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71. 发明专利

JPS6231174A FIELD EFFECT TRANSISTOR 失效
公开(公告)号：JPS6231174A
公开(公告)日：1987-02-10
申请号：JP17134185
申请日：1985-08-02
申请人： MITSUBISHI ELECTRIC CORP
发明人： TSUMURA AKIRA , TSUNODA MAKOTO , HIZUKA YUJI , ANDO TORAHIKO
IPC分类号： H01L51/05 , H01L27/12 , H01L29/78 , H01L29/786 , H01L51/30
摘要： PURPOSE:To obtain an element with a low cost, a long life and excellent electrical characteristics by employing a pi-conjugated system polymer film which has a composition shown by formula I (wherein R and R' denote radicals such as H or CH3 and R'' denotes a radical such as H or phenyl). CONSTITUTION:A pi-conjugated system polymer film 4, which has a composition shown by formula I (wherein R and R' denote H, CH3, OCH3, C2H5 or OC2H5 and R'' denotes H, CH3, C2H5 or phenyl radical), and which has ohmic contact with both of a source electrode 5 and a drain electrode 6, is formed on an insulation film 3 and the source electrode 5 and the drain electrode 6. As this polymer film 4 is economical as an organic semiconductor and has excellent stability in the air, an FET with excellent electrical characteristics can be obtained.

72. 发明专利

JPS61202469A FIELD EFFECT TRANSISTOR AND MANUFACTURE THEREOF 失效
公开(公告)号：JPS61202469A
公开(公告)日：1986-09-08
申请号：JP4506685
申请日：1985-03-05
申请人： MITSUBISHI ELECTRIC CORP
发明人： TSUMURA AKIRA , TSUNODA MAKOTO , HIZUKA YUJI , ANDO TORAHIKO
IPC分类号： H01L51/05 , H01L29/78 , H01L29/786 , H01L51/30
摘要： PURPOSE:To readily manufacture an inexpensive element having excellent stability by dissolving a starter in deionized water to dip an intermediate member formed with an electrode and an insulating film in sufficiently degassed solution, and adding N-methylpyrrole in the solution. CONSTITUTION:A gate electrode 2 is provided on one side of a substrate 1, an insulating film 3 is formed on the substrate 1 and the electrode 2, source and drain electrodes 5, 6 are formed separately on the film 3 to form an intermediate member. Ferric chloride is dissolved as a starter in deionized water, N- methylpyrrole is added to sufficiently degassed solution, the intermediate member is dipped in the solution to form a polymer film 4 of the N-methylpyrrole on the substrate 1.

73. 发明专利

JPS6129591A Thermal recording method 失效
标题翻译：热记录方法
公开(公告)号：JPS6129591A
公开(公告)日：1986-02-10
申请号：JP15150984
申请日：1984-07-19
申请人： Mitsubishi Electric Corp
发明人： ENMANJI KIMIE , ANDO TORAHIKO
IPC分类号： B41M5/382 , B41M5/26 , B41M5/41 , B41M5/50 , B41M5/52
CPC分类号： B41M5/41
摘要： PURPOSE:To obtain a thermal recording method which enables easy image fixing and provides high image stability and sensitivity by heating a thermal recording body consisting of a nitrocellulose support and a double-chain DNA which is impregnated in the former, changing said DNA to a single-chain DNA and dying this DNA. CONSTITUTION:Moisture-absorbing agent containing H2O, double-chain DNA and Cu are impregnated into a porous nitrocellulose support having 0.1-10mum mircopores, thus preparing a thermal recording medium. Copper chloride or copper sulfate is used as Cu and 0.4-1.0mol of Cu is added to 1mol of phosphorous acid of DNA. In addition, H2O is contained in a moisture-absorbing agent e.g. lithium chloride and calcium bromide and 0.1-10pts.wt. of said agent are used for DNA and Cu . This recording medium is to be heated and DNA of the heated part to be changed to a single-chain DNA. Then this DNA is to be adsorbed into the nitrocellulose support and the support to be water-washed to wash out double-chain DNA. Next, the support is to be immersed into a 0.01- 5% ethydium bromide solution to dye single-chain DNA and fix the dye.
摘要翻译：目的：为了获得能够容易地进行图像定影并通过加热由硝酸纤维素载体和浸渍在前者中的双链DNA构成的热记录体而提供高图像稳定性和灵敏度的热记录方法，将所述DNA变为单一链DNA并染死DNA。构成：将含有H 2 O，双链DNA和Cu 2+的吸湿剂浸渍在具有0.1-10mum微孔的多孔硝酸纤维素载体中，从而制备热敏记录介质。使用氯化铜或硫酸铜作为Cu 2+，向1mol的磷酸中加入0.4-1.0mol的Cu 2+。此外，H 2 O包含在吸湿剂中。氯化锂和溴化钙和0.1-10pts.wt。的所述试剂用于DNA和Cu 2+。将该记录介质加热，加热部分的DNA变为单链DNA。然后将该DNA吸附到硝酸纤维素载体中，并将待水洗的载体洗脱出双链DNA。接下来，将载体浸入0.01-5％的溴化乙锭溶液中以染色单链DNA并固定染料。

74. 发明专利

JPS6125885A Thermal recording medium 失效
标题翻译：热记录介质
公开(公告)号：JPS6125885A
公开(公告)日：1986-02-04
申请号：JP14901984
申请日：1984-07-16
申请人： Mitsubishi Electric Corp
发明人： ENMANJI KIMIE , ANDO TORAHIKO
IPC分类号： B41M5/337 , B41M5/30 , B41M5/18
CPC分类号： B41M5/30
摘要： PURPOSE:To prevent light fading from occurring and enhance light resistance of recorded images, by using a water-soluble resin material containing a colorless dye, an acidic material and a water-soluble antioxidant. CONSTITUTION:A water-soluble resin material 5 containing a colorless dye 1, an acidic material 2 and a water-soluble antioxidant is applied to a base 4. When the recording medium thus obtained is selectively heated, the dye 1 and the acidic material 2 are melted, are mixed with each other, and the dye 1 undergoes a chemical reaction to be a water-soluble basic dye. When the basic dye is exposed to light, singlet oxygen capable of fading the color of the dye is generated. However, since the antioxidant is present, singlet oxygen thus generated is quenched, and the fading is prevented from occurring. The antioxidant may be, for example, a clathrate compund of tocophenol included in cyclodextrin.
摘要翻译：目的：通过使用含有无色染料，酸性物质和水溶性抗氧化剂的水溶性树脂材料，防止发生光褪色，提高记录图像的耐光性。构成：将含有无色染料1，酸性物质2和水溶性抗氧化剂的水溶性树脂材料5施加到基材4上。当选择性地加热这样得到的记录介质时，染料1和酸性物质2 熔融，彼此混合，染料1发生化学反应，成为水溶性碱性染料。当碱性染料暴露于光时，产生能够褪色染料颜色的单线态氧。然而，由于存在抗氧化剂，因此产生的单线态氧被淬灭，并且防止发生褪色。抗氧化剂可以是例如包含在环糊精中的包合物组合物。

75. 发明专利

JP2566576B2 失效
公开(公告)号：JP2566576B2
公开(公告)日：1996-12-25
申请号：JP13718687
申请日：1987-05-29
申请人： MITSUBISHI ELECTRIC CORP
发明人： KURATA TETSUYUKI , TSUNODA MAKOTO , HIZUKA JUJI , ANDO TORAHIKO
IPC分类号： G01J3/02 , G01J3/50 , H01L27/14 , H01L27/146 , H01L31/08 , H01L31/10 , H01L51/10 , H01L51/42

76. 发明专利

JPH0555073B2 失效
公开(公告)号：JPH0555073B2
公开(公告)日：1993-08-16
申请号：JP6052687
申请日：1987-03-16
申请人： MITSUBISHI ELECTRIC CORP
发明人： KUBOTA SHIGERU , YANAGIURA SATOSHI , MASUI KATSUE , MORIWAKI NORIMOTO , ANDO TORAHIKO
IPC分类号： C08G59/14 , C08G59/00 , C08G59/16 , C08G59/17 , C08G59/18 , C08G59/40 , G03F7/027 , G03F7/028 , G03F7/038 , H05K3/18 , H05K3/06

77. 发明专利

JPH0482063B2 失效
公开(公告)号：JPH0482063B2
公开(公告)日：1992-12-25
申请号：JP28680685
申请日：1985-12-18
申请人： MITSUBISHI ELECTRIC CORP
发明人： KURATA TETSUYUKI , TSUNODA MAKOTO , HIZUKA JUJI , ANDO TORAHIKO
IPC分类号： H01L27/146 , H01L27/14 , H01L31/08 , H01L51/42

78. 发明专利

JPH0426556B2 失效
公开(公告)号：JPH0426556B2
公开(公告)日：1992-05-07
申请号：JP3693585
申请日：1985-02-26
申请人： MITSUBISHI ELECTRIC CORP
发明人： ENMANJI KIMIE , TAKAHASHI KENZO , ANDO TORAHIKO
IPC分类号： H01S3/113 , H01S3/20 , H01S3/213

79. 发明专利

JPH0159571B2 失效
公开(公告)号：JPH0159571B2
公开(公告)日：1989-12-18
申请号：JP14610783
申请日：1983-08-09
申请人： MITSUBISHI ELECTRIC CORP
发明人： KUBOTA SHIGERU , MORIWAKI NORIMOTO , ANDO TORAHIKO , ETO SHOHEI
IPC分类号： G03F7/004 , C08G73/10 , C08G73/12 , G03C1/72 , G03F7/038 , G03F7/039

80. 发明专利

JPH01144044A POSITIVE TYPE PHOTORESIST MATERIAL 失效
公开(公告)号：JPH01144044A
公开(公告)日：1989-06-06
申请号：JP30368487
申请日：1987-11-30
申请人： MITSUBISHI ELECTRIC CORP
发明人： YANAGIURA SATOSHI , MORIWAKI NORIMOTO , ANDO TORAHIKO
IPC分类号： G03C1/72 , G03F7/075
摘要： PURPOSE:To obtain the high sensitivity and resolution and the excellent resistance to O2RIE of the title material by incorporating a polymer having Si-O-C bond in the main chain of the polymer, and a polysulfone in the photoresist material. CONSTITUTION:The positive type photoresist material contains the polymer (the silylether polymer) having the Si-O-C bond in the main chain of the polymer, and the polysulfone. The polysulfone contd. in the components of the resist material is decomposed by irradiation of light or radiant rays, thereby enabling the polymer to be soluble in a developer, resulting in the formation of a positive type pattern. Thus, the high sensitivity of the resist material against the light and the radiant rays is obtd., and the excellent resolution and resistance to O2RIE of the resist material is obtd., and the resist material is suitable for use in a two layer resist process using an O2RIE.

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