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    • 79. 发明授权
    • Semiconductor device
    • 半导体器件
    • US08159023B2
    • 2012-04-17
    • US12692527
    • 2010-01-22
    • Syotaro OnoWataru SaitoNana HatanoHiroshi OhtaMiho Watanabe
    • Syotaro OnoWataru SaitoNana HatanoHiroshi OhtaMiho Watanabe
    • H01L29/00
    • H01L29/7802H01L29/0634H01L29/1095H01L29/66712H01L29/7397
    • A semiconductor device includes a semiconductor substrate of a first conductivity type, a first semiconductor region of the first conductivity type on the semiconductor substrate, and a plurality of second semiconductor regions of a second conductivity type disposed separately in the first semiconductor region. A difference between a charge quantity expressed by an integral value of a net activated doping concentration in the second semiconductor regions in the surface direction of the semiconductor substrate and a charge quantity expressed by an integral value of a net activated doping concentration in the first semiconductor region in the surface direction of the semiconductor substrate is always a positive quantity and becomes larger from the depth of the first junction plane to a depth of a second junction plane on an opposite side from the first junction plane.
    • 半导体器件包括第一导电类型的半导体衬底,半导体衬底上的第一导电类型的第一半导体区域和分开设置在第一半导体区域中的多个第二导电类型的第二半导体区域。 由半导体衬底的表面方向上的第二半导体区域中的净活化掺杂浓度的积分值表示的电荷量与由第一半导体区域中的净活化掺杂浓度的积分值表示的电荷量之间的差异 在半导体基板的表面方向总是为正量,并且从第一接合面的深度到与第一接合面相反的一侧的第二接合面的深度变得更大。