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71. 发明授权

EP3062329B1 Multi-source GIS for particle-optical apparatus 有权
标题翻译： GIS具有用于粒子光学设备的多个源
公开(公告)号：EP3062329B1
公开(公告)日：2016-12-14
申请号：EP15156537.1
申请日：2015-02-25
申请人： FEI COMPANY
发明人： Mulders, Hans , Trompenaars, Piet , Dona, Pleun
IPC分类号： H01J37/30
CPC分类号： C23C14/221 , B05B1/005 , B05B1/14 , B05B7/24 , H01J37/30 , H01J2237/006 , H01J2237/31732 , H01J2237/3174 , H01J2237/31749

72. 发明公开

EP2836242A4 LOW ENERGY ELECTRON STERILIZATION 审中-公开
标题翻译：电源ARMS电子消毒
公开(公告)号：EP2836242A4
公开(公告)日：2015-12-16
申请号：EP13775703
申请日：2013-03-15
申请人： ELECTRONWORKS HOLDINGS LLC
发明人： GORZEN DANIEL F , KIRK RANDOL E
IPC分类号： A61L2/08 , H01J37/30
CPC分类号： A61L2/087 , A61L2202/24 , H01J37/30 , H01J2237/06366 , H01J2237/182 , H01J2237/2002 , H01J2237/202 , H01J2237/31

73. 发明公开

EP2372337A3 Automated Slice Milling for Viewing a Feature 审中-公开
标题翻译：全自动圆盘式粉碎机查看功能
公开(公告)号：EP2372337A3
公开(公告)日：2014-01-22
申请号：EP11160332.0
申请日：2011-03-30
申请人： FEI Company
发明人： Tanner, Ryan
IPC分类号： G01N1/28 , H01J37/304 , H01J37/26
CPC分类号： H01J37/3005 , G01N1/286 , H01J37/26 , H01J37/265 , H01J37/28 , H01J37/30 , H01J37/3045 , H01J37/3056 , H01J2237/2611 , H01J2237/28 , H01J2237/2803 , H01J2237/2814 , H01J2237/30472 , H01J2237/3174 , H01J2237/31745 , H01J2237/31749
摘要： A method and apparatus for performing a slice and view technique with a charged particle beam system. The feature of interest in an image of a sample is located by machine vision, and the area to be milled and imaged in a subsequent slice and view iteration is determined through analysis of data gathered by the machine vision at least in part. A determined milling area may be represented as a bounding box around a feature, which dimensions can be changed in accordance with the analysis step. In a dual beam system, the FIB is then adjusted accordingly to slice and mill a new face in the subsequent slice and view iteration, and the SEM images the new face. Because the present invention accurately locates the feature and determines an appropriate size of area to mill and image, efficiency is increased by preventing the unnecessary milling of substrate that does not contain the feature of interest.

74. 发明公开

EP2600380A1 Inductively coupled plasma source as an electron beam source for spectroscopic analysis 有权
标题翻译： Induktiv gekoppelte Plasmaquelle als eine Elektronenstrahlquelle zur Spektralanalyse
公开(公告)号：EP2600380A1
公开(公告)日：2013-06-05
申请号：EP12194516.6
申请日：2012-11-28
申请人： FEI Company
发明人： Routh, Jr., Brian
IPC分类号： H01J37/08 , H01J37/077 , H01J37/05 , H01J27/16 , H01J37/304 , H01J37/305
CPC分类号： H01J37/285 , G01T1/28 , H01J27/16 , H01J37/05 , H01J37/077 , H01J37/08 , H01J37/10 , H01J37/1471 , H01J37/265 , H01J37/30 , H01J37/304 , H01J37/305 , H01J37/3056 , H01J2237/0817 , H01J2237/24415 , H01J2237/2445 , H01J2237/24475 , H01J2237/2448 , H01J2237/31749
摘要： A single column inductively coupled plasma source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the ICP to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.
摘要翻译：具有用户可选择配置的单列电感耦合等离子体源以离子模式工作，用于FIB操作或SEM操作的电子模式。配备了X射线检测器，能量色散X射线光谱分析是可能的。用户可以选择性地配置ICP以在离子模式或FIB模式下准备样品，然后基本上翻转开关选择电子模式或SEM模式，并使用EDS或其他类型的分析来分析样品。

75. 发明公开

EP2474019A2 TEILCHENSTRAHLBEARBEITUNGSVORRICHTUNG WIE EINE ELEKTRONENSTRAHLBEARBEITUNGSVORRICHTUNG 有权
公开(公告)号：EP2474019A2
公开(公告)日：2012-07-11
申请号：EP10750065.4
申请日：2010-08-31
申请人： Global Beam Technologies AG.
发明人： VOKURKA, Franz
IPC分类号： H01J37/16 , G21K5/10 , H01J37/31 , H01J37/30 , B23K15/06 , B23K15/00
CPC分类号： H01J37/16 , B23K15/002 , B23K15/06 , H01J37/30 , H01J2237/0245 , H01J2237/166
摘要： The invention relates to a particle beam processing device having a particle beam generator (7), a vacuum chamber (101) comprising a chamber volume (V) that can be evacuated, wherein the vacuum chamber (101) has a chamber wall (1) with a first opening (O1) which is designed in the chamber wall (1). Said device also has a first cover (2) which is adapted to cover the first opening (O1) and to be rotated about a first rotational axis (C1) passing through the first opening (O1), and a second opening (O2) which is designed in the first cover (2). Said device also has a second cover (3) which is adapted to cover the second opening (O2) and to be rotated about a second rotational axis (C2) passing through the second opening (O2) and move the particle beam generator (7). The particle beam generator (7) can be driven in a first direction (Z) in the chamber volume (V) that can be evacuated.
摘要翻译：本发明涉及一种具有粒子束发生器（7）的粒子束处理装置，包括可被抽空的室容积（V）的真空室（101），其中真空室（101）具有室壁（1）具有设计在室壁（1）中的第一开口（O1）。所述装置还具有适于覆盖第一开口（O1）并且围绕穿过第一开口（O1）的第一旋转轴线（C1）旋转的第一盖（2）以及第二开口（O2），第二开口被设计在第一盖（2）中。所述装置还具有适于覆盖第二开口（O2）并且围绕穿过第二开口（O2）的第二旋转轴线（C2）旋转并移动粒子束发生器（7）的第二盖（3）。粒子束发生器（7）可以在腔室容积（V）中的第一方向（Z）上被驱动，该腔室容积（V）可以被排空。

76. 发明公开

EP2133903A2 Electron spectroscopy 有权
标题翻译： Elektronenspektroskopie
公开(公告)号：EP2133903A2
公开(公告)日：2009-12-16
申请号：EP09251534.5
申请日：2009-06-11
申请人： Kratos Analytical Limited
发明人： Page, Simon
IPC分类号： H01J37/08 , H01J37/05 , H01J37/295 , H01J37/30
CPC分类号： H01J37/05 , G01N23/2273 , H01J37/08 , H01J37/295 , H01J37/30 , H01J2237/05 , H01J2237/08 , H01J2237/0815
摘要： The present invention provides an electron spectroscopy apparatus (12) comprising a high energy particle source (12) for irradiating a sample, an electron detector system (16) (e.g. including a delay line detector) for detecting electrons emitted from the sample and an ion gun (8) for delivering a polycyclic aromatic hydrocarbon (PAH) ion beam to the sample, wherein the ion gun comprises a polycyclic aromatic hydrocarbon ion source, for example comprising coronene. In an embodiment, the PAH is located in a heated chamber (22) and vaporised to produce gas phase PAH. The gas phase PAH molecules are then ionised by electron impact, extracted from the ion source via an extraction field and focussed using ion optics. The PAH ion beam can be used for surface cleaning and depth analysis.
摘要翻译：本发明提供了一种包括用于照射样品的高能量粒子源（12），用于检测从样品发射的电子的电子检测器系统（16）（例如包括延迟线检测器）的电子能谱装置（12）用于将多环芳烃（PAH）离子束输送到样品的枪（8），其中所述离子枪包括多环芳族烃离子源，例如包含芳烃。在一个实施方案中，PAH位于加热室（22）中并蒸发以产生气相PAH。气相PAH分子然后通过电子轰击电离，通过提取场从离子源提取，并使用离子光学聚焦。 PAH离子束可用于表面清洁和深度分析。

77. 发明公开

EP1690264A2 METHOD AND APPARATUS FOR MODIFYING OBJECT WITH ELECTRONS GENERATED FROM COLD CATHODE ELECTRON EMITTER 审中-公开
标题翻译：方法和设备，用于修改一个对象，具有作为阴极电子发射体产生的电子
公开(公告)号：EP1690264A2
公开(公告)日：2006-08-16
申请号：EP04799906.5
申请日：2004-11-25
申请人： MATSUSHITA ELECTRIC WORKS, LTD.
发明人： AIZAWA, Koichi, Matsushita Electric Works, Ltd. , ICHIHARA, Tsutomu, Matsushita Electric Works, Ltd. , KOMODA, Takuya, Matsushita Electric Works, Ltd. , IKEDA, Jyunji, Matsushita Electric Works, Ltd. , BABA, Toru, Matsushita Electric Works, Ltd.
IPC分类号： G21K5/00
CPC分类号： G21K5/04 , B82Y10/00 , H01J1/308 , H01J1/312 , H01J37/073 , H01J37/30
摘要： Apparatus and method for modifying an object with electrons are provided, by which the object can be uniformly and efficiently modified with the electrons under a pressure substantially equal to atmospheric pressure even when having a relatively wide surface area to be treated. This method uses a cold-cathode electron emitter having the capability of emitting electrons from a planar electron emitting portion according to tunnel effect, and preferably comprising a pair of electrodes, and a strong field drift layer including nanocrystalline silicon disposed between the electrodes. The object is exposed to electrons emitted from the planar electron emitting portion by applying a voltage between the electrodes. It is preferred that an energy of the emitted electrons is selected from a range of 1 eV to 50 keV, and preferably 1 eV to 100 eV.

78. 发明公开

EP0306275A2 Photoelectron image projection apparatus 失效
标题翻译： Photoelektronische Bildprojektionsvorrichtung。
公开(公告)号：EP0306275A2
公开(公告)日：1989-03-08
申请号：EP88308029.3
申请日：1988-08-31
申请人： FUJITSU LIMITED
发明人： Yamada, Akio , Yasuda, Hiroshi , Sakamoto, Kiichi , Kudo, Jinko
IPC分类号： H01L21/32 , H01J37/30 , G03F9/00 , G03F7/26
CPC分类号： G03F9/00 , G03F7/26 , H01J37/30 , H01J2237/2817 , H01J2237/31779 , H01J2237/31794 , H01L21/32
摘要： A photoelectron image projection apparatus has a device (30, 50) for detecting an image of a pattern of a mask (4) within a predetermined projection region of the mask. An image signal describing the detected image is compared with a reference image signal which is known from the pattern of the mask, and a defect in the projection pattern is detected when the two compared image signals differ.
摘要翻译：光电子图像投影装置具有用于在掩模的预定投影区域内检测掩模（4）的图案的图像的装置（30,50）。将描述检测到的图像的图像信号与从掩模的图案中已知的参考图像信号进行比较，并且当两个比较的图像信号不同时，检测投影图案中的缺陷。

79. 发明授权

EP0001889B1 Method for surface hardening metals 无效
标题翻译：表面硬化金属的方法
公开(公告)号：EP0001889B1
公开(公告)日：1985-07-31
申请号：EP78300484.9
申请日：1978-10-11
申请人： SCIAKY BROS., INC.
发明人： Connors, John Francis , Bass, Douglas Dean , Bell, Michael G. , Ream, Stanley L
IPC分类号： C21D1/06 , C22F1/00 , H01J37/30
CPC分类号： H01J37/3023 , C21D1/09 , H01J37/30

80. 发明公开

EP4390975A1 ELECTRON BEAM MONITORING DEVICE AND ELECTRON BEAM IRRADIATION SYSTEM 审中-实审
公开(公告)号：EP4390975A1
公开(公告)日：2024-06-26
申请号：EP22880577.6
申请日：2022-06-10
申请人： Hamamatsu Photonics K.K.
发明人： MATSUI, Shinjiro
IPC分类号： G21K5/04
CPC分类号： G01T1/29 , H01J37/30 , H01J37/244 , G21K5/04
摘要： An electron beam monitoring device monitors an electron beam in an electron beam irradiation system having an electron beam irradiation device configured to irradiate an irradiation target object with the electron beam via an emission window. The electron beam monitoring device includes a first X-ray detection unit and a second X-ray detection unit. The first X-ray detection unit has a detection surface directed toward between the emission window and the irradiation target object and detects an X-ray. The second X-ray detection unit is arranged to face the emission window and detects a one-dimensional or two-dimensional distribution of the X-ray.

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