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    • 72. 发明授权
    • Process for design and manufacture of fine line circuits on planarized thin film dielectrics and circuits manufactured thereby
    • 在平面化薄膜电介质和由此制造的电路上设计和制造细线电路的方法
    • US06290860B1
    • 2001-09-18
    • US09283679
    • 1999-04-01
    • Bernd K. AppeltJohn M. LaufferVoya R. MarkovichIrving MemisDavid J. Russell
    • Bernd K. AppeltJohn M. LaufferVoya R. MarkovichIrving MemisDavid J. Russell
    • H01B1300
    • H05K3/4652H05K3/0023H05K3/0035H05K2203/0508H05K2203/0554
    • A circuit board having a structure including a permanent photoimageable dielectric material suitable for fabrication of vias both by laser ablation, plasma ablation, or mechanical drilling techniques and by photoimaging techniques. A process is also disclosed for the manufacture of a multi-level circuit on a substrate having a first-level circuitry pattern on at least one side. The process comprises applying a permanent photoimageable dielectric over the first-level circuitry pattern; exposing the permanent photoimageable dielectric to radiation; laminating a conductive metal layer to the dielectric; making holes in the conductive metal layer and dielectric by mechanical drilling or by laser or plasma ablation; and making a second-level circuitry pattern and filling the holes with a conductive material to electrically connect the first and second layers of circuitry. A further process is claimed for designing a multi-level circuit board product comprising making a prototype having the above structure in which the holes are manufactured by mechanical drilling or by laser or plasma ablation, evaluating the prototype, and then manufacturing a commercial circuit board having essentially the same structure and materials of construction as the prototype, but wherein the holes are manufactured by photoimaging techniques.
    • 一种电路板,其结构包括适用于通过激光烧蚀,等离子体消融或机械钻孔技术制造通孔的永久可光成像介电材料,以及通过光成像技术。 还公开了一种用于在至少一侧具有第一级电路图案的衬底上制造多电平电路的工艺。 该过程包括在第一级电路图案上施加永久可光成像电介质; 将永久可光成像电介质暴露于辐射; 将导电金属层层叠到电介质上; 通过机械钻孔或通过激光或等离子体消融在导电金属层和电介质中形成孔; 以及制作二级电路图案,并用导电材料填充所述孔,以电连接所述第一和第二层电路。 要求设计多级电路板产品的另一方法包括制造具有上述结构的原型,其中通过机械钻孔或通过激光或等离子体烧蚀制造孔,评估原型,然后制造商业电路板,其具有 基本上与原型相同的结构和结构材料,但是其中孔通过光成像技术制造。
    • 76. 发明申请
    • Photosensitive dielectric film
    • 感光电介质膜
    • US20110017498A1
    • 2011-01-27
    • US12460975
    • 2009-07-27
    • John M. LaufferVoya R. MarkovichKostas I. Papathomas
    • John M. LaufferVoya R. MarkovichKostas I. Papathomas
    • H05K1/09C08J3/28B05D5/12
    • H05K3/4676H05K3/0023H05K2201/0209
    • A photosensitive dielectric composition adapted for forming a dielectric film layer for use in a circuitized substrate is provided according to one embodiment of the invention, the composition including an epoxide bearing component including at least one polyepoxide resin curable by electromagnetic radiation, a cyanate ester, a flexibilizer, a nanostructured toughener, a photoinitiator in a predetermined amount by weight of the resin component, and a ceramic filler, the photosensitive dielectric composition forming the dielectric film layer having no solvent therein. In an alternative embodiment, a heat activated dielectric composition is provided which is curable by heat and includes an epoxide bearing component including at least one polyepoxide resin curable by heat, a cyanate ester, a flexibilizer, a nanostructured toughener, a heat activated curing agent for accelerating reaction of the cyanate ester and polyepoxide resin components, and a ceramic filler. Methods of making circuitized substrates from the above compositions are also provided.
    • 根据本发明的一个实施方案提供一种适用于形成用于电路化基底的电介质膜层的光敏电介质组合物,该组合物包括含环氧化物的组分,该组分包括至少一种可通过电磁辐射固化的聚环氧树脂,氰酸酯, 增韧剂,纳米结构增韧剂,预定量的树脂组分的光引发剂和陶瓷填料,所述光敏介电组合物形成在其中不溶剂的电介质膜层。 在另一个实施方案中,提供热活化电介质组合物,其可通过加热固化,并且包括含环氧化物的组分,其包含至少一种可热固化的聚环氧树脂,氰酸酯,增韧剂,纳米结构增韧剂,热活化固化剂 加速氰酸酯和聚环氧树脂组分的反应,以及陶瓷填料。 还提供了从上述组合物制备电路化基底的方法。
    • 78. 发明申请
    • Method of making a circuitized substrate having at least one capacitor therein
    • 制造其中具有至少一个电容器的电路化基板的方法
    • US20080248596A1
    • 2008-10-09
    • US11878673
    • 2007-07-26
    • Rabindra N. DasFrank D. EgittoHow T. LinJohn M. LaufferVoya R. Markovich
    • Rabindra N. DasFrank D. EgittoHow T. LinJohn M. LaufferVoya R. Markovich
    • H01L21/77
    • H01G4/206H01G4/232H01G4/33H05K1/162H05K3/0032H05K3/107H05K2201/0209H05K2201/0257H05K2201/09236H05K2201/09309H05K2201/09881H05K2203/0108H05K2203/066
    • A method of making a circuitized substrate which includes at least one and possibly several capacitors as part thereof. In one embodiment, the substrate is produced by forming a layer of capacitive dielectric material on a dielectric layer and thereafter forming channels with the capacitive material, e.g., using a laser. The channels are then filled with conductive material, e.g., copper, using selected deposition techniques, e.g., sputtering, electro-less plating and electroplating. A second dielectric layer is then formed atop the capacitor and a capacitor “core” results. This “core” may then be combined with other dielectric and conductive layers to form a larger, multilayered PCB or chip carrier. In an alternative approach, the capacitive dielectric material may be photo-imageable, with the channels being formed using conventional exposure and development processing known in the art. In still another embodiment, at least two spaced-apart conductors may be formed within a metal layer deposited on a dielectric layer, these conductors defining a channel there-between. The capacitive dielectric material may then be deposited (e.g., using lamination) within the channels.
    • 一种制造电路化衬底的方法,其包括至少一个可能的几个电容器作为其一部分。 在一个实施例中,通过在电介质层上形成电容电介质材料层,然后用电容材料形成通道,例如使用激光来制造衬底。 然后使用所选择的沉积技术,例如溅射,无电镀和电镀,用导电材料(例如铜)填充通道。 然后在电容器顶部形成第二电介质层,并产生电容器“芯”。 然后,该“芯”可以与其它电介质层和导电层组合以形成较大的多层PCB或芯片载体。 在替代方法中,电容介电材料可以是可光成像的,其中通道是使用本领域已知的常规曝光和显影处理形成的。 在另一个实施例中,可以在沉积在电介质层上的金属层内形成至少两个间隔开的导体,这些导体在其间限定通道。 然后可以在通道内沉积(例如,使用层压)的电容电介质材料。