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    • 72. 发明授权
    • Reproduction device
    • 繁殖装置
    • US08724965B2
    • 2014-05-13
    • US12609095
    • 2009-10-30
    • Satoshi HashimotoMasahiro OashiHiroaki Iwamoto
    • Satoshi HashimotoMasahiro OashiHiroaki Iwamoto
    • H04N9/80
    • G11B27/10G11B20/10G11B27/005G11B27/105G11B2220/2541
    • A playback apparatus has a platform 1410 that is a program execution environment of an application 1400. When the platform 1410 initiates the application 1400, a graphics information transmission unit 1403, which corresponds to an API function, obtains graphics information and stores the graphics information in a graphics information storage unit 1413. A graphics information control unit 1414 selects graphics information to be rendered, based on a stream event obtained by a stream event reception unit 1416 and the graphics information stored in the graphics information storage unit 1413. The graphics information control unit 1414 has a graphics rendition unit 1415 render the selected graphics with a video playback timing relating to the stream event.
    • 回放装置具有作为应用程序1400的程序执行环境的平台1410.当平台1410启动应用程序1400时,对应于API功能的图形信息发送单元1403获取图形信息并将图形信息存储在 图形信息存储单元1413.图形信息控制单元1414基于由流事件接收单元1416获得的流事件和存储在图形信息存储单元1413中的图形信息来选择要呈现的图形信息。图形信息控制 单元1414具有图形再现单元1415,其使得具有与流事件相关的视频播放定时呈现所选择的图形。
    • 75. 发明申请
    • VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND ORGANIC EL DISPLAY DEVICE
    • 蒸气沉积装置,蒸发沉积方法和有机EL显示装置
    • US20130337597A1
    • 2013-12-19
    • US13984799
    • 2012-03-02
    • Shinichi KawatoSatoshi InoueTohru SonodaSatoshi Hashimoto
    • Shinichi KawatoSatoshi InoueTohru SonodaSatoshi Hashimoto
    • H01L51/56
    • H01L51/56C23C14/044C23C14/12C23C14/562C23C16/45578H01L51/0011
    • A vapor deposition device includes a vapor deposition source (60) having a plurality of vapor deposition source openings (61) that discharge vapor deposition particles (91), a limiting unit (80) having a plurality of limiting openings (82), and a vapor deposition mask (70) in which a plurality of mask openings (71) are formed only in a plurality of vapor deposition regions (72) where the vapor deposition particles that have passed through a plurality of limiting openings reach. The plurality of vapor deposition regions are arranged along a second direction that is orthogonal to the normal line direction of the substrate (10) and the movement direction of the substrate, with non-vapor deposition regions (73) where the vapor deposition particles do not reach being sandwiched therebetween. Mask openings through which the vapor deposition particles pass are formed at different positions in the movement direction of the substrate from the positions of the non-vapor deposition regions located on a straight line parallel to the second direction, as viewed along the normal line direction of the substrate. Accordingly, it is possible to stably form a vapor deposition coating film in which edge blurring is suppressed at a desired position on a substrate.
    • 蒸镀装置包括:蒸镀源(60),具有排出气相沉积粒子(91)的多个气相沉积源开口(61),具有多个限制开口(82)的限制单元(80) 气相沉积掩模(70),其中多个掩模开口(71)仅形成在已经通过多个限制孔的气相沉积颗粒到达的多个气相沉积区(72)中。 多个气相沉积区域沿着与基板(10)的法线方向正交的第二方向和基板的移动方向排列,其中气相沉积微粒不具有非气相沉积区域(73) 夹在其间。 沿着平行于第二方向的直线上的非蒸镀区域的位置,沿着基板的移动方向的不同位置,沿蒸镀粒子的法线方向 底物。 因此,可以稳定地形成在基板上的期望位置抑制边缘模糊的气相沉积涂膜。