized. Consequently, the particles are not deposited on the sample 107, and yields are increased.

88. 发明专利

JPH0547870A CHARGED PARTICLE FLOW IRRADIATION DEVICE 失效
公开(公告)号：JPH0547870A
公开(公告)日：1993-02-26
申请号：JP23227291
申请日：1991-08-20
申请人： OMI TADAHIRO
发明人： OMI TADAHIRO , YAMASHITA TAKEO , SHIBATA SUNAO
IPC分类号： H01L21/66
摘要： PURPOSE:To provide a charged particle flow irradiation device which enables prevention of electrification of the surface of an insulator sample. CONSTITUTION:A projector 105 for projecting ultraviolet light to gas introduced inside a container is provided to a charged particle irradiation device which is formed of a container 101 whose inside pressure can be reduced and an irradiation means 102 for applying charged particle flow toward an irradiated object 103 on a holding part arranged inside the container 101.

89. 发明专利

JPH0547735A CLEANING APPARATUS 失效
公开(公告)号：JPH0547735A
公开(公告)日：1993-02-26
申请号：JP23228091
申请日：1991-08-20
申请人： OMI TADAHIRO
发明人： OMI TADAHIRO , IMAOKA TAKAYUKI
IPC分类号： H01L21/304
摘要： PURPOSE:To effectively clean by providing a vessel for shielding a light on a part of a member to be processed, in contact with chemicals or ultrapure water to be used for cleaning, and further providing inert gas supply means into the vessel, gas spraying means to a member to be dried, and ultraviolet irradiation means to gas. CONSTITUTION:An apparatus for cleaning or drying a member to be processed, comprises a light shielding vessel 101 having a function of shielding a light in a part of a member 102 to be processed, in contact with chemicals or ultrapure water to be used for cleaning in such a manner that an inner atmosphere can be replaced, further, an inert gas supply unit 104 for supplying inert gas into the vessel 101, a gas injection nozzle 207a for drying a member 209 to be dried by spraying the inert gas toward the member 209, and an ultraviolet irradiation unit 204 for irradiating part of the gas with ultraviolet ray. Thus, impurities on the surface of a semiconductor of the member to be processed can be effectively removed.

90. 发明专利

JPH0547734A CLEANING APPARATUS 失效
公开(公告)号：JPH0547734A
公开(公告)日：1993-02-26
申请号：JP23227991
申请日：1991-08-20
申请人： OMI TADAHIRO
发明人： OMI TADAHIRO , IMAOKA TAKAYUKI
IPC分类号： H01L21/304
摘要： PURPOSE:To effectively remove impurities on a surface of an optical processing element by incorporating a function of shielding a light in a part of a member to be processed, in contact with chemicals or ultrapure water to be used for cleaning in an apparatus for cleaning or drying the member to be processed. CONSTITUTION:A cleaning vessel 3 for cleaning semiconductor 2 is mounted in a light shielding vessel 1 for shielding an external light. Nitrogen gas 6 is supplied from a nitrogen gas supply unit 4 to the vessel 1 through a tube 5. On the other hand, ultrapure water 9 in which dissolved oxygen is removed, is supplied from an ultrapure water supply unit 7 to the vessel 3 mounted in the vessel 1 through a tube 8. Further, the ultrapure water after the semiconductor 2 is cleaned, is fed to a waste water processor 12 through a waste water reservoir 10 and a piping 11 to be processed. The gas 6 substituted for the atmosphere in the vessel 1 is discharged through a discharge valve 13 and a piping 14. Thus, impurities on the surface of a member to be processed can be effectively removed without adherence of the impurities due to excitation of electrons or holes by a light.

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