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71. 发明授权

US5003567A Soft x-ray reduction camera for submicron lithography 失效
标题翻译：用于亚微米光刻的软X射线照相机
公开(公告)号：US5003567A
公开(公告)日：1991-03-26
申请号：US308332
申请日：1989-02-09
申请人： Andrew M. Hawryluk , Lynn G. Seppala
发明人： Andrew M. Hawryluk , Lynn G. Seppala
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： B82Y10/00 , G02B17/0621 , G03F7/2039 , G03F7/70033 , G03F7/70233
摘要： Soft x-ray projection lithography can be performed using x-ray optical components and spherical imaging lenses (mirrors), which form an x-ray reduction camera. The x-ray reduction is capable of projecting a 5x demagnified image of a mask onto a resist coated wafer using 4.5 nm radiation. The diffraction limited resolution of this design is about 135 nm with a depth of field of about 2.8 microns and a field of view of 0.2 cm.sup.2. X-ray reflecting masks (patterned x-ray multilayer mirrors) which are fabricated on thick substrates and can be made relatively distortion free are used, with a laser produced plasma for the source. Higher resolution and/or larger areas are possible by varying the optic figures of the components and source characteristics.
摘要翻译：可以使用形成x射线减少相机的X射线光学部件和球形成像透镜（反射镜）来执行软X射线投影光刻。 X射线减少能够使用4.5nm辐射将掩模的5x缩小图像投影到抗蚀剂涂覆的晶片上。该设计的衍射限制分辨率为约135nm，景深为约2.8微米，视场为0.2cm 2。使用制造在厚基板上并且可以相对无变形的X射线反射掩模（图案化的X射线多层反射镜），其中激光产生用于源的等离子体。通过改变组件的光学图形和源特性，可以实现更高的分辨率和/或更大的面积。

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