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71. 发明申请

US20050162632A1 Light application apparatus, crystallization apparatus and optical modulation element assembly 失效
标题翻译：光施加装置，结晶装置和光调制元件组件
公开(公告)号：US20050162632A1
公开(公告)日：2005-07-28
申请号：US11041832
申请日：2005-01-25
申请人： Yukio Taniguchi , Masakiyo Matsumura
发明人： Yukio Taniguchi , Masakiyo Matsumura
IPC分类号： G02F1/13 , G02F1/00 , G03B27/72 , H01L21/00
CPC分类号： G03B27/72
摘要： A light application apparatus includes an optical modulation element provided with a plurality of phase steps, a light beam which is entered into the optical modulation element being phase-modulated by the phase steps and exits from the optical modulation element as a light beam having a first light intensity distribution. An optical system is arranged between the optical modulation element and an predetermined plane. The optical system divides the phase-modulated light beam into at least two light fluxes having second and third light intensity distributions and different optical characteristics from each other, and projects a light beam including the divided two light fluxes, the light intensity distributions of the projected light fluxes being combined with each other, so that the projected light beam has a fourth light intensity distribution with an inverse peak shape on the predetermined plane and enters the predetermined plane. The first to fourth light intensity distributions are different from each other on the predetermined plane.
摘要翻译：一种光应用装置，包括具有多个相位步进的光调制元件，入射到光调制元件中的光束被相位步进相位调制并从光调制元件出射，作为具有第一光强分布。光学系统布置在光调制元件和预定平面之间。光学系统将相位调制光束分成具有第二和第三光强分布和不同光学特性的至少两个光束，并且投影包括分割的两个光束的光束，投影的光强度分布光束彼此组合，使得投影光束在预定平面上具有反向峰值形状的第四光强分布并进入预定平面。第一至第四光强分布在预定平面上彼此不同。

72. 发明授权

US07675663B2 Apparatus for producing a hologram mask 有权
标题翻译：用于制造全息掩模的装置
公开(公告)号：US07675663B2
公开(公告)日：2010-03-09
申请号：US11258333
申请日：2005-10-24
申请人： Yukio Taniguchi
发明人： Yukio Taniguchi
IPC分类号： G03H1/12
CPC分类号： G03F7/70408 , G03H1/0406 , G03H2001/0094
摘要： An apparatus for producing a hologram mask. The apparatus includes a first object light at least partially transmittable through a first original mask having a light transmitting screening pattern, and a first reference light having a first phase difference between it and the first object light. The first object and reference lights cause interference patterns to be recorded a hologram recording material, as do a second object light at least partially transmittable through a second original mask having a light transmitting screening pattern, and a second reference light having a second phase difference between it and the second object light where the second phase difference is not the same as the first phase difference. The resulting first and second original mask images recorded in the hologram recording material can be simultaneously replayed to produce an exposed pattern approximating an exposed pattern of a non-holographic phase shifting photomask.
摘要翻译：一种用于制造全息掩模的装置。该装置包括可通过具有透光屏蔽图案的第一原始掩模至少部分透射的第一物体光，以及在其与第一物体光之间具有第一相位差的第一参考光。第一对象和参考光使得能够记录全息记录材料的干涉图案，以及通过具有透光屏蔽图案的第二原始掩模至少部分透射的第二对象光，以及具有第二相位差的第二参考光，它和第二对象光，其中第二相位差不同于第一相位差。可以同时重放记录在全息记录材料中的所得到的第一和第二原始掩模图像，以产生接近非全息相移光掩模的曝光图案的曝光图案。

73. 发明授权

US07608369B2 Photomask to which phase shift is applied and exposure apparatus 失效
标题翻译：应用相移的光掩模和曝光装置
公开(公告)号：US07608369B2
公开(公告)日：2009-10-27
申请号：US11372075
申请日：2006-03-10
申请人： Yukio Taniguchi
发明人： Yukio Taniguchi
IPC分类号： G03F1/00
CPC分类号： G03F1/30 , G03F1/32 , G03F1/38
摘要： A problem of a decrease in transmissive light, which partly occurs at a boundary between two polarization modulation regions of a polarized phase shift mask, is solved. A photomask for use in an exposure apparatus which forms an exposure pattern by illumination includes at least two polarization modulation regions which produce mutually incoherent polarized light components and adjoin each other, at least two phase modulation regions which impart a phase difference of 180° and adjoin each other, and amplitude modulation regions which decrease transmittance. A contact line between the polarization modulation regions and a contact line between the phase modulation regions are located at a corresponding position, and the amplitude modulation regions are provided on both sides of the common contact line, with a predetermined distance from the common contact line.
摘要翻译：解决了偏振相移掩模的两个偏振调制区域之间的边界部分地发生的透射光减少的问题。用于通过照明形成曝光图案的曝光装置的光掩模包括产生相互非相干偏振光分量并相互邻接的至少两个偏振调制区域，至少两个赋予相位差为180°并相邻的相位调制区域彼此以及降低透射率的幅度调制区域。偏振调制区域和相位调制区域之间的接触线之间的接触线位于相应位置处，并且幅度调制区域设置在公共接触线的两侧，距离公共接触线具有预定的距离。

74. 发明申请

US20070115522A1 HOLOGRAM RECORDING SHEET, HOLOGRAPHIC OPTICAL ELEMENT USING SAID SHEET, AND ITS PRODUCTION PROCESS 失效
标题翻译： HOLOGRAM记录表，使用说明书的全息光学元件及其生产过程
公开(公告)号：US20070115522A1
公开(公告)日：2007-05-24
申请号：US11622859
申请日：2007-01-12
申请人： Kenji Ueda , Tsuyoshi Hotta , Yukio Taniguchi , Atsushi Sekiguchi , Hideyuki Iriyama
发明人： Kenji Ueda , Tsuyoshi Hotta , Yukio Taniguchi , Atsushi Sekiguchi , Hideyuki Iriyama
IPC分类号： G02B5/32
CPC分类号： G03H1/26 , G02B5/32 , G03H1/0236 , G03H1/18 , G03H1/24 , G03H2001/0439 , G03H2001/186 , G03H2001/2263 , G03H2001/2271 , G03H2001/263 , G03H2001/266 , G03H2001/303 , G03H2222/16 , G03H2223/18 , G03H2230/10 , G03H2250/34 , G03H2250/44 , G03H2260/12 , G03H2270/23
摘要： The hologram recording sheet according to the invention is made up of a base film and hologram sensitive materials sensitive to different wavelength regions formed therein in a desired pattern, or a film and at least two hologram recording sensitive materials sensitive to different wavelength regions laminated on the film with a transparent plastic spacer layer located therebetween, thereby enabling the required diffraction light wavelengths to be recorded on the required sites without producing unnecessary interference fringes. At least two hologram recording sensitive materials sensitive to different wavelength regions are formed on different sites on a film in dotted or striped configuration, the size of which is up to 200 mm or at least twice as large as the thickness of the sensitive material layers, thereby enabling regions diffracting light of different wavelengths to be formed in the form of independent sets of interference fringes.
摘要翻译：根据本发明的全息记录片材由基片和全息图敏感材料构成，所述基片和全息图敏感材料以所需图案形成在其中形成的不同波长区域，或薄膜和至少两个对不同波长区域敏感的全息图记录敏感材料，薄膜具有位于其间的透明塑料间隔层，从而使所需的衍射光波长能够记录在所需位置上，而不产生不必要的干涉条纹。至少两个对不同波长区域敏感的全息图记录敏感材料形成在薄膜上的不同位置上，点状或条纹形状，其尺寸高达200mm或至少是敏感材料层厚度的两倍，从而能够以不同的干涉条纹的形式形成衍射不同波长的光的区域。

75. 发明授权

US07156091B2 Oral airway and airway management assistive device provided with the oral airway 失效
标题翻译：口腔气道和气道管理辅助装置配备口腔气道
公开(公告)号：US07156091B2
公开(公告)日：2007-01-02
申请号：US10985935
申请日：2004-11-12
申请人： Junichi Koyama , Kei Jin Shu , Takao Nawakura , Yukio Taniguchi
发明人： Junichi Koyama , Kei Jin Shu , Takao Nawakura , Yukio Taniguchi
IPC分类号： A61M16/00
CPC分类号： A61B1/267 , A61B1/00052 , A61B1/0676 , A61B1/0684 , A61M16/04
摘要： An oral airway, which is used by being inserted into the mouth of a patient who is suffering from unconsciousness or has lost consciousness to secure an airway of the patient, is adapted to be used with a tube to be inserted into the trachea of the patient through the mouth thereof. The oral air way includes a main body, and an insertion part provided on the main body. The insertion part is adapted to be inserted into the trachea of the patient through the mouth thereof so that an appropriate portion of the insertion part at the side of the distal end thereof comes into contact with the root of the tongue of the patient to secure the airway of the patient. The insertion part includes a guide groove for guiding the tube when the tube is inserted into the trachea of the patient, and the guide groove has a structure from which the tube can be separated after the distal end of the tube has been inserted into the trachea of the patient.
摘要翻译：通过插入患有无意识或失去意识以确保患者气道的患者的口中使用的口腔气道适于与待插入患者气管的管一起使用通过它的嘴。口腔空气方式包括主体和设置在主体上的插入部。插入部适于通过其口插入到患者的气管中，使得其远端侧的插入部分的适当部分与患者舌头的根部接触以固定病人气道。插入部包括用于在将管插入患者的气管中时引导管的引导槽，并且引导槽具有在管的远端已经插入气管之后可以从该管分离的结构的病人。

76. 发明申请

US20050190352A1 Method and apparatus for forming pattern on thin substrate or the like 有权
标题翻译：在薄基板等上形成图案的方法和装置
公开(公告)号：US20050190352A1
公开(公告)日：2005-09-01
申请号：US11118479
申请日：2005-05-02
申请人： Yukio Taniguchi , Hirotaka Yamaguchi , Susumu Tsujikawa
发明人： Yukio Taniguchi , Hirotaka Yamaguchi , Susumu Tsujikawa
IPC分类号： H01L21/027 , G03F7/20 , G03B27/42
CPC分类号： G03F7/70783 , G03F7/70791
摘要： A substrate processing apparatus of the present invention has a retaining base which retains a substrate, a device detecting undulation or thickness unevenness, and a control device which operates the detecting device. The substrate is deformed in a range of a field to be processed, by locally displacing the retaining base on the basis of the detected undulation or thickness unevenness of the substrate. Blurring of an image formed on the substrate can be thereby prevented.
摘要翻译：本发明的基板处理装置具有保持基板的保持基座，检测波动或厚度不均匀的装置以及操作检测装置的控制装置。通过基于检测到的基板的起伏或厚度不均匀性，局部地移动保持基板，使基板在待加工的场的范围内变形。因此可以防止形成在基板上的图像的模糊。

77. 发明申请

US20050179885A1 Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, device, and light modulation element 有权
标题翻译：光照射装置，光照射法，结晶装置，结晶方法，装置和光调制元件
公开(公告)号：US20050179885A1
公开(公告)日：2005-08-18
申请号：US11051189
申请日：2005-02-07
申请人： Yukio Taniguchi
发明人： Yukio Taniguchi
IPC分类号： B23K26/00 , B23K26/06 , B23K26/073 , B23K26/08 , G02F1/00 , G02F1/133 , G03B27/54 , G03F7/20 , H01L21/00 , H01L21/20 , H01L21/324 , H01L21/77
CPC分类号： H01L21/02678 , B23K26/066 , B23K26/073 , B23K26/08 , H01L21/2026 , H01L27/1285 , H01L27/1296
摘要： A light irradiation apparatus includes a light modulation element which modulates a phase of an incident light beam to obtain a V-shaped light intensity distribution having a bottom portion of a minimum light intensity, and an image formation optical system which applies the modulated light beam from the light modulation element to an irradiation target surface in such a manner that the V-shaped light intensity distribution is provided on the irradiation target surface. The light modulation element has such a complex amplitude transmittance distribution that a secondary derivative of a phase value of a complex amplitude distribution becomes substantially zero at the bottom portion of the V-shaped light intensity distribution in an image space of the image formation optical system.
摘要翻译：光照射装置包括光调制元件，其调制入射光束的相位以获得具有最小光强度的底部的V形光强分布;以及图像形成光学系统，其施加来自光调制元件以照射目标表面上的V形光强度分布的方式照射到照射目标表面。光调制元件具有这样的复振幅透射率分布，使得复数振幅分布的相位值的二次导数在图像形成光学系统的图像空间中的V形光强度分布的底部处变为基本为零。

78. 发明授权

US07927421B2 Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, and semiconductor device 有权
标题翻译：光照射装置，光照射法，结晶装置，结晶法和半导体装置
公开(公告)号：US07927421B2
公开(公告)日：2011-04-19
申请号：US11687113
申请日：2007-03-16
申请人： Yukio Taniguchi
发明人： Yukio Taniguchi
IPC分类号： C30B1/02
CPC分类号： C30B13/24 , Y10T117/10 , Y10T117/1008
摘要： A light irradiation apparatus irradiates a target plane with light having a predetermined light intensity distribution. The apparatus includes a light modulation element having a light modulation pattern of a periodic structure represented by a primitive translation vector (a1, a2), an illumination system for illuminating the modulation element with the light, and an image forming optical system for forming the predetermined light intensity distribution obtained by the modulation pattern on the target plane. A shape of an exit pupil of the illumination system is similar to the Wigner-Seitz cell of a primitive reciprocal lattice vector (b1, b2) obtained from the primitive translation vector (a1, a2) by the following equations: b1=2π(a2×a3)/(a1·(a2×a3)) and b2=2π(a3×a1)/(a1·(a2×a3)) in which a3 is a vector having an arbitrary size in a normal direction of a flat surface of the modulation pattern of the modulation element, “·” is an inner product of the vector, and “×” is an outer product of the vector.
摘要翻译：光照射装置用具有预定光强度分布的光照射目标平面。该装置包括具有由原始平移向量（a1，a2）表示的周期性结构的光调制图案的光调制元件，用于用光照亮调制元件的照明系统，以及用于形成预定的通过目标平面上的调制图案获得的光强度分布。照明系统的出射光瞳的形状类似于通过以下等式从原始平移向量（a1，a2）获得的原始互逆格子向量（b1，b2）的Wigner-Seitz单元：b1 = 2＆pgr a2×a3）/（a1·（a2×a3））和b2 = 2＆pgr（a3×a1）/（a1·（a2×a3）），其中a3是在调制元件的调制图案的平坦面，“·”是矢量的内积，“×”是矢量的外积。

79. 发明授权

US07813022B2 Light irradiation apparatus, light irradiation method, crystallization apparatus, crystallization method, device, and light modulation element 有权
标题翻译：光照射装置，光照射法，结晶装置，结晶方法，装置和光调制元件
公开(公告)号：US07813022B2
公开(公告)日：2010-10-12
申请号：US11785314
申请日：2007-04-17
申请人： Yukio Taniguchi
发明人： Yukio Taniguchi
IPC分类号： G02B26/00
CPC分类号： H01L21/02678 , B23K26/066 , B23K26/073 , B23K26/08 , H01L21/2026 , H01L27/1285 , H01L27/1296
摘要： A light irradiation apparatus includes a light modulation element which modulates a phase of an incident light beam to obtain a V-shaped light intensity distribution having a bottom portion of a minimum light intensity, and an image formation optical system which applies the modulated light beam from the light modulation element to an irradiation target surface in such a manner that the V-shaped light intensity distribution is provided on the irradiation target surface. The light modulation element has such a complex amplitude transmittance distribution that a secondary derivative of a phase value of a complex amplitude distribution becomes substantially zero at the bottom portion of the V-shaped light intensity distribution in an image space of the image formation optical system.
摘要翻译：光照射装置包括光调制元件，其调制入射光束的相位以获得具有最小光强度的底部的V形光强分布;以及图像形成光学系统，其施加来自光调制元件以照射目标表面上的V形光强度分布的方式照射到照射目标表面。光调制元件具有这样的复振幅透射率分布，使得复数振幅分布的相位值的二次导数在图像形成光学系统的图像空间中的V形光强度分布的底部处变为基本为零。

80. 发明申请

US20090009751A1 ABERRATION MEASUREMENT APPARATUS AND ABERRATION MEASUREMENT METHOD 失效
标题翻译： ABERRATION测量设备和测量方法
公开(公告)号：US20090009751A1
公开(公告)日：2009-01-08
申请号：US12043657
申请日：2008-03-06
申请人： Yukio Taniguchi
发明人： Yukio Taniguchi
IPC分类号： G01J1/00
CPC分类号： G01M11/0264 , G01M11/0257
摘要： An aberration measurement apparatus measures the aberration of an imaging optical system. The apparatus includes an illumination system, a separation member, and a measurement unit. The illumination system supplies the imaging optical system with measurement light used to measure an aberration of the imaging optical system and background light different from the measurement light. The separation member separates the measurement light and the background light which have passed through the imaging optical system. The measurement unit measures the aberration of the imaging optical system on the basis of the measurement light separated by the separation member.
摘要翻译：像差测量装置测量成像光学系统的像差。该装置包括照明系统，分离构件和测量单元。照明系统向成像光学系统提供用于测量成像光学系统的像差和与测量光不同的背景光的测量光。分离构件分离已经通过成像光学系统的测量光和背景光。测量单元基于由分离构件分离的测量光来测量成像光学系统的像差。

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