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    • 72. 发明授权
    • Key switch and keyboard
    • 钥匙开关和键盘
    • US08624140B2
    • 2014-01-07
    • US11822840
    • 2007-07-10
    • Takeshi NishinoJunichi MaruyamaShuji Nakamura
    • Takeshi NishinoJunichi MaruyamaShuji Nakamura
    • H01H13/06
    • H01H3/122H01H13/702H01H2209/082H01H2219/014H01H2219/064H01H2221/07H01H2223/002
    • A key switch preferably used for a keyboard as an input device in electronic equipment. The key switch includes a base section; a key top disposed above the base section; a pair of link members interlocked to each other to support and direct the key top in a vertical direction relative to the base section; a switch member including a contact section capable of opening and closing in response to a vertical movement of the key top; and a biasing member capable of applying an elastic biasing force in a vertically upward direction to the key top. The key switch further includes a protection member disposed and inserted between the base section and the key top at a position where the protection member surrounds the pair of link members, the contact section and the biasing member. The protection member is elastically deformed to follow the vertical movement of the key top, and protects the pair of link members, the contact section and the biasing member from penetration of foreign matter.
    • 一种键盘开关,优选用于键盘作为电子设备中的输入装置。 钥匙开关包括基座部分; 位于基部上方的键顶; 一对连杆构件彼此互锁,以相对于基部在垂直方向上支撑和引导键顶; 开关构件,其包括响应于所述键顶的垂直移动而能够打开和关闭的接触部; 以及能够向键顶向垂直向上方向施加弹性偏压力的偏置构件。 钥匙开关还包括保护构件,该保护构件设置并插入在基部和键顶之间的保护构件围绕该对连杆构件,接触部分和偏置构件的位置处。 保护构件弹性变形以跟随键顶的垂直运动,并且保护一对连杆构件,接触部分和偏压构件不会渗透异物。
    • 75. 发明授权
    • LED with current confinement structure and surface roughening
    • LED具有电流限制结构和表面粗糙化
    • US08541788B2
    • 2013-09-24
    • US12581759
    • 2009-10-19
    • Steven P. DenbaarsShuji NakamuraMax Batres
    • Steven P. DenbaarsShuji NakamuraMax Batres
    • H01L27/15
    • H01L33/42H01L33/145H01L33/22H01L33/405
    • A light emitting diode having a vertical orientation with an ohmic contact on portions of a top surface of the diode and a reflective layer adjacent the light emitting region of the diode. This light emitting diode includes a confinement structure. The confinement structure may be an opening in the reflective layer generally beneath the top ohmic contact that defines a non-contact area between the reflective layer and the light emitting region of the diode to encourage current flow to take place other than at the non-contact area to in turn decrease the number of light emitting recombinations beneath the ohmic contact and increase the number of light emitting recombinations in the areas not beneath said ohmic contact. The LED may include roughened emitting surfaces to further enhance light extraction.
    • 具有在二极管的顶表面的部分上的欧姆接触的垂直取向的发光二极管和与二极管的发光区相邻的反射层。 该发光二极管包括限制结构。 约束结构可以是反射层中通常在顶部欧姆接触下方的开口,其限定反射层和二极管的发光区域之间的非接触区域,以促进除非接触之外的电流流动 面积又减少欧姆接触下方的发光复合数,并增加不在所述欧姆接触下方的区域中的发光复合数。 LED可以包括粗糙化的发射表面以进一步增强光提取。
    • 80. 发明申请
    • GALLIUM NITRIDE BULK CRYSTALS AND THEIR GROWTH METHOD
    • 氮化钾块状晶体及其生长方法
    • US20130022528A1
    • 2013-01-24
    • US13592750
    • 2012-08-23
    • Tadao HashimotoShuji Nakamura
    • Tadao HashimotoShuji Nakamura
    • C30B7/10C01B21/06
    • C30B29/406C30B7/10
    • A gallium nitride crystal with a polyhedron shape having exposed {10-10} m-planes and an exposed (000-1) N-polar c-plane, wherein a surface area of the exposed (000-1) N-polar c-plane is more than 10 mm2 and a total surface area of the exposed {10-10} m-planes is larger than half of the surface area of (000-1) N-polar c-plane. The GaN bulk crystals were grown by an ammonothermal method with a higher temperature and temperature difference than is used conventionally, using a high-pressure vessel with an upper region and a lower region. The temperature of the lower region is at or above 550° C., the temperature of the upper region is set at or above 500° C., and the temperature difference between the lower and upper regions is maintained at or above 30° C. GaN seed crystals having a longest dimension along the c-axis and exposed large area m-planes are used.
    • 具有暴露的{10-10} m面和暴露(000-1)N极c面的多面体形状的氮化镓晶体,其中暴露(000-1)N-极性c-面的表面积, 平面大于10平方毫米,暴露的{10-10} m面的总表面积大于(000-1)N极C面的表面积的一半。 通过使用具有上部区域和下部区域的高压容器,通过与常规使用的温度和温度差更高的氨热法生长GaN本体晶体。 下部区域的温度为550℃以上,上部区域的温度为500℃以上,下部和上部区域之间的温度差保持在30℃以上。 使用沿着c轴具有最长尺寸和暴露的大面积m面的GaN晶种。