专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明授权

US5680376A Optical recording medium, and apparatus and method for recording and reproducing information on the same 失效
标题翻译：光记录介质以及用于记录和再现信息的装置和方法
公开(公告)号：US5680376A
公开(公告)日：1997-10-21
申请号：US648899
申请日：1996-05-16
申请人： Hiroyuki Katayama , Junji Hirokane , Akira Takahashi , Kenji Ohta
发明人： Hiroyuki Katayama , Junji Hirokane , Akira Takahashi , Kenji Ohta
IPC分类号： G11B7/00 , G11B7/005 , G11B7/007 , G11B7/013 , G11B7/14 , G11B20/12 , G11B20/18 , G11B27/10 , G11B27/30
CPC分类号： G11B7/00745 , G11B27/105 , G11B27/3027 , G11B7/013 , G11B7/14
摘要： In an optical disk, since a header section has only one recording section for address information, the capacity of memory where a user can freely record data is increased. In an optical disk drive, four laser beams have a fixed positional relation. Based on the address information of a header section read out by at least one of the laser beams and the positional relation among the laser beams, the address information of tracks being scanned by the other laser beams is obtained. It is therefore possible to accurately record or reproduce information on the optical disk.
摘要翻译：在光盘中，由于报头部分仅具有一个用于地址信息的记录部分，所以用户可以自由记录数据的存储器的容量增加。在光盘驱动器中，四个激光束具有固定的位置关系。基于通过至少一个激光束读出的标题部分的地址信息和激光束之间的位置关系，获得由其他激光束扫描的轨道的地址信息。因此，可以准确地在光盘上记录或再现信息。

72. 发明授权

US5470694A Optical memory element and manufacturing method thereof 失效
标题翻译：光存储元件及其制造方法
公开(公告)号：US5470694A
公开(公告)日：1995-11-28
申请号：US74272
申请日：1993-06-10
申请人： Kenji Ohta , Junji Hirokane , Akira Takahashi , Tetsuya Inui , Shohichi Katoh , Toshihisa Deguchi
发明人： Kenji Ohta , Junji Hirokane , Akira Takahashi , Tetsuya Inui , Shohichi Katoh , Toshihisa Deguchi
IPC分类号： G11B7/26 , G03C5/16
CPC分类号： G11B7/261 , Y10S430/136 , Y10S430/146
摘要： A method for manufacturing an optical memory element including the steps of disposing a resist film on a substrate, placing a photo-mask carrying a guide groove pattern on the resist film so as to position the photo-mask over a predetermined position of the substrate, forming a guide groove pattern latent image on the resist film, developing the guide groove pattern latent image formed on the resist film, conducting an etching operation through the developed guide groove pattern as to form guide grooves in the substrate, removing the resist film from the substrate, and disposing a recording medium layer on the substrate having the guide grooves formed therein.
摘要翻译：一种用于制造光学存储元件的方法，包括以下步骤：在衬底上设置抗蚀剂膜，将在所述抗蚀剂膜上携带引导槽图案的光掩模放置在所述衬底的预定位置上，在抗蚀剂膜上形成引导槽图案潜像，使形成在抗蚀剂膜上的引导槽图案潜像显影，通过显影导槽图案进行蚀刻操作，以在基板上形成引导槽，并且在其上形成有引导槽的基板上设置记录介质层。

73. 发明授权

US5087535A Method of manufacturing photo-mask and photo-mask manufactured thereby 失效
标题翻译：制造照相胶片和制造的照相胶片的方法
公开(公告)号：US5087535A
公开(公告)日：1992-02-11
申请号：US19704
申请日：1987-02-27
申请人： Junji Hirokane , Hiroyuki Katayama , Akira Takahashi , Tetsuya Inui , Kenji Ohta , Junichi Washo , Tomoyuki Miyake , Kazuo Van , Michinobu Mieda
发明人： Junji Hirokane , Hiroyuki Katayama , Akira Takahashi , Tetsuya Inui , Kenji Ohta , Junichi Washo , Tomoyuki Miyake , Kazuo Van , Michinobu Mieda
IPC分类号： G03F1/00 , G03F1/54 , G03F1/68 , G11B7/26
CPC分类号： G03F1/54 , G03F1/68 , G11B7/261 , Y10S430/146
摘要： A photo-mask and a method of manufacturing a photo-mask, which includes the steps of applying a resist film onto a substrate of quartz, glass and the like, subjecting the resist film to light exposure and development to form a fine resist pattern, etching the mask substrate covered by the fine resist pattern causing a non-light transmitting thin film of Cr, Ta, etc. to adhere thereon by vapor deposition, sputtering and the like, and removing the thin film on the resist pattern together with the resist film, thereby to form the photo-mask.

74. 发明授权

US5498485A Magneto-optical recording medium and manufacturing method thereof 失效
标题翻译：磁光记录介质及其制造方法
公开(公告)号：US5498485A
公开(公告)日：1996-03-12
申请号：US207054
申请日：1994-03-08
申请人： Junichiro Nakayama , Hiroyuki Katayama , Junji Hirokane , Michinobu Mieda
发明人： Junichiro Nakayama , Hiroyuki Katayama , Junji Hirokane , Michinobu Mieda
IPC分类号： G11B11/105 , G11B5/66 , G11B11/00
CPC分类号： G11B11/10582 , G11B11/10586
摘要： A magneto-optical recording medium has a recording layer including two magnetic layers. The magneto-optical recording medium satisfies a condition of .vertline.A.sub.1.K.sub.1 -A.sub.2.K.sub.2 .vertline..ltoreq.0.18 (erg.sup.2 /cm.sup.4) wherein A.sub.1, K.sub.1, A.sub.2, and K.sub.2 respectively represent an exchange constant of a first magnetic layer, a perpendicular magnetic anisotropy of the first magnetic layer, an exchange constant of a second magnetic layer, and a perpendicular magnetic anisotropy of the second magnetic layer. First and Second magnetic layers are made of TbFeCo.
摘要翻译：磁光记录介质具有包括两个磁性层的记录层。磁光记录介质满足条件| A1.K1-A2.K2 |

75. 发明授权

US5128922A Optical disk with glass substrate and method of producing same 失效
标题翻译：具有玻璃基板的光盘及其制造方法
公开(公告)号：US5128922A
公开(公告)日：1992-07-07
申请号：US687769
申请日：1991-04-18
申请人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
发明人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
IPC分类号： B24B9/08 , G11B7/24 , G11B7/26 , G11B11/10 , G11B11/105
CPC分类号： G11B7/24 , G11B7/26
摘要： An optical disk with a substrate made of glass at least partially has its inner and outer peripheral surfaces polished to surface roughness of 5 .mu.m or less so as to reduce the amount of glass powder generated from these surfaces and to thereby improve the yield.
摘要翻译：具有由玻璃制成的基板的光盘至少部分地具有抛光的表面粗糙度为5μm以下的内周面和外周面，以减少由这些表面产生的玻璃粉末的量，从而提高成品率。

76. 发明授权

US5403683A Photo-mask 失效
公开(公告)号：US5403683A
公开(公告)日：1995-04-04
申请号：US102229
申请日：1993-08-05
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48 , G11B7/26 , G03F9/00
CPC分类号： G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

77. 发明授权

US5260150A Photo-mask with light shielding film buried in substrate 失效
标题翻译：光掩模与遮光膜埋在基板上
公开(公告)号：US5260150A
公开(公告)日：1993-11-09
申请号：US631277
申请日：1990-12-20
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48 , G11B7/26 , G03F9/00
CPC分类号： G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
摘要翻译：光掩模包括透光基板，设置在基板上的多个遮光膜，形成掩模图案的遮光膜，以及设置在该基板的表面上的透光保护膜包括遮光膜的基板，以保护遮光膜。

78. 发明授权

US5286583A Method of manufacturing a photomask for an optical memory 失效
标题翻译：制造光学存储器的光掩模的方法
公开(公告)号：US5286583A
公开(公告)日：1994-02-15
申请号：US798616
申请日：1991-11-26
申请人： Junji Hirokane , Tetsuya Inui , Michinobu Mieda , Kenji Ohta
发明人： Junji Hirokane , Tetsuya Inui , Michinobu Mieda , Kenji Ohta
IPC分类号： G03F1/68 , G03F1/80 , G11B7/26 , H01L21/027 , H01L21/30 , G03F9/00
CPC分类号： G11B7/261 , G03F1/00 , G03F1/26
摘要： A method of manufacturing a photomask for an optical memory, the photomask having two types of pattern where guide tracks and formatting pits are different in amount of optical transmissions, including the steps of (a) forming on a transparent substrate a thin film of which light transmission amount depends upon its thickness; (b) forming a photoresist film on the thin film; (c) exposing the photoresist film to light with different light intensities depending selectively on the guide tracks or formatting pits; (d) eliminating the photoresist film exposed to the more intense light by the development till the thin film becomes surface; (e) etching the thin film exposed to the more intense light and surfaced; (f) eliminating the photoresist film till the thin film exposed to the less intense light becomes surface; (g) etching away the thin film exposed to the more intense light and surfaced till the transparent substrate becomes surface; and (h) eliminating the remnant photoresist.
摘要翻译：一种制造光存储器的光掩模的方法，所述光掩模具有两种类型的图案，其中导轨和格栅凹坑的光传输量不同，包括以下步骤：（a）在透明基板上形成薄膜，传输量取决于其厚度; （b）在薄膜上形成光致抗蚀剂膜; （c）根据导轨或格式化凹坑选择性地将光致抗蚀剂膜暴露于具有不同光强度的光; （d）通过显影来消除暴露于更强光的光致抗蚀剂膜，直到薄膜变成表面; （e）蚀刻暴露于更强烈的光并露出的薄膜; （f）消除光致抗蚀剂膜，直到暴露于不太强光的薄膜变成表面; （g）蚀刻掉暴露于更强光的薄膜，并露出，直到透明基板变成表面; 和（h）消除残余光致抗蚀剂。

79. 发明授权

US5079113A Photo-mask 失效
标题翻译：照片面具
公开(公告)号：US5079113A
公开(公告)日：1992-01-07
申请号：US450438
申请日：1989-12-14
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48
CPC分类号： G03F1/48
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
摘要翻译：光掩模包括透光基板，设置在基板上的多个遮光膜，形成掩模图案的遮光膜，以及设置在该基板的表面上的透光保护膜包括遮光膜的基板，以保护遮光膜。

80. 发明授权

US5112727A Method of and photomask for manufacturing optical memory element 失效
标题翻译：用于制造光学记忆元件的光电子学方法
公开(公告)号：US5112727A
公开(公告)日：1992-05-12
申请号：US527265
申请日：1990-05-23
申请人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
发明人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
IPC分类号： G11B7/26
CPC分类号： G11B7/261 , Y10S428/913
摘要： A method of and a photomask for manufacturing an optical memory element. The manufacturing method includes the steps of: subjecting a positive type photoresist coated on a glass substrate to exposure by using the photomask capable of irradiating light onto a portion of the photoresist other than the remaining portion for forming pits of the glass substrate such that the portion of the photoresist is solubilized against developing solution; developing the photoresist by using the developing solution so as to remove the portion of the photoresist; and etching the glass substrate so as to directly form, as convex portions, the pits on a surface of the glass substrate.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式