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71. 发明申请

US20100139889A1 Multiple Slot Load Lock Chamber and Method of Operation 有权
标题翻译：多槽负载锁定室和操作方法
公开(公告)号：US20100139889A1
公开(公告)日：2010-06-10
申请号：US12709713
申请日：2010-02-22
申请人： Shinichi Kurita , Suhail Anwar , Jae-Chull Lee
发明人： Shinichi Kurita , Suhail Anwar , Jae-Chull Lee
IPC分类号： H01L21/677 , F28F13/00
CPC分类号： H01L21/67201 , C23C14/566 , H01L21/67109 , H01L21/67126 , H01L21/67167 , H01L21/67178 , H01L21/6719 , H01L21/67742 , H01L21/67751 , Y10S414/139
摘要： Embodiments of the invention include a load lock chamber, a processing system having a load lock chamber and a method for transferring substrates between atmospheric and vacuum environments. In one embodiment, the method includes maintaining a processed substrate within a transfer cavity formed in a chamber body for two venting cycles. In another embodiment, the method includes transferring a substrate from a transfer cavity to a heating cavity formed in the chamber body, and heating the substrate in the heating cavity. In another embodiment, a load lock chamber includes a chamber body having substrate support disposed in a transfer cavity. The substrate support is movable between a first elevation and a second elevation. A plurality of grooves are formed in at least one of a ceiling or floor of the transfer cavity and configured to receive at least a portion of the substrate support when located in the second elevation.
摘要翻译：本发明的实施例包括负载锁定室，具有负载锁定室的处理系统和用于在大气和真空环境之间传送衬底的方法。在一个实施例中，该方法包括将经处理的基板保持在形成在室主体中的传送空腔内用于两个排气循环。在另一个实施例中，该方法包括将基底从传递腔转移到形成在腔体中的加热腔，以及加热加热腔中的基底。在另一个实施例中，负载锁定室包括具有设置在传送腔中的衬底支撑件的室主体。衬底支撑件可在第一高度和第二高度之间移动。多个槽形成在传送腔的天花板或地板中的至少一个中，并且被配置为当位于第二高度时容纳衬底支撑件的至少一部分。

72. 发明申请

US20100051111A1 SLIT VALVE CONTROL 有权
标题翻译：滑阀控制
公开(公告)号：US20100051111A1
公开(公告)日：2010-03-04
申请号：US12538237
申请日：2009-08-10
申请人： Takayuki Matsumoto , Shinichi Kurita
发明人： Takayuki Matsumoto , Shinichi Kurita
IPC分类号： F15D1/00 , F16K3/00
CPC分类号： F16K3/188 , F16K51/02 , H01L21/67772 , Y10T137/0391
摘要： Embodiments disclosed herein generally relate to methods for sealing a processing chamber with a slit valve door. The door initially raises from a position below the opening for the processing chamber to a raised position. The door then expands until an O-ring that is on the door just touches the sealing surface. Then, the door expands again to compress the O-ring against the sealing surface. The door expands by flowing a gas into the interior volume of the door. By controlling the pressure buildup within the door, the speed with which the door expands is controlled to ensure that the door gently contacts the sealing surface and then compresses against the sealing surface. Thus, the door may be prevented from contacting the sealing surface with too great a force that may jolt or shake the processing chamber and produce undesired particles that may contaminate the process.
摘要翻译：本文公开的实施例通常涉及用狭缝阀门密封处理室的方法。门最初从处理室的开口下方的位置升高到升高位置。门然后膨胀，直到门上的O形圈刚好碰到密封面。然后，门再次膨胀以将O形环压靠在密封表面上。通过将气体流入门的内部空间来扩大门。通过控制门内的压力积分，控制门膨胀的速度，以确保门轻轻地接触密封表面，然后压靠密封表面。因此，可以防止门用太大的力使密封表面接触，该力可能使处理室震动或摇晃并产生可能污染该过程的不期望的颗粒。

73. 发明申请

US20090122099A1 METHODS AND SYSTEMS FOR CALIBRATION OF INKJET DROP POSITIONING 审中-公开
标题翻译：用于校准喷墨定位的方法和系统
公开(公告)号：US20090122099A1
公开(公告)日：2009-05-14
申请号：US12354759
申请日：2009-01-15
申请人： John M. White , Emanuel Beer , Hongbin Ji , Chang-Tsung Lin , Shinichi Kurita
发明人： John M. White , Emanuel Beer , Hongbin Ji , Chang-Tsung Lin , Shinichi Kurita
IPC分类号： B41J29/393
CPC分类号： B41J29/393
摘要： Methods and apparatus for inkjet drop positioning are provided. A first method includes determining an intended deposition location of an ink drop on a substrate, depositing the ink drop on the substrate using an inkjet printing system, detecting a deposited location of the deposited ink drop on the substrate, comparing the deposited location to the intended location, determining a difference between the deposited location and the intended location, and compensating for the difference between the deposited location and the intended location by adjusting a parameter of an inkjet printing system. Numerous other aspects are provided.
摘要翻译：提供了用于喷墨滴定位的方法和装置。第一种方法包括确定墨滴在基底上的预期沉积位置，使用喷墨印刷系统将墨滴沉积在基底上，检测沉积的墨滴在基底上的沉积位置，将沉积位置与预期的位置进行比较确定存放位置与预期位置之间的差异，以及通过调整喷墨打印系统的参数来补偿存放位置与预期位置之间的差异。提供了许多其他方面。

74. 发明申请

US20090090883A1 CHAMBER ISOLATION VALVE RF GROUNDING 有权
标题翻译：室隔离阀射频接地
公开(公告)号：US20090090883A1
公开(公告)日：2009-04-09
申请号：US12333043
申请日：2008-12-11
申请人： Ke Ling Lee , Shinichi Kurita , Emanuel Beer
发明人： Ke Ling Lee , Shinichi Kurita , Emanuel Beer
IPC分类号： F16K25/00
CPC分类号： F16K3/0227 , F16K51/02 , H01J37/32844 , H01J2237/166 , H01L21/67126 , Y02C20/30 , Y02P70/605 , Y10S277/919 , Y10S277/92 , Y10T137/8242
摘要： Embodiments described herein provide a method and apparatus for grounding a chamber isolation valve. In one embodiment, a grounded chamber isolation valve for a plasma processing system is described. The chamber isolation valve includes a door and a bracing member movably attached to and opposing the door, and at least one electrically conductive member in electrical communication with the door, the at least one electrically conductive member comprising one or more reaction bumpers disposed on the bracing member that are adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position.
摘要翻译：本文描述的实施例提供了用于使腔室隔离阀接地的方法和装置。在一个实施例中，描述了用于等离子体处理系统的接地室隔离阀。室隔离阀包括门和可移动地附接到门并与其相对的支撑构件，以及至少一个与门电连通的导电构件，所述至少一个导电构件包括设置在支撑上的一个或多个反应缓冲器当门处于关闭位置时，适于接触等离子体处理系统的至少一个接地部件的构件。

75. 发明申请

US20090058941A1 METHODS AND APPARATUS FOR MODULAR PRINT HEAD AND ADAPTER AND ROTATION THEREOF WITH INKJET PRINTER SYSTEMS 审中-公开
标题翻译：使用喷墨打印机系统的模块化打印头和适配器及其旋转的方法和装置
公开(公告)号：US20090058941A1
公开(公告)日：2009-03-05
申请号：US12202190
申请日：2008-08-29
申请人： Shinichi Kurita , Benjamin Johnston
发明人： Shinichi Kurita , Benjamin Johnston
IPC分类号： B41J2/14
CPC分类号： B41J2/14201 , B41J2202/09 , B41J2202/14
摘要： Methods, systems and apparatus are provided for use with an inkjet printing system. In some embodiments, an apparatus is provided, comprising an adapter including one or more supply lines, wherein the one or more supply lines are adapted to transmit at least one of ink and solvent to a print head. Numerous other aspects are provided.
摘要翻译：提供了与喷墨打印系统一起使用的方法，系统和装置。在一些实施例中，提供了一种装置，其包括适配器，其包括一个或多个供应管线，其中所述一个或多个供应管线适于将油墨和溶剂中的至少一个传送到打印头。提供了许多其他方面。

76. 发明申请

US20080118236A1 LOAD LOCK CHAMBER WITH HEATER IN TUBE 有权
标题翻译：带加热器的管路箱
公开(公告)号：US20080118236A1
公开(公告)日：2008-05-22
申请号：US11782290
申请日：2007-07-24
申请人： Suhail Anwar , Jae-Chull Lee , Shinichi Kurita
发明人： Suhail Anwar , Jae-Chull Lee , Shinichi Kurita
IPC分类号： H01L21/00 , H05B3/14 , H05B31/08
CPC分类号： H01L21/67115 , C23C16/54 , H01L21/67201
摘要： Embodiments of the invention include a heated load lock chamber. In one embodiment, a heated load lock chamber includes a chamber body having a plurality of lamp assembles disposed at least partially therein. Each lamp assembly includes a transmissive tube housing a lamp. The transmissive tube extends into the chamber body and provides a pressure barrier isolating the lamp from the interior volume of the load lock chamber. In another embodiment, an open end of the transmissive tube extends through a sidewall of the chamber body. A closed end of the transmissive tube is surrounded by the interior volume of the chamber body and is supported below a top of the chamber body in a spaced apart relation. The open end of the tube is sealed to the sidewall of the chamber body such that the interior of the tube is open to atmosphere.
摘要翻译：本发明的实施例包括加热的负载锁定室。在一个实施例中，加热的负载锁定室包括具有至少部分地设置在其中的多个灯组件的室主体。每个灯组件包括容纳灯的透射管。透射管延伸到室主体中并提供将灯隔离到负载锁定室的内部空间的压力屏障。在另一个实施例中，透射管的开口端延伸穿过腔体的侧壁。透射管的封闭端被室主体的内部空间包围，并以间隔的关系支撑在腔室主体的顶部下方。管的开口端被密封到腔体的侧壁，使得管的内部对大气敞开。

77. 发明授权

US07330021B2 Integrated substrate transfer module 有权
标题翻译：集成基板传输模块
公开(公告)号：US07330021B2
公开(公告)日：2008-02-12
申请号：US11018236
申请日：2004-12-21
申请人： Shinichi Kurita , Emanuel Beer , Hung T. Nguyen , Benjamin Johnston , Fayez E. Abboud
发明人： Shinichi Kurita , Emanuel Beer , Hung T. Nguyen , Benjamin Johnston , Fayez E. Abboud
IPC分类号： G01R13/04
CPC分类号： G09G3/006 , G01R31/2893 , G01R31/305
摘要： A substrate table and method for supporting and transferring a substrate are provided. The substrate table includes a segmented stage having an upper surface for supporting a substrate, and an end effector. The end effector includes two or more spaced apart fingers and an upper surface for supporting a substrate. The end effector is at least partially disposed and moveable within the segmented stage such that the fingers of the end effector and the segmented stage interdigitate to occupy the same horizontal plane. The segmented stage is adapted to raise and lower about the end effector.
摘要翻译：提供了用于支撑和转移衬底的衬底台和方法。衬底台包括具有用于支撑衬底的上表面的分段段和端部执行器。末端执行器包括两个或更多间隔开的指状物和用于支撑基底的上表面。末端执行器至少部分地设置并在分段台内移动，使得末端执行器和分段台阶的指状物相互指向以占据相同的水平面。分段段适于围绕末端执行器升高和降低。

78. 发明申请

US20070281090A1 SYSTEM ARCHITECTURE AND METHOD FOR SOLAR PANEL FORMATION 审中-公开
标题翻译：太阳能电池板的系统结构与方法
公开(公告)号：US20070281090A1
公开(公告)日：2007-12-06
申请号：US11733906
申请日：2007-04-11
申请人： Shinichi Kurita , Takako Takehara , Suhail Anwar
发明人： Shinichi Kurita , Takako Takehara , Suhail Anwar
IPC分类号： C23C16/24 , C23C16/54
CPC分类号： H01L31/206 , H01L21/67155 , H01L21/67161 , H01L21/67167 , H01L21/67184 , H01L21/67207 , H01L21/67236 , Y02E10/50 , Y02P70/521
摘要： A method and apparatus for forming solar panels from n-doped silicon, p-doped silicon, intrinsic amorphous silicon, and intrinsic microcrystalline silicon using a cluster tool is disclosed. The cluster tool comprises at least one load lock chamber and at least one transfer chamber. When multiple clusters are used, at least one buffer chamber may be present between the clusters. A plurality of processing chambers are attached to the transfer chamber. As few as five and as many as thirteen processing chambers can be present.
摘要翻译：公开了一种使用簇工具从n掺杂硅，p掺杂硅，本征非晶硅和本征微晶硅形成太阳能电池板的方法和装置。集群工具包括至少一个装载锁定室和至少一个传送室。当使用多个簇时，可以在簇之间存在至少一个缓冲室。多个处理室附接到传送室。只有五个和多达十三个处理室可以存在。

79. 发明申请

US20070086881A1 DUAL SUBSTRATE LOADLOCK PROCESS EQUIPMENT 审中-公开
标题翻译：双基板负载工艺设备
公开(公告)号：US20070086881A1
公开(公告)日：2007-04-19
申请号：US11613556
申请日：2006-12-20
申请人： Shinichi Kurita , Wendell Blonigan , Akihiro Hosokawa
发明人： Shinichi Kurita , Wendell Blonigan , Akihiro Hosokawa
IPC分类号： H01L21/677 , H01L21/306 , C23C16/00 , B65H1/00
CPC分类号： H01L21/68742 , B65G49/068 , B65G2249/02 , B65G2249/04 , C23C14/566 , C23C14/568 , C23C16/54 , H01L21/67103 , H01L21/67109 , H01L21/67167 , H01L21/67201 , H01L21/67739 , H01L21/67745 , H01L21/67748
摘要： One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as well as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.
摘要翻译：一个实施例涉及一种其中具有第一支撑结构的负载锁，用于支撑一个未处理的基板和其中的第二支撑结构以支撑一个处理的基板。第一支撑结构位于第二支撑结构的上方。负载锁包括用于控制支撑结构的垂直位置的电梯。负载锁还包括第一孔，以允许将未处理的衬底插入到装载锁中并从加载锁中移除经处理的衬底，以及第二孔，以允许将未处理的衬底从负载锁上移除并将经处理的衬底插入负载锁。一个冷却板也位于负载锁中。冷却板包括适于在其上支撑经处理的基板的表面。加热装置可以位于第一支撑结构上方的装载锁中。

80. 发明授权

US07105463B2 Load lock chamber having two dual slot regions 有权
标题翻译：负载锁定室具有两个双槽区域
公开(公告)号：US07105463B2
公开(公告)日：2006-09-12
申请号：US09957784
申请日：2001-09-21
申请人： Shinichi Kurita , Wendell T. Blonigan
发明人： Shinichi Kurita , Wendell T. Blonigan
IPC分类号： H01L21/31
CPC分类号： H01L21/67748 , H01L21/67098 , H01L21/67167 , H01L21/67201
摘要： Provided herein is a substrate processing system, which comprises a cassette load station; a load lock chamber; a centrally located transfer chamber; and one or more process chambers located about the periphery of the transfer chamber. The load lock chamber comprises double dual slot load locks constructed at same location. Such system may be used for processing substrates for semiconductor manufacturing.
摘要翻译：本文提供了一种基板处理系统，其包括盒式装载台; 负载锁定室; 位于中心的传送室; 以及位于传送室的周边周围的一个或多个处理室。负载锁定室包括在相同位置构造的双重双槽加载锁。这种系统可用于处理用于半导体制造的衬底。

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