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    • 61. 发明授权
    • Biaxial balance adjusting structure for medical stand apparatus
    • 医用支架设备的双轴平衡调整结构
    • US5480114A
    • 1996-01-02
    • US204456
    • 1994-03-02
    • Katsushige Nakamura
    • Katsushige Nakamura
    • A61B19/00A61B19/02F16M11/04F16M11/12G02B7/00F16L3/00
    • F16M11/42A61B90/50F16M11/126F16M11/18F16M11/2064F16M11/2092F16M11/24G02B7/001A61B90/20F16M2200/044F16M2200/068
    • Disclosed is a biaxial balance adjusting structure for a medical stand apparatus, containing a retaining link mechanism 4, utilizing a parallel link 2, supported on the pivot S of a frame 1; a medical optical device W.sub.1 and/or auxiliary devices W.sub.2, W.sub.3, disposed to one end portion of the retaining link mechanism and a counterweight disposed on the other end portion thereof relative to the pivot S; characterized in that the counterweight consists of a first counterweight W.sub.4 which can be moved in the horizontal direction and a second counterweight W.sub.5 which can be moved in the vertical direction, and that the balance adjusting structure employs a system for moving the first and second counterweights W.sub.4, W.sub.5 interlocking with each other to be closer to or farther from the pivot S in the respective directions. Thus, balance adjustment in accordance with the weight change on the operating microscope side can be facilitated.
    • 公开了一种用于医疗架设备的双轴平衡调节结构,其包含支撑在框架1的枢轴S上的平行连杆2的保持连杆机构4; 设置在保持连杆机构的一个端部的配对装置W1和/或辅助装置W2,W3相对于枢轴S配置在另一端部的配重; 其特征在于,所述配重由能够在水平方向上移动的第一配重W4和能够在垂直方向上移动的第二配重W5构成,所述平衡调整结构采用用于使所述第一配重W4 ,彼此互锁的W5在相应方向上更靠近或远离枢轴S。 因此,能够容易地根据显微镜侧的重量变化进行平衡调整。
    • 62. 发明授权
    • Two-stage detection noncontact positioning apparatus having a first
light detector with a central slit
    • 具有具有中央狭缝的第一光检测器的两级检测非接触定位装置
    • US5432330A
    • 1995-07-11
    • US242872
    • 1994-05-16
    • Katsushige Nakamura
    • Katsushige Nakamura
    • G01B11/00G01B11/02G01B11/06G01C3/06G01S7/481G01S17/46G01J1/20
    • G01S17/48G01B11/026G01B11/0608G01S7/4811
    • A two-stage detection noncontact positioning apparatus comprises a light position-detecting mechanism 3 which includes a first light position detector 15 having a slit 17 at a central location corresponding to an optical axis K.sub.4, and a light position detector 16 for receiving a measuring beam S.sub.9 having passed through the slit 17. The first light position detector 15 can be switchably operated such that while the second light position detector 16 receives the measuring beam, the first light position detector 15 is made inoperative not to detect light. The apparatus also includes an optical mechanism 2 having focusing lenses 13 and 14 provided in a manner corresponding to the first and second light position detectors 15 and 16, respectively. As the measuring beam, a semiconductor laser beam, a He-Ne laser beam or the like is suitably employed, which enables the two-stage detection noncontact positioning apparatus to perform highly accurate positioning without being adversely affected by scattered lights.
    • 两级检测非接触定位装置包括光位置检测机构3,其包括在对应于光轴K4的中心位置处具有狭缝17的第一光位置检测器15和用于接收测量光束的光位置检测器16 S9通过狭缝17.第一光位置检测器15可以可切换地操作,使得当第二光位置检测器16接收测量光束时,使第一光位置检测器15不能检测光。 该装置还包括光学机构2,其具有分别以对应于第一和第二光位置检测器15和16的方式设置的聚焦透镜13和14。 作为测量光束,适当地采用半导体激光束,He-Ne激光束等,这使得两级检测非接触式定位装置能够在不受散射光的不利影响的情况下执行高精度定位。