会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 61. 发明授权
    • Methods for producing and using silk nanofiber nerve conduits
    • 丝绸纳米纤维神经导管的生产和使用方法
    • US09072592B2
    • 2015-07-07
    • US13389787
    • 2010-08-11
    • Young Hwan ParkChang Seok KiHyun Jeung KimSook Young Park
    • Young Hwan ParkChang Seok KiHyun Jeung KimSook Young Park
    • D01D5/06A61F2/04D01D1/02D01D1/06D01D5/00D01F4/02A61L27/36A61L27/56
    • A61F2/04A61L27/3604A61L27/56A61L2400/12A61L2430/32D01D1/02D01D1/06D01D5/003D01D5/0046D01D5/0076D01F4/02
    • The present invention relates to a silk nanofiber nerve conduit characterized in that fibroin nanofibers having a diameter of 200 to 400 nm, originated from silk fiber, are stacked layer upon layer to form a porous conduit-shape; and a method for producing thereof, more specifically, to a method for producing a silk nanofiber nerve conduit comprising: (Step 1) preparing a fibrous spinning solution; (Step 2) producing a silk nanofiber of conduit-shape by electrospinning the fibrous spinning solution prepared in step 1 into the cylindrical collecting part coated with polyethyleneoxide; and (Step 3) separating a silk nanofiber of conduit-shape produced in step 2 from the collecting part. The silk nanofiber nerve conduit of the present invention has excellent biocompatibility; allows the body fluid to be exchanged inter in and out of conduit through pores of the conduit, as well; has a proper elasticity, tensile strength, and tear strength. Due to these properties, the silk nanofiber nerve conduit of the present invention helps the regeneration of the nerve injury to recover a motor skill and a sensory function, and thus shows an excellent effect of nerve regeneration. Therefore, the silk nanofiber nerve conduit of the present invention can be used in treating a nerve injury instead of an existing synthetic polymeric nerve conduit.
    • 本发明涉及一种丝绸纳米纤维神经管,其特征在于,由丝纤维形成的直径为200〜400nm的丝心蛋白纳米纤维层叠在层上,形成多孔导管状; 及其制造方法,更具体地说,涉及一种丝素纳米纤维神经导管的制造方法,其特征在于,包括:(步骤1)制备纤维纺丝溶液; (步骤2)通过将步骤1中制备的纤维纺丝溶液静电纺丝到涂覆有聚环氧乙烷的圆柱形收集部分中来生产导管形状的丝素纳米纤维; 和(步骤3)将在步骤2中产生的导管形状的丝纳米纤维与收集部分分离。 本发明的丝素纳米纤维神经管具有优异的生物相容性; 允许体液通过导管的孔隙进入和导出; 具有适当的弹性,拉伸强度和撕裂强度。 由于这些特性,本发明的丝纳米纤维神经管有助于神经损伤的再生以恢复运动技能和感觉功能,因此显示出优异的神经再生效果。 因此,本发明的丝纳米纤维神经管可用于治疗神经损伤而不是现有的合成聚合物神经导管。
    • 62. 发明授权
    • Semiconductor device and method for manufacturing the same
    • 半导体装置及其制造方法
    • US08735940B2
    • 2014-05-27
    • US12965640
    • 2010-12-10
    • Woo Chul JeonKi Yeol ParkYoung Hwan ParkJung Hee Lee
    • Woo Chul JeonKi Yeol ParkYoung Hwan ParkJung Hee Lee
    • H01L29/66
    • H01L29/7786H01L29/2003H01L29/66462
    • There are provided a semiconductor device and a method for manufacturing the same. The semiconductor device according to the present invention includes a base substrate; a semiconductor layer that includes a receiving groove and a protrusion part formed on the base substrate, a first carrier injection layer and at least two insulating layers formed to traverse the first carrier injection layer formed in the semiconductor layer, and a second carrier injection layer spaced apart from the first carrier injection layer formed on the protrusion part; a source electrode and a drain electrode that are disposed to be spaced apart from each other on the semiconductor layer; and a gate electrode that is insulated from the source electrode and the drain electrode and has a recess part recessed into the receiving groove, wherein the lowest end portion of the receiving groove contacts the uppermost layer of the first carrier injection layer and the insulating pattern disposed at the innermost side of the semiconductor layer among the insulating patterns traverses the entire layer forming the first carrier injection layer and is disposed at the outer side of both side end portions in the thickness direction of the receiving groove.
    • 提供了一种半导体器件及其制造方法。 根据本发明的半导体器件包括:基底; 半导体层,其包括形成在所述基底基板上的接收槽和突出部,第一载流子注入层和形成为穿过形成在所述半导体层中的所述第一载流子注入层的至少两个绝缘层,以及间隔开的第二载流子注入层 除了形成在突出部上的第一载流子注入层之外; 源电极和漏电极,其设置成在半导体层上彼此间隔开; 以及与源电极和漏电极绝缘并且具有凹入到接收槽中的凹部的栅电极,其中接收槽的最低端部接触第一载流子注入层的最上层,并且布置的绝缘图案 在绝缘图案中的半导体层的最内侧穿过形成第一载流子注入层的整个层,并且设置在接收槽的厚度方向上的两个侧端部的外侧。
    • 63. 发明授权
    • Semiconductor device and method of manufacturing the same
    • 半导体装置及其制造方法
    • US08525231B2
    • 2013-09-03
    • US12965649
    • 2010-12-10
    • Ki Yeol ParkWoo Chul JeonYoung Hwan ParkJung Hee Lee
    • Ki Yeol ParkWoo Chul JeonYoung Hwan ParkJung Hee Lee
    • H01L29/66
    • H01L29/7786H01L29/0649H01L29/2003H01L29/365H01L29/4236H01L29/66462H01L29/78681
    • There is provided a semiconductor device and a method of manufacturing the same. The semiconductor device includes a base substrate; a semiconductor layer having a receiving groove, a protrusion part, a first carrier injection layer, at least two insulating patterns, and a second carrier injection layer provided on the base substrate, the insulating patterns being disposed to traverse the first carrier injection layer and the second carrier injection layer being spaced apart from the first carrier injection layer and disposed on a lower portion of the protrusion part; a source electrode and a drain electrode disposed to be spaced apart from each other on the semiconductor layer; and a gate electrode insulated from the source electrode and the drain electrode and having a recess part recessed into the receiving groove, wherein a lowest portion of the receiving groove contacts an uppermost layer of the first carrier injection layer or is disposed above the uppermost layer thereof, and an insulating pattern, disposed at an innermost portion of the semiconductor layer among the insulating patterns, traverses the first carrier injection layer and is disposed at the outside of both sides of the receiving groove in a thickness direction thereof.
    • 提供了一种半导体器件及其制造方法。 半导体器件包括:基底; 具有接收槽的半导体层,突起部分,第一载流子注入层,至少两个绝缘图案和设置在基底基板上的第二载流子注入层,绝缘图案设置成穿过第一载流子注入层和 第二载体注入层与第一载体注入层间隔开并设置在突出部分的下部; 源电极和漏电极,设置成在半导体层上彼此间隔开; 以及与源电极和漏电极绝缘的栅电极,并且具有凹入到所述接收槽中的凹部,其中所述接收槽的最下部接触所述第一载流子注入层的最上层,或者设置在所述第一载流子注入层的最上层 并且绝缘图案设置在绝缘图案中的半导体层的最内部,穿过第一载流子注入层,并且沿着其厚度方向设置在容纳槽的两侧的外侧。