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    • 74. 发明授权
    • Organic light emitting display device
    • 有机发光显示装置
    • US09159958B2
    • 2015-10-13
    • US13339075
    • 2011-12-28
    • Il JeonJin-Ho Kim
    • Il JeonJin-Ho Kim
    • G02F1/1335H01L51/52G02B5/30H01L27/32
    • H01L51/5281G02B5/3016H01L27/3211
    • Disclosed is an organic light emitting display device to prevent deterioration of visibility caused by reflection of incident light and color transition at high viewing angle, and improve transmittance, the organic light emitting display device includes an organic light emitting display panel, and an antireflective member adhered to an outer surface of the organic light emitting display panel, the antireflective member including a reactive liquid crystal layer and a polarizer film which are laminated in this order, wherein the reactive liquid crystal layer has a λ/4 retardation with respect to a transmitted light of the polarizer film.
    • 公开了一种有机发光显示装置,用于防止由于入射光的反射和高视角的颜色变化引起的可见度的劣化,并且提高透射率,有机发光显示装置包括有机发光显示面板和附着的防反射构件 涉及有机发光显示面板的外表面,该防反射构件包括依次层叠的反应性液晶层和偏振膜,其中反应性液晶层相对于透射光具有λ/ 4延迟 的偏光膜。
    • 78. 发明授权
    • Liquid crystal display device and method of fabricating the same
    • 液晶显示装置及其制造方法
    • US08054420B2
    • 2011-11-08
    • US12683756
    • 2010-01-07
    • Sung-Soo ChangWoo-Hyun KimJin-Ho Kim
    • Sung-Soo ChangWoo-Hyun KimJin-Ho Kim
    • G02F1/1335G02F1/13
    • G02F1/133555G02F1/133504G02F1/133514
    • A liquid crystal display device includes an array substrate having reflective and transmissive regions in a pixel region, wherein the array substrate includes a reflective electrode corresponding to the reflective region and a pixel electrode on a first substrate. A color filter substrate defines the reflective region and the transmissive region in the pixel region. The color filter substrate includes a color filter with first and second portions that correspond to the respective transmissive and reflective regions on a second substrate. The thickness of the second portion is less than a thickness of the first portion. The combined thickness of the scatter and the thickness of the second portion is greater than the thickness of the first portion; and a liquid crystal layer between the array and color filter substrates.
    • 一种液晶显示装置,具备在像素区域具有反射和透射区域的阵列基板,其中阵列基板包括对应于反射区域的反射电极和在第一基板上的像素电极。 滤色器基板限定像素区域中的反射区域和透射区域。 滤色器基板包括滤色器,滤色器具有对应于第二基板上的相应透射和反射区域的第一和第二部分。 第二部分的厚度小于第一部分的厚度。 第二部分的散射和厚度的组合厚度大于第一部分的厚度; 以及阵列和滤色器基板之间的液晶层。
    • 80. 发明授权
    • Method of forming ONO-type sidewall with reduced bird's beak
    • 用鸟喙形成ONO型侧壁的方法
    • US07910429B2
    • 2011-03-22
    • US10821100
    • 2004-04-07
    • Zhong DongChuck JangChing-Hwa ChenChunchieh HuangJin-Ho KimVei-Han ChanChung Wai LeungChia-Shun HsiaoGeorge KovallSteven Ming Yang
    • Zhong DongChuck JangChing-Hwa ChenChunchieh HuangJin-Ho KimVei-Han ChanChung Wai LeungChia-Shun HsiaoGeorge KovallSteven Ming Yang
    • H01L21/336
    • H01L21/28273H01L29/42328H01L29/513H01L29/7881
    • Conventional fabrication of sidewall oxide around an ONO-type memory cell stack usually produces Bird's Beak because prior to the fabrication, there is an exposed sidewall of the ONO-type memory cell stack that exposes side parts of a plurality of material layers respectively composed of different materials. Certain materials in the stack such as silicon nitrides are more difficult to oxidize than other materials in the stack such polysilicon. As a result oxidation does not proceed uniformly along the multi-layered height of the sidewall. The present disclosure shows how radical-based fabrication of sidewall dielectric can help to reduce the Bird's Beak formation. More specifically, it is indicated that short-lived oxidizing agents (e.g., atomic oxygen) are able to better oxidize difficult to oxidize materials such as silicon nitride and the it is indicated that the short-lived oxidizing agents alternatively or additionally do not diffuse as deeply through already oxidized layers of the sidewall such as silicon oxide layers. As a result, a more uniform sidewall dielectric can be fabricated with more uniform breakdown voltages along it height.
    • 通常在ONO型存储单元堆叠周围制造侧壁氧化物通常产生鸟喙,因为在制造之前,存在ONO型存储单元堆叠的暴露的侧壁,其暴露分别由不同的多个材料层组成的多个材料层的侧面部分 材料 堆叠中的某些材料如氮化硅比堆叠中的其它材料更难以氧化,这样的多晶硅。 结果,氧化不沿着侧壁的多层高度均匀地进行。 本公开显示了基于侧壁电介质的基于基础的制造有助于减少鸟喙形成。 更具体地,表明短寿命氧化剂(例如原子氧)能够更好地氧化难以氧化的材料如氮化硅,并且表明短寿命氧化剂交替地或另外不扩散为 深深地通过侧壁的已氧化层,例如氧化硅层。 结果,可以制造更均匀的侧壁电介质,沿其高度具有更均匀的击穿电压。