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    • 84. 发明申请
    • PROCESS FOR THE HYDROGENATION OF ESTERS OF ALPHA-SUBSTITUTED CARBOXYLIC ACIDS
    • 羟基取代的羧酸的加氢过程
    • WO2005023737A1
    • 2005-03-17
    • PCT/GB2004/003884
    • 2004-09-10
    • AVECIA LIMITEDMOODY, David, JohnHÄRRÖD, MagnusFIELDHOUSE, Robin
    • MOODY, David, JohnHÄRRÖD, MagnusFIELDHOUSE, Robin
    • C07C29/149
    • C07C29/149C07C67/31Y02P20/544C07C69/675C07C31/22C07C31/205
    • There is provided a process for the hydrogenation of esters of alpha-substituted carboxylic acids which comprises reacting an ester of an alpha-substituted carboxylic acid with hydrogen in the presence of a catalyst under substantially homogeneous supercritical conditions. Preferably, the ester of an alpha-substituted carboxylic acids is an ester of formula (1): wherein: R 1 and R 2 are each independently an optionally substituted hydrocarbyl group or an optionally substituted heterocyclic group; and Y is a heteroatom or an optionally substituted heteroatom group. More preferably, the ester of an alpha-substituted is carboxylic acids is an ester of formula (2): wherein: R 3 is an optionally substituted hydrocarbyl group or an optionally substituted heterocyclic group; R 4 and R 5 are each independently hydrogen, an optionally substituted hydrocarbyl group or an optionally substituted heterocyclic group; Y is a heteroatom or an optionally substituted heteroatom group; Q is a functional group; and n 1. Most preferably, the ester of an alpha-substituted carboxylic acids is an ester of formula (3): wherein: R 3 and R 6 are each independently an optionally substituted hydrocarbyl group or an optionally substituted heterocyclic group; R 4 and R 5 are each independently hydrogen, an optionally substituted hydrocarbyl group or an optionally substituted heterocyclic group; Y is a heteroatom or an optionally substituted heteroatom group; and n 1.
    • 提供了α-取代羧酸酯的氢化方法,其包括在催化剂存在下,在基本上均匀的超临界条件下使α-取代的羧酸的酯与氢反应。 优选地,α-取代的羧酸的酯是式(1)的酯:其中:R 1和R 2各自独立地为任选取代的烃基或任选取代的杂环基; 并且Y是杂原子或任选取代的杂原子基团。 更优选地,α-取代的酯是羧酸是式(2)的酯:其中:R 3是任选取代的烃基或任选取代的杂环基; R 4和R 5各自独立地为氢,任选取代的烃基或任选取代的杂环基; Y是杂原子或任选取代的杂原子基团; Q是功能组; 最优选地,α-取代的羧酸的酯是式(3)的酯:其中:R 3和R 6各自独立地是任选取代的烃基或任选取代的杂环基 ; R 4和R 5各自独立地为氢,任选取代的烃基或任选取代的杂环基; Y是杂原子或任选取代的杂原子基团; 和n 1。
    • 87. 发明申请
    • PROCESS AND INK FOR MAKING ELECTRONIC DEVICES
    • 制造电子设备的工艺和墨水
    • WO2004026977A1
    • 2004-04-01
    • PCT/GB2003/003697
    • 2003-08-22
    • AVECIA LIMITEDHOPPER, Alan, JohnJAMES, Mark, Robert
    • HOPPER, Alan, JohnJAMES, Mark, Robert
    • C09D11/10
    • C09D11/36C09D11/101H05K3/0076H05K3/061H05K2203/013Y10T428/24917
    • A process for making an electronic device comprising a dielectric substrate laminated with an electrically conductive metal or alloy which comprises applying a non­-aqueous etch-resistant ink by ink jet printing to selected areas of the metal or alloy, exposing the etch-resistant ink to actinic radiation and/or particle beam radiation to effect polymerisation, removing exposed metal or alloy by a chemical etching process and then removing the polymerised etch-resistant ink by alkali wherein the etch-resistant ink is substantially solvent free and comprises the components: A) 30 to 90 parts acrylate functional monomers free from acid groups comprising mono or higher functionality wherein 5 - 95% by weight is one or more mono­functional monomers; B) 1 to 30 parts acrylate functional monomer containing one or more acid groups; C) 0 to 20 parts polymer or prepolymer; D) 0 to 20 parts radical initiator; E) 0 to 5 parts colorant; F) 0 to 5 parts surfactant; and wherein the ink has a viscosity of not greater than 30 cPs (mPa.s) at 40°C and all parts are by weight.
    • 一种用于制造电子器件的方法,该电子器件包括层叠有导电金属或合金的电介质基底,其包括通过喷墨印刷将非水性耐蚀刻油墨施加到金属或合金的选定区域,将耐蚀刻油墨暴露于 光化辐射和/或粒子束辐射以进行聚合,通过化学蚀刻方法去除暴露的金属或合金,然后通过碱除去聚合的耐蚀刻油墨,其中耐蚀刻油墨基本上无溶剂并且包含组分:A) 30至90份不含包含单官能或更高官能度的酸基的丙烯酸酯官能单体,其中5-95重量%是一种或多种单官能单体; B)1至30份含有一个或多个酸基的丙烯酸酯官能单体; C)0至20份聚合物或预聚物; D)0〜20份自由基引发剂; E)0-5份着色剂; F)0-5份表面活性剂; 并且其中所述油墨在40℃下的粘度不大于30cPs(mPa.s),并且所有份数均为重量份。