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71. 发明申请

US20100015102A1 Composition for treatment of cartilage disease 有权
标题翻译：用于治疗软骨疾病的组合物
公开(公告)号：US20100015102A1
公开(公告)日：2010-01-21
申请号：US12311426
申请日：2008-02-21
申请人： Norimasa Iwasaki , Akio Minami , Yasuhiko Kasahara , Tatsuya Igarashi , Daisuke Kawamura , Fumiyoshi Kasahara , Chihiro Miyajima , Nobuo Ohzawa , Mariko Imai
发明人： Norimasa Iwasaki , Akio Minami , Yasuhiko Kasahara , Tatsuya Igarashi , Daisuke Kawamura , Fumiyoshi Kasahara , Chihiro Miyajima , Nobuo Ohzawa , Mariko Imai
IPC分类号： A61K35/12 , A61K31/715 , A61P19/04
CPC分类号： A61K35/28 , A61K31/734 , A61L27/20 , A61L27/3834 , A61L27/3852 , A61L2430/06 , C08L5/04
摘要： The present invention provides a composition for regenerating cartilage or treating a cartilage disease containing a monovalent metal salt of alginic acid for which the endotoxin level thereof has been lowered to an extent that does not substantially induce inflammation or fever. As a result, it is possible to provide a composition for regenerating cartilage that improves cartilage regenerative action and ease of application to a cartilage injury lesion, and a composition for treating a cartilage disease, which has the effects of protecting cartilage from mechanical irritation, inhibiting degenerative changes in cartilage caused by wear and inflammation, repairing a cartilage injury lesion, and inhibiting inflammation and pain of joint tissue.
摘要翻译：本发明提供一种用于再生软骨或治疗软骨疾病的组合物，其含有海藻酸的一价金属盐，其内毒素水平已被降低至基本上不引起炎症或发热的程度。结果，可以提供一种提高软骨再生作用的软骨再生用软化组合物和软骨损伤损伤的易用性的组合物，以及用于治疗软骨疾病的组合物，其具有保护软骨免受机械刺激，抑制由磨损和炎症引起的软骨退行性变化，修复软骨损伤病变，以及抑制关节组织的炎症和疼痛。

72. 发明申请

US20090220896A1 PATTERN FORMING METHOD 审中-公开
标题翻译：图案形成方法
公开(公告)号：US20090220896A1
公开(公告)日：2009-09-03
申请号：US12392905
申请日：2009-02-25
申请人： Katsutoshi Kobayashi , Kotaro Sho , Daisuke Kawamura
发明人： Katsutoshi Kobayashi , Kotaro Sho , Daisuke Kawamura
IPC分类号： G03F7/20
CPC分类号： G03F7/11 , G03F7/0757 , G03F7/095
摘要： A pattern forming method has forming a lower layer film on a film to be processed, forming a silicon-containing intermediate film containing a protecting group which is removed by an acid, on said lower layer film, forming a resist film on said silicon-containing intermediate film, exposing a predetermined region of said resist film to light, and developing said resist film with a developer.
摘要翻译：图案形成方法在被处理膜上形成下层膜，在所述下层膜上形成含有被酸去除的保护基的含硅中间膜，在所述含硅物质上形成抗蚀剂膜中间膜，将所述抗蚀剂膜的预定区域曝光，并用显影剂显影所述抗蚀剂膜。

73. 发明申请

US20090115978A1 METHOD FOR TREATING SUBSTRATE, METHOD FOR CONVEYING SUBSTRATE, AND APPARATUS FOR CONVEYING SUBSTRATE 失效
标题翻译：用于处理基板的方法，用于输送基板的方法和用于输送基板的装置
公开(公告)号：US20090115978A1
公开(公告)日：2009-05-07
申请号：US12261596
申请日：2008-10-30
申请人： Kentaro MATSUNAGA , Daisuke Kawamura , Seiro Miyoshi , Eishi Shiobara
发明人： Kentaro MATSUNAGA , Daisuke Kawamura , Seiro Miyoshi , Eishi Shiobara
IPC分类号： G03F7/38
CPC分类号： G03F7/16
摘要： A method for treating a substrate before exposing the substrate to which a resist is applied, includes, rinsing the substrate to which a resist is applied, and holding the rinsed substrate in an atmosphere. The atmosphere substantially contains no moisture until conveying the substrate to an exposure apparatus.
摘要翻译：在曝光施加有抗蚀剂的基板之前处理基板的方法包括：冲洗施加有抗蚀剂的基板，并将漂洗的基板保持在气氛中。气氛基本上不含湿气，直到将基板输送到曝光装置。

74. 发明授权

US07466216B2 Security control system 有权
标题翻译：安全控制系统
公开(公告)号：US07466216B2
公开(公告)日：2008-12-16
申请号：US11059057
申请日：2005-02-16
申请人： Daisuke Kawamura , Akihito Kimura , Keiji Yamamoto , Koichi Masamura , Takao Ozawa , Yoshihide Nakane
发明人： Daisuke Kawamura , Akihito Kimura , Keiji Yamamoto , Koichi Masamura , Takao Ozawa , Yoshihide Nakane
IPC分类号： H04Q9/00
CPC分类号： G07C9/00309 , B60R25/24 , G07C2009/00825
摘要： A control system for improving the security level of a security device. A portable device is provided with a communication function and has a portable device ID code. A security controller includes a memory for recording a controller ID code. The security controller communicates with the portable device to determine whether the portable device ID code matches the controller ID code, and controls deactivation of security functions for a door lock driver and an engine controller based on the determination result. In response to a restriction request signal, the management apparatus transmits a function restriction signal to the security controller. The security controller prohibits or restricts control of the door lock driver or the engine controller when receiving the function restriction signal and communicating with the portable device.
摘要翻译：一种用于提高安全设备安全级别的控制系统。便携式设备具有通信功能并且具有便携式设备ID代码。安全控制器包括用于记录控制器ID代码的存储器。安全控制器与便携式设备通信以确定便携式设备ID代码是否与控制器ID代码相匹配，并且基于确定结果控制门锁驱动器和引擎控制器的安全功能的停用。响应于限制请求信号，管理装置向安全控制器发送功能限制信号。当接收功能限制信号并与便携式设备通信时，安全控制器禁止或限制门锁驱动器或发动机控制器的控制。

75. 发明申请

US20070190462A1 Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device 失效
标题翻译：基板处理方法，基板处理装置以及半导体装置的制造方法
公开(公告)号：US20070190462A1
公开(公告)日：2007-08-16
申请号：US11654565
申请日：2007-01-18
申请人： Eishi Shiobara , Kentaro Matsunaga , Daisuke Kawamura , Tomoyuki Takeishi , Kei Hayasaki , Shinichi Ito
发明人： Eishi Shiobara , Kentaro Matsunaga , Daisuke Kawamura , Tomoyuki Takeishi , Kei Hayasaki , Shinichi Ito
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , Y10S430/162
摘要： A substrate processing method including while a liquid is supplied between a processing target substrate to be applied with exposure treatment and a projection optical system of an exposure apparatus for carrying out the exposure treatment, prior to providing a resist film on a first main face of the processing target substrate that is provided for liquid immersion exposure for carrying out the exposure treatment at a side to be applied with the exposure treatment, selectively applying at least hydrophobic treatment with respect to a region in a predetermined range from a peripheral rim part of a second main face opposite to the first main face.
摘要翻译：一种基板处理方法，包括在将待施加曝光处理的处理对象基板和用于进行曝光处理的曝光装置的投影光学系统之间提供液体之前，在将抗蚀剂膜提供在第一主面为了进行曝光处理的一侧进行曝光处理而设置的液浸曝光处理对象基板，从第二图像的外围边缘部选择性地施加相对于规定范围的区域的至少疏水处理主面与第一主面相对。

76. 发明申请

US20060194155A1 Resist pattern forming method and semiconductor device manufacturing method 审中-公开
标题翻译：抗蚀剂图案形成方法和半导体器件制造方法
公开(公告)号：US20060194155A1
公开(公告)日：2006-08-31
申请号：US11360502
申请日：2006-02-24
申请人： Daisuke Kawamura , Tsuyoshi Shibata , Shinichi Ito
发明人： Daisuke Kawamura , Tsuyoshi Shibata , Shinichi Ito
IPC分类号： G03F7/00
CPC分类号： G03F7/2022 , G03F7/2028 , G03F7/70341 , G03F7/7045
摘要： A resist pattern forming method includes forming a resist film above a substrate. A first exposure is performed in which a specific region of an edge of the resist film is irradiated with light much enough to allow subsequent development to dissolve the resist film, thereby forming a latent image in the resist film at the edge. The resist film whose edge has been irradiated is rinsed. A second exposure is performed in which a desired pattern of light is projected onto an exposure region of the rinsed resist film via a projection optical system of an immersion exposure tool with liquid whose refractive index is larger than that of air existing between the exposure region and the substrate-side face of a component element closest to the substrate in the projection optical system. Development on the exposure region of the resist film is performed.
摘要翻译：抗蚀剂图案形成方法包括在基板上形成抗蚀剂膜。进行第一曝光，其中抗蚀剂膜的边缘的特定区域被足够多的光照射以允许随后的显影以溶解抗蚀剂膜，从而在边缘处在抗蚀剂膜中形成潜像。冲洗其边缘的抗蚀剂膜。进行第二次曝光，其中期望的图案通过浸没曝光工具的投影光学系统投射到冲洗的抗蚀剂膜的曝光区域上，其中折射率大于曝光区域和在投影光学系统中最靠近基板的元件元件的基板侧面。进行抗蚀剂膜的曝光区域的显影。

77. 发明授权

US07075098B2 Method of selecting pattern to be measured, pattern inspection method, manufacturing method of semiconductor device, program, and pattern inspection apparatus 失效
标题翻译：选择待测图案的方法，图案检查方法，半导体装置的制造方法，程序和图案检查装置
公开(公告)号：US07075098B2
公开(公告)日：2006-07-11
申请号：US10730921
申请日：2003-12-10
申请人： Takahiro Ikeda , Daisuke Kawamura , Hisako Aoyama
发明人： Takahiro Ikeda , Daisuke Kawamura , Hisako Aoyama
IPC分类号： G01N21/86
CPC分类号： G01N21/9501 , G01N21/95607
摘要： A method of selecting a pattern to be measured includes selecting only points from a combination of all factors effecting dimensional fluctuations. For example, fluctuation between wafers, fluctuation in a wafer, and fluctuation in a chip are candidates for measurement points of patterns to be measured. Further, the number of the selected points corresponds to a divisor of the combination of all factors.
摘要翻译：选择要测量的图案的方法包括仅从影响尺寸波动的所有因素的组合中选择点。例如，晶片之间的波动，晶片的波动和芯片的波动是待测量图案的测量点的候选。此外，所选择的点的数量对应于所有因子的组合的除数。

78. 发明申请

US20050248741A1 Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool, and method of manufacturing semiconductor device 失效
标题翻译：产生书写图案的方法，形成抗蚀剂图案的方法，控制曝光工具的方法以及制造半导体器件的方法
公开(公告)号：US20050248741A1
公开(公告)日：2005-11-10
申请号：US11108751
申请日：2005-04-19
申请人： Daisuke Kawamura , Shinichi Ito
发明人： Daisuke Kawamura , Shinichi Ito
IPC分类号： G03B27/42 , G03F1/36 , G03F1/68 , G03F1/70 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70616 , G03F7/70341 , G03F7/70433 , G03F7/70441
摘要： A method of generating a writing pattern is disclosed, which generates, from pattern data, writing pattern data to write a mask pattern in a photomask used in an exposure tool comprising a projection optical system to transfer the mask pattern to a resist film formed on a substrate, an immersion mechanism which forms a liquid film in a local region, and a movement mechanism which moves the substrate with respect to the projection optical system and the immersion mechanism, the method comprising obtaining a typical distribution of contact history values between the resist film and the liquid film in the unit exposure region, dividing a pattern which corresponds to the pattern data into a plurality of regions according to the typical distribution of the contact history values, and carrying out correction of a pattern included in each of the divided regions under a rule according to the contact history values.
摘要翻译：公开了一种生成写入图案的方法，其从图案数据生成写入图案数据以将掩模图案写入用于包括投影光学系统的曝光工具中的光掩模中，以将掩模图案转印到形成在基板，在局部区域形成液膜的浸渍机构，以及相对于投影光学系统和浸渍机构移动基板的移动机构，所述方法包括获得抗蚀剂膜之间的接触历史值的典型分布和单位曝光区域中的液膜，根据接触历史值的典型分布将与图案数据对应的图案分割成多个区域，并对包含在每个分割区域内的图案进行校正根据联系历史值的规则。

79. 发明申请

US20050179519A1 Security control system 有权
标题翻译：安全控制系统
公开(公告)号：US20050179519A1
公开(公告)日：2005-08-18
申请号：US11059057
申请日：2005-02-16
申请人： Daisuke Kawamura , Akihito Kimura , Keiji Yamamoto , Koichi Masamura , Takao Ozawa , Yoshihide Nakane
发明人： Daisuke Kawamura , Akihito Kimura , Keiji Yamamoto , Koichi Masamura , Takao Ozawa , Yoshihide Nakane
IPC分类号： E05B49/00 , B60R25/01 , B60R25/10 , B60R25/23 , B60R25/24 , G07C9/00 , H04B1/38 , H04B7/26 , H04W4/04 , H04W12/00 , H04B1/00
CPC分类号： G07C9/00309 , B60R25/24 , G07C2009/00825
摘要： A control system for improving the security level of a security device. A portable device is provided with a communication function and has a portable device ID code. A security controller includes a memory for recording a controller ID code. The security controller communicates with the portable device to determine whether the portable device ID code matches the controller ID code, and controls deactivation of security functions for a door lock driver and an engine controller based on the determination result. In response to a restriction request signal, the management apparatus transmits a function restriction signal to the security controller. The security controller prohibits or restricts control of the door lock driver or the engine controller when receiving the function restriction signal and communicating with the portable device.
摘要翻译：一种用于提高安全设备安全级别的控制系统。便携式设备具有通信功能并且具有便携式设备ID代码。安全控制器包括用于记录控制器ID代码的存储器。安全控制器与便携式设备通信以确定便携式设备ID代码是否与控制器ID代码相匹配，并且基于确定结果控制门锁驱动器和引擎控制器的安全功能的停用。响应于限制请求信号，管理装置向安全控制器发送功能限制信号。当接收功能限制信号并与便携式设备通信时，安全控制器禁止或限制门锁驱动器或发动机控制器的控制。

80. 发明申请

US20050158670A1 Apparatus for processing substrate and method of processing the same 失效
公开(公告)号：US20050158670A1
公开(公告)日：2005-07-21
申请号：US11030135
申请日：2005-01-07
申请人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
发明人： Kenji Kawano , Shinichi Ito , Eishi Shiobara , Daisuke Kawamura , Kei Hayasaki
IPC分类号： B05C5/02 , B05C9/14 , B05C11/08 , B05D1/40 , B05D3/02 , G03F7/16 , G03F7/20 , G03F7/30 , G03F7/38 , H01L21/00 , H01L21/027 , G03F7/00
CPC分类号： H01L21/6715 , B05C5/0254 , B05C11/08 , G03F7/168 , G03F7/3021 , G03F7/38 , G03F7/70358 , G03F7/70558 , H01L21/67109 , H01L21/67115
摘要： A heating apparatus for a substrate to be processed with a coating film has a chamber with an inner space, a heating plate heating the substrate to be processed in the inner space, and a partition member. The heating plate has a support surface which supports the substrate to be processed within the chamber. The partition member is arranged in the chamber so as to face the support surface. The partition member partitions the inner space into first and second spaces, and has a plurality of pores which allow the first and second spaces to communicate with each other. The support surface of the heating plate is set in the first space. An air stream formation mechanism forming an air stream is arranged in the second space. This mechanism discharges a substance evaporated from the photoresist film.

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