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71. 发明申请

US20070042291A1 Positive resist composition and a pattern forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US20070042291A1
公开(公告)日：2007-02-22
申请号：US11504040
申请日：2006-08-15
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/0045
摘要： A positive resist composition comprises (A) a compound capable of generating sulfonic acid, bis(alkylsulfonyl)amide, or tris(alkylsulfonyl)methine upon irradiation with actinic ray or radiation, and (B) a resin capable of increasing the solubility in an alkali developer by action of an acid having specific repeating units, and a pattern forming method using the same.
摘要翻译：正型抗蚀剂组合物包含（A）在用光化射线或辐射照射时能够产生磺酸，双（烷基磺酰基）酰胺或三（烷基磺酰基）次甲基的化合物，和（B）能够增加在碱中的溶解度的树脂显影剂具有特定重复单元的酸的作用，以及使用其的图案形成方法。

72. 发明授权

US07105275B2 Positive resist composition and method of forming pattern using the same 有权
标题翻译：正型抗蚀剂组合物和使用其形成图案的方法
公开(公告)号：US07105275B2
公开(公告)日：2006-09-12
申请号：US10870220
申请日：2004-06-18
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition comprising (A) a resin that increases solubility in a developing solution by the action of an acid and comprises (a) a repeating unit containing a group that is decomposed by the action of an acid to become alkali-soluble, (b) a repeating unit containing an alicyclic lactone structure, (c) a repeating unit containing an alicyclic structure substituted with a hydroxy group and (d) a methacrylic acid repeating unit, wherein an amount of the methacrylic acid repeating unit is from 5 to 18% by mole based on the total repeating units of the resin, and (B) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）通过酸的作用增加在显影液中的溶解度的树脂，并且包含（a）含有通过酸作用而分解成碱溶性的基团的重复单元（ b）含有脂环族内酯结构的重复单元，（c）含有被羟基取代的脂环结构的重复单元和（d）甲基丙烯酸重复单元，其中甲基丙烯酸重复单元的量为5〜18 基于树脂的总重复单元的摩尔％，和（B）在光化射线或辐射照射时产生酸的化合物。

73. 发明申请

US20060046190A1 Positive resist composition and pattern forming method utilizing the same 有权
标题翻译：正型抗蚀剂组合物和利用其的图案形成方法
公开(公告)号：US20060046190A1
公开(公告)日：2006-03-02
申请号：US11210672
申请日：2005-08-25
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： G03C1/76
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition comprising: a resin that comprises a repeating unit including a specific norbornane lactone structure and a repeating unit including a specific alicyclic hydrocarbon structure, and that increases a solubility of the resin in an alkaline developer by an action of an acid; and a compound that generates an acid upon treatment with one of an actinic ray and radiation, and a pattern forming method utilizing the same.
摘要翻译：一种正型抗蚀剂组合物，其包含：包含特定降冰片烷内酯结构的重复单元和包含特定脂环族烃结构的重复单元的树脂，并且通过酸的作用增加树脂在碱性显影剂中的溶解度; 以及在用光化学射线和辐射之一处理时产生酸的化合物，以及利用该化合物的图案形成方法。

74. 发明授权

US06927009B2 Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06927009B2
公开(公告)日：2005-08-09
申请号：US10150967
申请日：2002-05-21
申请人： Kunihiko Kodama , Kenichiro Sato , Toru Fujimori
发明人： Kunihiko Kodama , Kenichiro Sato , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0397 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/123
摘要： A positive photosensitive composition comprising (A) a specific acid generator that generates an acid upon irradiation of an actinic ray or radiation, and (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution.
摘要翻译：一种正型光敏组合物，其包含（A）在光化射线或辐射照射时产生酸的特定酸产生剂，和（B）具有单环或多环脂环烃结构并通过酸作用分解的树脂至增加在碱性显影液中的溶解度。

75. 发明申请

US20050064326A1 Positive resist composition and pattern-forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US20050064326A1
公开(公告)日：2005-03-24
申请号：US10941822
申请日：2004-09-16
申请人： Shoichiro Yasunami , Kenji Wada , Kunihiko Kodama , Kenichiro Sato
发明人： Shoichiro Yasunami , Kenji Wada , Kunihiko Kodama , Kenichiro Sato
IPC分类号： G03F7/004 , G03C1/76 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/126
摘要： A positive resist composition includes: (A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid represented by the following formula (I) upon irradiation with one of an actinic ray and a radiation; and (C1) at least one of an amine compound having at least an aliphatic hydroxyl group in a molecule and an amine compound having at least an ether bond in a molecule: A1A2—SO3H)n (I) wherein A1 represents an n-valent linking group, A2 represents a single bond or a divalent aliphatic group, and A2's each may be the same or different, provided that at least one group represented by A1 or A2 contains a fluorine atom, and n represents an integer of from 2 to 4.
摘要翻译：正型抗蚀剂组合物包括：（A）能够通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）在用光化学射线和辐射之一照射时能够产生由下式（I）表示的磺酸的化合物; 和（C1）分子中至少具有脂肪族羟基的胺化合物和分子中至少具有醚键的胺化合物中的至少一种：A1和Parenopenst; A2-SO3H）n（I）其中A1表示n 连接基团，A2表示单键或二价脂族基团，并且A2可以相同或不同，条件是由A1或A2表示的至少一个基团含有氟原子，n表示2的整数到4。

76. 发明授权

US06858370B2 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06858370B2
公开(公告)日：2005-02-22
申请号：US10079414
申请日：2002-02-22
申请人： Kunihiko Kodama , Kenichiro Sato
发明人： Kunihiko Kodama , Kenichiro Sato
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0048 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive photosensitive composition comprises: (A) an acid generator capable of generating an acid upon irradiation with one of an actinic ray and a radiation; and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkali developer, wherein the acid generator (A) comprises at least two compounds of a sulfonium salt compound not having an aromatic ring, a triarylsulfonium salt compound, and a compound having a phenacylsulfonium salt structure.
摘要翻译：正型光敏组合物包括：（A）能够在用光化射线和辐射之一照射时产生酸的酸发生剂; 和（B）具有单环或多环脂环族烃结构并且能够通过酸的作用分解以增加在碱性显影剂中的溶解度的树脂，其中酸产生剂（A）包含至少两种锍盐化合物不具有芳香环，三芳基锍盐化合物和具有苯甲酰甲基锍盐结构的化合物。

77. 发明授权

US06818377B2 Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US06818377B2
公开(公告)日：2004-11-16
申请号：US10176067
申请日：2002-06-21
申请人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
发明人： Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A positive photosensitive composition comprising (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B-1) a resin having a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and containing at least one structure represented by formulae (I), (II) and (III) as described in the specification or (B-2) a resin having at least one monovalent polyalicyclic group represented by formula (Ib) as described in the specification and a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution. The positive photosensitive composition containing the resin according to the present invention has high transmittance to far ultraviolet light particularly having a wavelength of 220 nm or less and exhibits good dry etching resistance. Further, the positive photosensitive composition exhibits high sensitivity, good resolution and good pattern profile when far ultraviolet light having a wavelength of 250 nm or less, particularly 220 nm or less (especially an ArF excimer laser beam) is employed as an exposure light source, and thus it can be effectively employed for the formation of fine pattern necessary for the production of semiconductor elements.
摘要翻译：一种正型光敏组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物，和（B-1）具有通过酸作用分解的基团的树脂，以增加在碱性显影中的溶解度溶液，并且如说明书中所述含有至少一种由式（I），（II）和（III）表示的结构，或（B-2）具有至少一个由式（Ib）表示的一价多元脂环基团的树脂，如说明书和通过酸的作用而分解以增加在碱性显影液中的溶解度的基团。含有本发明树脂的正型感光性组合物对于远紫外线具有高透射率，特别是波长为220nm以下，表现出良好的耐干蚀刻性。此外，当使用波长为250nm以下，特别是220nm以下的远紫外光（特别是ArF准分子激光）时，正型感光性组合物显示出高灵敏度，良好的分辨率和良好的图案分布，作为曝光光源，因此可以有效地用于形成半导体元件的制造所需的精细图案。

78. 发明授权

US06794108B1 Positive photoresist composition for far ultraviolet exposure 失效
标题翻译：用于远紫外线曝光的正光致抗蚀剂组合物
公开(公告)号：US06794108B1
公开(公告)日：2004-09-21
申请号：US09541597
申请日：2000-04-03
申请人： Kenichiro Sato , Yutaka Adegawa , Toshiaki Aoai , Kunihiko Kodama
发明人： Kenichiro Sato , Yutaka Adegawa , Toshiaki Aoai , Kunihiko Kodama
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0395 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a positive photoresist composition for far ultraviolet exposure, which comprises a polymer having at least one of a repeating unit represented by formula (Ia) and a repeating unit represented by formula (Ib), and a repeating unit represented by formula (II), and having a group capable of decomposing by the action of an acid: wherein R1 and R2 each represents hydrogen atom, a cyano group, a hydroxyl group, —COOH, —COOR5, —CO—NH—R6, —CO—NH—SO2—R6, an alkyl group, an alkoxy group, a cyclic hydrocarbon group or a —Y group, X represents —O—, —S—, —NH—, —NHSO2— or —NHSO2NH—, A represents a single bond or a divalent linking group, Z2 represents —O— or —N(R3)—, R11 and R12 each represents a hydrogen atom, a cyano group, a halogen atom or an alkyl group, Z1 represents an atomic group necessary for forming an alicyclic structure which contains two bonded carbon atoms (C—C), and Y, R3, R5 and R6 are as defined in the specification.
摘要翻译：本发明提供一种用于远紫外线曝光的正性光致抗蚀剂组合物，其包含具有式（Ia）表示的重复单元和式（Ib）表示的重复单元中的至少一种的聚合物和由式（Ib）表示的重复单元， II），并且具有能够通过酸的作用分解的基团：其中R 1和R 2各自表示氢原子，氰基，羟基，-COOH，-COOR 5，-CO-NH-R 6，-CO- NH-SO 2 -R 6，烷基，烷氧基，环状烃基或-Y基，X表示-O - ， - S - ， - NH-，-NHSO 2 - 或-NHSO 2 NH-，A表示单键或二价连接基团，Z 2表示-O-或-N（R 3） - ，R 11和R 12各自表示氢原子，氰基，卤素原子或烷基，Z 1表示形成含有两个键合碳原子（CC）的脂环结构，Y，R3，R5和R6如说明书中所定义。

79. 发明授权

US06787283B1 Positive photoresist composition for far ultraviolet exposure 有权
标题翻译：用于远紫外线曝光的正光致抗蚀剂组合物
公开(公告)号：US06787283B1
公开(公告)日：2004-09-07
申请号：US09620708
申请日：2000-07-20
申请人： Toshiaki Aoai , Kenichiro Sato , Kunihiko Kodama
发明人： Toshiaki Aoai , Kenichiro Sato , Kunihiko Kodama
IPC分类号： G03F7039
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： Disclosed is a positive photoresist composition comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in alkali, containing a repeating unit having a group represented by the following formula (I): wherein R1 represents hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, which may have a substituent, R1 to R7, which may be the same or different, each represents hydrogen atom, an alkyl group which may have a substituent, a cycloalkyl group which may have a substituent or an alkenyl group which may have a substituent, provided that at least one of R6 and R7 is a group exclusive of hydrogen atom and R6 and R7 may combine to form a ring, and m and n each independently represents 0 or 1, provided that m and n are not 0 at the same time. The positive photoresist composition can further comprise a fluorine-containing and/or silicon-containing surfactant and at least one first solvent selected from propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate and 3-ethoxypropionate.
摘要翻译：公开了一种正型光致抗蚀剂组合物，其包含（A）在用光化射线或辐射照射时能够产生酸的化合物和（B）能够在酸的作用下分解以增加在碱中的溶解度的树脂，其含有重复单元具有由下式（I）表示的基团：其中R 1表示氢原子或可具有取代基的具有1至4个碳原子的烷基，R 1至R 7可以相同或不同，各自表示氢原子，可以具有取代基的烷基，可以具有取代基的环烷基或可以具有取代基的烯基，条件是R 6和R 7中的至少一个是不是氢原子的基团，并且R 6和R 7可以组合形成环，m和n各自独立地表示0或1，条件是m和n不同时为0。正性光致抗蚀剂组合物可以进一步包括含氟和/或含硅表面活性剂和至少一种选自丙二醇单甲醚乙酸酯，丙二醇单甲醚丙酸酯，3-甲氧基丙酸甲酯，3-甲氧基丙酸乙酯，甲基3 乙氧基丙酸酯和3-乙氧基丙酸酯。

80. 发明授权

US06787282B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US06787282B2
公开(公告)日：2004-09-07
申请号：US10253484
申请日：2002-09-25
申请人： Kenichiro Sato
发明人： Kenichiro Sato
IPC分类号： G03F7004
CPC分类号： G03F7/0397 , Y10S430/111
摘要： A positive resist composition comprising (A) a resin, which increases a solubility rate in an alkali developing solution by the action of an acid, containing a repeating unit represented by formula (I) defined in the specification, a repeating unit represented by formula (II) defined in the specification and a repeating unit represented by formula (III) defined in the specification, and (B) a compound that generates an acid upon irradiation of an actinic ray or radiation.
摘要翻译：一种正型抗蚀剂组合物，其包含（A）树脂，其通过酸的作用增加碱显影液中的溶解度，该酸包含由说明书中定义的式（I）表示的重复单元，由式（ II）和由说明书中定义的式（III）表示的重复单元，和（B）在光化射线或辐射照射时产生酸的化合物。

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