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71. 发明申请

US20110102793A1 Inspection Apparatus for Lithography 有权
标题翻译：光刻检验仪
公开(公告)号：US20110102793A1
公开(公告)日：2011-05-05
申请号：US12922587
申请日：2009-03-24
申请人： Alexander Straaijer
发明人： Alexander Straaijer
IPC分类号： G01J4/00
CPC分类号： G03F7/70608 , G01B11/0641 , G01J4/04 , G01N21/211 , G01N21/9501
摘要： Four separately polarized beams are simultaneously measured upon diffraction from a substrate (W) to determine properties of the substrate. Linearly, circularly or elliptically polarized radiation is transmitted through a first beam splitter (N-PBS) and split into two polarized beams. These two beams are further split into two further beams using two further beam splitters, the further beam splitters (32,34) being rotated by 45° with respect to each other. The plurality of polarizing beam splitters enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate. Algorithms are used to compare the four intensities of each of the polarized angles to give rise to the phase difference between the polarization directions and the ratio between the two main polarization direction amplitudes of the original polarized beam.
摘要翻译：在从基底（W）衍射时同时测量四个分离的偏振光束，以确定基底的性质。线性，圆形或椭圆偏振辐射通过第一分束器（N-PBS）传输并分裂成两个偏振光束。使用两个另外的分束器将这两个光束进一步分成两个另外的光束，另外的光束分离器（32,34）相对于彼此旋转45°。多个偏振分束器能够测量所有四个光束的强度，从而测量组合光束的相位调制和振幅，以给出衬底的特征。算法用于比较每个偏振角的四个强度，以产生偏振方向之间的相位差和原始偏振光束的两个主偏振方向幅度之间的比率。

72. 发明申请

US20050259324A1 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems 失效
标题翻译：用于高数值孔径系统的静态和动态径向横向电偏振器
公开(公告)号：US20050259324A1
公开(公告)日：2005-11-24
申请号：US11187848
申请日：2005-07-25
申请人： Donis Flagello , Kevin Cummings , Alexander Straaijer
发明人： Donis Flagello , Kevin Cummings , Alexander Straaijer
IPC分类号： G02B5/30 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70566 , G02B5/3058
摘要： A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.
摘要翻译：提供径向横向电偏振器装置。该器件包括具有第一折射率的第一材料层，具有第二折射率的第二材料层和位于方位角和周期上间隔开的多个细长元件，并且设置在第一层和第二层之间。多个细长元件与辐射的电磁波相互作用以透射辐射的电磁波的横向电极化。本发明的一个方面是例如在光刻投影设备中使用这种偏振器装置来增加成像分辨率。另一方面是提供一种包括在横向电极化中偏振辐射束的装置制造方法。

73. 发明授权

US5602683A Lens system with lens elements arranged in a gas-filled holder and photolithographic apparatus including such a system 失效
标题翻译：具有布置在充气保持器中的透镜元件和包括这种系统的光刻设备的透镜系统
公开(公告)号：US5602683A
公开(公告)日：1997-02-11
申请号：US361082
申请日：1994-12-21
申请人： Alexander Straaijer , Jan W. D. Martens
发明人： Alexander Straaijer , Jan W. D. Martens
IPC分类号： G02B7/02 , G02B27/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70241 , G02B27/0006 , G03F7/70825 , G03F7/70933
摘要： A high-quality lens system (PL) is described, which system is rinsed with a gas having a low refractive index so as to reduce the influence of variations of ambient parameters on the optical behaviour. By adding a very small quantity of ozone to this gas, it is prevented that any deposit will be produced on the lens elements within the lens holder (PLH) as a result of decomposition of organic particles caused by UV radiation and precipitation of the decomposition products.
摘要翻译：描述了高品质透镜系统（PL），该系统用具有低折射率的气体冲洗，以便减少环境参数的变化对光学行为的影响。通过向该气体添加非常少量的臭氧，可以防止由于紫外线辐射和分解产物的沉淀引起的有机颗粒的分解而在透镜保持器（PLH）内的透镜元件上产生任何沉积物。

74. 发明授权

US08681312B2 Inspection apparatus for lithography 有权
标题翻译：光刻检验装置
公开(公告)号：US08681312B2
公开(公告)日：2014-03-25
申请号：US12920968
申请日：2009-03-20
申请人： Alexander Straaijer
发明人： Alexander Straaijer
IPC分类号： G03B27/42
CPC分类号： G03F7/70616 , G01N21/211 , G01N21/956
摘要： The measurement of two separately polarized beams (Ix, Iy) upon diffraction from a substrate (W) in order to determine properties of the substrate is disclosed. Circularly or elliptically polarized radiation is passed via a variable phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The phase change is dependent on the wavelength of the polarized beam. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface.
摘要翻译：公开了从衬底（W）衍射出的两个单独偏振光束（Ix，Iy）的测量，以便确定衬底的性质。圆形或椭圆偏振辐射通过可变相位延迟器通过，以改变两个正交偏振辐射束中的一个相对于两个光束中的另一个的相位。相位变化取决于偏振光束的波长。在检测器中测量的两个辐射束的相对相位和光束的其它特征产生了衬底表面的性质。

75. 发明申请

US20120044495A1 Inspection Method and Apparatus, and Associated Computer Readable Product 有权
标题翻译：检验方法与装置及相关计算机可读产品
公开(公告)号：US20120044495A1
公开(公告)日：2012-02-23
申请号：US13033135
申请日：2011-02-23
申请人： Alexander Straaijer
发明人： Alexander Straaijer
IPC分类号： G01J4/00
CPC分类号： G03F7/70625
摘要： A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of a grating on a substrate. Linearly polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface. The grating and the initial linear polarization of the radiation beam are angled non-orthogonally relative to each other.
摘要翻译：系统被配置为在从基板衍射时测量两个分离的偏振光束，以便确定衬底上的光栅的性质。线性偏振光源通过固定相位延迟器通过，以改变两个正交偏振辐射束中的一个相对于两个光束中的另一个的相位。在检测器中测量的两个辐射束的相对相位和光束的其它特征产生了衬底表面的性质。辐射束的光栅和初始线性极化相对于彼此非正交成角度。

76. 发明申请

US20110032500A1 INSPECTION APPARATUS FOR LITHOGRAPHY 有权
标题翻译：检验仪器
公开(公告)号：US20110032500A1
公开(公告)日：2011-02-10
申请号：US12920968
申请日：2009-03-20
申请人： Alexander Straaijer
发明人： Alexander Straaijer
IPC分类号： G03B27/52 , G01J4/00
CPC分类号： G03F7/70616 , G01N21/211 , G01N21/956
摘要： The measurement of two separately polarized beams (Ix, Iy) upon diffraction from a substrate (W) in order to determine properties of the substrate is disclosed. Circularly or elliptically polarized radiation is passed via a variable phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The phase change is dependent on the wavelength of the polarized beam. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface.
摘要翻译：公开了从衬底（W）衍射出的两个单独偏振光束（Ix，Iy）的测量，以便确定衬底的性质。圆形或椭圆偏振辐射通过可变相位延迟器通过，以改变两个正交偏振辐射束中的一个相对于两个光束中的另一个的相位。相位变化取决于偏振光束的波长。在检测器中测量的两个辐射束的相对相位和光束的其它特征产生了衬底表面的性质。

77. 发明申请

US20100157299A1 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权
标题翻译：检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法
公开(公告)号：US20100157299A1
公开(公告)日：2010-06-24
申请号：US12718599
申请日：2010-03-05
申请人： Alexander Straaijer , Ronald Franciscus Herman Hugers
发明人： Alexander Straaijer , Ronald Franciscus Herman Hugers
IPC分类号： G01J4/00
CPC分类号： G01B11/0641 , G01N2021/4711 , G01N2021/4792 , G03F7/70625 , G03F7/70633
摘要： The simultaneous measurement of four separately polarized beams upon diffraction from a substrate is used to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beamsplitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.
摘要翻译：使用从衬底衍射的同时测量四个分离的偏振光束来确定衬底的性质。圆形或椭圆偏振光源最多通过三个偏振元件。这使光源偏振0°，45°，90°和135°。多个偏振分束器取代了相位调制器的使用，但是能够测量所有四个光束的强度，从而测量组合光束的相位调制和幅度，以给出基板的特征。

78. 发明授权

US07158211B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07158211B2
公开(公告)日：2007-01-02
申请号：US10946340
申请日：2004-09-22
申请人： Alexander Straaijer
发明人： Alexander Straaijer
IPC分类号： G03B27/42 , G03B27/52 , G03B27/60 , B25B11/00
CPC分类号： G03F7/707 , G03F7/70341
摘要： A table configured to support a substrate has one or more projections which support the substrate. In an embodiment, the table also has a raised perimeter defining a space which is configured to be filled with a liquid. A pump is configured to remove liquid from the space via outlet passages to an optional inlet. The removal of liquid can create a pressure differential across the substrate which then clamps it in place. Liquid circulated to the inlet may be filtered by a filter to remove contaminants.
摘要翻译：被配置为支撑衬底的工作台具有支撑衬底的一个或多个突起。在一个实施例中，桌子还具有限定被填充有液体的空间的凸起周边。泵构造成通过出口通道将液体从空间移除到可选的入口。液体的去除可以在衬底上产生压差，然后将其夹在适当位置。循环到入口的液体可以通过过滤器过滤以除去污染物。

79. 发明申请

US20060250591A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060250591A1
公开(公告)日：2006-11-09
申请号：US11120198
申请日：2005-05-03
申请人： Alexander Straaijer
发明人： Alexander Straaijer
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane, another high-index hydrocarbon, a perfluoropolyether, such as perfluoro-N-methylmorpholine and perfluoro E2, a perfluoroalkane, such as perfluorohexane, or a hydrofluoroether; and water, respectively.
摘要翻译：光刻投影设备使用一定体积的第二液体将第一液体限制在投影系统和基底之间的空间上。在一个实施方案中，第一和第二液体基本上是不混溶的，并且可以是环烷烃，例如环辛烷，十氢化萘，二环己基，外 - 四氢 - 二环戊二烯和环己烷，另一种高折射率烃，全氟聚醚，如全氟-N-甲基吗啉和全氟E2，全氟烷烃如全氟己烷或氢氟醚; 和水。

80. 发明授权

US6084673A Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders 失效
标题翻译：用于在掩模和晶片保持器上用干涉仪镜进行掩模图案的步进扫描成像的平版印刷设备
公开(公告)号：US6084673A
公开(公告)日：2000-07-04
申请号：US810793
申请日：1997-03-04
申请人： Marinus A. Van Den Brink , Alexander Straaijer
发明人： Marinus A. Van Den Brink , Alexander Straaijer
IPC分类号： G03F7/22 , G03F7/20 , G03F9/00 , H01L21/027 , G01B9/02
CPC分类号： G03F7/70241 , G03F7/70358 , G03F7/70716 , G03F7/70775 , G03F7/70825 , G03F7/709 , G03F9/70
摘要： A lithographic projection apparatus for step-and-scan imaging of a mask pattern (c) on a substrate (W) is described. The synchronous movement of the mast (MA) and the substrate (W) during scanning is controlled by means of contactless measuring systems, inter alia, interferometer systems (ISR, ISW), while the measuring faces (R.sub.1,r, R.sub.1,w) associated with these systems are formed by faces of the holders (WH, MH) for the substrate (W) and the mask (MA), so that very accurate measurements are possible.
摘要翻译：描述了用于在衬底（W）上的掩模图案（c）的步进扫描成像的光刻投影设备。扫描期间桅杆（MA）和基板（W）的同步运动通过非接触式测量系统（尤其是干涉仪系统（ISR，ISW））进行控制，而测量面（R1，r，R1，w）与这些系统相关联的部件由用于基板（W）和掩模（MA）的保持器（WH，MH）的表面形成，使得非常精确的测量是可能的。

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