会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 65. 发明公开
    • METHOD AND APPARATUS FOR MEASURING RADIATION DOSE DISTRIBUTION
    • 方法和设备测量辐射密度分布
    • EP0855015A1
    • 1998-07-29
    • EP96934099.0
    • 1996-10-04
    • PHOTOELECTRON CORPORATION
    • SLISKI, Alan, P.DALTERIO, MichaelSMITH, Donald, O.
    • G01T7G01T1A61N5
    • G01T1/169A61N5/1048
    • This invention is a phantom apparatus (10) for measuring the radiation dose distribution produced by a brachy-therapy device used to treat a localized area with radiation. The brachy-therapy device includes an insertable probe (24) capable of producing predefined radiation dose geometries about a predefined point. The phantom apparatus (10) includes a tank (12) containing a medium having a radiological equivalent characteristic of the localized area to be treated. The phantom apparatus (10) also includes a radiation sensor (32) for measuring the radiation dose and a positioning system for moving the probe (24) with respect to the radiation sensor (32). The radiation sensor (32) is also coupled to a positioning system (50) to orient the sensor (32) for optimal dose measurements. The phantom apparatus (10) includes a control system (160) that coordinates the movements of the probe (24) and the radiation sensor (32) to avoid a collision. The control system (160) moves the probe (24) along a predefined path around radiation sensor (32) and records the dose at predefined points along the path. In order to reduce the settling time of the sensor (32), the path is selected to coincide with the isodose contours of the radiation dose distribution of the probe (24).
    • 69. 发明专利
    • 金屬體射源校正假體及其校正方法 METAL VOLUME SOURCE CALIBRATION PHANTOM AND CALIBRATING METHOD THEREOF
    • 金属体射源校正假体及其校正方法 METAL VOLUME SOURCE CALIBRATION PHANTOM AND CALIBRATING METHOD THEREOF
    • TW201200895A
    • 2012-01-01
    • TW099120752
    • 2010-06-25
    • 行政院原子能委員會核能研究所
    • 葉俊賢袁明程
    • G01T
    • G01T1/167G01T1/169
    • 一種金屬體射源校正假體包括:一容器;複數種金屬板體,其係放置於該容器內,以及至少一射源板體,其係分別設置於相鄰之金屬板體間,每一個射源板體具有複數個射源;藉由置入不同數量的複數種金屬板體於該容器內,以得到複數種密度之校正假體。此外,本發明更提供一種金屬體射源校正假體校正方法,藉由置入不同數量的複數種金屬板體與至少一射源板體於容器內,得到該射源之複數種密度之校正假體,並利用一廢棄物活度監測器分別偵測關於該複數種密度之校正假體之活度,進而可得到密度與計測效率關係。
    • 一种金属体射源校正假体包括:一容器;复数种金属板体,其系放置于该容器内,以及至少一射源板体,其系分别设置于相邻之金属板体间,每一个射源板体具有复数个射源;借由置入不同数量的复数种金属板体于该容器内,以得到复数种密度之校正假体。此外,本发明更提供一种金属体射源校正假体校正方法,借由置入不同数量的复数种金属板体与至少一射源板体于容器内,得到该射源之复数种密度之校正假体,并利用一废弃物活度监测器分别侦测关于该复数种密度之校正假体之活度,进而可得到密度与计测效率关系。