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71. 发明授权

US07375796B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07375796B2
公开(公告)日：2008-05-20
申请号：US11092964
申请日：2005-03-30
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogedam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogedam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F9/7096 , G03F7/70341
摘要： An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.
摘要翻译：公开了一种浸没式光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充投影系统的最终元件和基板台之间的空间与第一液体，以及测量系统，其被配置为测量每个多个点在基板上，测量系统布置成使得通过第二液体进行测量，第二液体不由液体供应系统供应。

72. 发明授权

US07110081B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07110081B2
公开(公告)日：2006-09-19
申请号：US10831370
申请日：2004-04-26
申请人： Christian Alexander Hoogendam , Sjoerd Nicolaas Lambertus Donders , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Alexander Straaijer , Bob Streefkerk
发明人： Christian Alexander Hoogendam , Sjoerd Nicolaas Lambertus Donders , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.
摘要翻译：在光刻投影设备中，提供了一种液体供应系统，其包括至少部分地限定投影系统和基板之间的空间的容器，该容器在其中具有可选择的可开启和关闭的孔，以及关闭构造成选择性地关闭和打开光圈。在一个实施例中，快门可以包括位于快门面向孔的表面中的通道和/或当连接到液体供应系统时活门可以从液体供应系统移位。此外，在光刻设备中，提供了一种液体供应系统，其配置为在投影系统和基板之间的空间中提供待投射的光束的液体，以及被配置为控制对投影系统的应用的控制器与由液体供给系统的构件产生的重量传递有关的力。

73. 发明授权

US09013672B2 Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method 有权
标题翻译：清洁装置，光刻设备和光刻设备清洁方法
公开(公告)号：US09013672B2
公开(公告)日：2015-04-21
申请号：US11819949
申请日：2007-06-29
申请人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
发明人： Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marius Beeren , Kornelis Tijmen Hoekerd
IPC分类号： G03F7/20 , B08B3/12
CPC分类号： G03F7/70925 , B08B3/12 , G03F7/70341
摘要： An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.
摘要翻译：公开了一种具有构造成清洁表面的兆声传感器的浸没式光刻投影设备和使用超声波通过液体清洁浸没式光刻投影设备的表面的方法。在液体中诱导流动，期望地是径向流动。

74. 发明授权

US08817227B2 Immersion lithography apparatus 有权
标题翻译：浸渍光刻设备
公开(公告)号：US08817227B2
公开(公告)日：2014-08-26
申请号：US12285432
申请日：2008-10-03
申请人： Marco Koert Stavenga , Hans Jansen
发明人： Marco Koert Stavenga , Hans Jansen
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/7085 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that includes a detector to measure a distance between a substrate support structure and/or a substrate and a fluid handling system and/or to detect when an item is present between the fluid handling system and a top surface of the substrate and/or substrate support structure. The detector may use information of an electrical property of the fluid provided by the fluid handling system to measure the distance. The detector may measure variation in resistance and/or in capacitance between an electrode of the fluid handling system and an electrode of the substrate and/or substrate support structure.
摘要翻译：公开了一种浸没式光刻设备，其包括用于测量衬底支撑结构和/或衬底与流体处理系统之间的距离的检测器和/或检测在流体处理系统和流体处理系统的顶表面之间何时存在物品衬底和/或衬底支撑结构。检测器可以使用由流体处理系统提供的流体的电性质的信息来测量距离。检测器可以测量流体处理系统的电极和基板和/或基板支撑结构的电极之间的电阻和/或电容的变化。

75. 发明授权

US08462313B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08462313B2
公开(公告)日：2013-06-11
申请号：US12818724
申请日：2010-06-18
申请人： Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
发明人： Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.
摘要翻译：一种浸没式光刻设备，其包括弯曲的表面，使得表面张力引流力沿表面上的浸没液体的膜上的方向作用。

76. 发明授权

US08432531B2 Lithographic apparatus and a method of operating the apparatus 有权
标题翻译：光刻设备和操作该设备的方法
公开(公告)号：US08432531B2
公开(公告)日：2013-04-30
申请号：US12893875
申请日：2010-09-29
申请人： Kornelis Tijmen Hoekerd , Roelof Frederik De Graaf , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Pieter Jacob Kramer , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Sandra Van Der Graaf , Alexandre Viktorovych Padiy
发明人： Kornelis Tijmen Hoekerd , Roelof Frederik De Graaf , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Pieter Jacob Kramer , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Sandra Van Der Graaf , Alexandre Viktorovych Padiy
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341
摘要： A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
摘要翻译：公开了一种清洗液供应系统。清洁液体供应系统可以提供乳化清洁液体以清洁浸没式光刻设备。还公开了一种光刻设备。

77. 发明授权

US08427627B2 Lithographic apparatus and methods 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08427627B2
公开(公告)日：2013-04-23
申请号：US12398403
申请日：2009-03-05
申请人： Koen Kivits , Hans Jansen , Vasco Miguel Matias Serrao
发明人： Koen Kivits , Hans Jansen , Vasco Miguel Matias Serrao
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70925
摘要： A system for cleaning a limited area of a top surface of a substrate table or an object positioned on a top surface of a substrate table is disclosed. The optical system used during normal imaging is adjusted to limit the cross-sectional area of a radiation beam to form a cleaning radiation beam which impinges on the limited area.
摘要翻译：公开了一种用于清洁衬底台或位于衬底台顶表面上的物体的顶表面的有限区域的系统。调整在正常成像期间使用的光学系统以限制辐射束的横截面积以形成撞击有限区域的清洁辐射束。

78. 发明申请

US20120281190A1 LITHOGRAPHIC APPARATUS AND IN-LINE CLEANING APPARATUS 有权
标题翻译：平面设备和在线清洁设备
公开(公告)号：US20120281190A1
公开(公告)日：2012-11-08
申请号：US13549037
申请日：2012-07-13
申请人： Roelof Frederik DE GRAAF , Hans Jansen , Bauke Jansen , Hubertus Leonardus Franciscus Heusschen
发明人： Roelof Frederik DE GRAAF , Hans Jansen , Bauke Jansen , Hubertus Leonardus Franciscus Heusschen
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/7085
摘要： A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.
摘要翻译：光刻系统包括浸没型光刻设备，其包括构造和布置成支撑衬底的支撑件，构造和布置成将图案化的辐射束投影到衬底的目标部分上的投影系统，配置为用浸没液体至少部分地填充所述投影系统与所述基板和支撑体中的至少一个之间的空间，布置成将所述浸没液体提供给所述液体限制结构的液体供应系统，以及布置成提供清洁液体流到与浸没液接触的光刻设备的表面。该系统包括将洗涤液直接提供给液体限制结构并通过液体净化系统将浸液液体间接提供给液体限制结构的开关。

79. 发明授权

US08243255B2 Lithographic apparatus and in-line cleaning apparatus 有权
标题翻译：平版印刷设备和在线清洁设备
公开(公告)号：US08243255B2
公开(公告)日：2012-08-14
申请号：US12318037
申请日：2008-12-19
申请人： Roelof Frederik De Graaf , Hans Jansen , Bauke Jansen , Hubertus Leonardus Franciscus Heusschen
发明人： Roelof Frederik De Graaf , Hans Jansen , Bauke Jansen , Hubertus Leonardus Franciscus Heusschen
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/7085
摘要： An immersion type lithographic apparatus includes an immersion system configured to at least partially fill an immersion space with an immersion liquid. The apparatus also includes an indicator configured to indicate whether a part of the immersion system should be cleaned and a cleaning liquid supply system configured to supply a cleaner to the part of the lithographic apparatus. The cleaner is at least one of a plurality of different cleaners. Each cleaner or combination of cleaners is configured to clean a different type and/or level of contamination in the part of the lithographic apparatus. The apparatus also includes a controller configured to control which of the plurality of cleaners is provided to the part of the lithographic apparatus, based on an indication received from the indicator.
摘要翻译：浸没式光刻设备包括浸没系统，其配置为至少部分地用浸没液体填充浸没空间。该设备还包括指示器，其被配置为指示浸没系统的一部分是否应被清洁;以及清洁液体供应系统，被配置为向光刻设备的一部分提供清洁剂。清洁器是多个不同清洁器中的至少一个。每个清洁器或清洁器的组合被配置为清洁光刻设备的一部分中的不同类型和/或污染水平。该设备还包括控制器，其被配置为基于从指示器接收的指示来控制将多个清洁器中的哪一个提供给光刻设备的一部分。

80. 发明申请

US20110080567A1 LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS 有权
标题翻译：平面设备和操作设备的方法
公开(公告)号：US20110080567A1
公开(公告)日：2011-04-07
申请号：US12893875
申请日：2010-09-29
申请人： Kornelis Tijmen HOEKERD , Roelof Frederik De Graaf , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Pieter Jacob Kramer , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Sandra Van Der Graaf , Alexandre Viktorovych Padiy
发明人： Kornelis Tijmen HOEKERD , Roelof Frederik De Graaf , Hans Jansen , Martinus Hendrikus Antonius Leenders , Antonius Johannus Van Der Net , Pieter Jacob Kramer , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Sandra Van Der Graaf , Alexandre Viktorovych Padiy
IPC分类号： G03B27/52 , G05D11/02
CPC分类号： G03F7/70925 , G03F7/70341
摘要： A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.
摘要翻译：公开了一种清洗液供给系统。清洁液体供应系统可以提供乳化清洁液体以清洁浸没式光刻设备。还公开了一种光刻设备。

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