会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 71. 发明授权
    • Interferometric apparatus for measuring moving object and optical interferometry method for measuring moving object
    • 用于测量移动物体的干涉仪和用于测量移动物体的光学干涉测量方法
    • US07580133B2
    • 2009-08-25
    • US11447164
    • 2006-06-06
    • Nobuaki UekiHidenori Takahashi
    • Nobuaki UekiHidenori Takahashi
    • G01N21/84G01B11/02
    • G01N21/45G01B11/0675
    • A moving-object measuring interferometric apparatus comprises: a light beam output section outputting a measuring beam; an interference optical system obtaining interference light by projecting the measuring beam onto an object and by allowing light reflected from the object or transmitted light having passed through the object to interfere with reference light; an image pickup section obtaining image information by receiving the interference light on an image pickup surface; and an image pickup timing control section setting a momentary image pickup period during which the object is regarded as being stationary to be contained in a light reception acceptable period of the image pickup surface and controlling the interference light to enter the image pickup surface only during the momentary image pickup period.
    • 移动物体测量干涉仪包括:输出测量光束的光束输出部分; 干涉光学系统通过将测量光束投射到物体上并且允许从物体反射的光或穿过物体的透射光干涉参考光来获得干涉光; 图像拾取部分,通过在图像拾取表面上接收干涉光来获得图像信息; 以及图像拾取定时控制部分,其设置将所述对象视为静止的瞬时图像拾取周期,以被包含在所述图像拾取表面的光接收可接受周期中,并且仅在所述摄像表面期间控制所述干涉光进入所述图像拾取表面 瞬间图像拾取期。
    • 72. 发明申请
    • INK COMPOSITION AND IMAGE RECORDING METHOD AND IMAGE RECORDED MATTER USING SAME
    • 墨水组合物和图像记录方法和图像记录方法
    • US20080241485A1
    • 2008-10-02
    • US12055397
    • 2008-03-26
    • Norihide SHIMOHARAHisato NagaseHidenori Takahashi
    • Norihide SHIMOHARAHisato NagaseHidenori Takahashi
    • B32B3/10C08G75/02C08F2/46
    • C09D11/326C09D11/101Y10T428/24802Y10T428/31504Y10T428/31855
    • An ink composition containing at least a polymerizable composition, a pigment, and a polymer represented by General Formula (1): where R1 represents an (m+n)-valent organic linking group, R2 represents a single bond or divalent organic linking group; A1 represents a monovalent organic group having a pigment adsorption structure that contains at least one selected from organic pigment structure, heterocyclic structure, acidic group, group having a basic nitrogen atom, urea group, urethane group, group having a coordinating oxygen atom, hydrocarbon group having 4 or more carbon atoms, alkoxysilyl group, epoxy group, isocyanate group, and hydroxyl group; the n groups A1 and bonds or groups R2 may independently be the same or different; “m” is 1 to 8, “n” is 2 to 9, and m+n is 3 to 10; P1 represents a polymer skeleton; and the m skeletons P1 may be the same or different.
    • 含有至少一种可聚合组合物,颜料和由通式(1)表示的聚合物的油墨组合物:其中R 1表示(m + n)价有机连接基团R SUP > 2 表示单键或二价有机连接基团; A 1表示具有颜料吸附结构的1价有机基团,其含有选自有机颜料结构,杂环结构,酸性基团,具有碱性氮原子的基团,脲基,氨基甲酸酯基,基团 具有配位氧原子,具有4个或更多个碳原子的烃基,烷氧基甲硅烷基,环氧基,异氰酸酯基和羟基; n个基团A <1>和键或基团R 2可以独立地相同或不同; “m”为1〜8,“n”为2〜9,m + n为3〜10。 P 表示聚合物骨架; 并且m个骨架P 1可以相同或不同。
    • 73. 发明授权
    • Motor drive circuit
    • 电机驱动电路
    • US07248013B2
    • 2007-07-24
    • US11430888
    • 2006-05-10
    • Hidenori TakahashiKoichi Nagata
    • Hidenori TakahashiKoichi Nagata
    • G05B11/28
    • H02P7/29H02M2003/1555H02P7/28
    • A motor drive circuit is provided and includes: a PWM wave generation circuit for generating a PWM (pulse-width-modulated) wave having a high frequency, whose pulse width has been modulated, in response to a rotational frequency control signal used for driving a motor; a switching element (FET) that receives an input of a PWM wave output from the PWM wave generation circuit and performs switching operation; and a current resonance circuit including an inductance and a capacitor. Current resonance is induced in response to power of a battery cell imparted by means of operation of the switching element. A value falling within the range of 60 to 90 KHz, which is 1.1 to 1.7 times as large as a switching frequency 54 KHz of the switching element, may be selected and set for the resonance frequency.
    • 提供一种电动机驱动电路,包括:PWM波产生电路,用于响应于用于驱动电压的旋转频率控制信号,产生具有已调制脉冲宽度的高频PWM(脉冲宽度调制)波 发动机; 开关元件(FET),其接收从所述PWM波生成电路输出的PWM波的输入,并进行切换动作; 以及包括电感和电容器的电流谐振电路。 响应于通过开关元件的操作赋予的电池单元的功率而感应出电流共振。 对于共振频率,可以选择并设置落在开关元件的开关频率54KHz的范围内的值在60至90KHz的范围内的值为1.1至1.7倍的值。
    • 75. 发明授权
    • Chromatic dispersion device
    • 色散装置
    • US07035495B2
    • 2006-04-25
    • US10964954
    • 2004-10-13
    • Hidenori TakahashiRyo InoharaKosuke NishimuraMasashi Usami
    • Hidenori TakahashiRyo InoharaKosuke NishimuraMasashi Usami
    • G02B6/26
    • G02B6/29343G02B6/29355G02B6/29392G02F1/225
    • A chromatic dispersion device according to the invention comprises an input/output waveguide, a plurality of first ring waveguides and a second ring waveguide. The plurality of first ring waveguides optically couple with the input/output waveguide through directional coupling and are disposed along an optical axis direction of the input/output waveguide, each ring waveguide having a predetermined FSR (free spectral range) and group delay characteristics with a peak value of the same polarity. The second ring waveguide optically couples with the input/output waveguide through directional coupling, the second ring waveguide having the predetermined FSR and group delay characteristics with a peak value of a polarity different from those of the first ring waveguides.
    • 根据本发明的色散装置包括输入/​​输出波导,多个第一环形波导和第二环形波导。 多个第一环形波导通过定向耦合与输入/输出波导光学耦合,并沿着输入/输出波导的光轴方向设置,每个环形波导具有预定的FSR(自由光谱范围)和组延迟特性 相同极性的峰值。 第二环形波导通过定向耦合与输入/输出波导光耦合,第二环形波导具有预定的FSR和群延迟特性,峰值的值与第一环形波导的极性不同。
    • 78. 发明授权
    • Thickness measuring apparatus, thickness measuring method, and wet etching apparatus and wet etching method utilizing them
    • 厚度测量装置,厚度测量方法和湿蚀刻装置以及利用它们的湿式蚀刻方法
    • US06897964B2
    • 2005-05-24
    • US10181557
    • 2001-01-16
    • Teruo TakahashiMotoyuki WatanabeHidenori Takahashi
    • Teruo TakahashiMotoyuki WatanabeHidenori Takahashi
    • G01B11/06H01L21/00H01L21/66G01B9/02G01B11/28
    • G01B11/06H01L21/67075H01L22/12
    • At each measurement time, measurement light is supplied from a measurement light source 11, and interference light obtained when reflected light from a semiconductor wafer W and reference light from a reference light generating section 14 are coupled is detected by a photodetector 15. A thickness calculating section 16 obtains a light intensity distribution representing the correlation between the light intensity of the interference light and the reference optical path length, selects a wafer upper surface peak and wafer lower surface peak from a plurality of light intensity peaks in the light intensity distribution using a predetermined selection criterion, and calculates the thickness of the semiconductor wafer W from the optical path length difference between the light intensity peaks. With this arrangement, a thickness measuring apparatus and thickness measuring method capable of measuring the thickness of a semiconductor wafer during execution of wet etching independently of the presence of an etchant, and a wet etching apparatus and wet etching method using the thickness measuring apparatus and method are implemented.
    • 在每个测量时间,测量光从测量光源11提供,并且当来自半导体晶片W的反射光和来自参考光产生部14的参考光耦合时获得的干涉光被光电检测器15检测。 厚度计算部分16获得表示干涉光的光强度与基准光程长度之间的相关性的光强度分布,从光强度的多个光强度峰值中选择晶片上表面峰值和晶片下表面峰值 分布,并且根据光强度峰值之间的光程长度差计算半导体晶片W的厚度。 利用这种布置,可以独立于蚀刻剂的存在,以及使用该厚度测量装置和方法的湿蚀刻装置和湿式蚀刻方法,能够在执行湿蚀刻期间测量半导体晶片的厚度的厚度测量装置和厚度测量方法 被实施。