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71. 发明申请

US20080079926A1 NEAR-FIELD EXPOSURE MASK, NEAR-FIELD EXPOSURE APPARATUS, AND NEAR-FIELD EXPOSURE METHOD 失效
标题翻译：近场曝光掩模，近场曝光装置和近场曝光方法
公开(公告)号：US20080079926A1
公开(公告)日：2008-04-03
申请号：US11864097
申请日：2007-09-28
申请人： Toshiki Ito , Natsuhiko Mizutani
发明人： Toshiki Ito , Natsuhiko Mizutani
IPC分类号： G03F1/00 , G03B27/58 , G03B27/60
CPC分类号： G03F7/24 , B82Y10/00 , G03F1/50 , G03F1/60 , G03F7/2014 , G03F7/7035
摘要： A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.
摘要翻译：近场曝光掩模包括具有比曝光光的波长小的开口的遮光膜和用于保持遮光膜的掩模基材。近场曝光掩模被构造和定位成使得要暴露于与要暴露的物体接触期间对应于开口产生的近场光的物体的曝光。掩模基材对曝光光是透明的，并且包含杨氏模量在1GPa以上至10GPa以下的合成树脂材料。

72. 发明授权

US07315354B2 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method 失效
公开(公告)号：US07315354B2
公开(公告)日：2008-01-01
申请号：US10529893
申请日：2004-08-06
申请人： Natsuhiko Mizutani
发明人： Natsuhiko Mizutani
IPC分类号： G03B27/64
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/703 , G03F7/70325
摘要： A near-field exposure method wherein a pressure difference is applied between a front face and a rear face of an elastically deformable exposure mask to cause deformation of the exposure mask in accordance with a substrate to be exposed, and to cause the exposure mask surface to follow a surface irregularity state of the substrate so that these surfaces closely contact each other, for exposure based on near field light. The method includes setting the pressure difference applied between the front and rear faces of the exposure mask at a predetermined pressure difference corresponding to a surface roughness of the substrate to be exposed. The predetermined pressure difference is set at a pressure difference larger than a minimum pressure P, which is determined to satisfy equation (1) below, in relation to a maximum surface roughness w at a measurement length a of the substrate to be exposed: P = P m + E ⁢ 16 ⁢ hw ⁡ ( 4 ⁢ h 2 + ( 7 - v ) ⁢ w 2 ) 3 ⁢ a 4 ⁡ ( 1 - v ) ( 1 ) wherein h is a thickness of a thin-film mask base material, E is Young's modulus, v is Poisson's ratio, and Pm is a pressure difference for roughly contacting a first substrate and a second substrate with each other.

73. 发明授权

US07297933B2 Probe, near-field light generation apparatus including probe, exposure apparatus, and exposing method using probe 失效
标题翻译：探头，近场光产生装置，包括探针，曝光装置和使用探针的曝光方法
公开(公告)号：US07297933B2
公开(公告)日：2007-11-20
申请号：US10440237
申请日：2003-05-19
申请人： Tomohiro Yamada , Natsuhiko Mizutani
发明人： Tomohiro Yamada , Natsuhiko Mizutani
IPC分类号： G01N13/14 , G02B26/00
CPC分类号： G11B7/22 , G01Q60/22 , G01Q80/00 , G11B7/1387 , Y10S977/862 , Y10S977/868
摘要： A probe which generates near-field light from an aperture at the tip is provided. The tip is covered with a lightproof member, at least the interior of the lightproof member is in the shape of a cone having a plane-shaped top, and the aperture is provided in the top plane.
摘要翻译：提供从尖端的孔产生近场光的探针。尖端覆盖有防光构件，至少防光构件的内部是具有平面形顶部的锥体形状，并且孔设置在顶平面中。

74. 发明授权

US07262828B2 Near-field photomask and near-field exposure apparatus including the photomask 失效
标题翻译：包括光掩模的近场光掩模和近场曝光装置
公开(公告)号：US07262828B2
公开(公告)日：2007-08-28
申请号：US10648317
申请日：2003-08-27
申请人： Ryo Kuroda , Natsuhiko Mizutani
发明人： Ryo Kuroda , Natsuhiko Mizutani
IPC分类号： G03B27/54 , G03B27/64 , G03B27/16 , G03F1/08 , G03F7/20
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/2014 , G03F7/70325 , G03F7/70566
摘要： A near-field photomask includes a light shield film having openings to constitute a light shield portion. The photomask can be used to expose an exposure target with near-field light generated through the openings. The openings formed in the light shield film include two or more parallel rows of first slit openings each having a width smaller than 100 nm, and two or more parallel rows of second slit openings each having a width smaller than 100 nm, which extend perpendicularly to the rows of first slit openings while interlinking at least two of the rows of first slit openings. A near-field exposure apparatus includes the near-field photomask with a positioning unit and a source for illuminating polarized light parallel to the first slit openings for forming a latent-dot-image on an exposure target only where a second slit opening crosses the light shield portion on the near-field photomak.
摘要翻译：近场光掩模包括具有用于构成遮光部的开口的遮光膜。光掩模可以用于通过开口产生的近场光来曝光曝光目标。形成在遮光膜中的开口包括宽度小于100nm的两个或更多个平行的第一狭缝开口行，以及两个或更多个平行的第二狭缝开口，其宽度小于100nm，垂直于第一狭缝开口的行，同时连接至少两排第一狭缝开口。近场曝光装置包括具有定位单元的近场光掩模和用于照射与第一狭缝开口平行的偏振光的源，用于仅在第二狭缝开口穿过光的情况下在曝光目标上形成潜像图像屏蔽部分在近场光掩模上。

75. 发明申请

US20070127037A1 POSITION SENSOR, METHOD FOR DETECTING HORIZONTAL AND VERTICAL POSITION, ALIGNMENT APPARATUS INCLUDING POSITION SENSOR, AND METHOD FOR HORIZONTAL AND VERTICAL ALIGNMENT 失效
标题翻译：位置传感器，用于检测水平和垂直位置的方法，包括位置传感器的对准装置以及用于水平和垂直对准的方法
公开(公告)号：US20070127037A1
公开(公告)日：2007-06-07
申请号：US11549738
申请日：2006-10-16
申请人： Tomohiro Yamada , Natsuhiko Mizutani
发明人： Tomohiro Yamada , Natsuhiko Mizutani
IPC分类号： G01B11/14
CPC分类号： G03F9/7038 , G01B11/14 , G03F9/703 , G03F9/7088
摘要： A position sensor has an interface structure between negative dielectrics and a dielectric, and is provided with a configuration in which the plasmon intensity with respect to a microstructure in a surface including the interface structure or in the vicinity thereof is detected by the interface structure, and the positional relationship between the interface structure and the microstructure is thereby detected.
摘要翻译：位置传感器在负电介质和电介质之间具有界面结构，并且具有这样的构造，其中通过界面结构检测包括界面结构或其附近的表面中的微结构的等离子体激发强度，由此检测界面结构和微结构之间的位置关系。

76. 发明授权

US07144682B2 Near-field exposure method 失效
标题翻译：近场曝光法
公开(公告)号：US07144682B2
公开(公告)日：2006-12-05
申请号：US10654913
申请日：2003-09-05
申请人： Yasuhisa Inao , Ryo Kuroda , Natsuhiko Mizutani
发明人： Yasuhisa Inao , Ryo Kuroda , Natsuhiko Mizutani
IPC分类号： G03F7/20
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/2014 , G03F7/70325 , G03F7/70566
摘要： A method for exposing a workpiece on the basis of near-field light escaping from an exposure mask having a light blocking film with a plurality of rectangular openings. The method includes protecting non-polarized near-field exposure light from a light source through the openings of the exposure mask to perform exposure of a pattern on the workpiece. The widths of the rectangular openings are smaller than that at a cross-point between a first curve on a coordinate of widths of the openings versus a near-field light intensity for an incident-light electric-field direction perpendicular to a lengthwise direction of a small-opening pattern and a second curve on the same coordinate for an incident-light electric-field direction parallel to the lengthwise direction of the small-opening pattern.
摘要翻译：基于从具有多个矩形开口的具有遮光膜的曝光掩模逃逸的近场光来曝光工件的方法。该方法包括通过曝光掩模的开口保护来自光源的非偏振近场曝光光，以进行图案在工件上的曝光。矩形开口的宽度小于开口宽度坐标上的第一曲线与垂直于纵向方向的入射光电场方向的近场光强度之间的交叉点处的宽度小开口图案和平行于小开口图案的长度方向的入射光电场方向的相同坐标上的第二曲线。

77. 发明申请

US20060110693A1 Exposure method and apparatus, exposure mask, and device manufacturing method 审中-公开
标题翻译：曝光方法和装置，曝光掩模和装置制造方法
公开(公告)号：US20060110693A1
公开(公告)日：2006-05-25
申请号：US10529907
申请日：2004-06-24
申请人： Ryo Kuroda , Natsuhiko Mizutani , Tomohiro Yamada
发明人： Ryo Kuroda , Natsuhiko Mizutani , Tomohiro Yamada
IPC分类号： G03C5/00 , G03B27/42 , G03F1/00
CPC分类号： G03F7/70325 , B82Y10/00 , G03F1/50 , G03F7/2014
摘要： Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking member from its second surface side so that exposure of the exposure object is carried out on the basis of near field light leaking from the openings. For exposure, interference is caused between surface plasmon polariton waves passing respectively through adjacent openings and going around to the first surface side, and, on the basis of it, a portion having a decreased light intensity is produced in the exposure object so that the exposure is carried out by use of the decreased light intensity portion.
摘要翻译：公开了一种曝光方法和装置，曝光掩模和装置制造方法，其中具有相互邻接关系形成的多个开口的遮光构件的第一表面被放置在曝光物体侧，并且将光投射到遮光构件从其第二表面侧使得曝光对象的曝光是基于从开口泄漏的近场光进行的。对于曝光，分别通过相邻的开口并绕到第一表面侧的表面等离子体激元波之间产生干涉，并且在其基础上，在曝光对象中产生具有降低的光强度的部分，使得曝光通过使用减小的光强度部分进行。

78. 发明授权

US07050144B2 Photomask for near-field exposure and exposure apparatus including the photomask for making a pattern 失效
标题翻译：用于近场曝光的光掩模和包括用于形成图案的光掩模的曝光装置
公开(公告)号：US07050144B2
公开(公告)日：2006-05-23
申请号：US10423938
申请日：2003-04-28
申请人： Natsuhiko Mizutani , Yasuhisa Inao
发明人： Natsuhiko Mizutani , Yasuhisa Inao
IPC分类号： G03B27/54 , G03B27/62 , G03B27/18 , G03F1/08
CPC分类号： B82Y10/00 , G03F1/50 , G03F7/2014 , G03F7/70325 , G03F7/7035
摘要： A photomask for near-field light exposure includes a transparent substrate, and a shading member on the substrate, a mask pattern including at least two apertures with different widths not greater than the wavelength of light from a light source. The shading member has a constant thickness that is set such that differences between light intensities directly below each of the apertures of different widths is 20% or less based on a largest light intensity of the light intensities directly below each of the apertures of different widths. A near-field light exposure apparatus includes a stage that holds the photomask, a light source, a sample table that holds a work substrate provided with a photoresist having a thickness that is less than the wavelength of exposure light, and a means for controlling the distance between the work substrate and the photomask.
摘要翻译：用于近场曝光的光掩模包括透明基板和在基板上的遮光构件，掩模图案包括不大于来自光源的光的波长的不同宽度的至少两个孔。遮光构件具有恒定的厚度，其被设定为使得在不同宽度的每个孔之下的每个孔下方的光强度之间的差异基于不同宽度的每个孔下面的光强度的最大光强度为20％或更小。近场曝光装置包括保持光掩模的台，光源，保持具有小于曝光光的波长的厚度的光致抗蚀剂的工作基板的样品台，以及用于控制工作基板和光掩模之间的距离。

79. 发明申请

US20060003269A1 Resist pattern forming method, substrate processing method, and device manufacturing method 审中-公开
标题翻译：抗蚀剂图案形成方法，基板处理方法和装置制造方法
公开(公告)号：US20060003269A1
公开(公告)日：2006-01-05
申请号：US11168422
申请日：2005-06-29
申请人： Toshiki Ito , Natsuhiko Mizutani , Takako Yamaguchi
发明人： Toshiki Ito , Natsuhiko Mizutani , Takako Yamaguchi
IPC分类号： G03F7/00
CPC分类号： G03F7/2014 , B82Y10/00 , G03F7/023 , G03F7/0382 , G03F7/0392
摘要： Disclosed is a pattern forming method for forming a resist pattern on a substrate to be processed. The method includes a resist layer forming step for forming a resist layer on the substrate, an exposure step for exposing the resist layer with near-field light, and a developing step for developing the exposed resist layer, wherein the resist layer is made of a resist material having an Y value calculated from a sensitivity curve, not less than 1.6.
摘要翻译：公开了一种用于在待处理的基板上形成抗蚀剂图案的图案形成方法。该方法包括用于在基板上形成抗蚀剂层的抗蚀剂层形成步骤，用近场光曝光抗蚀剂层的曝光步骤和用于显影曝光的抗蚀剂层的显影步骤，其中抗蚀剂层由具有由灵敏度曲线计算的Y值的抗蚀剂材料，不小于1.6。

80. 发明授权

US06448552B1 Gyro 失效
标题翻译：陀螺仪
公开(公告)号：US06448552B1
公开(公告)日：2002-09-10
申请号：US09524260
申请日：2000-03-14
申请人： Natsuhiko Mizutani , Takahiro Numai
发明人： Natsuhiko Mizutani , Takahiro Numai
IPC分类号： G01D534
CPC分类号： G01C19/66
摘要： A gyro comprises a ring resonator type laser, a vibration table for applying an oscillation to the laser, and a signal processor for processing an output signal from the laser. The signal processor determines the phase angle of the output signal from the amplitude of an oscillation cycle component of the vibration table and that of a higher harmonic component thereof.
摘要翻译：陀螺仪包括环形谐振器型激光器，用于向激光器施加振荡的振动台，以及用于处理来自激光器的输出信号的信号处理器。信号处理器根据振动台的振荡周期分量的振幅和其高次谐波分量的振幅来确定输出信号的相位角。

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