会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 66. 发明申请
    • Detection device and particle beam device having a detection device
    • 具有检测装置的检测装置和粒子束装置
    • US20110220793A1
    • 2011-09-15
    • US12925704
    • 2010-10-27
    • Christian ThomasLucian Stefan
    • Christian ThomasLucian Stefan
    • H01J37/26
    • H01J37/244G01N23/2254G01N2223/612H01J37/20H01J37/226H01J37/228H01J2237/2445H01J2237/2808
    • A detection device and a particle beam device having a detection device ensure a good efficiency in detecting interaction particles and electromagnetic radiation. The detection device has a detector for detecting electromagnetic radiation and/or interaction particles and a filter element through which the electromagnetic radiation is transmitted. The filter element prevents the interaction particles from striking the detector such that the filter element is situated to move between a first position and a second position, the filter element in the first position being situated in relation to the detector in such a way that the filter element prevents the interaction particles from striking the detector. The filter element in the second position is situated in relation to the detector in such a way that the filter element allows the interaction particles to strike the detector. As an alternative, the filter element may be an object holder.
    • 具有检测装置的检测装置和粒子束装置确保检测相互作用粒子和电磁辐射的良好效率。 检测装置具有用于检测电磁辐射和/或相互作用颗粒的检测器和通过其传送电磁辐射的过滤元件。 过滤器元件防止相互作用的颗粒撞击检测器,使得过滤元件位于第一位置和第二位置之间,第一位置中的过滤元件相对于检测器位于与检测器相关的位置,使得过滤器 元件防止相互作用的颗粒撞击检测器。 处于第二位置的过滤元件以与检测器相关的方式定位,使得过滤元件允许相互作用的颗粒撞击检测器。 作为替代,过滤元件可以是物体保持器。
    • 67. 发明授权
    • Sample inspection apparatus, sample inspection method and sample inspection system
    • 样品检验仪器,样品检验方法和样品检测系统
    • US07923700B2
    • 2011-04-12
    • US11960267
    • 2007-12-19
    • Hidetoshi Nishiyama
    • Hidetoshi Nishiyama
    • H01J37/20
    • G01N23/2251H01J37/20H01J37/228H01J37/256H01J37/28H01J2237/206H01J2237/208H01J2237/2608H01J2237/2808
    • Sample inspection apparatus, sample inspection method, and sample inspection system are offered which can give a stimulus to a sample held on a film when the sample is inspected by irradiating it with a primary beam (e.g., an electron beam or other charged-particle beam) via the film. The apparatus has the film, a vacuum chamber, primary beam irradiation column, signal detector, and a controller for controlling the operations of the beam irradiation column and signal detector. The sample is held on a first surface of the film opened to permit access to the film. The vacuum chamber reduces the pressure of the ambient in contact with a second surface of the film. The irradiation column irradiates the sample with the primary beam via the film from the second surface side. The detector detects a secondary signal produced from the sample in response to the irradiation.
    • 提供样品检查装置,样品检查方法和样品检查系统,其可以通过用初级束(例如电子束或其他带电粒子束)照射样品来检查样品时对保持在膜上的样品的刺激 )通过电影。 该装置具有膜,真空室,主光束照射柱,信号检测器和用于控制光束照射柱和信号检测器的操作的控制器。 样品被保持在薄膜的第一表面上,以允许接近薄膜。 真空室减小与膜的第二表面接触的环境的压力。 照射列从第二表面侧通过膜从主光束照射样品。 检测器响应于照射而检测从样品产生的二次信号。
    • 68. 发明授权
    • Particle-optical apparatus for simultaneous observing a sample with particles and photons
    • 用于同时观察具有颗粒和光子的样品的粒子光学装置
    • US07718979B2
    • 2010-05-18
    • US12027245
    • 2008-02-06
    • William Ralph Knowles
    • William Ralph Knowles
    • A61N5/00
    • H01J37/228H01J37/244H01J37/256H01J37/28H01J2237/188H01J2237/2608H01J2237/2808
    • A particle-optical apparatus, such as an ESEM®, for simultaneous observing a sample with particles and photons. A pressure limiting aperture (PLA) is placed in a diaphragm between the objective lens of the ESEM® and the sample position. The distance between the sample position and the aperture is sufficiently small to allow a large collection angle of the photons through this aperture. A mirror is placed between the diaphragm and the objective lens. Due to the large collection angle for photons a large NA is achieved. The small distance between sample position and aperture also result in less scattering of electrons than occurs in ESEM's where a mirror is placed between aperture and sample position, as the electrons have to travel through only a limited length in a high pressure area. Embodiments describe combinations where e.g. an immersion lens is used.
    • 用于同时观察具有颗粒和光子的样品的颗粒光学装置,例如ESEM。 压力限制孔(PLA)放置在ESEM®的物镜和样品位置之间的隔膜中。 样品位置和孔径之间的距离足够小,以允许光子通过该孔的大的收集角。 镜片放置在隔膜和物镜之间。 由于光子的收集角度大,所以实现了大的NA。 样品位置和孔径之间的小距离也导致电子散射比在孔径和样品位置之间放置镜子的ESEM中发生的少,因为电子必须在高压区域中仅通过有限的长度行进。 实施例描述了例如 使用浸没透镜。