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    • 77. 发明申请
    • Protecting a Vacuum Environment from Leakage
    • 保护真空环境免受泄漏
    • US20160353561A1
    • 2016-12-01
    • US15233438
    • 2016-08-10
    • TRUMPF Laser- und Systemtechnik GmbH
    • Andreas EnzmannBjoern Volz
    • H05G2/00
    • H05G2/008G02B7/007G02B7/008H01S3/2232H05G2/005
    • Methods, devices, and systems for protecting a vacuum environment from leakage are provided. The devices include an optical component for gas-tight closure of the vacuum environment, a retention device configured to retain the optical component and including a cooling region separated from the vacuum environment in a gas-tight manner and configured to receive a cooling medium to cool the optical component, a first part-region of the optical component being arranged in the cooling region, and a reduced-pressure region configured to have a reduced pressure and separated in a gas-tight manner from the vacuum environment and from the cooling region, a second part-region of the optical component being arranged in the reduced-pressure region, and a detector configured to detect a leakage in the optical component when the cooling medium flows from the cooling region into at least one of the reduced-pressure region or the vacuum environment.
    • 提供了用于保护真空环境免受泄漏的方法,装置和系统。 这些装置包括用于真空环境的气密闭合的光学部件,保持装置,其构造成保持光学部件并且包括以气密方式从真空环境分离的冷却区域,并且被配置为接收冷却介质以冷却 所述光学部件,所述光学部件的布置在所述冷却区域中的第一部分区域和被配置为具有减压并且以气密方式从所述真空环境和所述冷却区域分离的减压区域, 布置在减压区域中的光学部件的第二部分区域,以及检测器,被配置为当冷却介质从冷却区域流入至少一个减压区域时检测光学部件的泄漏, 真空环境。
    • 78. 发明授权
    • Beam guide and method for adjusting the opening angle of a laser beam
    • 光束引导件和调整激光束打开角度的方法
    • US09016881B2
    • 2015-04-28
    • US13834172
    • 2013-03-15
    • Trumpf Laser-und Systemtechnik GmbH
    • Martin Lambert
    • G02B5/10G02B7/182G02B5/08G02B27/09H05G2/00
    • G02B27/0983H05G2/008
    • Beam guides for guiding a laser beam from a driver laser device in the direction of a target position for generating extreme ultraviolet (“EUV”) radiation are disclosed. The beam guides include a device for increasing or decreasing the beam diameter of the laser beam. The device includes a first off-axis parabolic mirror having a first convex curved reflecting surface and a second off-axis parabolic mirror having a second concave curved reflecting surface. The beam guides also include a moving device arranged to change a distance between the first and the second reflecting surfaces to change the opening angle (α), e.g., the convergence or divergence angle, of the laser beam. Methods for adjusting an opening angle (α) of a laser beam using such beam guides are also disclosed.
    • 公开了用于引导来自驱动器激光装置的激光束在用于产生极紫外(“EUV”)辐射的目标位置的方向上的光束引导件。 光束引导件包括用于增加或减小激光束的光束直径的装置。 该装置包括具有第一凸曲面反射表面的第一离轴抛物面反射镜和具有第二凹曲面反射表面的第二离轴抛物面反射镜。 光束引导件还包括移动装置,其布置成改变第一和第二反射表面之间的距离以改变激光束的打开角度(α),例如会聚或发散角度。 还公开了使用这种光束引导件来调节激光束的打开角度(α)的方法。
    • 79. 发明授权
    • EUV radiation generating apparatus and operating methods
    • EUV辐射发生装置和操作方法
    • US08847182B2
    • 2014-09-30
    • US13834108
    • 2013-03-15
    • Trumpf Laser- und Systemtechnik GmbH
    • Martin LambertAndreas Enzmann
    • G01N21/00G01N21/33H05G2/00
    • H05G2/008
    • The invention relates to extreme ultraviolet “EUV” radiation generating systems that include a vacuum chamber where a target material can be positioned at a target position for generation of EUV radiation, and a beam guiding chamber for guiding a laser beam from a driver laser device towards the target position. The EUV radiation generating apparatus includes an intermediate chamber which is arranged between the vacuum chamber and the beam guiding chamber, a first window which seals the intermediate chamber in a gas-tight manner for entry of the laser beam from the beam guiding chamber and a second window which seals the intermediate chamber in a gas-tight manner for exit of the laser beam into the vacuum chamber. The invention also relates to a method for operating the EUV radiation generating apparatus.
    • 本发明涉及包括真空室的极紫外“EUV”辐射发生系统,其中目标材料可以定位在用于产生EUV辐射的目标位置处,以及光束引导室,用于将来自驱动激光装置的激光束引向 目标位置。 EUV辐射发生装置包括设置在真空室和光束引导室之间的中间室,第一窗口,其以气密方式密封中间室,以使激光束从光束引导室进入;以及第二窗口 窗口,其以气密方式密封中间室,以将激光束退出到真空室中。 本发明还涉及一种用于操作EUV辐射发生装置的方法。