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    • 77. 发明授权
    • Fabrication of high-density trench DMOS using sidewall spacers
    • 使用侧壁间隔件制造高密度沟槽DMOS
    • US5904525A
    • 1999-05-18
    • US646593
    • 1996-05-08
    • Fwu-Iuan HshiehYueh-Se HoBosco LanJowei Dun
    • Fwu-Iuan HshiehYueh-Se HoBosco LanJowei Dun
    • H01L21/26H01L21/336H01L29/06H01L29/10H01L29/40H01L29/78H01L21/3205H01L21/4763
    • H01L29/7813H01L29/1095H01L29/404H01L29/0696Y10S148/126
    • A method for forming a trenched DMOS transistor with deep body regions that occupy minimal area on an epitaxial layer formed on a semiconductor substrate. A first oxide layer is formed over the epitaxial layer and patterned to define deep-body areas beneath which the deep body regions are to be formed. Next, diffusion-inhibiting regions of the first conductivity type are formed in each of the deep-body areas before forming a second oxide layer covering the deep-body areas and the remaining portion of the first oxide layer. Portions of the second oxide layer are then removed to expose the centers of the diffusion inhibiting regions, leaving the first oxide layer and oxide sidewall spacers from the second oxide layer to cover the peripheries of the diffusion-inhibiting regions. A deep-body diffusion of a second conductivity type is then performed, resulting in the formation of deep body regions in the epitaxial layer between the sidewall spacers. The peripheries of the diffusion-inhibiting regions covered by the remaining portions of the first and second oxide layers inhibit lateral diffusion of the deep body diffusions without significantly inhibiting diffusion depth.
    • 一种用于形成具有在半导体衬底上形成的外延层上占据最小面积的深体区的沟槽DMOS晶体管的方法。 第一氧化物层形成在外延层上并且被图案化以限定将在其下形成深体区域的深体区域。 接下来,在形成覆盖深体区域的第二氧化物层和第一氧化物层的剩余部分之前,在每个深体区域中形成第一导电类型的扩散抑制区域。 然后去除第二氧化物层的部分以暴露扩散抑制区域的中心,从第二氧化物层留下第一氧化物层和氧化物侧壁间隔物以覆盖扩散抑制区域的周边。 然后执行第二导电类型的深体扩散,导致在侧壁间隔件之间的外延层中形成深体区。 由第一和第二氧化物层的剩余部分覆盖的扩散抑制区域的周边阻止深体扩散的横向扩散,而不显着抑制扩散深度。
    • 79. 发明授权
    • Surface mount and flip chip technology for total integrated circuit
isolation
    • 表面贴装和倒装芯片技术,用于全集成电路隔离
    • US5757081A
    • 1998-05-26
    • US603512
    • 1996-02-20
    • Mike F. ChangKing OwyangFwu-Iuan HshiehYueh-Se HoJowei Dun
    • Mike F. ChangKing OwyangFwu-Iuan HshiehYueh-Se HoJowei Dun
    • H01L23/367H01L23/373H01L23/48
    • H01L23/3672H01L23/3738H01L2224/16H01L2224/73253H01L2924/01078H01L2924/01079H01L2924/1305H01L2924/13055H01L2924/14Y10S148/135Y10S438/928Y10S438/977
    • An integrated circuit chip has full trench dielectric isolation of each portion of the chip. Initially the chip substrate is of conventional thickness and has semiconductor devices formed in it. After etching trenches in the substrate and filling them with dielectric material, a heat sink cap is attached to the passivation layer on the substrate front side surface. The substrate backside surface is removed (by grinding or CMP) to expose the bottom portion of the trenches. This fully isolates each portion of the die and eliminates mechanical stresses at the trench bottoms. Thereafter drain or collector electrical contacts are provided on the substrate backside surface. In a flip chip version, frontside electrical contacts extend through the frontside passivation layer to the heat sink cap. In a surface mount version, vias are etched through the substrate, with surface mount posts formed on the vias, to contact the frontside electrical contacts and provide all electrical contacts on the substrate backside surface. The wafer is then scribed into die in both versions without need for further packaging.
    • 集成电路芯片具有芯片每个部分的全沟槽绝缘隔离。 最初,芯片基板具有常规的厚度并且在其中形成半导体器件。 在蚀刻衬底中的沟槽并用电介质材料填充沟槽之后,将散热器盖附着到衬底前侧表面上的钝化层。 通过研磨或CMP去除衬底背面以露出沟槽的底部。 这完全隔离了模具的每个部分,并消除了沟槽底部的机械应力。 此后,漏极或集电极电触点设置在基板背面上。 在倒装芯片版本中,前端电触点延伸穿过前侧钝化层到散热器盖。 在表面安装型式中,通孔穿过衬底被蚀刻,表面安装柱形成在通孔上,以接触前侧电触点并提供衬底背面上的所有电触头。 然后将晶片刻成两个版本的模具,无需进一步包装。