会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 71. 发明公开
    • Tool for searching similar machining data and automatic programming apparatus based thereon
    • 用于搜索类似加工数据的装置,并在其上自动编程装置基于
    • EP1283456A1
    • 2003-02-12
    • EP02017390.2
    • 2002-08-02
    • Mori Seiki Co., Ltd.Intelligent Manufacturing Systems International
    • Nakamura, TakayukiTanaka, Shojiro
    • G05B19/4093
    • G05B19/4093G05B2219/31265G05B2219/35291G05B2219/36337Y02P90/265
    • The invention relates to an apparatus that generates an NC program efficiently by using programming base data for a previously similar machines product. The apparatus comprises: (A) a historical data storing section (16) for prestoring programming base data which is base data for NC program generation and comprises (A.1) machining element data including configuration data concerning a workpiece and a product and process data concerning the kind of machining, and (A.2) tool-related data concerning a tool and machining conditions; (B) a machining element data generating section (13) for generating the machining element data for the product to be machined, based on three-dimensional shape data for the product to be machined and the workpiece; (C) and a searching section (15) for seaching in the historical data storing section (16) on the basis of the generated machining element data, and for extracting programming base data for a product similar to the product to be machined.
    • 本发明涉及一种装置生成有效地使用编程基础数据针对先前类似机器产品费率做到NC程序。 该装置包括:(A)用于急环编程基础数据的所有历史数据存储部(16),其是用于NC程序生成,并包括基本数据(A.1)的加工元件的数据包括配置数据关于工件和一个产品和过程数据 关于那种加工,和(A.2)工具相关的数据有关的工具和加工条件的; (B)的加工元件数据生成部(13),用于产生所述加工要素数据为产品基于用于待加工的产品和工件的三维形状数据进行机械加工,; (C)和用于seaching在历史数据存储所生成的加工元件的数据的基础上部分(16),以及用于类似产品的产品中提取节目的基本数据被加工的检索部(15)。
    • 72. 发明申请
    • CONTROLLING AND MONITORING A PROCESS TO PRODUCE A CHEMICAL, PHARMACEUTICAL OR BIOTECHNOLOGICAL PRODUCT
    • 控制和监测生产化学,药物或生物技术产品的过程
    • WO2018041423A1
    • 2018-03-08
    • PCT/EP2017/061303
    • 2017-05-11
    • SARTORIUS STEDIM BIOTECH GMBH
    • GRIMM, ChristianBECKER, MarioBÖTTCHER, LarsTHORSTEN, Adams
    • G05B19/418
    • G05B19/41835C12M41/36G05B19/4181G05B19/4185G05B19/41865G05B19/41875G05B2219/31265G05B2219/32191G05B2219/32201G05B2219/42001Y02P90/22
    • A computer system and computer-implemented method are described for controlling and monitoring a process to produce a chemical, pharmaceutical or biotechnological product, the method comprising: providing a database, the database storing sets of process parameters to control and monitor respective ones of a plurality of processes performed in order to produce products, wherein each of the stored sets of process parameters is associated with a successful trajectory of a respective one of the processes performed according to the respective set process parameters, wherein each successful trajectory is a time-based profile of measurements recorded during performance of the respective process; receiving a set of characterizing process parameters that characterize the process; identifying a first set process parameters from the stored sets of process parameters, the first set of process parameters having a specified degree of similarity to the set of characterizing process parameters, wherein the first set of process parameters is associated with a first successful trajectory, controlling and monitoring the process using the first successful trajectory, comprising: recording measurements of the process; estimating a trajectory of the process based on the recorded measurements.
    • 描述了用于控制和监控生产化学,药物或生物技术产品的过程的计算机系统和计算机实现的方法,所述方法包括:提供数据库,所述数据库将过程参数组存储为 控制和监测为了生产产品而执行的多个过程中的相应过程,其中,所存储的过程参数组中的每一个与根据相应的设定过程参数执行的过程中的相应过程的成功轨迹相关联,其中每个 成功的轨迹是在相应过程的执行过程中记录的基于时间的测量结果; 接收表征所述过程的一组特征化过程参数; 从所存储的过程参数组中识别第一组过程参数,所述第一组过程参数具有与所述一组特征过程参数的指定的相似度,其中所述第一组过程参数与第一成功的轨迹相关联,控制 以及使用所述第一成功轨迹监视所述过程,所述方法包括:记录所述过程的测量结果; 根据记录的测量结果估算过程的轨迹。
    • 79. 发明授权
    • Advanced finishing control
    • 高级整理控制
    • US08353738B2
    • 2013-01-15
    • US13136437
    • 2011-08-01
    • Charles J. Molnar
    • Charles J. Molnar
    • B24B49/00B24B51/00
    • B24B37/042G05B19/41865G05B2219/31265G05B2219/31415G05B2219/45031G06Q10/06G06Q50/04H01L21/67248H01L21/68785Y02P90/18Y02P90/20Y02P90/22Y02P90/30Y02P90/86
    • Methods of using in situ finishing information for finishing workpieces and semiconductor wafers are described. Methods of using yield information at least in part related to cost of manufacture for finishing workpieces and semiconductor wafers are described. Changes or improvements to cost of manufacture of a workpiece using current in-process cost of manufacture information, tracked current in-process cost of manufacture information, or current cost of manufacture parameters are discussed. Appreciable changes to quality or cost of manufacture of a workpiece using tracking, using in-process tracked information, networks including a multiplicity of apparatus, and using in situ finishing information are discussed. A factory, apparatus, and methods to change or improve process control are discussed. A factory, apparatus, and methods to change or improve real-time process control are discussed. A factory, apparatus, and methods to change or improve feedforward and feedback control are discussed. The workpieces can be tracked individually or by process group such as a process batch.
    • 描述了使用原位精加工信息来完成工件和半导体晶片的方法。 描述了至少部分地与完成工件和半导体晶片的制造成本相关的产量信息的方法。 讨论了使用当前的制造过程成本信息,跟踪电流在制造信息的过程成本或制造参数的当前成本来改变或改进制造工件的成本。 讨论了使用跟踪,使用过程中跟踪信息,包括多种设备的网络和使用原位整理信息的工件的质量或制造成本的可观察的变化。 讨论了改变或改进过程控制的工厂,设备和方法。 讨论了改变或改进实时过程控制的工厂,设备和方法。 讨论了改变或改进前馈和反馈控制的工厂,设备和方法。 工件可以单独跟踪,也可以由工艺组进行跟踪,例如工艺批次。