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    • 79. 发明申请
    • Ball screw lubricative sealing device
    • 滚珠丝杠润滑密封装置
    • US20060088430A1
    • 2006-04-27
    • US11254471
    • 2005-10-20
    • Hiroki SakuraiYoshimi Iwasaki
    • Hiroki SakuraiYoshimi Iwasaki
    • F04B39/00
    • F16H57/0497F16H25/2204F16H25/2418Y10T74/18744
    • The invention provides a ball screw lubricative sealing device having a simplified lubrication mechanism. It is attachable to an installed standard ball screw nut, capable of retaining larger amount of lubricant and long supply of lubricant to the contacting screw parts, and further includes a sealing function. It includes: generally cylindrical case members having attachment part to be attached to both ends of a screw nut, respectively; plural thin seal plates made of lubricating oil impregnated felt-like fiber material which is a three-dimensionally crosslinked plastic fiber and resilient rubber members, and having a hole each and fitted inside said case member in such a state that they circumferentially overlap with each other, the hole having a shape corresponding to a lateral cross-sectional shape of a screw groove of ball screw shaft; and a plastic wiper fitted with a space from the thin seal plates inside each of the case member.
    • 本发明提供一种具有简化的润滑机构的滚珠丝杠润滑密封装置。 可附接到安装的标准滚珠丝杠螺母上,能够保持较大量的润滑剂和长时间的润滑剂供应到接触螺丝部件,并且还包括密封功能。 它包括:一般为圆柱形的壳体,其分别具有附接到螺母的两端的连接部分; 由润滑油浸渍的毡状纤维材料制成的多个薄密封板,其为三维交联的塑料纤维和弹性橡胶构件,并且在其彼此周向重叠的状态下具有各自并且装配在所述壳体构件内的孔 所述孔具有与滚珠丝杠轴的螺纹槽的横截面形状对应的形状; 以及塑料擦拭器,其在每个壳体内部均具有从薄密封板的空间。
    • 80. 发明授权
    • Optical apparatus for measuring profiles of a wafer
    • 用于测量晶片轮廓的光学装置
    • US5995226A
    • 1999-11-30
    • US93219
    • 1998-06-08
    • Kohzo AbeNobuaki Iguchi
    • Kohzo AbeNobuaki Iguchi
    • G01B11/24G01B11/245G01B11/30H01L21/66G01B9/02
    • G01B11/306H01L22/12
    • A pair of optical profile measuring systems 10, 20 are provided at positions faced to both sides of a wafer 1 vertically supported at its edge. Each system 10, 20 includes a light emitter 11, 21 for discharging a measuring light beam 12, 22, a collimator lens 14, 24 for rectifying the light beam 12, 22 into a collimated beam, an optical flat 15, 25 for transmitting the collimated light beam 12, 22, a light detector 16, 26 receiving the light beams 12, 22 reflected on a surface of the wafer 1 and on a referential plane of the optical flat 15, 25 through the collimator lens 14, 24 and a computer 17, 27 for processing interference fringes which occur between the surface of the wafer 1 and the referential plane of the optical flat 15, 25. Profiles of main and back surfaces of the wafer as well as its thickness variation are easily measured utilizing light interference fringes corresponding to both sides of a wafer.
    • 一对光学轮廓测量系统10,20设置在面向其边缘处垂直支撑的晶片1的两侧的位置处。 每个系统10,20包括用于排出测量光束12,22的光发射器11,21,用于将光束12,22整流为准直光束的准直透镜14,24,用于发射光束的光学平面15,25 准直光束12,22,接收在晶片1的表面上反射的光束12,22的光检测器16,26,以及通过准直透镜14,24的光学平面15,25的参考平面和计算机 用于处理在晶片1的表面和光学平面15,25的参考平面之间发生的干涉条纹。晶片的主表面和背面的轮廓以及其厚度变化可以利用光干涉条纹 对应于晶片的两侧。