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71. 发明授权

US09200725B2 Opening degree detection device for manual valve 有权
标题翻译：手动阀门开度检测装置
公开(公告)号：US09200725B2
公开(公告)日：2015-12-01
申请号：US13885463
申请日：2011-11-14
申请人： Ryousuke Dohi , Atsuo Tomita , Kouji Nishino , Nobukazu Ikeda , Hideyuki Miyagawa
发明人： Ryousuke Dohi , Atsuo Tomita , Kouji Nishino , Nobukazu Ikeda , Hideyuki Miyagawa
IPC分类号： F16K37/00
CPC分类号： F16K37/0016 , F16K37/0041 , Y10T137/8275
摘要： A handle 13 is formed in a hollow shape. A displacement sensor 4 is fixed to an inner surface of the handle 13. The target 5 includes: a target body 22 which is arranged at a position away from a valve stem by a predetermined distance in the handle 13; a detection-use inclined surface 23 which is formed on a surface of the target body 22 which faces the displacement sensor 4 in an opposed manner; and a downwardly projecting portion 25 which projects downward from the target body 22. A lower surface of the downwardly projecting portion 25 of the target 5 is received by a valve body 11b so that the target 5 is rotated together with the handle 13 but is not upwardly and downwardly moved with respect to the valve body 11b.
摘要翻译：手柄13形成为中空形状。位置传感器4固定在手柄13的内表面上。目标5包括：目标体22，其设置在手柄13上远离阀杆一定距离的位置; 检测用倾斜面23，其以相对的方式形成在目标体22的面向位移传感器4的表面上; 以及从目标体22向下方突出的向下突出部25.目标5的向下突出部25的下表面被阀体11b容纳，使得目标5与手柄13一起旋转，但不是相对于阀体11b上下移动。

72. 发明授权

US09038663B2 Opening degree detection device for automatically operated valve 有权
标题翻译：自动操作阀开度检测装置
公开(公告)号：US09038663B2
公开(公告)日：2015-05-26
申请号：US13988836
申请日：2011-11-17
申请人： Ryousuke Dohi , Atsuo Tomita , Kouji Nishino , Yohei Sawada , Nobukazu Ikeda
发明人： Ryousuke Dohi , Atsuo Tomita , Kouji Nishino , Yohei Sawada , Nobukazu Ikeda
IPC分类号： F16K37/00 , F16K31/122
CPC分类号： F16K37/0041 , F16K31/1221 , F16K37/00 , F16K37/0083 , Y10T137/8158 , Y10T137/8242
摘要： To provide an opening degree detection device for an automatically operated valve which is easily assembled into an automatically operated valve, makes it easy to ensure detection accuracy at the time of assembling the opening degree detection device, and is easily applicable to an existing automatically operated valve. The opening degree detection device includes: a base plate 4 which is detachably mounted on an automatically operated valve 2; a displacement sensor 5; and a target 6 having an inclined detection surface 6a which is detected by the displacement sensor 5. The target 6 is fixed to the base plate 4. The displacement sensor 5 is supported on a valve stem 14 by way of a sensor support member 21, and the sensor support member 21 is supported on the base plate 4 by way of a guide means.
摘要翻译：为了提供容易组装成自动操作的阀的自动操作阀的开度检测装置，能够容易地确保组装开度检测装置时的检测精度，并且容易应用于现有的自动操作阀。开度检测装置包括：可拆卸地安装在自动操作的阀2上的基板4; 位移传感器5; 以及具有由位移传感器5检测出的倾斜检测面6a的目标6。目标6固定在基板4上。位移传感器5通过传感器支撑部件21支撑在阀杆14上，并且传感器支撑构件21通过引导装置支撑在基板4上。

73. 发明申请

US20130333777A1 OPENING DEGREE DETECTION DEVICE FOR MANUAL VALVE 有权
标题翻译：手动阀开启程度检测装置
公开(公告)号：US20130333777A1
公开(公告)日：2013-12-19
申请号：US13885463
申请日：2011-11-14
申请人： Ryousuke Dohi , Atsuo Tomita , Kouji Nishino , Nobukazu Ikeda , Hideyuki Miyagawa
发明人： Ryousuke Dohi , Atsuo Tomita , Kouji Nishino , Nobukazu Ikeda , Hideyuki Miyagawa
IPC分类号： F16K37/00
CPC分类号： F16K37/0016 , F16K37/0041 , Y10T137/8275
摘要： A handle 13 is formed in a hollow shape. A displacement sensor 4 is fixed to an inner surface of the handle 13. The target 5 includes: a target body 22 which is arranged at a position away from a valve stem by a predetermined distance in the handle 13; a detection-use inclined surface 23 which is formed on a surface of the target body 22 which faces the displacement sensor 4 in an opposed manner; and a downwardly projecting portion 25 which projects downward from the target body 22. A lower surface of the downwardly projecting portion 25 of the target 5 is received by a valve body 11b so that the target 5 is rotated together with the handle 13 but is not upwardly and downwardly moved with respect to the valve body 11b.
摘要翻译：手柄13形成为中空形状。位置传感器4固定在手柄13的内表面上。目标5包括：目标体22，其设置在手柄13上远离阀杆一定距离的位置; 检测用倾斜面23，其以相对的方式形成在目标体22的面向位移传感器4的表面上; 以及从目标体22向下方突出的向下突出部25.目标5的向下突出部25的下表面被阀体11b容纳，使得目标5与手柄13一起旋转，但不是相对于阀体11b上下移动。

74. 发明申请

US20110100483A1 GAS SUPPLY APPARATUS EQUIPPED WITH VAPORIZER 有权
标题翻译：气体供应装置配有蒸发器
公开(公告)号：US20110100483A1
公开(公告)日：2011-05-05
申请号：US12935870
申请日：2009-02-17
申请人： Atsushi Nagata , Masaaki Nagase , Atsushi Hidaka , Kaoru Hirata , Atsushi Matsumoto , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda
发明人： Atsushi Nagata , Masaaki Nagase , Atsushi Hidaka , Kaoru Hirata , Atsushi Matsumoto , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda
IPC分类号： F15D1/00
CPC分类号： B01J4/02 , B01B1/005 , B01J2219/00162 , B01J2219/00164 , B01J2219/00191 , B01J2219/00198 , B01J2219/00213 , B01J2219/00231 , C23C16/4481 , C23C16/4485 , C23C16/45561 , F02D19/023 , F02D19/027 , F02M21/0239 , F02M21/06 , Y02T10/32 , Y10T137/6416 , Y10T137/6606
摘要： An energy-saving, downsized gas supply apparatus equipped with a vaporizer is provided, wherein the gas supply apparatus is capable of stably and easily performing highly accurate gas flow rate control without requiring rigorous temperature control on the vaporizer side. The present invention pertains to a gas supply apparatus equipped with a vaporizer that includes (a) a liquid receiving tank; (b) a vaporizer that vaporizes liquid; (c) a high-temperature type pressure type flow rate control device that adjusts a flow rate of a vaporized gas; and (d) heating devices that heat the vaporizer, the high-temperature type pressure type flow rate control device, and desired portions of pipe passages connected to the vaporizer and the high-temperature type pressure type flow rate control device.
摘要翻译：提供一种配备有蒸发器的节能的小型化气体供给装置，其中，气体供给装置能够稳定且容易地进行高精度的气体流量控制，而无需对蒸发器侧进行严格的温度控制。本发明涉及一种配备有蒸发器的气体供给装置，该蒸发器包括：（a）液体接收罐; （b）蒸发液体的蒸发器; （c）调节汽化气体的流量的高温型压力式流量控制装置; 以及（d）加热蒸发器，高温型压力式流量控制装置以及连接到蒸发器和高温型压力式流量控制装置的管道的期望部分的加热装置。

75. 发明申请

US20100294964A1 NORMALLY OPEN TYPE PIEZOELECTRIC ELEMENT DRIVEN METAL DIAPHRAGM CONTROL VALVE 有权
标题翻译：正常开启型压电元件驱动金属膜片控制阀
公开(公告)号：US20100294964A1
公开(公告)日：2010-11-25
申请号：US12161549
申请日：2006-11-13
申请人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
发明人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
IPC分类号： F16K31/02
CPC分类号： F16K24/04 , F16K7/14 , F16K31/004 , F16K31/007 , F16K51/02
摘要： A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.
摘要翻译：控制阀具有形成阀室和阀座的主体，安装在阀室内部并与阀座接触和离开的金属隔膜，固定在主体侧的致动器盒，安装在压缩元件侧的压电元件在致动器箱内部，通过金属隔膜压板的调节，通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构，其在金属隔膜与阀座接触时吸收压电元件的伸长，规定的推力被施加到阀座等，以及预压机构，其向压电元件施加向上的压缩力，其中施加到压电元件的压缩力是外部可调节的。

76. 发明申请

US20100192854A1 GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTRUING FACILITIES 有权
标题翻译：用于半导体制造设备的气体供应系统
公开(公告)号：US20100192854A1
公开(公告)日：2010-08-05
申请号：US12680159
申请日：2008-07-17
申请人： Kouji Nishino , Ryousuke Dohi , Masaaki Nagase , Kaoru Hirata , Katsuyuki Sugita , Nobukazu Ikeda
发明人： Kouji Nishino , Ryousuke Dohi , Masaaki Nagase , Kaoru Hirata , Katsuyuki Sugita , Nobukazu Ikeda
IPC分类号： H01L51/40
CPC分类号： C23C16/455 , C23C16/45561 , C23C16/52
摘要： A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of carrier gas is supplied to the main gas supply line; a pressure control system disposed on an inlet side of the vent gas supply line, a carrier gas having a predetermined pressure is supplied to the vent gas supply line while the pressure control system performs a pressure adjustment, a gas pressure of the main gas supply line detected downstream from an orifice of the pressure type flow-rate control system and a gas pressure of the vent gas supply line are compared, and the gas pressure of the vent gas supply line is adjusted so a difference therebetween becomes zero.
摘要翻译：气体供应系统包括主气供应管线; 排气供气管线; 设置在两个气体供给管线的中间的多个气体供给机构; 压力型流量控制系统，设置在主气体供给管线的入口侧，从而将载气流供应到主气体供应管线; 设置在排出气体供给管路的入口侧的压力控制系统，在压力控制系统进行压力调节，主气体供给管线的气体压力的情况下，将具有规定压力的载气供给到排气供给管线从压力式流量控制系统的孔口下游检测出气体供给管路的气体压力，调整排出气体供给管路的气体压力，使其间的差为零。

77. 发明授权

US07594517B2 Gas supply facility of a chamber and a method for an internal pressure control of the chamber for which the facility is employed 有权
标题翻译：室的气体供应设备和用于对其进行设备的室的内部压力控制的方法
公开(公告)号：US07594517B2
公开(公告)日：2009-09-29
申请号：US10566495
申请日：2004-07-28
申请人： Hiroshi Kannan , Tomio Uno , Ryousuke Dohi , Kouji Nishino , Osamu Nakamura , Atsushi Matsumoto , Nobukazu Ikeda
发明人： Hiroshi Kannan , Tomio Uno , Ryousuke Dohi , Kouji Nishino , Osamu Nakamura , Atsushi Matsumoto , Nobukazu Ikeda
IPC分类号： G05D7/06
CPC分类号： G05D7/0652 , Y10T137/7761 , Y10T137/8741 , Y10T137/87507
摘要： The present invention prevents substantial reduction of flow rate control accuracy in a small flow quantity range, achieves accurate flow rate control over the entire range of flow rate control, and also allows control of a wide pressure range of a chamber with accurate flow rate control. Specifically, a gas supply facility having a plurality of pressure type flow controllers connected in parallel, and a third controller to control operation of the pressure type flow controllers to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, is provided wherein one pressure type flow controller is a controller used to control a gas flow rate range up to 10% of the maximum flow rate supplied to the chamber, while the remaining pressure type flow controllers are made to be ones controlling the rest of the gas flow rate range.
摘要翻译：本发明防止了在小流量范围内的流量控制精度的显着降低，在整个流量控制范围内实现精确的流量控制，并且还允许以精确的流量控制来控制腔室的宽压力范围。具体而言，具有并联连接的多个压力式流量控制器的气体供给装置和控制压力式流量控制器的动作的第三控制装置，在控制其流量的同时将由真空泵排出的期望气体供给到室，其中一个压力式流量控制器是用于控制高达提供给腔室的最大流量的10％的气体流量范围的控制器，而剩余的压力型流量控制器被制成控制其余的气体流量范围。

78. 发明授权

US07363810B2 Corrosion resistant metal made thermal type mass flow rate sensor and a fluid supply device using the same 有权
标题翻译：耐腐蚀金属制热型质量流量传感器和使用其的流体供应装置
公开(公告)号：US07363810B2
公开(公告)日：2008-04-29
申请号：US10553235
申请日：2004-02-12
申请人： Nobukazu Ikeda , Kaoru Hirata , Kouji Nishino , Ryousuke Dohi
发明人： Nobukazu Ikeda , Kaoru Hirata , Kouji Nishino , Ryousuke Dohi
IPC分类号： G01F1/68
CPC分类号： G01F1/6845
摘要： A corrosion resistant thermal type mass flow rate sensor, and a fluid supply device employing the sensor are provided thus allowing enhanced corrosion resistance of the thermal type mass flow rate sensor, improve responsiveness, to be achieved particle-free, and to prevent unevenness of product qualities. A thermal type mass flow rate sensor is constituted with a sensor part 1 comprising a corrosion resistant metal substrate 2 formed as a thin plate by applying electrolytic etching on the rear face side of a corrosion resistant metal material W, a thin film F forming a temperature sensor 3 and a heater 4 mounted on the rear face side of the corrosion resistant metal substrate 2, and a sensor base 13 hermetically fitted by welding to the outer periphery of the corrosion resistant metal substrate 2 of the afore-mentioned sensor part 1 fitted into a fixture groove 13a.
摘要翻译：提供了耐腐蚀热型质量流量传感器和使用该传感器的流体供给装置，从而能够提高热式质量流量传感器的耐腐蚀性，提高响应性，实现无颗粒，并且防止产品的不均匀品质热式质量流量传感器由传感器部件1构成，传感器部件1包括通过在耐腐蚀金属材料W的背面上施加电解蚀刻而形成为薄板的耐腐蚀金属基板2，形成温度传感器3和安装在耐腐蚀金属基板2的背面侧的加热器4以及通过焊接气密地装配到上述传感器部1的耐腐蚀金属基板2的外周的传感器基座13，固定槽13a。

79. 发明申请

US20060053878A1 Thermal type mass flow rate sensor made of corrosion resistant metal, and fluid supply equipment using the same 有权
标题翻译：由耐腐蚀金属制成的热式质量流量传感器，以及使用其的流体供给设备
公开(公告)号：US20060053878A1
公开(公告)日：2006-03-16
申请号：US10553235
申请日：2004-02-12
申请人： Nobukazu Ikeda , Kaoru Hirata , Kouji Nishino , Ryousuke Dohi
发明人： Nobukazu Ikeda , Kaoru Hirata , Kouji Nishino , Ryousuke Dohi
IPC分类号： G01F1/68
CPC分类号： G01F1/6845
摘要： A corrosion resistant thermal type mass flow rate sensor, and a fluid supply device employing the sensor, are provided thus allowing enhanced corrosion resistance of the thermal type mass flow rate sensor, improve responsiveness, to be achieved particle-free, and to prevent unevenness of product qualities. A thermal type mass flow rate sensor is constituted with a sensor part 1 comprising a corrosion resistant metal substrate 2 formed as a thin plate by applying electrolytic etching on the rear face side of a corrosion resistant metal material W, thin film F forming a temperature sensor 3 and a heater 4 mounted on the rear face side of the corrosion resistant metal substrate 2, and a sensor base 13 hermetically fitted by welding to the outer periphery of the corrosion resistant metal substrate 2 of the afore-mentioned sensor part 1 fitted into a fixture groove 13a.
摘要翻译：提供耐腐蚀热型质量流量传感器和采用该传感器的流体供给装置，从而能够提高热型质量流量传感器的耐腐蚀性，提高响应性，实现无颗粒，并且防止不均匀产品质量热式质量流量传感器由传感器部件1构成，传感器部件1包括通过在耐腐蚀金属材料W的后表面上施加电解蚀刻而形成为薄板的耐腐蚀金属基板2，形成温度传感器 3和安装在耐腐蚀金属基板2的背面侧的加热器4以及通过焊接气密地装配到上述传感器部1的耐腐蚀金属基板2的外周的传感器基座13，固定槽13a。

80. 发明授权

US09163743B2 Piezoelectrically driven valve and piezoelectrically driven flow rate control device 有权
标题翻译：压电阀和压电驱动流量控制装置
公开(公告)号：US09163743B2
公开(公告)日：2015-10-20
申请号：US13505620
申请日：2010-11-04
申请人： Atsushi Hidaka , Kaoru Hirata , Masaaki Nagase , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino
发明人： Atsushi Hidaka , Kaoru Hirata , Masaaki Nagase , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino
IPC分类号： G05D7/06 , F16K31/00 , F16K7/14 , F16K25/00
CPC分类号： F16K31/007 , F16K7/14 , F16K25/005 , G05D7/0629 , Y10T137/6416 , Y10T137/7759 , Y10T137/776 , Y10T137/7761
摘要： A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.
摘要翻译：提供了一种压电驱动阀和压电驱动的流体控制装置，其可以控制流体，即使流体的温度高于压电致动器的工作温度范围。压电驱动阀包括用于打开和关闭流体通道的阀元件，通过利用压电元件的延伸来驱动阀元件的压电致动器，以及将压电致动器提升和支撑远离流体通道的辐射间隔件，以及辐射从在流体通道中流动的流体转移到压电致动器的热量，并且优选地还包括容纳和支撑压电致动器和辐射间隔物的支撑筒，其中支撑筒由具有相同材料的材料制成至少在用于容纳辐射间隔物的部分处，与辐射间隔物的热膨胀系数相同。

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