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    • 76. 发明公开
    • PROLINAMIDE DERIVATIVES AS NK3 ANTAGONISTS
    • 作为NK3拮抗剂的PROLINAMIDE衍生物
    • EP2155672A1
    • 2010-02-24
    • EP08760181.1
    • 2008-05-29
    • F. Hoffmann-La Roche AG
    • HAN, BoKNUST, HennerNETTEKOVEN, MatthiasRATNI, HasaneWU, Xihan
    • C07D207/16C07D401/06C07D487/10A61P25/16A61P25/18A61K31/401
    • C07D207/16C07D401/06C07D471/10
    • The present invention relates to a compound of formula (I) wherein R1 is hydrogen, halogen, lower alkyl, lower alkyl substituted by halogen, lower alkoxy, or lower alkoxy substituted by halogen; R2 is hydrogen or lower alkyl; R3, R4 form together with the N-atom to which they are attached a non aromatic heterocyclic group, selected from R5 is hydrogen or halogen; R6 is phenyl, unsubstituted or substituted by cyano, halogen, lower alkyl, lower alkoxy, CF3, -(CH2)2O-lower alkyl, C(O)-lower alkyl or C(O)O-lower alkyl, or is pyridinyl, unsubstituted or substituted by CF3, or is -C(O)-phenyl; R7 is hydrogen or lower alkoxy; R8 is phenyl, lower alkyl or -C(O)O-lower alkyl; R9 is hydrogen or S(O)2-lower alkyl; R10 is hydrogen or cycloalkyl; X is -CH2- or -C(O)-; p is 1 or 2; n is 1, 2 or 3; o is 1 or 2; or to a pharmaceutically suitable acid addition salt thereof which are high potential NK-3 receptor antagonists for the treatment of depression, pain, psychosis, Parkinson's disease, schizophrenia, anxiety and attention deficit hyperactivity disorder (ADHD).
    • 本发明涉及式(I)的化合物,其中R 1为氢,卤素,低级烷基,被卤素取代的低级烷基,低级烷氧基或被卤素取代的低级烷氧基; R2是氢或低级烷基; R 3,R 4与它们所连接的N原子一起形成选自R 5为氢或卤素的非芳族杂环基团; R 6为未取代的或被氰基,卤素,低级烷基,低级烷氧基,CF 3, - (CH 2)2 O-低级烷基,C(O) - 低级烷基或C(O)O-低级烷基取代的苯基,或为吡啶基, 未被取代或被CF 3取代,或者是-C(O) - 苯基; R7是氢或低级烷氧基; R8是苯基,低级烷基或-C(O)O-低级烷基; R9是氢或S(O)2 - 低级烷基; R10是氢或环烷基; X是-CH 2 - 或-C(O) - ; p是1或2; n是1,2或3; o是1或2; 或其药学上合适的酸加成盐,它们是用于治疗抑郁症,疼痛,精神病,帕金森病,精神分裂症,焦虑和注意力缺陷多动障碍(ADHD)的高潜力NK-3受体拮抗剂。