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    • 74. 发明授权
    • Substrate exposure apparatus and illumination apparatus
    • 基板曝光装置和照明装置
    • US07755741B2
    • 2010-07-13
    • US11839863
    • 2007-08-16
    • Yoshitada OshidaKazuo Kobayashi
    • Yoshitada OshidaKazuo Kobayashi
    • G03B27/54G03B27/52G03B27/72
    • G03F7/70291G03F7/70066G03F7/70075
    • An illumination apparatus and an exposure apparatus that achieves higher quality exposure to light and higher operating speed even where the ratio Hx/Hy between the transverse dimension Hx and the longitudinal dimension Hy of the plane of optical modulation of a two-dimensional optical space modulator is 1.5 or above, for instance, are to be provided. The focal distance fx in an x-direction and the focal distance fy in a y-direction of a second optical system that guides light emitted from an integrator to a two-dimensional optical space modulator are made different, in a ratio of fx/fy=1.6, for instance. In this way, the number of rod lenses in the integrator can be made equal between transverse and longitudinal directions and the value of Hx/Hy can be made 2.5 by bringing the aspect ratio dx:dy of rod lenses to 1.6:1, close to 1.
    • 即使二维光学空间调制器的光学调制平面的横向尺寸Hx与纵向尺寸Hy之间的比率Hx / Hy为 例如提供1.5或以上。 将从积分器发射的光引导到二维光学空间调制器的第二光学系统的沿x方向的焦距fx和y方向的焦距fy被制成不同的fx / fy = 1.6,例如。 以这种方式,积分器中的棒状透镜的数量可以在横向和纵向方向上相等,并且通过将棒透镜的纵横比dx:dy设置为1.6:1,可以使得Hx / Hy的值为2.5 1。