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    • 74. 发明申请
    • Polysilicon microelectronic reflectors and beams and methods of fabricating same
    • 多晶硅微电子反射器和光束及其制造方法
    • US20020186444A1
    • 2002-12-12
    • US10207537
    • 2002-07-29
    • David Alan Koester
    • G02B026/08
    • B81B3/0072B81B2201/045B81C2201/0167G02B26/0866
    • A microelectronic reflector is fabricated by forming a first polysilicon layer on a microelectronic substrate, forming a first phosphosilicate glass (PSG) layer on the first polysilicon layer, and reactive ion etching to remove the first PSG layer from at least a portion of the first polysilicon layer. A second polysilicon layer is formed on at least a portion of the first polysilicon layer from which the first PSG layer was removed and a second PSG layer is formed on at least a second portion of the second polysilicon layer. Reactive ion etching is performed to remove the second PSG layer from at least a portion of the second polysilicon layer. A third PSG layer then is formed on at least a portion of the second polysilicon layer from which the second PSG layer was removed. Reactive ion etching is performed to remove the third PSG layer from at least a portion of the second polysilicon layer. By forming a third PSG layer, and reactive ion etching this layer, additional stress may be created in the first and/or second doped polysilicon layers that bends the ends of the doped first and/or second polysilicon layers towards the microelectronic substrate upon release of the treated polysilicon layer from the substrate, compared to doped polysilicon layers on which the third PSG layer was not formed and reactive ion etched. This increased stress may be counteracted by forming a stress-correcting layer on at least a portion of the second polysilicon layer from which the third PSG layer was removed, and then forming a reflective layer such as gold on at least a portion of the stress-correcting layer. The stress-correcting layer preferably comprises platinum, which can produce high stresses that can counteract the stresses in the first and second doped polysilicon layers, to thereby allow a flat mirror and/or beam to be produced.
    • 通过在微电子衬底上形成第一多晶硅层,在第一多晶硅层上形成第一磷硅酸盐玻璃(PSG)层,以及反应离子刻蚀以从第一多晶硅层的至少一部分去除第一PSG层来制造微电子反射体 层。 在去除第一PSG层的第一多晶硅层的至少一部分上形成第二多晶硅层,并且在第二多晶硅层的至少第二部分上形成第二PSG层。 执行反应离子蚀刻以从第二多晶硅层的至少一部分去除第二PSG层。 然后在去除第二PSG层的第二多晶硅层的至少一部分上形成第三PSG层。 执行反应离子蚀刻以从第二多晶硅层的至少一部分去除第三PSG层。 通过形成第三PSG层和反应离子蚀刻该层,可以在第一和/或第二掺杂多晶硅层中产生额外的应力,该第一和/或第二掺杂多晶硅层在释放时折射掺杂的第一和/或第二多晶硅层的端部朝向微电子衬底 与其上未形成第三PSG层的反射离子蚀刻的掺杂多晶硅层相比,来自衬底的处理过的多晶硅层。 这种增加的应力可以通过在去除第三PSG层的第二多晶硅层的至少一部分上形成应力校正层,然后在至少一部分应力层上形成反射层,例如金, 校正层。 应力校正层优选地包括铂,其可以产生可以抵消第一和第二掺杂多晶硅层中的应力的高应力,从而允许产生平坦的反射镜和/或光束。
    • 78. 发明申请
    • Confocal imaging apparatus and method using linear line-scanning
    • 共焦成像装置和方法使用线性扫描
    • US20020163717A1
    • 2002-11-07
    • US10138219
    • 2002-05-01
    • Jawoong Lee
    • G02B026/08
    • G02B21/0084G02B21/0032
    • The present invention relates to a confocal imaging apparatus and a method by which the frame rate and the field of view can be considerably enhanced. The apparatus of the present invention acquires the confocal images of a macroscopic specimen by combining the function of slit confocal optics, one-dimensional optical image processing, linear line-scanning, and compensating the change of the optical path length in real time. According to the present invention, the light is focused to a slit-beam on the specimen and only the light that is scattered back from the focal plane is received in parallel to form the confocal image of the specimen by the slit confocal optics that includes cylindrical lenses, a slit mask, and a line detector. In order to get the image frames, a linear line-scanning means is adopted, which linearly scans the slit-beam focused on the specimen across arbitrary desired planes that are parallel to the slit-direction of the slit-beam. Also, a real-time compensating means of the change in optical path length is adopted to remove the degrading effects on the image that is caused by the change of the optical path length during the scanning of the slit-beam.
    • 本发明涉及共焦成像装置以及可以显着增强帧频和视野的方法。 本发明的装置通过组合狭缝共焦光学的功能,一维光学图像处理,线性扫描和实时补偿光程长度的变化来获取宏观样本的共聚焦图像。 根据本发明,光被聚焦到样本上的狭缝光束,并且只有从焦平面散射回的光被平行地接收以通过狭缝共聚焦光学器件形成样品的共焦图像,所述狭缝共焦光学器件包括圆柱形 透镜,狭缝掩模和线检测器。 为了获得图像帧,采用线性扫描装置,其线束地扫描聚焦在样本上的狭缝光束穿过与狭缝光束的狭缝方向平行的任意的所需平面。 此外,采用光程长度变化的实时补偿装置来消除由扫描光束的光程长度变化引起的对图像的降级效果。
    • 79. 发明申请
    • Optical switch and servo mechanism
    • 光开关和伺服机构
    • US20020150324A1
    • 2002-10-17
    • US10063465
    • 2002-04-25
    • Herzel Laor
    • G02B006/26G02B006/42G02B026/08
    • G02B6/3572G02B6/3512G02B6/3556
    • The present invention is directed to an optical switch for switching the light from one of a plurality of inputs to one of a plurality of outputs. The switch contains at least two moveable mirrors constructed using MEM technology and a servo mechanism connected to the moveable mirrors to be used in mirror, input and output alignment. These switches are useful in applications such as fiber-fiber switches and optical disk drives. The switches may be combined with other optical equipment including stationary mirrors and lenses, such as focusing lenses, to optimize optical transmission.
    • 本发明涉及一种用于将来自多个输入中的一个输入的光切换到多个输出中的一个的光开关。 开关包含至少两个使用MEM技术构造的可移动反射镜,以及连接到可移动镜的伺服机构,用于镜像,输入和输出对准。 这些开关在光纤交换机和光盘驱动器等应用中非常有用。 开关可以与其他光学设备组合,包括固定镜和透镜,例如聚焦透镜,以优化光传输。
    • 80. 发明申请
    • Illumination system for scrolling color recycling
    • 照明系统滚动颜色回收
    • US20020135862A1
    • 2002-09-26
    • US10028023
    • 2001-12-21
    • D. Scott Dewald
    • G02F001/29G02B026/08
    • H04N9/3117G02B26/10
    • Distortion optics are used to efficiently couple a spiral color wheel and an orthogonal modulator. Light 602 from a light source enters an aperture in a reflective end of a recycling integrator rod 604. The light travels through the rod and exits the end of the rod adjacent a sequential color filter 606, shown as a spiral color wheel. The shape of the light beam 608 exiting the integrator rod 604 is determined by the shape of the exit aperture of the integrating rod 606. The exit aperture of the integrating rod 606 typically is formed by a reflective exit aperture on the exit face. A cross section of the light beam 608 exiting the sequential color filter includes several bands of filtered light, one for each of the filter segments of the color wheel illuminated by the light beam. The curvature of the color bands makes it difficult for a row addressed spatial light modulator to efficiently use the light. Illumination system 600 eliminates or mitigates this problem by distorting the light from the integrating rod to straighten the curved borders between the adjacent filter segments. The light 608 from the sequential color filter 606 is distorted by distortion optics 610, 612 to make the boundaries between the white or primary colored light segments align with the rows of the spatial light modulator 614.
    • 变形光学器件用于有效耦合螺旋色轮和正交调制器。 来自光源的光602进入再循环积分杆604的反射端中的孔。光穿过杆移动并离开杆的端部,邻近连续的彩色滤光器606,如螺旋色轮所示。 离开积分杆604的光束608的形状由积分杆606的出射孔的形状确定。积分杆606的出射孔通常由出射面上的反射出射孔形成。 离开顺序滤色器的光束608的横截面包括多个滤光光带,一个用于由光束照射的色轮的滤光片段中的每一个。 色带的曲率使得行寻址空间光调制器难以有效地使用光。 照明系统600通过使来自积分杆的光变形来矫正相邻过滤器段之间的弯曲边界来消除或减轻该问题。 来自顺序滤色器606的光608被失真光学器件610,612失真,以使白色或主要着色光段之间的边界与空间光调制器614的行对准。